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紫外光固化涂料的进展 总被引:48,自引:7,他引:41
综述了紫外光固化涂料在我国的发展历程,并从以下几个方面介绍紫外光固化技术的一些新进展:阳离子光固化体系、自由基-阳离子混杂光固化体系、星型超分枝化合物及其在光固化体系中的应用、光引发剂的高分子化、含颜料的光固化涂料的配制、水性光固化涂料、光固化粉末涂料、紫外光源的选择。 相似文献
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自由基-阳离子混杂光固化体系研究概况 总被引:5,自引:0,他引:5
混杂光固化是指在同一体系中采用2种或2种以上不同类型的聚合反应使体系固化的方法。混杂光固化体系中比较重要的是自由基-阳离子混杂光固化体系。本文介绍了自由基-阳离子混杂光固化体系的原理及发展概况。 相似文献
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混杂光固化体系的原理及应用 总被引:17,自引:0,他引:17
混杂光固化或双重固化是指在同一体系中采用两种或两种以上不同类型的聚合反应来使体系固化的方法,它是原位改性高分子的一种新方法,混杂光固化体系包括自由基-阳离子混杂光固化体系,自由基-缩聚混杂体系和自由基-自由基混杂体系等,本文综述了混杂光固化体系的原理及其应用。 相似文献
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光引发剂在光固化领域里有着非常重要的作用。随着各种光引发剂的发展,带动了紫外光固化粘合剂的一系列同步发展。综述了光引发剂以及它们在紫外光固化粘合剂中的应用研究进展。 相似文献
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紫外光固化涂料的研究进展及发展趋势 总被引:1,自引:0,他引:1
紫外光固化涂料是一种新型绿色环保节能涂料,近年来发展迅速。本文重点综述了紫外光固化涂料的国内外发展概况,介绍了光固化涂料的固化原理、组成及性能,阐述了其研究及应用现状,指出水性化和粉末化将是紫外光固化涂料未来的发展方向。 相似文献
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Sophie Putzien Eckhart Louis Oskar Nuyken James V. Crivello Fritz E. Kühn 《应用聚合物科学杂志》2012,126(4):1188-1197
Several epoxy difunctional hybrid alkylene‐silicone telomers with different silicone characters and organic spacers (linkers) were prepared via the platinum‐catalyzed polyhydrosilylation of α,ω‐dihydrosiloxanes and α,ω‐dienes. Thereafter, the resulting Si? H‐terminated prepolymers were terminally functionalized with 4‐vinyl‐1,2‐epoxycyclohexane or allyl glycidyl ether. In the presence of a lipophilic cationic photoinitiator, the terminally epoxy‐functionalized hybrid alkylene–silicone telomers were photopolymerized to give crosslinked, soft, elastomeric, and transparent films. The progress of the photoinitiated cationic ring‐opening epoxide polymerizations was monitored using optical pyrometry. Potential applications for these novel photocurable epoxy‐functional telomers are as modifiers for UV curable coatings, printing inks, adhesives, and release coatings. © 2012 Wiley Periodicals, Inc. J Appl Polym Sci, 2012 相似文献
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A series of silicon‐containing (vinyl ether)–(allyl ether) hybrid monomers used in nano‐imprint lithography resists were synthesized and subjected to photo‐initiated polymerization. The surface energies of the monomers and the resulting polymer films were then investigated. The surface energies of the monomers were very low at less than 15 mJ m–2. The photo‐curing behaviors of the five hybrid monomers were investigated using real‐time Fourier transform infrared spectroscopy. The monomers were sequentially initiated with cationic (PAG201) and mixed (cationic initiator PAG201, radical initiator ITX or TPO) initiators. The vinyl ether double bond polymerized both rapidly and completely, whereas the allyl ether double bond remained when PAG201 was used as the photo‐initiator and polymerized completely with mixed initiators. The different double bonds of the silicon‐containing (vinyl ether)–(allyl ether) hybrid monomer increased the efficiency of the polymerization and overcame the intrinsic limitations of the free radical and cationic polymerization processes, including strong oxygen inhibition, large volume shrinkage and high humidity sensitivity. The five monomers with low viscosity, low surface energy, good thermal stability and good photo‐polymerization properties were suitable for nano‐imprint photoresists. © 2013 Society of Chemical Industry 相似文献
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介绍了一种紫外光固化粘合剂ZUV-X的制备,讨论了预聚物、单体、光引发剂和固化装置对产品性能的影响,并将该产品的性能与同类胶作了对比。 相似文献