一种用于超宽带接收机的CMOS可变增益低噪声放大器

本文介绍一种符合中国超宽带应用标准的工作频率范围为4.2-4.8 GHz的CMOS可变增益低噪声放大器(LNA)。文章主要描述了LNA宽带输入匹配的设计方法和低噪声性能的实现方式,提出一种3位可编程增益控制电路实现可变增益控制。该设计采用0.13-μm RF CMOS工艺流片,带有ESD引脚的芯片总面积为0.9平方毫米。使用1.2 V直流供电,芯片共消耗18 mA电流。测试结果表明,LNA最小噪声系数为2.3 dB,S(1,1)小于-9 dB,S(2,2)小于-10 dB。最大和最小功率增益分别为28.5 dB和16 dB,共设有4档可变增益,每档幅度为4 dB。同时,输入1 dB压缩点是-10 dBm,输入三阶交调为-2 dBm。     

1GHz 0.5μm CMOS低噪声放大器的设计

从低噪声放大器(LNA)的设计原理出发,提出并设计了一种工作于1GHz的实用LNA.电路采用共源-共栅的单端结构,用HSPICE软件对电路进行分析和优化.模拟过程中选用的器件采用TSMC 0.5μm CMOS工艺实现.模拟结果表明所设计的LNA功耗小于15mW,增益大于10dB,噪声系数为1.87dB,IIP3大于10dBm,输入反射小于-50dB.可用于1GHz频段无线接收机的前端.     

2.45 GHz 0.18 μm全差分CMOS低噪声放大器设计

设计了一个基于TSMC 0.18 μm CMOS工艺的2.45 GHz全差分CMOS低噪声放大器.根据电路结构特点,采用图解法对LNA进行功耗约束下的噪声优化,以选取最优的晶体管栅宽;设计了仅消耗15 μA电流的偏置电路;采用在输入级增加电容的方法,在改善输入匹配网络特性的同时,解决了栅极电感的集成问题.仿真结果表明:LNA噪声系数为1.96 dB,功率增益S_(21)超过20 dB,输入反射系数S_(11)和输出反射系数S_(22)分别小于-30 dB和-20 dB,反向功率增益S_(12)小于-30 dB,1 dB压缩点和三阶互调输入点IIP3分别达到-17.1 dBm和-2.55 dBm,整个电路在1.8 V电源下功耗为22.4 mW.     

基于0.13 μm SiGe BiCMOS工艺的Ka波段低噪声放大器的设计

介绍了一款基于SiGe BiCMOS工艺的Ka波段低噪声放大器(LNA)的设计与测试。分析了毫米波频段硅基集成电路的匹配设计方法,给出了HBT晶体管电流密度与噪声系数的关系,以及最佳噪声偏置点的选取方法。并基于以上方法设计了单级共基共射低噪声放大器,LNA芯片基于Global Foundry 8HP工艺流片验证。测试结果表明,该LNA实现了30~40GHz的-1dB带宽、小于3.5dB的噪声系数以及6.2dBm的1dB压缩输出功率(P-1dB);输入输出反射系数均小于-15dB,中心频率(35GHz)处增益为7.2dB(单级),LNA的直流电流为6.7mA,电源电压为1.8V。     

1.5-6GHz增益和噪声系数稳定的两级超宽带CMOS低噪声放大器设计与性能模拟

 针对UWB应用设计实现了一个1.5-6GHz的两级CMOS低噪声放大器(LNA). 通过引入共栅(CG)和共源(CS)结构以获得宽范围内的输入匹配,采用电流镜和峰化电感进行电流复用,所提出的LNA实现了非常平坦化的功率增益和噪声系数(NF). 经标准0.18μm CMOS工艺实现后,版图后模拟结果表明在1.5-5GHz频率范围内功率增益(S21)为11.45±0.05dB,在2-6GHz频率范围内噪声系数(NF)为5.15±0.05dB,输入损耗(S11)小于-18dB. 在5GHz时,模拟得到的三阶交调点(IIP3)为-7dBm,1dB压缩点为-5dBm.在1.8V电源电压下,LNA消耗6mA的电流,版图实现面积仅为0.62mm^2.     

A wideband LNA employing gate-inductive-peaking and noise-canceling techniques in 0.18μm CMOS

正This paper presents a wideband low noise amplifier(LNA) for multi-standard radio applications.The low noise characteristic is achieved by the noise-canceling technique while the bandwidth is enhanced by gateinductive -peaking technique.High-frequency noise performance is consequently improved by the flattened gain over the entire operating frequency band.Fabricated in 0.18μm CMOS process,the LNA achieves 2.5 GHz of -3 dB bandwidth and 16 dB of gain.The gain variation is within±0.8 dB from 300 MHz to 2.2 GHz.The measured noise figure(NF) and average HP3 are 3.4 dB and -2 dBm,respectively.The proposed LNA occupies 0.39 mm2 core chip area.Operating at 1.8 V,the LNA drains a current of 11.7 mA.     

1V高线性度2.4GHz CMOS低噪声放大器

讨论了低噪声放大器(LNA)在低电压、低功耗条件下的噪声优化及线性度提高技术.使用Chartered 0.25μm RF CMOS 工艺设计一个低电压折叠式共源共栅LNA.后仿真结果表明在1V电源下,2.36GHz处的噪声系数NF仅有1.32dB,正向增益S21为14.27dB,反射参数S11、S12、S22分别为 -20.65dB、-30.27dB、-24dB,1dB压缩点为-13.0dBm,三阶交调点IIP3为-0.06dBm,消耗的电流为8.19mA.     

用于SiGe HBT LNA的新型双有源偏置电路的设计

偏置工作点是影响低噪声放大器(LNA)线性度的因素之一.为了保证LNA能够更好地对信号进行线性放大,稳定的偏置工作点对于放大器来说显得尤为重要.提出了一种新型有源偏置技术,通过同时采用两个电流源为LNA提供直流偏置,以达到稳定放大器偏置工作点的目的.基于JAZZ 0.35 μm SiGe工艺,采用该新型双有源偏置技术,设计了一款LNA.在1.8～2.2 GHz频带时,放大器的增益为22.03±0.46 dB,噪声系数小于3.7dB,2.0 GHz时的输入3阶交调点(IIP3)为5 dBm,相对于传统无源偏置的LNA提高了10 dBm.仿真验证了该新型有源偏置技术对提高LNA线性度的有效性.     

一种用于数字电视调谐器的宽带CMOS无电感噪声抵消低噪声放大器

A wideband inductorless low noise amplifier for digital TV tuner applications is presented. The proposed LNA scheme uses a composite NMOS/PMOS cross-coupled transistor pair to provide partial cancellation of noise generated by the input transistors. The chip is implemented in SMIC 0.18 μm CMOS technology. Measurement shows that the proposed LNA achieves 12.2-15.2 dB voltage gain from 300 to 900 MHz, the noise figure is below 3.1 dB and has a minimum value of 2.3 dB, and the best input-referred 1-dB compression point(IP1dB) is - 17 dBm at 900 MHz. The core consumes 7 mA current with a supply voltage of 1.8 V and occupies an area of 0.5×0.35 mm2.     

一种集成镜像抑制的低噪声放大器设计

为解决超外差接收机中镜像干扰的问题,采用了一种有源陷波滤波器(active notch-filter)来实现镜像抑制功能。并在此基础上设计了用于数字音频广播(Digital Audio Broadcast,DAB)系统的低噪声放大器。该LNA电路工作在L-band1.472GHz,,经过第一次变频到165MHz,其镜像频率为1.142GHz,有源陷波滤波器可提供超过55dB的镜像抑制度。整个LNA电路采用1.8V电源,消耗5mA电流,S11和S22分别为-22dB和-16dB,功率增益为21dB。噪声指数为1.45dB,输入P1db点为-25dBm。     

Resolution Enhancement Technology:Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.     

Cost-effective test solutions for smart card and other integrated flash applications

From its emergence in the late 1980s as a lower cost alternative to early EEPROM technologies, flash memory has evolved to higher densities and speedsand rapidly growing acceptance in mobile applications.In the process, flash memory devices have placed increased test requirements on manufacturers. Today, as flash device test grows in importance in China, manufacturers face growing pressure for reduced cost-oftest, increased throughput and greater return on investment for test equipment. At the same time, the move to integrated flash packages for contactless smart card applications adds a significant further challenge to manufacturers seeking rapid, low-cost test.     

An improved parallel thinning algorithm with two subiterations

The parallel thinning algorithm with two subiterations is improved in this paper. By analyzing the notions of connected components and passes, a conclusion is drawn that the number of passes and the number of eight-connected components are equal. Then the expression of the number of eight-connected components is obtained which replaces the old one in the algorithm. And a reserving condition is proposed by experiments, which alleviates the excess deletion where a diagonal line and a beeline intersect. The experimental results demonstrate that the thinned curve is almost located in the middle of the original curve connectivelv with single pixel width and the processing speed is high.     

Theoretical analysis of the relationship between the Brillouin gain coefficient and the strain in the optical-fiber sensors

The relation between the power of the Brillouin signal and the strain is one of the bases of the distributed fiber sensors of temperature and strain. The coefficient of the Bfillouin gain can be changed by the temperature and the strain that will affect the power of the Brillouin scattering. The relation between the change of the Brillouin gain coefficient and the strain is thought to be linear by many researchers. However, it is not always linear based on the theoretical analysis and numerical simulation. Therefore, errors will be caused if the relation between the change of the Brillouin gain coefficient and the strain is regarded as to be linear approximately for measuring the temperature and the strain. For this reason, the influence of the parameters on the Brillouin gain coefficient is proposed through theoretical analysis and numerical simulation.     

Novel fiber-optical interferometer with miniaturized probe for in-hole measurements

Today, micro-system technology and the development of new MEMS （Micro-Electro-Mechanical Systems） are emerging rapidly. In order for this development to become a success in the long run, measurement systems have to ensure product quality. Most often, MEMS have to be tested by means of functionality or destructive tests. One reason for this is that there are no suitable systems or sensing probes available which can be used for the measurement of quasi inaccessible features like small holes or cavities. We present a measurement system that could be used for these kinds of measurements. The system combines a fiber optical, miniaturized sensing probe with low-coherence interferometry, so that absolute distance measurements with nanometer accuracy are possible.     

Study of waveguide coupling efficiency in hybrid silicon lasers

This paper presents a new method to increase the waveguide coupling efficiency in hybrid silicon lasers. We find that the propagation constant of the InGaAsP emitting layer can be equal to that of the Si resonant layer through improving the design size of the InP waveguide. The coupling power achieves 42% of the total power in the hybrid lasers when the thickness of the bonding layer is 100 nm. Our result is very close to 50% of the total power reported by Intel when the thickness of the thin bonding layer is less than 5 nm. Therefore, our invariable coupling power technique is simpler than Intel＇s.     

Teleportation of an arbitrary unknown N-qubit entangled state under the controlling of M controllers

A new quantum protocol to teleport an arbitrary unknown N-qubit entangled state from a sender to a fixed receiver under M controllers(M < N) is proposed. The quantum resources required are M non-maximally entangled Greenberger-Home-Zeilinger (GHZ) state and N-M non-maximally entangled Einstein-Podolsky-Rosen (EPR) pairs. The sender performs N generalized Bell-state measurements on the 2N particles. Controllers take M single-particle measurement along x-axis, and the receiver needs to introduce one auxiliary two-level particle to extract quantum information probabilistically with the fidelity unit if controllers cooperate with it.     

A rigorous proof of MIMO channel capacity’s increase with antenna number

It is well known that adding more antennas at the transmitter or at the receiver may offer larger channel capacity in the multiple-input multiple-output（MIMO） communication systems. In this letter, a simple proof is presented for the fact that the channel capacity increases with an increase in the number of receiving antennas. The proof is based on the famous capacity formula of Foschini and Gans with matrix theory.     

Diode-end-pumped Nd:YVO4/LBO lasers with 4.2W continuous-wave output at 457 nm

A continuous-wave (CW) 457 nm blue laser operating at the power of 4.2 W is demonstrated by using a fiber coupled laser diode module pumped Nd: YVO4 and using LBO as the intra-cavity SHG crystal With the optimization of laser cavity and crystal parameters, the laser operates at a very high efficiency. When the pumping power is about 31 W, the output at 457nm reaches 4.2 W, and the optical to optical conversion efficiency is about 13.5% accordingly. The stability of the out putpower is better than 1.2% for 8 h continuously working.     

Call for Papers

正Wireless Body-area Networks The last decade has witnessed the convergence of three giant worlds:electronics,computer science and telecommunications.The next decade should follow this convergence in most of our activities with the generalization of sensor networks.In particular with the progress in medicine,people live longer and the aging of population will push the development of wireless personal networks