共查询到20条相似文献,搜索用时 15 毫秒
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报道了制备在50mm石英玻璃衬底上的透明氧化锌薄膜晶体管(ZnO-TFT),采用了底栅和顶栅两种结构进行比较.ZnO沟道层由射频磁控溅射方法制备,SiO2薄膜作为栅绝缘层.结果发现底栅结构的ZnO-TFT具有较好的电学性质,该器件工作在n沟道增强模式,具有较好的夹断效应和饱和特性,其场效应迁移率、阈值电压和电流开关比分别为18.4cm2/(V·s),-0.5V和104.顶栅结构的ZnO-TFT则工作在n沟道耗尽模式,没有明显的饱和特征.不同结构ZnO-TFT电学性质的差别可能是由于不同的ZnO/SiO2界面特性所致.两种结构的ZnO-TFT在可见光波段都有很高的光学透过率. 相似文献
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报道了制备在50mm石英玻璃衬底上的透明氧化锌薄膜晶体管(ZnO-TFT),采用了底栅和顶栅两种结构进行比较.ZnO沟道层由射频磁控溅射方法制备,SiO2薄膜作为栅绝缘层.结果发现底栅结构的ZnO-TFT具有较好的电学性质,该器件工作在n沟道增强模式,具有较好的夹断效应和饱和特性,其场效应迁移率、阈值电压和电流开关比分别为18.4cm2/(V·s),-0.5V和104.顶栅结构的ZnO-TFT则工作在n沟道耗尽模式,没有明显的饱和特征.不同结构ZnO-TFT电学性质的差别可能是由于不同的ZnO/SiO2界面特性所致.两种结构的ZnO-TFT在可见光波段都有很高的光学透过率. 相似文献
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薄膜晶体管(TFT)作为开关元件广泛应用于平板显示领域,沟道层材料的选择直接影响了TFT的性能.近年来,基于非晶氧化物半导体(AOS)沟道层材料的TFT已成为具有潜力替代传统硅材料(非晶硅或多晶硅)沟道层TFT的新一代技术,有望应用于超大屏显示、3D显示、柔性显示以及透明显示等新一代显示领域.综述了AOS TFT沟道层的研究进展,重点介绍了AOS TFT用AOS沟道层在材料体系、成膜技术、薄膜的后续处理工艺、材料体系中各元素含量以及掺杂等方面的研究成果,并分析了AOS沟道层对AOS TFT性能的影响以及存在的问题,对AOS TFT的未来发展趋势进行了预测和展望. 相似文献
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Himchan Oh Sang‐Hee Ko Park Min Ki Ryu Chi‐Sun Hwang Shinhyuk Yang Oh Sang Kwon 《ETRI Journal》2012,34(2):280-283
By inserting H2O treatment steps during atomic layer deposition of a ZnO layer, the turn‐on voltage shift from negative bias stress (NBS) under illumination was reduced considerably compared to that of a device that has a continuously grown ZnO layer without any treatment steps. Meanwhile, treatment steps without introducing reactive gases, and simply staying under a low working pressure, aggravated the instability under illuminated NBS due to an increase of oxygen vacancy concentration in the ZnO layer. From the experiment results, additional oxidation of the ZnO channel layer is proven to be effective in improving the stability against illuminated NBS. 相似文献
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Kyungyea Park Deok‐Kyou Lee Byung‐Sung Kim Haseok Jeon Nae‐Eung Lee Dongmok Whang Hoo‐Jeong Lee Youn Jea Kim Jong‐Hyun Ahn 《Advanced functional materials》2010,20(20):3577-3582
Stretchable and transparent thin film transistors (TFTs) with intrisically brittle oxide semiconductors are built using a wavy structural configuration that can provide high flexibility and stretchability. After device fabrication procedures including high temperature annealing, the oxide semiconductor‐based TFT arrays can be transferred directly to plastic or rubber substrates, without an additional device process, using transfer printing methods. This procedure can avoid some of the thermal degradation problems associated with plastic or rubber substrates by separating them from the annealing procedure needed to improve the device performance. These design and fabrication methods offer the possibility of developing a new format of stretchable electronics. 相似文献
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以玻璃为衬底,利用金属有机化学气相沉积(MOCVD)方法,在360℃附近实现ZnO薄膜的生长.利用ZnO为有源层制备底栅型薄膜晶体管.SiO2 被用作栅绝缘材料以有效的抑制漏泄电流的产生,达到氧化锌薄膜晶体管 (ZnO-TFT) 成功运作目的.ZnO-TFT 的电流开关(on/off)比达到104以上.ZnO-TFT 在可见光区平均光透过率大约为80%.以上表明利用ZnO 替代传统 Si 材料作有源层材料制备透明薄膜晶体管是可能的. 相似文献
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Kyongjun Kim Siyun Park Jong‐Baek Seon Keon‐Hee Lim Kookheon Char Kyusoon Shin Youn Sang Kim 《Advanced functional materials》2011,21(18):3546-3553
Flexible transparent thin‐film transistors (TTFTs) have emerged as next‐generation transistors because of their applicability in transparent electronic devices. In particular, the major driving force behind solution‐processed zinc oxide film research is its prospective use in printing for electronics. Since the patterning that prevents current leakage and crosstalk noise is essential to fabricate TTFTs, the need for sophisticated patterning methods is critical. In patterning solution‐processed ZnO thin films, several points require careful consideration. In general, as these thin films have a porous structure, conventional patterning based on photolithography causes loss of film performance. In addition, as controlling the drying process is very subtle and cumbersome, it is difficult to fabricate ZnO semiconductor films with robust fidelity through selective printing or patterning. Therefore, we have developed a simple selective patterning method using a substrate pre‐patterned through bond breakage of poly(methyl methacrylate) (PMMA), as well as a new developing method using a toluene–methanol mixture as a binary solvent mixture. 相似文献
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利用高纯度、高均一性的半导体型单壁碳纳米管(s-SWCNT)网络薄膜作为薄膜晶体管的沟道材料,以高透明度、低薄膜电阻的银纳米线(Ag NW)网络薄膜作为源、漏电极,在玻璃基底上制备了大面积、高透明度的碳纳米管薄膜晶体管阵列,并使用聚甲基丙烯酸甲酯(PMMA)薄膜在器件表面通过干法封装获得了较低回滞的电子器件,得到了整体透明度达到82%以上的器件。提出的器件制备方法不仅制备材料易得,不需要高温过程,而且能够实现器件的大面积制备,对碳纳米管薄膜晶体管的全透明柔性化进程具有推进作用。 相似文献