毫秒激光致光学薄膜损伤阈值的测试与分析

根据ISQ-11254分别测量了脉宽1 ms,波长1 064 nm激光作用下TiO2/SiO2高反膜、增透膜的损伤阈值,结合高分辨率CCD和光学显微镜观测了损伤形貌,分析了毫秒量级激光损伤光学薄膜的损伤机理.结果表明:脉宽1 ms激光作用下TiO2/SiO2增透膜的损伤阈值为高反膜的2.4倍,损伤区域为若干分离的损伤点...     

非λ/4激光增透膜的试制

我厂研制的激光平车仪对光学零件提出了表面剩余反射率不大于0.2%的要求。 镀于K9玻璃上的单层氟化镁(MgF2)增透膜只能把剩余反射率从4.2%下降到1.6%,满足不了平车仪的要求。为此,我们采用了硫化锌(ZnS)和氟化镁(MgF2)组成的非λ/4双层增透膜。由于较好地解决了ZnS层厚度控制问题,使得镀于 K9玻璃上的双层增透膜都达到了使用要求。K9玻璃表面剩余反射率从4.2%下降到0.1%～0.2%(在中心波长处)。 膜系选择 根据光线垂直入射时膜系的反射率公式 可知,当y=n0时可以消反射B=0 式中n0是空气的折射率等于1 y是膜系的等效导纳。在玻璃的折射率n…     

GaAs半导体激光器腔面膜的制备

研究高反射、减反射薄膜的膜系设计、薄膜材料的选取以及薄膜的制备工艺。以GaAs为基底用TXX-700箱式真空镀膜机通过电子束真空蒸度技术制备出808-850nm波段的高反膜、增透膜。反射镜波长在808-850nm范围内,平均反射率R>99.9%;增透膜具有高透射性能,输出镜波长在808-850nm范围内,T>98%。     

聚对二甲苯/SiO2薄膜应用于KDP晶体增透保护膜的制备研究

报道了采用真空化学气相沉积法制备的聚对二甲苯薄膜和采用溶胶-凝胶技术制备的二氧化硅增透膜,通过提拉镀膜法在聚对二甲苯薄膜表面镀制SiO2增透膜得到的双层膜可应用于KDP晶体的增透保护膜.用FT-IR、紫外-近红外分光光度计对聚对二甲苯/SiO2薄膜的结构和光学性能进行了表征和测试.双层膜的透射率达到92%以上,激光损伤阈值为8J/cm2.镀有保护膜的KDP晶体在相对温度稳定的环境下放置半年多后透射率基本保持不变.     

非λ/4两层增透膜

非λ/4两层增透膜对材料折射率的选择要求不很严格,可以在各种基板上达到接近零反射的效果。因此,很适合在激光器件上使用。曾在K_9、ZF_2、石英、水晶等基板上用ZnS、MgF_2、Al_2O_3、CeO_2、ZrO_2、SiO_2等镀薄材料做过多次试验,并在石英基板上镀ZrO_2-SiO_2膜,得到对于6328A单面剩余反射率优于0.05%,总透过率达到99.85%～99.95%的结果。     

1064 nm负滤光片的设计与制备北大核心CSCD

针对当前可见-近红外光电探测器的激光防护要求,研究了1064 nm负滤光片的设计和制备。基于等效折射率理论,综合考虑光谱和场强分布优化,设计了由SiO2/Y_(2)O_(3)/H4组合的规整膜系和SiO2/H4组合的非规整膜系负滤光片;采用离子束辅助热蒸发沉积方式对负滤光片进行了制备,并测试了其光学和抗激光损伤性能。结果表明:在膜系结构G|(0.5LH0.5L)s|A两侧匹配减反膜可以有效减小通带波纹,调整膜系最外层厚度可以同时改善膜系的光谱特性和电场强度分布。镀制的规整膜系负滤光片在400~900 nm和1200~2000 nm波段平均透过率分别为89.98%和93.21%,1064 nm透过率为1.29%,激光损伤阈值为6.0 J/cm^(2);非规整膜系负滤光片在650~900 nm和1200~2000 nm波段平均透过率分别为93.70%和94.99%,1064 nm透过率为1.60%,激光损伤阈值为6.8 J/cm^(2)。     

激光预处理对增透膜阈值的影响

激光预处理是提高光学薄膜激光损伤阈值的有效方法之一。本文就激光预处理前后增透膜损伤阈值的变化、破斑深度的变化、膜层中电场分布情况，分析了激光预处理对阈值的影响及原因。     

热蒸发沉积TiO_2薄膜的光学及激光损伤特性

采用电子束热蒸发技术,用不同沉积速率制备了TiO_2薄膜。根据透射率谱计算了薄膜的光学带隙,采用椭偏法测量了薄膜的折射率、消光系数及厚度,分析了薄膜内部的电场强度分布,对其激光损伤特性进行了研究。结果表明,在所研究的工艺参数范围内,TiO_2薄膜的光学带隙比较稳定,随沉积速率的变化并不显著,其值大小在3.95eV-3.97eV。当沉积速率从0.088nm/s,0.128nm/s增加到0.18nm/s时,薄膜折射率从1.9782,1.9928,升高到2.0021(波长1064nm),但当沉积速率继续增加到0.327nm/s时,折射率反而降低到1.9663,薄膜的消光系数随着沉积速率的增加单调增加。采用同一高能激光损伤薄膜后,当沉积速率较低时制备薄膜的损伤斑大小基本一致,但以0.327nm/s较高速率制备的薄膜,其损伤斑明显增大。高沉积速率下制备的TiO_2薄膜的吸收较大,激光损伤阈值较低。     

纳米ZrO2薄膜的制备与表征

用水热盐溶液水解法可合成含有单斜相晶态纳米ZrO2颗粒的ZrO2溶胶体.用匀胶法制备的纳米ZrO2薄膜厚度约160 nm,折光率为1.56.纳米ZrO2薄膜表面质量良好,无表面裂隙,台阶仪研究表明薄膜表面粗糙度算术差Ra=2.7 nm,均方根差Rq=3.7 nm.以ZrO2为高折射率膜层,碱催化的溶胶凝胶SiO2为低折射率膜层,制备了SiO2/ZrO2多层高反射率薄膜,10周期的SiO2/ZrO2多层膜系,在1.06 μm波段处透过率为1%,薄膜表面抗激光损伤阈值约15 J/cm2(1.06 μm,2.5 ns高功率激光作用下).     

不同技术制备DLC膜的激光损伤特性研究

随着高能量大功率激光器的发展和激光元件的广泛应用,用于红外窗口表面增透保护的类金刚石薄膜(DLC)的抗激光损伤特性成为评价薄膜质量优劣的一个重要指标。然而,不同的制备方法和技术沉积的DLC薄膜具有各异的微观结构,从而具有不同的抗激光损伤特性。本文采用脉冲真空电弧(PVAD)和非平衡磁控溅射(UBMS)技术沉积了DLC膜,对两种DLC膜抗激光损伤特性进行了研究,测试结果表明,两种技术沉积的DLC薄膜激光损伤阈值分别0.6 J/cm2和0.3 J/cm2,PVAD技术比UBMS技术沉积的DLC薄膜具有更高的抗激光损伤阈值。基于实验研究了薄膜光学常数和表面形态,分析了两种技术制备DLC膜激光损伤特性差异的主要原因。结果表明,采用UBMS技术沉积的DLC膜具有较小的折射率和较大的消光系数,薄膜表面存在较多的疵病和缺陷,这些是其激光损伤阈值较低的主要原因。     

Antireflection coatings for UV radiation obtained by molecular-beam deposition

We have developed fluoride antireflection (AR) coatings on MgF(2) substrates for a wavelength of 248 nm by molecular-beam deposition. Transmission and laser-induced damage threshold of the samples were measured and atomic force microscope (AFM) investigations were carried out. We compare a 14-layer design for AR coatings with sublayer thicknesses of 12 nm with a conventional two-layer design with quarter-wavelength thicknesses. The laser-induced damage threshold of the 14-layer coating is slightly higher than that of the two-layer coating. The AFM surface images show that the 14-layer coating has a smoother surface than the two-layer coating.     

自组装法制备中空二氧化硅纳米粒子减反射薄膜

以正硅酸乙酯(TEOS)为壳层材料, 聚丙烯酸(PAA)为核材料, 以传统的Stöber水解法为基础制备得到结构规整的中空二氧化硅纳米粒子, 并采用自组装法制备单层减反射薄膜和宽波段双层减反射薄膜。主要研究中空二氧化硅纳米粒子的结构调控方法; 自组装次数和中空二氧化硅纳米粒子分散液的pH值对减反射薄膜透光率的影响规律, 以及具有渐变折射率的双层减反射薄膜的制备。研究结果表明: 通过调节PAA和TEOS的用量可精确调控中空二氧化硅纳米粒子的粒径和空腔体积分率, 进而可精确调控减反射薄膜的厚度和折射率; 通过酸洗工艺, 将自组装次数由10次减少为2次, 简化了涂膜的工艺条件, 在最佳工艺条件下所制备的单层减反射薄膜在350~800 nm波长范围内可显著提高玻璃的透光率, 在最佳波长(λ=520 nm)处将玻璃的透光率由91.6%提高至98.1%; 双层减反射薄膜可在更宽的波段范围内提高基材的透光率, 在400~1500 nm波长范围内将玻璃的透光率提高了5%以上。     

Characterization of low losses in optical thin films and materials

Residual absorption in optical coatings and materials is directly measured by means of the laser-induced deflection (LID) technique. For transmissive coatings a measurement strategy is introduced that allows for the separation of different absorptions of the investigated sample (bulk, coating, surface) by use of only one sample. Laser irradiation yields absorption values between 2 x 10(-3) and 2.9 x 10(-2) for antireflecting and highly reflecting (HR) coatings at 193 nm and 30.6 x 10(-6) for a HR mirror at 527 nm. Use of laser-induced fluorescence at 193 nm excitation reveals trivalent cerium and prasodymium and hydrocarbons in different single layers and coatings. In addition to correlation with absorption data, the influence of a high fluorescence quantum yield on the absorption measurement is discussed.     

Chemomechanical effects in optical coating systems

The major in-service failure mechanisms of modern optical coatings for architectural glass can be mechanical (e.g. scratch damage). Many of these coatings are multilayer structures of less than 100 nm thickness and different coating architectures are possible (i.e. different layer materials, thickness and stacking order). These coatings are exposed to different types of climatic conditions. In such circumstances it has been shown that chemomechanical effects can lead to changes in the hardness as well as the fracture resistance of bulk oxides. High performance glass is coated with anti-reflection coatings (e.g. ZnO, SnO₂) and barrier layers (e.g. TiO_xN_y) which are also expected to suffer from such chemomechanical effects. In this study we have demonstrated the chemomechanical behaviour of a range of optical coatings exposed to water. Water exposure tends to reduce the hardness and increase the fracture resistance of the coating making it more vulnerable to plastic deformation during scratching. The susceptibility of different coatings to chemomechanical effects is discussed.     

Microstructure-related properties at 193 nm of MgF2 and GdF3 films deposited by a resistive-heating boat

MgF2 and GdF3 materials, used for a single-layer coating at 193 nm, are deposited by a resistive-heating boat at specific substrate temperatures. Optical characteristics (transmittance, refractive index, extinction coefficient, and optical loss) and microstructures (morphology and crystalline structure) are investigated and discussed. Furthermore, MgF2 is used as a low-index material, and GdF3 is used as a high-index material for multilayer coatings. Reflectance, stress, and the laser-induced damage threshold (LIDT) are studied. It is shown that MgF2 and GdF3 thin films, deposited on the substrate at a temperature of 300 degrees C, obtain good quality thin films with high transmittance and little optical loss at 193 nm. For multilayer coatings, the stress mainly comes from MgF2, and the absorption comes from GdF3. Among those coatings, the sixteen-layer design, sub/(1.4L 0.6H)8/air, shows the largest LIDT.     

Fluoride antireflection coatings deposited at 193 nm

Antireflection coatings for 193 nm composed of low-index (MgF(2) and AlF(3)) and high-index (LaF(3) and GdF(3)) materials are deposited by the resistive heating boat method at a substrate temperature of 300 degrees C. The optical characteristics (reflectance and optical loss), microstructure (morphology and surface roughness), stress, and laser-induced damage threshold (LIDT) of the coatings are investigated and discussed. The related reflection at 193 nm of the four kinds of antireflection coatings is smaller than 0.2% and the optical loss is less than 0.15%. Of the fluoride antireflection coatings, AlF(3)/GdF(3) had the lowest stress value. Antireflection coatings with AlF(3) as the low-index material had higher LIDT values than when MgF(2) was used.     

Sol–gel broadband anti-reflective single-layer silica films with high laser damage threshold

A simple processing of preparing broadband anti-reflective single-layer silica films is presented in this article. By adding polyvinylpyrrolidone (PVP) into reactant mixture, PVP-containing SiO₂ sol was obtained under base catalyzed hydrolysis and condensation of tetraethoxysilane. The spin-coating films and the dip-coating films were deposited on one side and two sides of quartz substrates. The anti-reflection band is 315 nm wide for dip-coating film and 559 nm wide for spin-coating film and the transmittance reached to 99.95 and 95.92% for dip-coating film and spin-coating film, respectively. By a Nd:YAG lasers the laser damage threshold of as-deposited films was measured at 1064 nm wavelength (1 ns pulse). It ranged from 24 to 33 J/cm² with an average of 28.7 J/cm². Compared to SiO₂ sol without PVP, not only was the anti-reflection band broadened but the anti-reflection and laser damage threshold were retained.     

Micromechanical properties of amorphous carbon coatings deposited by different deposition techniques

Amorphous carbon coatings about 20 nm thick are commonly used as an overcoat on magnetic thin-film rigid disks and tape and disk head surfaces to improve their wear performance. In this study, we deposited amorphous carbon coatings with thicknesses ranging from 20 to 400 nm on single-crystal silicon substrates by four deposition processes: cathodic arc, ion beam deposition, r.f.-plasma-enhanced chemical vapor deposition, and r.f. sputtering. R.f.-sputtered SiC coatings were also deposited for comparison. The hardness, elastic modulus, and scratch resistance of these coatings were measured by nanoindentation and microscratching using a nanoindenter. The cathodic arc carbon coatings followed by sputtered SiC coatings exhibited the highest hardness, elastic modulus, scratch resistance/adhesion, and residual compressive stresses. The critical load, a measure of the scratch resistance/adhesion of the coating, increases with thickness. The cathodic arc coatings of lower thicknesses (˜ 30 nm) exhibited instant damage when the normal load exceeded the critical load, whereas thick coatings (greater than or equal to 100 nm) exhibited gradual damage through the formation of tensile cracks. The sputtered carbon coatings exhibited damage to the coating at very low loads and ploughing of the tip into the coating occurred right from the beginning of the scratch.     

Defect induced laser damage in oxide multilayer coatings for 248 nm

Photothermal displacement microscopy is used for the detection of μm-sized defects in Al₂O₃/SiO₂ multilayer coatings highly reflective for 248 nm. It is shown that for high quality coatings the global (averaged over several cm²) laser-induced damage threshold for coatings of different quality is determined by the density and absorption strength of the light absorbing defects. This is confirmed by a measurement of local (averaged over 0.01 mm²) damage thresholds with the pulsed photoacoustic mirage technique allowing a direct correlation of local damage with photothermally detected thin film defects. An analysis of laser-damaged spots reveals damage-craters of 13 μm diameter at the onset of detrimental irradiation effects. The formation of these craters is explained by a thermoelastic model describing the tensile stress in the film system resulting from evaporation of a defect located at the interface between thin film and substrate.     

In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens

A simple and sensitive mode-mismatched thermal lens (TL) technique with a pulsed top-hat beam excitation and a near-field detection scheme is developed to measure in situ the thermoelastic and the thermooptical responses of ultraviolet (UV) dielectric coatings as well as bulk materials under excimer laser (193- or 248-nm) irradiations. Owing to its high sensitivity, the TL technique can be used for measurements at fluences far below the laser-induced damage threshold (LIDT). We report on the measurement of both linear and nonlinear absorption of the UV dielectric coatings and bulk materials as well as the investigation of time-resolved predamage phenomena, such as laser conditioning of highly reflective dielectric coatings and irradiation-induced changes of a coating's various properties. The pulsed TL technique is also a convenient technique for accurate measurement of the LIDT of dielectric coatings and for distinguishing different damage mechanisms: thermal-stress-induced damage or melting-induced damage.