钝化层及P型基底结构优化对电子轰击型有源传感器电荷收集效率影响的研究

为获得高增益的电子轰击型有源传感器(EBAPS)，对EBAPS成像器件中电子倍增层的电荷收集效率的影响因素进行了研究。基于载流子输运理论，采用蒙特卡罗方法研究了钝化层种类、厚度、入射电子能量、P型基底厚度和掺杂浓度对二次电子分布及收集的影响。结果表明：为提高入射电子的入射深度进而提高电荷收集效率，宜采用密度小的SiO₂作为钝化层；为了减少钝化层对倍增电子的复合进而提高电荷收集效率，宜降低钝化层厚度和提高入射电子能量；为了降低倍增电子扩散过程中载流子的复合进而提高电荷收集效率，宜降低P型基底的厚度和掺杂浓度。     

电子倍增层表层掺杂分布对EBCMOS电荷收集效率的影响

设计了电子倍增层的多种表层结构,并模拟分析了表层掺杂分布对电子轰击型CMOS(EBCMOS)成像器件的电荷收集效率的影响。结合离子注入工艺优化设计电子倍增层表层结构,并利用离子注入模拟软件TRIM模拟分析了不同掩蔽层种类、厚度、离子注入剂量、注入角度和注入能量次数对掺杂分布的影响。再依据载流子传输理论并结合蒙特卡洛模拟方法,模拟分析了相应结构下EBCMOS中电子倍增层的电荷收集效率。模拟研究结果表明:通过选择SiO2作为掩蔽层、减小掩蔽层厚度、增加注入能量次数等方法可以提高电荷收集效率。在注入剂量选择方面,对电子倍增层表层进行重掺杂,使掺杂浓度下降幅度足够大、下降速度足够缓慢,也可以有效提高电荷收集效率。仿真优化后表层结构所对应器件的电荷收集效率最高可以达到93.61%。     

基底均匀和梯度掺杂下EBCMOS电荷收集效率的优化模拟

为获得高增益的电子轰击型CMOS(EBCMOS)成像器件,根据载流子输运理论,采用蒙特卡罗方法,研究了EBCMOS基底在不同掺杂方式和结构参数下的电荷收集效率。结果表明：当基底均匀掺杂时,减小掺杂浓度、降低基底厚度及缩小近贴距离可以有效提高电荷收集效率;当基底梯度掺杂时,减小重掺杂浓度区域的范围,可以有效提高电荷收集效率。仿真优化后器件的电荷收集效率最高可达到86.28%,为国产EBCMOS器件的研制提供了理论支撑。     

基底均匀掺杂下EBAPS电荷收集效率的模拟研究

对P型基底均匀掺杂的情况下电子轰击有源像素传感器(EBAPS)的电荷收集效率进行了理论模拟研究,依据低能电子与固体的相互作用模型结合Monte-Carlo计算方法模拟了光电子入射到死层和倍增层中的运动轨迹,并分析了经过死层后的能量损失率所受影响因素;依据半导体理论研究了P型基底掺杂浓度、膜厚、入射电子能量对电荷收集效率的影响因素。最终获得的电荷收集效率理论模拟结果与已报道的(4 keV,均匀掺杂的EPAPS)实测的结果较为相符,表明此文的模拟结果可以为高增益的EBAPS的制作提供理论指导。     

EBCMOS钝化层表面残气吸附特性

基于密度泛函理论，研究了电子轰击互补金属氧化物半导体(EBCMOS)钝化层表面的残气吸附机制，并分析其电学特性。结果表明，以Al₂O₃钝化层为例，真空腔内残余气体H₂在Al₂O₃不同表面的吸附为物理吸附，在(001)面的吸附距离最大，吸附强度最低，电荷转移最少。对比CO,N₂,CO₂,H₂O等残余气体分子在(001)表面的吸附结果发现，(001)面对残气分子的吸附均为物理吸附，(001)面相比于其他表面，对残余气体分子有更好的抑制作用，所生成钝化层能提高EBCMOS器件电子倍增层的电荷收集效率。研究结果对研制寿命长而稳定的EBCMOS器件具有理论指导意义。     

表面钝化膜对BCMOS传感器电子敏感特性影响的实验研究

基于硅表面的薄膜钝化原理,开展了不同厚度的表面钝化膜对背减薄CMOS(Back-thinned CMOS,BCMOS)传感器电子敏感特性影响的实验研究。首先,对CMOS传感器进行背减薄处理后,对背减薄CMOS进行电子轰击测试,由测试结果可知,电子图像灰度随入射电子能量的变化呈现出线性关系。然后,采用电子束蒸镀法在BCMOS传感器表面镀制了不同厚度的氧化铝薄膜,并进行了电子轰击测试。研究发现,当表面氧化铝薄膜厚度为20 nm时,可以将BCMOS传感器的二次电子收集效率提高14.9%,通过表面薄膜钝化实现了电子敏感性的提升,同时,随着薄膜厚度的增加,BCMOS暗电流由1510 e-/s/pix减小至678 e-/s/pix。上述结果说明,氧化铝薄膜对BCMOS背减薄表面具有良好的钝化作用,可以提高BCMOS传感器的二次电子收集效率、降低暗电流,为将来高灵敏度EBCMOS器件的研制提供了技术支撑。     

SAGCM-APD增益影响因子分析与优化

应用二维漂移扩散模型研究具有分立吸收层、渐变层、电荷层和倍增层结构(SAGCM)的InGaAsP-InP雪崩光电探测器(APD),仿真分析了不同电荷层、倍增层厚度和掺杂浓度对电场分布、电流响应及击穿电压的影响,特别是参数变量对增益计算模型的影响,载流子传输过程的时间依赖关系和倍增层中所处位置的影响,仿真结果表明:较高掺杂浓度和较薄电荷层结构可以改变器件内部的电场分布,进而提高增益值.当入射光波长为1.55μm,光功率为500 W/m2时,光电流响应量级在10-2A;阈值电压降低到10V以下,击穿电压为42.6V时,器件倍增增益值大于100.     

基于异质结倍增层的InAlAsSb SACM雪崩光电二极管的优化

使用低工作电压的雪崩光电二极管(APD)有利于提高集成电路的稳定性和降低功耗.文章建立了一个分离吸收、电荷、倍增(SACM)型的雪崩光电二极管的模型,为了在低偏压下获得高增益同时不降低工作电压范围,这个模型采用了具有高低禁带宽度的异质结倍增层.同时,文章研究了异质结倍增层的厚度和掺杂浓度对暗电流和增益的影响.通过对掺杂浓度的优化,击穿电压和穿通电压可以同时下降.     

In0.53Ga0.47As/In0.52Al0.48As雪崩光电二极管的数值模拟研究

建立了SACM型In0.53Ga0.47As/In0.52Al0.48As雪崩光电二极管(APD)的分析模型,通过数值研究和理论分析设计出高性能的In0.53Ga0.47As/In0.52Al0.48As APD。器件设计中,一方面添加了In0.52Al0.48As势垒层来阻挡接触层的少数载流子的扩散,进而减小暗电流的产生;另一方面,雪崩倍增区采用双层掺杂结构设计,优化了器件倍增区的电场梯度分布。最后,利用ATLAS软件较系统地研究并分析了雪崩倍增层、电荷层以及吸收层的掺杂水平和厚度对器件电场分布、击穿电压、IV特性和直流增益的影响。优化后APD的单位增益可以达到0.9 A/W,在工作电压(0.9 Vb)下增益为23.4,工作暗电流也仅是纳安级别(@0.9 Vb)。由于In0.52Al0.48As材料的电子与空穴的碰撞离化率比InP材料的差异更大,因此器件的噪声因子也较低。     

InGaAs/InP雪崩光电探测器异质结结构优化分析

根据一个吸收层、电荷层和倍增层分立结构(SACM)的InGaAs/InP雪崩光电探测器,减薄电荷层的厚度而引入渐变层,保持材料与厚度不变,改进成吸收层、电荷层、过渡层与倍增层分立结构(SAGCM)的雪崩光电探测器,优化了吸收层与倍增层间材料的异质结结构.采用APSYS软件对其能带结构、电场分布以及暗电流和1.55μm的脉冲光响应电流、增益等进行仿真与计算.对比两种器件的性能,结果分析表明,改进后的器件获得更低的穿通值电压,降低探测器在低偏压下的漏电流,同时得到更大的增益.     

Effect of Doping on the Optical Characteristics of Quantum-Dot Semiconductor Optical Amplifiers

The influence of p-type and n-type doping on the optical characteristics of a quantum-dot semiconductor optical amplifier (SOA) is studied using a rate equation model that takes into account the effect of the multidiscrete energy levels and the charge neutrality relation. Our calculations show that the amplifier optical gain can be greatly enhanced through p-type doping where the doping concentration should not exceed the certain level. We find that increasing the acceptor concentration increases the unsaturated optical gain but at the same time decreases the saturation density and the effective relaxation lifetime. Also our calculation reveals that the use of p-type doping will be associated with an increase in the transparency current where the increase in the transparency current depends on the incident photon energy. On the other hand, we find that it is possible to increase the saturation density and enhance the linearity of the SOA by using n-type doping.      

界面电荷对C-Si表面钝化质量的影响

深入分析了影响晶体硅与钝化介质层界面复合的主要因素:界面态密度(Dit)、介质层表面电荷密度、衬底掺杂类型及掺杂浓度.研究发现,随着载流子注入水平改变,介质层的钝化质量与介质层带电类型和硅片掺杂类型紧密相关.随着载流子注入水平的降低,富含正电荷(负电荷)的钝化介质在P型(N型)硅片上的钝化质量随之降低;富含负电荷(正电...     

Bphen掺杂Cs_2CO_3作为电子传输层对OLED器件性能的影响

为改善OLED器件的载子注入平衡,本文在其结构ITO/MoO3/NPB/Alq3/Cs2CO3/Al中,分别引入高电子迁移率材料Bphen及Bphen∶Cs2CO3作为电子传输层。通过改变Bphen的厚度以及Bphen中Cs2CO3的体积掺杂浓度,研究其对器件发光亮度、电流密度和效率等性能的影响。实验结果表明,采用Bphen或者Bphen∶Cs2CO3作为电子传输层,均能提高器件的电子注入能力,改善器件的性能。相比于未引入Bphen的器件,采用25nm的Bphen作为电子传输层,改善了器件的电子注入,使器件的最大电流效率提高112%;采用体积掺杂浓度为15%,厚度为5nm的Bphen∶Cs2CO3作为电子传输层,减小了电子注入势垒,使器件的最大电流效率提高27%,并且掺杂层厚度的改变对器件的电子注入影响很小。该方法可用于OLED器件的阴极修饰,对器件性能的提升将起到一定的促进作用。     

Combustion Synthesized Zinc Oxide Electron‐Transport Layers for Efficient and Stable Perovskite Solar Cells

Perovskite solar cells (PSCs) have advanced rapidly with power conversion efficiencies (PCEs) now exceeding 22%. Due to the long diffusion lengths of charge carriers in the photoactive layer, a PSC device architecture comprising an electron‐ transporting layer (ETL) is essential to optimize charge flow and collection for maximum performance. Here, a novel approach is reported to low temperature, solution‐processed ZnO ETLs for PSCs using combustion synthesis. Due to the intrinsic passivation effects, high crystallinity, matched energy levels, ideal surface topography, and good chemical compatibility with the perovskite layer, this combustion‐derived ZnO enables PCEs approaching 17–20% for three types of perovskite materials systems with no need for ETL doping or surface functionalization.     

Enhanced performance of inverted organic solar cell by a solution-based fluorinated acceptor doped P3HT:PCBM layer

An inverted organic solar cell based on strong electron acceptor 2,3,5,6-tetrafluoro-7,7,8,8-tetracyanoquinodimethane (F4-TCNQ) doped poly (3-hexylthiophene) P3HT: [6,6]-phenyl-C₆₁-butyric acid methyl ester (PCBM) was fabricated to figure out the p-type doping effect on the device performance. It was found that the doping concentration played a critical role on the electrical output of the devices. An enhanced power conversion efficiency (PCE) of 4.22% was achieved, in comparison of PCE of 3.68% for the device based on pristine P3HT:PCBM. The topography morphology of the active film, the hole mobility, the ultraviolet–visible absorption spectrum, the photoluminescence (PL) lifetime and the Fermi energy level of P3HT film with and without F4-TCNQ doping were characterized to investigate the doping effect. The measured results indicated that the hole mobility and absorption of P3HT film was slightly modified with F4-TCNQ doping. On the contrary, the active film morphology, the PL lifetime and the Fermi energy level of P3HT changed dramatically with doping. It was found that F4-TCNQ preferred to approach to the air/liquid interface during the solvent dry process, leading to F4-TCNQ-rich upper layer due to its low surface energy. The layer with proper thickness between anode and active layer dramatically improve the interface contact, resulting in the enhanced device performance.     

Insights into charge balance and its limitations in simplified phosphorescent organic light-emitting devices

Simplified phosphorescent organic light-emitting device (PHOLED), which utilizes only two organic layers, showed record-high efficiency when first introduced. It is quite surprising that this device can have such high efficiency without the use of complex carrier and exciton confinement layers that are common in the state-of-the-art PHOLEDs nowadays. Therefore, it is important to understand how good charge balance is in simplified PHOLED and why. In this work, we study the effects of altering charge balance in simplified PHOLED through means of changing layer thickness in the hole transport layer (HTL) and electron transport layer (ETL) as well as intentionally doping hole and electron traps in the HTL and ETL, respectively, on device efficiency. The results show that when using high carrier mobility charge transport materials, changing layer thickness does not impact charge balance appreciably. On the other hand, introducing charge traps in a thin layer within the HTL or ETL can, in comparison, influence charge balance more significantly, and proves to be a more effective approach for studying the factors limiting charge balance in these devices. The results reveal that simplified PHOLEDs are generally hole-rich, and that the leakage of electrons to the counter electrode is also a major mechanism behind the poor charge balance and efficiency loss in these devices. In order to optimize charge balance in simplified PHOLED, it is important to reduce hole transport in the device so that e-h ratio can be brought closer to unity, as well as eliminate electron leakage. Finally, we show that by simply using an electron blocking HTL, the efficiency of the device can be enhanced by as much as 25%, representing the highest reported for simplified PHOLEDs.