Au-TiB<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>-<Emphasis Type="Italic">n</Emphasis>-6<Emphasis Type="Italic">H</Emphasis>-SiC Schottky barrier diodes: Specific features of charge transport in rectifying and nonrectifying contacts

Mechanism of charge transport in a diode of a silicon carbide’s Schottky barrier formed by a quasi-amorphous interstitial phase TiB _x on the surface of n-6H-SiC (0001) single crystals with an uncompensated donor (nitrogen) concentration of ～10¹⁸ cm^?3 and dislocation density of ～(10⁶–10⁸) cm^?2 has been studied. It is demonstrated that, at temperatures T ? 400 K, the charge transport is governed by the tunneling current along dislocations intersecting the space charge region. At T > 400 K, the mechanism of charge transport changes to a thermionic mechanism with a barrier height of ～0.64 eV and ideality factor close to 1.3.     

Graphite/<Emphasis Type="Italic">p</Emphasis>-SiC Schottky Diodes Prepared by Transferring Drawn Graphite Films onto SiC

Graphite/p-SiC Schottky diodes are fabricated using the recently suggested technique of transferring drawn graphite films onto p-SiC single-crystal substrates. The current–voltage and capacitance–voltage characteristics are measured at different temperatures and at different frequencies of a small-signal AC signal, respectively. The temperature dependences of the potential-barrier height and of the series resistance of the graphite/p-SiC junctions are measured and analyzed. The dominant mechanisms of the charge–carrier transport through the diodes are determined. It is shown that the dominant mechanisms of the transport of charge carriers through the graphite/p-Si Schottky diodes at a forward bias are multi-step tunneling recombination and tunneling described by the Newman formula (at high bias voltages). At reverse biases, the dominant mechanisms of charge transport are the Frenkel–Poole emission and tunneling. It is shown that the graphite/p-SiC Schottky diodes can be used as detectors of ultraviolet radiation since they have the open-circuit voltage V_oc = 1.84 V and the short-circuit current density I_sc = 2.9 mA/cm² under illumination from a DRL 250-3 mercury–quartz lamp located 3 cm from the sample.     

Temperature dependences of the electrical parameters of anisotype NiO/CdTe heterojunctions

The I–V characteristics of NiO/CdTe heterostructures fabricated by reactive magnetron sputtering are measured at different temperatures. It is established that current transport through the NiO/CdTe heterojunction is mainly controlled via generation–recombination and tunneling under forward bias and via tunneling under reverse bias. The investigated heterostructures generate an open-circuit voltage of V _oc = 0.26 V and a short-circuit current density of I _sc = 58.7 μA/cm² at an illumination intensity of 80 mW/cm².     

Tunneling Current in Oppositely Connected Schottky Diodes Formed by Contacts between Degenerate <Emphasis Type="Italic">n</Emphasis>-GaN and a Metal

The nonlinear behavior of the I–V characteristics of symmetric contacts between a metal and degenerate n-GaN, which form oppositely connected Schottky diodes, is investigated at free-carrier densities from 1.5 × 10¹⁹ to 2.0 × 10²⁰ cm^–3 in GaN. It is demonstrated that, at an electron density of 2.0 × 10²⁰ cm^–3, the conductivity between metal (chromium) and GaN is implemented via electron tunneling and the resistivity of the Cr–GaN contact is 0.05 Ω mm. A method for determining the parameters of potential barriers from the I–V characteristics of symmetric opposite contacts is developed. The effect of pronounced nonuniformity of the current density and voltage distributions over the contact area at low contact resistivity is taken into account. The potential-barrier height for Cr–n⁺-GaN contacts is found to be 0.47 ± 0.04 eV.     

Characteristics of the Schottky barriers of two-terminal thin-film Al/nano-Si film/ITO structures

The temperature dependence of the Schottky-barrier height and series resistance of two-terminal thin-film Al/nano-Si film/ITO structures are determined from the current—voltage (I–V) characteristics in the temperature range of 20–150°C. It is found that the form of the I–V characteristic at all investigated temperatures can be described by a model of two Schottky diodes connected back-to-back. For these diodes, the general formula is obtained, which allows the construction of functions approximating experimental curves with high accuracy. Based on this formula, a computational model is built, which generalizes the theoretical data obtained by S.K. Cheung and N.W. Cheung widely used for analyzing the I–V characteristics of single Schottky diodes. A technique is developed for calculating the Schottky-barrier heights in a system of two Schottky diodes connected back-to-back, their ideality factors, and the series resistance of the system. It is established that the barrier heights in the investigated temperature range are ~1 eV. According to the temperature dependence of the barrier height, such large values result from the presence of a SiO _x (0 ≤ x ≤ 2) oxide layer at the nanoparticle boundaries. Charge carriers can overcome this layer by means of thermal excitation or tunneling. It is established that the intrinsic Schottky-barrier height of the Al/nc-Si film and nc-Si film/ITO junctions is ~0.1 eV. The activation dependences of the series resistance of the Al/nc-Si film/ITO structures and impedance spectra show that combined electric-charge transport related to ionic and electronic conductivity takes place in the structures under study. It is shown that the contribution of the electronic conductivity to the total transport process increases as the sample temperature is raised.     

Schottky-Barrier Model Nonlinear in Surface-State Concentration and Calculation of the <Emphasis Type="Italic">I–V</Emphasis> Characteristics of Diodes Based on SiC and Its Solid Solutions in the Composite Charge-Transport Model

A modified Schottky-barrier model, which is nonlinear in terms of the surface-state concentration and contains a local quasi-Fermi level at the interface induced by excess surface charge, is proposed. Such an approach makes it possible to explain the observed similarity of the I–V characteristics of diodes with the Schottky barrier M/(SiC)_1–x(AlN) _x and those of heterojunctions based on SiC and its solid solutions taking into account Φ_g ≈ Φ_B. The results of calculations of the Schottky-barrier heights are consistent with the experimental data obtained from measurements of the photocurrent for metals (M): Al, Ti, Cr, and Ni. The I–V characteristics in the composite–additive model of charge transport agree with the experimental data for the n-M/p-(SiC)_1–x(AlN) _x and n-6H-SiC/p-(SiC)_0.85(AlN)_0.15 systems.     

<Emphasis Type="Italic">C-V</Emphasis> and <Emphasis Type="Italic">I-V</Emphasis> characteristics of ultrathin-oxide MOS structures: Identification and analysis

For an NMOS structure with 3.7-nm-thick oxide, dynamic I-V characteristics are digitally measured by applying an upward and a downward gate-voltage ramp. An averaging procedure is employed to deduce the tunneling (active) current component and the quasi-static C-V characteristic (CVC). Analyzing the depletion segment of the CVC provides reliable values of the semiconductor doping level, the oxide capacitance and thickness, and the sign and density of oxide-fixed charge, as well as estimates of the dopant concentration in the poly-Si region. These data are used to identify the Ψ_s(V _g), V _i(V _g), and I _t(V _i) characteristics, where Ψ_s is the n-Si surface potential, V _i is the voltage drop across the oxide, V _g is the gate voltage, and I _t is the tunneling current; the gate-voltage range explored extends to prebreakdown fields (～13 MV cm^?1). The results are obtained without recourse to fitting parameters and without making any assumptions as to the energy spectrum of electrons tunneling from the n-Si deep-accumulation region through the oxide. It is believed that experimental I _t-V _i and Ψ_s-V _g characteristics will provide a basis for developing a theory of tunneling covering not only the degeneracy and size quantization of the electron gas in the semiconductor but also the nonclassical profile of the potential barrier to electron tunneling associated with the oxide-fixed charge.     

Structural and Electrical Properties of Ag/<Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-Si/Al Heterostructure Fabricated by Pulsed Laser Deposition Technique

We have investigated the structural and electrical characteristics of the Ag/n-TiO₂/p-Si/Al heterostructure. Thin films of pure TiO₂ were deposited on p-type silicon (100) by optimized pulsed laser ablation with a KrF-excimer laser in an oxygen-controlled environment. X-ray diffraction analysis showed the formation of crystalline TiO₂ film having a tetragonal texture with a strong (210) plane as the preferred direction. High purity aluminium and silver metals were deposited to obtain ohmic contacts on p-Si and n-TiO₂, respectively. The current–voltage (I–V) characteristics of the fabricated heterostructure were studied by using thermionic emission diffusion mechanism over the temperature range of 80–300 K. Parameters such as barrier height and ideality factor were derived from the measured I–V data of the heterostructure. The detailed analysis of I–V measurements revealed good rectifying behavior in the inhomogeneous Ag/n-TiO₂/p-Si(100)/Al heterostructure. The variations of barrier height and ideality factor with temperature and the non-linearity of the activation energy plot confirmed that barrier heights at the interface follow Gaussian distributions. The value of Richardson’s constant was found to be 6.73 × 10⁵ Am^?2 K^?2, which is of the order of the theoretical value 3.2 × 10⁵ Am^?2 K^?2. The capacitance–voltage (C–V) measurements of the heterostructure were investigated as a function of temperature. The frequency dependence (Mott–Schottky plot) of the C–V characteristics was also studied. These measurements indicate the occurrence of a built-in barrier and impurity concentration in TiO₂ film. The optical studies were also performed using a UV–Vis spectrophotometer. The optical band gap energy of TiO₂ films was found to be 3.60 eV.     

Electrical properties of isotype <Emphasis Type="Italic">N</Emphasis><Superscript>+</Superscript>-GaSb/n<Superscript>0</Superscript>-GaInAsSb/<Emphasis Type="Italic">N</Emphasis><Superscript>+</Superscript>-GaAlAsSb type-II heterojunctions

Band diagrams and current-voltage and capacitance-voltage characteristics of isotype N ⁺-GaSb/n⁰-GaInAsSb/N ⁺-GaAlAsSb heterostructures have been studied. Dark-current flow mechanisms have been analyzed. It is shown that a staggered type-II heterojunction can behave as a Schottky diode and its current-voltage characteristics exhibit rectifying properties over the entire temperature range 90–300 K. The thermionic-emission current predominates at high temperatures and low voltages. This current is due to thermal excitation of electrons from GaInAsSb to GaSb over the barrier at the heterointerface. A comparison of the relevant theoretical and experimental data confirmed that the tunneling charge transport mechanism plays the key role at low temperatures under both forward and reverse biases.     

Hopping conductivity and dielectric relaxation in Schottky barriers on GaN

A study of the current and capacitance dependences on the forward voltage in Au/n-GaN Schottky diodes, the sub-band optical absorption spectra, and the defect photoluminescence in n-GaN bulk crystals and thin layers is reported. It is shown that defect-assisted tunneling is the dominant transport mechanism for forward-biased Schottky contacts on n-GaN. The dependences of the current and capacitance on forward bias reflect the energy spectrum of defects in the band gap of n-GaN: the rise in the density of deep states responsible for yellow photoluminescence in GaN with increasing energy and the steep exponential tail of states with an Urbach energy of E _U = 50 meV near the conduction-band edge. A decrease in the frequency of electron hops near the Au/n-GaN interface results in a wide distribution of local dielectric relaxation times and in a dramatic transformation of the electric-field distribution in the space-charge region under forward biases.     

C60 Concentration Influence on MEH-PPV:C60 Bulk Heterojunction-Based Schottky Devices

We have investigated the effect of C60 concentration on the performance of poly[2-methoxy-5-(2′-ethylhexoxy-p-phenylene vinylene] (MEH-PPV):C60 blend-based Schottky barrier-based devices. Incorporation of C60 in MEH-PPV leads to a red shift and the reduction of intensity in MEH-PPV absorption spectra. The appearance of a C60 characteristic band in the Raman spectra of the composites indicates the presence of C60 in the blends. A FESEM study reveals that the addition of C60 significantly modifies the surface morphology of the blend films. However, higher concentrations (>?5 wt.%) results in agglomeration of C60 particles. Dark I–V measurements allow us to extract various diode parameters including barrier height, ideality factor, and saturation current. Profound variations have been observed in the dominant charge carrier transport mechanism for different C60 concentrations. A photoresponse study demonstrates the enhancement in the photocurrent with the increase in the C60 concentration up to 5 wt.%. Beyond this concentration, agglomeration impedes exciton dissociation and charge transport, which results in a decrease in the photocurrent. Finally, an impedance spectroscopy analysis has been extensively carried out to estimate the internal device parameters, such as junction resistance, capacitance and carrier lifetime. The correlation between these parameters and I–V curves has been established.     

X-ray conductivity of ZnSe single crystals

The experimental I–V and current–illuminance characteristics of the X-ray conductivity and X-ray luminescence of zinc-selenide single crystals feature a nonlinear shape. The performed theoretical analysis of the kinetics of the X-ray conductivity shows that even with the presence of shallow and deep traps for free charge carriers in a semiconductor sample, the integral characteristics of the X-ray conductivity (the current–illuminance and I–V dependences) should be linear. It is possible to assume that the nonlinearity experimentally obtained in the I–V and current–illuminance characteristics can be caused by features of the generation of free charge carriers upon X-ray irradiation, i.e., the generation of hundreds of thousands of free charge carriers of opposite sign in a local region with a diameter of <1 μm and Coulomb interaction between the free charge carriers of opposite signs.     

Conductivity of Ga<Subscript>2</Subscript>O<Subscript>3</Subscript>–GaAs Heterojunctions

The effect of annealing in argon at temperatures of T_an = 700–900°C on the I–V characteristics of metal–Ga₂O₃–GaAs structures is investigated. Samples are prepared by the thermal deposition of Ga₂O₃ powder onto GaAs wafers with a donor concentration of N _d = 2 × 10¹⁶ cm^–3. To measure theI–V characteristics, V/Ni metal electrodes are deposited: the upper electrode (gate) is formed on the Ga₂O₃ film through masks with an area of S _k = 1.04 × 10^–2 cm² and the lower electrode in the form of a continuous metallic film is deposited onto GaAs. After annealing in argon at T_an ≥ 700°C, the Ga₂O₃-n-GaAs structures acquire the properties of isotype n-heterojunctions. It is demonstrated that the conductivity of the structures at positive gate potentials is determined by the thermionic emission from GaAs to Ga₂O₃. Under negative biases, current growth with an increase in the voltage and temperature is caused by field-assisted thermal emission in gallium arsenide. In the range of high electric fields, electron phonon-assisted tunneling through the top of the potential barrier is dominant. High-temperature annealing does not change the electron density in the oxide film, but affects the energy density of surface states at the GaAs–Ga₂O₃ interface.     

Electrical activity of dislocations and point defects of deformation origin in Cd<Subscript>x</Subscript>Hg<Subscript>1−<Emphasis Type="Italic">x</Emphasis></Subscript>Te crystals

The generation of dislocations with even a relatively low density (N_dis≤10⁷cm^?2) leads to significant variations in the kinetic coefficients of Cd_xHg_1?xTe (x=0.20–0.21) crystals. In n-type crystals, a substantial decrease in electron mobility takes place along with a marked growth in electron concentration. For p-type crystals, the transition from the activation conductivity to the metal one is observed in the low-temperature range of 4.2–40 K, as is the alternating-sign behavior of the Hall coefficient R _H depending on temperature and magnetic-field strength. A dominant role in the observed modifications is played by electronic states of point defects formed during the dislocation motion rather than the dislocations themselves. The totality of the data can be explained in terms of the formation of connected channels of an opposite-type conductivity in the form of a three-dimensional dislocation network in the matrix of the main crystal.     

High-voltage (900 V) 4 <Emphasis Type="Italic">H</Emphasis>-SiC Schottky diodes with a boron-implanted guard <Emphasis Type="Italic">p-n</Emphasis> junction

High-voltage (900 V) 4H-SiC Schottky diodes terminated with a guard p-n junction were fabricated and studied. The guard p-n junction was formed by room-temperature boron implantation with subsequent high-temperature annealing. Due to transient enhanced boron diffusion during annealing, the depth of the guard p-n junction was equal to about 1.7 μm, which is larger by approximately 1 μm than the projected range of 11 B ions in 4H-SiC. The maximum reverse voltage of fabricated 4H-SiC Schottky diodes is found to be limited by avalanche breakdown of the planar p-n junction; the value of the breakdown voltage (910 V) is close to theoretical estimate in the case of the impurity concentration N = 2.5 × 10¹⁵ cm^?3 in the n-type layer, thickness of the n-type layer d = 12.5 μm, and depth of the p-n junction r _j = 1.7 μm. The on-state diode resistance (3.7 mΩ cm²) is controlled by the resistance of the epitaxial n-type layer. The recovery charge of about 1.3 nC is equal to the charge of majority charge carriers that are swept out of an epitaxial n-type layer under the effect of a reverse voltage.     

Heat- and radiation-resistant contacts to SiC made on the basis of quasi-amorphous ZrB<Subscript>2</Subscript> films

The radiation and thermal stability of the Schottky-barrier structures deposited by the magnetron sputtering of zirconium diboride onto the (0001) face of the Lely-grown n-6H(15R)SiC single crystals with the uncompensated-donor concentration of ～10¹⁸ cm^?3 was investigated by the methods of the I–V and C–V characteristics combined with the layer-by-layer Auger analysis. It is shown that the use of quasi-amorphous ZrB₂ films when manufacturing contacts on n-6H(15R)SiC leads to no changes in the Schottky-barrier characteristics during rapid thermal annealing to 800°C in the range of ⁶⁰Co γ-ray irradiation doses of 10³–10⁷ Gy.     

Diamond Diode Structures Based on Homoepitaxial Films

(m–i–p)-Structures with high-resistance epitaxial i-layers are fabricated on heavily doped p⁺-type substrates with platinum contacts. The structures are studied using several methods: optical and electron microscopy and luminescence, and electrophysical (C–V and I–V characteristics) methods and tested as detectors of ionizing radiation. It is shown that the (m–i–p)-structures are promising for development of several electronic devices (high-voltage diodes, detectors of ionizing radiation, and photovoltaic devices).     

Resonant Γ-<Emphasis Type="Italic">X</Emphasis> tunneling in single-barrier GaAs/AlAs/GaAs heterostructures

The electron transport through single-barrier GaAs/AlAs/GaAs heterostructures is studied. This transport is caused by resonant tunneling between the two-dimensional states related to the Γ valley of the GaAs conduction band and various two-or zero-dimensional donor states related to the lower X valleys of the AlAs conduction band. The resonant electron tunneling both via various two-dimensional states related to the X_z and X_xy valleys in AlAs (the X_z and X_xy states) and via related states of Si donors X _z ^D and X _xy ^D was observed. This circumstance made it possible to determine the binding energies of these states (E_B(X _z ^D )≈50 meV and E_B(X _xy ^D )≈70 meV, respectively) directly from the results of identification of resonance features in transport characteristics. An analysis of the structure of experimental resonances corresponding to tunneling between the Γ and X Landau levels in a magnetic field made it possible to determine the transverse effective mass in the X valleys of AlAs (m_t=(0.2±0.02)m₀). An additional fine structure of donor resonances is observed in experimental transport characteristics. This fine structure is caused by resonant tunneling of electrons through the states of the donors that are located in various atomic layers of the AlAs barrier (in the growth direction) and therefore have different binding energies.     

The effect of damaging radiation (<Emphasis Type="Italic">p,e, γ</Emphasis>) on photovoltaic and tunneling GaAs and GaSb <Emphasis Type="Italic">p-n</Emphasis> junctions

The properties of multiple-junction solar cells depend on the properties of the constituent photovoltaic and tunneling p-n junctions. In this study, the properties of the space-charge region for photovoltaic and tunneling p-n junctions were examined using the dark current-voltage characteristics for two semiconductors: GaSb (a narrow-gap semiconductor) and GaAs (a wide-gap semiconductor). The effects of irradiation with protons (the energy of 6.78 MeV and the maximum fluence of 3 × 10¹² cm^?2), electrons (the energy of 1 MeV and the maximum fluence of 3 × 10¹⁶ cm^?2), and γ-ray photons (the energy of 1.17–1.33 MeV and the maximum dose of 17 Mrad) on the lifetime of charge carriers in the space-charge region of photovoltaic p-n junctions and on the peak current of connecting tunneling p-n junctions were studied. The coefficients of the damage for the inverse lifetime are determined for photovoltaic p-n junctions. The coefficients of equivalence between the used types of radiation are determined; these coefficients are found to be almost independent, on the order of magnitude, of the type and material of the p-n-junction (and nearly equal for photovoltaic GaAs p-n junctions and tunneling GaAs and GaSb p-n junctions).