CMOS射频集成电路的现状与进展

随着低功耗、可移动个人无线通信的发展和CMOS工艺性能的提高,用CMOS工艺实现无线通信系统的射频前端不仅必要而且可能.本文讨论了用CMOS工艺实现射频集成电路的特殊问题.首先介绍各种收发器的体系结构,对它们的优缺点进行比较,指出在设计中要考虑的一些问题.其次讨论CMOS射频前端的重要功能单元,包括低噪声放大器、混频器、频率综合器和功率放大器.对各单元模块在设计中的技术指标,可能采用的电路结构以及应该注意的问题进行了讨论.此外,论文还讨论了射频频段电感、电容等无源器件集成的可能性以及方法.最后对CMOS射频集成电路的发展方向提出了一些看法.     

无线应用CMOS低噪声放大器的设计

基于射频CMOS集成电路技术, 设计出用于无线通信系统的CMOS低噪声放大器.对影响其增益、噪声系数的阻抗匹配进行了分析.采用TSMC的0.35 μm射频工艺库,在ADS仿真平台上对低噪声放大器电路进行了仿真.其中,低噪声放大器设计成差分结构,提供了13 dB增益、-10 dBm IIP3、-13 dBm P1dB、1.9 dB的噪声系数和55 mW的功耗.     

CMOS射频集成电路的最新进展和应用

本文介绍RF(射频)CMOS集成电路的最新进展和应用.着重于深亚微米CMOS技术在实现高端射频(几十GHz频带)集成系统方面的潜能.首先,综述CMOS技术的主要特点,继而介绍CMOS射频集成电路的最新进展.其中有63GHz的毫米波段的CMOS压控振荡器,数据速率达50Gb/s的2:1多路复用器,40GHzCMOS低功耗注入锁定分频器,24GHzCMOS射频前端和17GHzISM/WLAN的CMOS射频前端等.同时,介绍CMOS射频集成电路的几种主要应用,如无线局域网和射频识别等.     

CMOS射频电路的发展趋势

本文介绍目前正在研发、将来终将成为主流射频收发器的CMOS射频电路的体系结构和电路设计,设计实例将展示CMOS射频电路的良好性能,并预示CMOS射频集成电路取代砷化镓和SiGe电路实现系统集成。     

高耦合系数层叠结构片上变压器的频率无关等效电路

针对高耦合系数层叠结构的片上变压器提出了一个新型2-Ⅱ集总元件等效电路模型.主要基于解析公式提取了该模型的元件参数.由于该模型中伞部元件取值均与工作频率无关,因此该模型完全可以用于射频集成电路设计中的时域瞬态仿真及噪声分析.为了验证该模型的精度,采用台湾半导体制造有限公司(TSMC)提供的0.13μm混合信号/射频CMOS工艺实际制作了一个高耦合系数层叠结构片上变压器,并使用Agilent E8363B矢量网络分析仪测量了其S参数.测量结果表明该模型在高于两倍自谐振频率范围内均能够与测试结果很好地符合.     

高耦合系数层叠结构片上变压器的频率无关等效电路

针对高耦合系数层叠结构的片上变压器提出了一个新型2-Ⅱ集总元件等效电路模型.主要基于解析公式提取了该模型的元件参数.由于该模型中伞部元件取值均与工作频率无关,因此该模型完全可以用于射频集成电路设计中的时域瞬态仿真及噪声分析.为了验证该模型的精度,采用台湾半导体制造有限公司(TSMC)提供的0.13μm混合信号/射频CMOS工艺实际制作了一个高耦合系数层叠结构片上变压器,并使用Agilent E8363B矢量网络分析仪测量了其S参数.测量结果表明该模型在高于两倍自谐振频率范围内均能够与测试结果很好地符合.     

IBM即将发布2 GHz石墨烯集成电路未来有可能取代CMOS电路

据美国科技媒体报道,IBM计划在今年12月份在美国华盛顿举办的国际电子器件会议上,介绍其采用CMOS兼容工艺制造的2 GHz石墨烯实验型射频集成电路。乔治亚大学纳米研究中心的教授James D.Meindl称CMOS工艺线宽在到达7 nm时将无以为继,而石墨烯工艺将是下一代集成电路制造方法的首     

纳米CMOS集成电路设计技术和发展趋势

论述了日美等国纳米CMOS集成电路半导体制造工艺的现状和发展趋势,分析说明国外半导体制造技术的战略和发展状况;结合90 nm CMOS工艺设计的超大规模SOC芯片的实践,对纳米CMOS集成电路设计技术进行分析;阐述SOC设计面临的技术难题,并对今后的发展趋势进行了预测。     

CMOS环形振荡器的噪声分析

在CMOS射频集成电路的设计中，分析振荡器的相位噪声是非常重要的。文章以射频段的一种环形振荡器为例，在时间域，用小信号模型深入分析，得出了设计射频段环形振荡器时进行李产分析的一般方法和分析模型。由此方法得到的结果和仿真结果相符合。     

MM工C和RFIC的GAD

微波单片集成电路和射频集成电路频率和集成度的提高使设计复杂化,对计算机辅助设计的依赖性更强,元器件行为的精确描述和仿真器的功能是设计精度的关键所在.本文对微波单片集成电路和射频集成电路设计的计算机辅助设计问题进行了论述,着重讨论了元器件模型和仿真器功能在微波射频集成电路设计中的问题和应用.     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Development of the readout system for waveguide multilayer optical card

Waveguide multilayer optical card （WMOC） is a novel storage device of three-dimensional optical information. An advanced readout system fitting for the WMOC is introduced in this paper. The hardware mainly consists of the light source for reading, WMOC, motorized stages addressing unit, microscope imaging unit, CCD detecting unit and PC controlling ＆ processing unit. The movement of the precision motorized stage is controlled by the computer through Visual Basic （VB） language in software. A control panel is also designed to get the layer address and the page address through which the position of the motorized stages can be changed. The WMOC readout system is easy to manage and the readout result is directly displayed on computer monitor.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Collinear phase-matching study of terahertz-wave generation via difference frequency mixed in GaAs and Inp

The collinearly phase-matching condition of terahertz-wave generation via difference frequency mixed in GaAs and InP is theoretically studied. In collinear phase-matching, the optimum phase-matching wave hands of these two crystals are calculated. The optimum phase-matching wave bands in GaAs and lnP are 0.95-1.38μm and 0.7-0.96μm respectively. The influence of the wavelength choice of the pump wave on the coherent length in THz-wave tuning is also discussed. The influence of the temperature alteration on the phase-matching and the temperature tuning properties in GaAs crystal are calculated and analyzed. It can serve for the following experiments as a theoretical evidence and a reference as well.     

Effects of the alloy compositions on the phonon-polaritons in ternary mixed crystals

Composition dependence of bulk and surface phonon-polaritons in ternary mixed crystals are studied in the framework of the modified random-element-isodisplacement model and the Bom-Huang approximation. The numerical results for Several Ⅱ - Ⅵ and Ⅲ- Ⅴ compound systems are performed, and the polariton frequencies as functions of the compositions for ternary mixed crystals AlxGa1-xAs, GaPxAS1-x, ZnSxSe1-x, GaAsxSb1-x, GaxIn1-xP, and ZnxCd1-xS as examples are given and discussed. The results show that the dependence of the energies of two branches of bulk phonon-polaritons which have phonon-like characteristics, and surface phonon-polaritons on the compositions of ternary mixed crystals are nonlinear and different from those of the corresponding binary systems.     

New insert layer structure OLEDs

An insert layer structure organic electroluminescent device（OLED） based on a new luminescent material （Zn（salen）） is fabricated. The configuration of the device is ITO/CuPc/NPD/Zn（salen）/Liq/LiF/A1/CuPc/NPD/Zn（salen）/Liq/LiF/A1. Effective insert electrode layers comprising LiF（1nm）/Al（5 nm） are used as a single semitransparent mirror, and bilayer cathode LiF（1 nm）/A1（100 nm） is used as a reflecting mirror. The two mirrors form a Fabry-Perot microcavity and two emissive units. The maximum brightness and luminous efficiency reach 674 cd/m^2 and 2.652 cd/A, respectively, which are 2.1 and 3.7 times higher than the conventional device, respectively. The superior brightness and luminous efficiency over conventional single-unit devices are attributed to microcavity effect.