40Cr钢表面离子镀TiAlN涂层的膜基结合力研究

采用多弧离子镀的方法在齿轮材料40Cr钢基体表面上制备TiAlN涂层,分析了工艺参数对涂层与基体结合力的影响。结果表明,随着基体负偏压的增加,膜基结合力增强,当超过某一最大值时膜基结合力会逐渐下降。随着N_2分压的增加,膜基结合力逐渐增强。     

基体材料对AlCrN硬质涂层结构及摩擦学性能的影响

采用真空阴极多弧离子镀技术,分别在Cr8、W6、Cr12及V-4E四种不同材质模具钢表面制备了Al Cr N多元纳米硬质涂层。利用划痕仪、工具显微镜、HV显微硬度计、球磨仪、SEM及XRD对Al Cr N涂层硬度,膜层厚度、结合力、摩擦系数进行了对比测试,并对涂层磨痕宽度、划痕宽度、表面形貌及相结构进行了表征。结果表明:相对于其它三种基材,V-4E基材的Al Cr N涂层显微硬度更高、膜基结合力更好、摩擦系数更低、耐磨性最好;四种基材的表面形貌基本一致,均有大颗粒及凹坑,V-4E基材Al Cr N涂层的晶粒尺寸最小,沉积的Al Cr N涂层结构更致密,耐磨性更优异。     

电弧离子镀(Ti,Cr)N涂层的制备与性能研究

采用电弧离子镀膜机,通过调节Ti靶和Cr靶的阴极弧电流,在W6Mo5Cr4V2高速钢基体上制备了（Ti1-x Crx）N涂层,并对其组织结构和性能进行了研究。结果表明,该涂层具有较高的显微硬度,而且随Cr含量的增加,硬度值先增大后减小;涂层具有较高的膜基结合力;Cr的引入不仅有利于提高膜基结合力,对（Ti,Cr）N涂层的抗氧化性也有好处,在700℃时具有很好的抗氧化性。     

TC4钛合金表面沉积TiCN涂层及其耐磨耐腐蚀性能研究

目的提高TC4钛合金的耐磨耐蚀性能。方法采用双阴极等离子溅射沉积技术在TC4合金表面制备了TiCN涂层。通过XRD表征了涂层的物相组成,并通过SEM表征了涂层的微观形貌。利用声发射划痕仪研究了涂层与基体的结合力,摩擦磨损试验机用于研究TiCN涂层的摩擦磨损性能。用电化学工作站在3.5%NaCl溶液中进行电化学实验。结果所沉积涂层均匀致密,无明显缺陷,涂层由外层厚度约为8μm的TiCN沉积层和其下约4μm厚的过渡层组成。TiCN涂层与TC4基体的结合强度比较高,其结合力达到66.4 N。室温条件下法向载荷相同时,TiCN涂层的磨痕宽度远小于TC4钛合金基体的磨痕宽度。TiCN涂层的比磨损率为(1～2)×10-5 mm~3/(N·m),TC4钛合金的比磨损率为(2～4)×10~(-4) mm~3/(N·m),TiCN涂层的比磨损率较TC4钛合金降低了1个数量级以上,并且对载荷的变化不敏感。TiCN涂层与TC4钛合金基体比较,具有更高的自腐蚀电位和更低的腐蚀电流密度,涂层的腐蚀电流密度为1.57×10-9 A/cm~2,TC4钛合金的腐蚀电流密度为1.35×10-8 A/cm~2,涂层的腐蚀电流密度较钛合金基体小1个数量级。TiCN涂层的EIS阻抗谱容抗弧值也较大。结论双阴极等离子溅射沉积TiCN涂层可以有效提高TC4钛合金的耐磨耐腐蚀性能。     

不同PVD技术沉积TiN涂层的形貌和力学性能研究（英文）

采用阴极弧沉积、中频磁控溅射及二者的复合技术在GCr15基底上制备了TiN涂层。通过扫描电镜、XRD谱、微米划痕测试、硬度测试以及摩擦磨损测试对涂层的组织结构和力学性能进行了表征及对比。结果表明,采用复合磁控阴极弧技术制备的TiN涂层具有较好的综合性能,如较光滑的表面、较高的结合力和硬度,故磨损率较低。     

不同PVD技术沉积TiN涂层的形貌和力学性能研究

本文采用阴极弧沉积、中频磁控溅射及二者的复合技术在GCr15基底上制备了TiN涂层。通过扫描电镜、XRD谱、微米划痕测试、硬度测试以及摩擦磨损测试对涂层的组织结构和力学性能进行了表征及对比。结构表明,采用复合磁控阴极弧技术制备的TiN涂层具有较好的综合性能,如较光滑的表面、较高的结合力和硬度,故磨损率较低。     

锆合金表面涂层耐高温高压动水腐蚀性能的研究

目的 提高锆合金在高温高压环境中耐动水腐蚀性能。方法 利用多弧离子镀技术（MAIP）在Zr-4合金表面分别制备了Al2O3涂层和Cr/TiAlN复合涂层,利用磁控溅射技术（MS）在Zr-4合金表面制备了TiN涂层。通过堆外高压釜实验,对比研究了三种不同涂层的耐高温高压动水腐蚀性能,利用自动划痕仪检测膜基结合力,利用XRD分析涂层的物相成分,利用SEM观察涂层腐蚀前后的微观形貌,利用EDS对涂层元素种类与含量进行分析。结果 多弧离子镀技术制备的Al2O3涂层和Cr/TiAlN涂层致密度较高,但表面存在少量大颗粒与微孔洞;磁控溅射技术制备的TiN涂层均匀平整,表面大颗粒较少。Al2O3涂层、TiN涂层和Cr/TiAlN涂层可承受的临界载荷分别为26、16、26.5 N。在实验条件下,Cr/TiAlN涂层和TiN涂层表面均发生了剥落或腐蚀现象,且这两种试样表面均检测出大量的ZrO2,而Al2O3涂层几乎未被破坏,基体得到了充分防护。结论 利用多弧离子镀技术在Zr-4合金表面制备的Al2O3涂层和Cr/TiAlN涂层的膜基结合力较高,利用磁控溅射技术制备的TiN涂层的膜基结合性能较差,其中Al2O3涂层具备良好的耐腐蚀性能,在高温高压动水腐蚀环境中能够有效地保护锆合金基体。     

滚轮表面TiAlSiN涂层制备及失效机理研究

目的通过对滚轮表面制备超硬纳微米TiAlSiN涂层,提高滚轮的综合工作性能。方法采用阴极电弧离子镀膜技术在滚轮工作面及高速钢试样表面制备超硬纳微米TiAlSiN涂层。通过X射线荧光测量系统测量涂层厚度,采用扫描电子显微镜(SEM)观察涂层表面特征和形貌,采用能谱仪(EDS)对涂层元素的成分进行分析,通过纳米压痕仪及洛氏硬度计对涂层的硬度及膜基结合力进行测定和分析。结果滚轮表面1.97μm厚的TiAlSiN涂层的Si原子数分数为4.21%,其显微硬度为37.69 GPa,涂层与基体的膜基结合力符合VDI-3198工业等级的HF3,呈现出较强的膜基结合力。经生产线上滚压机实际成形加工验证,涂层后滚轮的工作寿命是未涂层滚轮的5倍,滚轮具有强度高、耐磨损、抗氧化、耐腐蚀、粘附性降低等特性,显著改善了磨损、剥落、疲劳裂纹、缠辊、粘滚等现象。结论在滚轮表面制备超硬纳微米TiAlSiN涂层,能显著提高滚轮的综合工作性能。     

锆合金表面渗氮层对TiAlN涂层结合力的影响

对锆合金基材表面分别进行离子渗氮和气体氮碳共渗,然后采用多弧离子镀技术在锆合金渗氮层表面制备Ti Al N涂层,并与锆合金基材表面直接制备的Ti Al N涂层进行对比,研究渗氮层对涂层结合力的影响。用立式万能摩擦磨损试验机进行摩擦磨损试验;用显微硬度计测试显微硬度;用洛氏硬度计进行压痕试验;用划痕仪测试膜基结合力。试验结果表明:锆合金经过渗氮处理其表面摩擦因数保持稳定;表面硬度和膜基结合力均有所提升,且气体氮碳共渗后的表面硬度和膜基结合力比离子渗氮略高。     

电弧离子镀电磁线圈电压对TiAlN涂层结构及性能的影响

目的 揭示电弧离子镀过程中,电磁和永磁复合磁场耦合作用下电磁线圈偏压对TiAlN涂层结构及性能的作用规律,优化TiAlN涂层制备工艺。方法 采用电弧离子镀技术在M2高速钢基体表面沉积高Al含量Ti0.33Al0.67N涂层（TiAl靶,原子数分数,Ti∶Al=1∶2）。改变电磁线圈电压,研究涂层微观组织结构、表面粗糙度、硬度、膜/基结合力和耐磨性的变化规律。结果 在15~45 V范围内,电磁线圈电压小于30 V时,Ti0.33Al0.67N涂层内部致密;线圈电压大于30 V时,涂层内部变得疏松。线圈电压为15 V时,TiAlN涂层表面粗糙度最小,为0.2 μm。随着线圈电压升高,Ti0.33Al0.67N涂层硬度增大,线圈电压为45 V时,Ti0.33Al0.67N涂层硬度达到最大,为3866HV0.025。随着线圈电压的升高,Ti0.33Al0.67N涂层膜/基结合力及耐磨性先增加后减小,线圈电压为15 V时,结合力最高,为95.4 N,磨损率达到最低,为1.62×10-15 m3/(N?m)。结论 在线圈电压较小时,随着电压的升高,作用于阴极靶材的磁场强度增加,阴极弧斑速度加快,每个弧光点维持时间缩短,能量降低,离化率升高,溅射出的液滴数量减少,涂层结构致密,粗糙度降低,硬度和耐磨性能升高;随着线圈电压进一步升高,磁场强度继续增大,弧斑运动受到的磁性束缚力增大,弧斑运动半径向靶材中心收缩,作用于固定位置的弧光累计时间更长,离化率降低,液滴增多,涂层综合性能下降。     

负偏压在电弧离子镀沉积TiN／TiCN多层薄膜中的作用

用电弧离子镀方法在高速钢、不锈钢与铜基体上沉积合成Ti/TiCN多层薄膜,在其他参数不变的情况下只改变负偏压,着重考察不同负偏压下薄膜的沉积深度、膜基结合强度、显微硬度以及表面形貌等,研究基体负偏压在沉积多层薄膜中所起的作用。结果表明,负偏压影响沉积温度,负偏压值越大,温度越高;负偏压值增大,表面形貌中的大颗粒数量减少,薄膜质量得到改善;负偏压在－300V左右时,膜基结合强度与硬度出现对应最佳性能点的峰值。     

电子束蒸发镀铬制备凹印版材耐磨层的研究

利用电子束蒸发镀技术在铜表面沉积铬层,并对制备的工艺,涂层的性能行了初步研究.结果显示,采用低电压(6kV)和低束流(50mA、60mA))蒸镀时,沉积速度适中,所得的膜层呈银白色且光亮,内应力较小,无开裂现象,镀层厚度均匀,硬度较高,且与基体结合良好.适当控制电子枪的工艺参数和烘烤时间可以增加薄膜与基体的结合力.     

偏压对电弧离子镀CrNx薄膜结构和机械性能的影响

采用电弧离子镀技术在不锈钢基体表面制备了CrNx薄膜,并采用场发射扫描电镜、X射线衍射仪、显微硬度仪、球-盘式摩擦磨损试验机等手段对在不同偏压下沉积的CrNx薄膜的表面形貌、相结构、显微硬度和摩擦学性能进行考察.结果表明:随着偏压的增加, CrNx薄膜沉积率下降,厚度降低,CrNx薄膜表面颗粒逐渐变少,表面粗糙度降低,结晶度增大,晶粒尺寸增加;CrNx薄膜由Cr2N相和CrN相组成,薄膜的择优取向发生较大变化.当偏压为-100V时,CrNx薄膜的表面结构最致密,硬度最高,抗磨损性能最强.     

Study of adhesion of TiN grown on a polymer substrate

TiN films were deposited on polycarbonate substrates by cathodic vacuum arc using the plasma immersion ion implantation and deposition (PIII&D) method. The biaxial intrinsic stress in the film deposited using PIII&D with 3 kV applied bias was 0.3 GPa — much lower than that found in films deposited without the application of high-voltage pulsed bias. It was found that the dominant mechanism for generating stress in the TiN film was thermal stress arising from the large difference between the thermal expansion coefficient of TiN and that of the polymer. Tensile testing was used to ascertain film adhesion and a model was used to estimate the adhesion between the film and the substrate. It was found that PIII&D strongly reduced the stress in the TiN film and increased the adhesion to the polycarbonate. The ultimate shear strength of adhesion is of the same order of magnitude as that of TiN on stainless steel.     

沉积温度对钢球表面含氢碳薄膜结构和摩擦学性能的影响

目前,含有类富勒烯碳结构的氢化碳薄膜(FL-C:H)主要通过等离子体增强化学气相沉积技术(PECVD)在单晶硅表面制备。文中在碳薄膜PECVD沉积工艺之前,通过额外引入原位渗氮方法在钢球表面沉积过渡层以增强薄膜与基材结合力,从而成功制备了具有类富勒烯结构的含氢碳薄膜。通过改变钢球表面碳膜沉积时间(30、60、90、120、150和180 min)获得厚度不同、结构变化的碳膜,进而研究碳膜的结构演变与摩擦学性能之间的关系。结果表明:FL-C:H薄膜PECVD沉积工艺(采用了比额外引入的原位渗氮工艺更低的基底偏压)使钢基底温度随沉积时间增加而下降,导致薄膜结构转变。碳膜结构最初为类石墨结构,随着沉积时间的增长逐渐转变为类富勒烯结构;沉积时间为180 min的碳基薄膜具有超低摩擦因数(0.009)和超长磨损寿命(53 000个周期)。     

UHV arc for high quality film deposition

The vacuum arc is a well-known technique for producing coatings with enhanced adhesion and film density. Many cathodic arc deposition systems are actually in use in industry and research. They all work under (high) vacuum conditions in which water vapor pressure is an important source of film contamination, especially in the pulsed arc mode of operation. Here we present a cathodic arc system working under ultra-high vacuum conditions (UHVCA). We have used for arc ignition a Nd-YAG pulsed laser focused on the cathode surface, which provides a reliable system and allows eliminating all possible sources of contaminants. We have proven that the arc technique produces bulk-like films suitable for superconducting applications. UHVCA has been used to produce ultra-pure niobium films with excellent structural and electrical properties at a deposition temperature lower than 100 °C. The UHVCA technique therefore opens up new perspectives for all applications requiring pure films and low deposition temperatures.     

阴极电弧制备TiAlN薄膜工艺参数的正交分析研究

为深入理解不同工艺参数对阴极电弧制备TiAlN薄膜性质的影响重要性,文中设计了L9(34)正交试验表,研究了基体负偏压、N2流量、阴极弧流对TiAlN沉积速率、表面粗糙度的影响,给出了工艺参数优化组合。结果表明:负偏压对TiAlN薄膜的沉积速率影响最大,其次是N2流量、弧流;对表面粗糙度的影响次序则为N2流量、弧流、负偏压。薄膜沉积速率随N2流量的升高而增大,随负偏压增加先增加后降低,随弧流的增大变化不明显。薄膜表面粗糙度随N2流量的升高逐渐减小,随负偏压的增加而增加,随弧流的增大而增大。     

Fast chemical vapor deposition of microcrystalline silicon by applying magnetic field to hollow electrode enhanced radio frequency glow plasma

Fast chemical vapor deposition of microcrystalline silicon by applying magnetic field to hollow electrode enhanced radio frequency (rf) glow plasma has been investigated. We have already developed a plasma generation technique called hollow electrode enhanced rf glow plasma transportation (HEEPT). In this study, we equipped a HEEPT system with a hollow cylinder shaped permanent magnet around an orifice prepared at the center of the counter electrode. The plasma was characterized by plasma emission spectroscopy. Silicon thin films were deposited on a glass substrate. It was found that increasing the magnetic flux density resulted in increasing plasma emission intensity, film deposition rate, and crystallinity. The maximum deposition rate of 6.9 nm/s was achieved with high crystallinity and photo-sensitivity at a plasma excitation frequency of 13.56 MHz, a substrate temperature of 300 °C and a magnetic flux density of 75 mT. Our results indicate that the magnetic field is effective in promoting fast chemical vapor deposition of microcrystalline silicon thin films with photo-sensitivity using the HEEPT technique. We consider that the effectiveness is due to a decrease of electron temperature caused by drift motion of electrons in the magnetic field inside the orifice.     

Microstructural, mechanical and tribological properties of tungsten-gradually doped diamond-like carbon films with functionally graded interlayers

A series of tungsten-gradually doped diamond-like carbon (DLC) films with functionally graded interlayer were prepared using a hybrid technique of vacuum cathodic arc/magnetron sputtering/ion beam deposition. With ‘compositionally graded coating’ concept, the deposition of wear-resistant carbon-based films with excellent adhesion to metallic substrate was realized. In the films, a functionally graded interlayer with layer sequence of Cr/CrN/CrNC/CrC/WC was first deposited onto the substrate, and then, a DLC layer doped with gradually decreasing content of W was coated on. The W concentration gradient along depth of the film was tailored by adjusting the W target current and deposition time. The characterized results indicate that the microstructural, mechanical and tribological properties of these films show a significant dependence on the W concentration gradient. A high fraction of W atom in carbon matrix can promote the formation of sp² sites and WC_1 − x nanoparticles. Applying this coating concept, strongly adherent carbon films with critical load exceeding 100 N in scratch test were obtained, and no fractures or delaminations were observed at the end of the scratched trace. The hardness was found to vary from 13.28 to 32.13 GPa with increasing W concentration. These films also presented excellent tribological properties, especially significantly low wear rate under dry sliding condition against Si₃N₄ ball. The optimum wear performance with friction coefficient of 0.19 and wear rate of 8.36 × 10⁻⁷ mm³/Nm was achieved for the tungsten-gradually doped DLC film with a graded W concentration ranging from 52.5% to 17.8%. This compositionally graded coating system might be a potentially promising candidate for wear-resistant carbon-based films in the demanding tribological applications.