共查询到18条相似文献,搜索用时 109 毫秒
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用磁控射法制备Mo/Si多层膜和Mo/B4C多层膜,并在真这中加热30min,温度为200,400,600,800和1000℃。用小角X射线衍射法和透射电镜研究不同温度下加热的样品。实验结果表明,当加热温度达600℃时,Mo/Si多层膜周期被破坏。 相似文献
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用磁控溅射法制备Mo/Si多层膜(周期为25nm,20层)和Mo/B4C多层膜(周期为3.9nm,121层),并在真空中加热30min,温度为200,400,600,800和1000℃。用小角X射线衍射法和透射电镜研究不同温度下(保温0.5h)加热的样品。实验结果表明,当加热温度达600℃时,Mo/Si多层膜周期被破坏。而Mo/B4C多层膜在800℃加热温度下仍保持周期性层状结构。说明Mo/B4C多层膜不仅周期只有3.9nm,而且具有很好的热稳定性,可以作为较短波长的软X射线多层膜推广应用。 相似文献
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Raman光谱是研究纳米TiO2结构的最常用工具之一。纳米TiO2的Raman光谱研究是建立在以前对TiO2体材料的Raman光谱研究的基础之上。但是纳米TiO2与体相材料的表面性质和结构有较大的不同,其Raman光谱会产生明显变化。研究人员对纳米TiO2的Raman光谱已展开研究。本文概述了晶粒大小、结构、氧空位、退火温度、压力、相组成等因素对纳米TiO2的Raman光谱的影响。 相似文献
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采用离子束溅射方法在Si衬底上制备Si/Ge多层膜,通过改变生长温度、溅射速率等因素得到一系列Si/Ge多层膜样品;通过X射线衍射、Raman散射等表征方法研究薄膜结构与生长条件的关系。在小束流(10mA)、室温条件下制备出界面清晰、周期完整的Si/Ge多层膜。 相似文献
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Multilayered Au/Ni/Al thin film metallization deposited by DC sputtering on n+Si substrates has been investigated. AES depth profiling was performed to reveal the concentration depth profiles of the Au/Ni/Al multilayers before and after annealing at different temperatures in the range 623-723 K. It was found that Ni aluminide layers begin to form during heat treatments at temperatures above 623 K. In addition to this process, Ni was found to diffuse significantly through the Au layer and segregates at the surface, proportionally to the increased annealing temperature. Consequently, the Ni oxidation process was found to take place thus causing the degradation of electrical contact. On the other hand Ni diffuses faster as well toward the Si/Al interface. No contamination traces at interfaces were observed. Electrical measurements of the metallized diode forward characteristics showed minor influence of the metallization heat treatment on the series resistance. Degradations were observed only in the reverse characteristics if the annealing was performed above 723 K. 相似文献
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Thermal stability of hydrogenated amorphous Si/Ge multilayers has been investigated by Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and Small-Angle X-Ray Diffraction (SAXRD) techniques. Amorphous H-Si/Ge multilayers were prepared by RF sputtering with 1.5 and 6 ml/min H2 flow-rate. It is shown by Elastic Recoil Detection Analysis (ERDA) that the hydrogen concentration increased by increasing the H2 flow-rate. Annealing of the samples was carried out at 400 and 450 °C for several hours. It has been observed that samples prepared with 6 ml/min flow-rate at both annealing temperatures underwent significant structural changes: the surface of the samples was visibly roughened, gas bubbles were formed and craters were created. The decay of the periodic structure of Si and Ge layers in these types of multilayers was faster than in non-hydrogenated samples. Samples prepared with 1.5 ml/min flow-rate have similar behaviour at 450 °C, but at 400 °C the decay of the first order SAXRD peaks was slower than in case of the non-hydrogenated multilayers. Qualitatively the observed behaviour can be explained by the fast desorption of the saturated hydrogen, leading to the formation of bubbles and craters at 450 °C, as well as, at 400 °C in the sample with lower H-content, by the possible passivation of the dangling bonds resulting in a slowing down of the diffusion intermixing. 相似文献
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采用磁控溅射技术在石英衬底上制备出(Ge/SiO2)15多层膜,并在不同温度下对其进行退火处理。XRD和Raman结果表明:溅射态的薄膜为非晶态,当退火温度为500℃时开始出现明显的结晶衍射峰,随后晶化率明显增大,当600℃后,薄膜的晶化率几乎不变。FESEM和小角度X射线衍射结果表明:溅射态薄膜的层与层之间存在明显的界面,具有良好的周期性,升高退火温度,晶粒尺寸增大,但仍保持周期性结构。薄膜的紫外-可见光吸收光谱表明:随着退火温度的升高,吸收边发生红移,光学带隙从溅射态的1.86eV减小到600℃时的1.59eV。 相似文献
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We review current understanding of the island formation process, and outline some of the remaining problems. The initial island formation is coherent, with islands stabilised by the elastic relaxation associated with deformation of the substrate. We use finite element analysis to demonstrate the degree of relaxation associated with these deformations. The islands then relax further by introduction of dislocations. The first dislocations introduced in the large coherent islands are shown to be inclined burgers vectors (about 60°) adopting a nearly semicircular path around the island perimeter. The outstanding anomaly in Ge/Si growth is the temperature dependence of islanding, with slower relaxation rates and greater metastability associated with higher temperatures. We describe various possible explanations for this problem. 相似文献
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研究了Si基富Ge含量的Si1-x-yGexCy异质结构的热退火地为,采用等离子体增强化学气相淀积(PECVD)法在Si(100)衬底上淀积一层厚度为170nm的Si1-x-yGexCy薄膜(x-0.7,y-0.15),并在其上覆盖-Ge层,将样品分别在650度和800度下进行N2氛围下热退火20min。用拉曼谱(Raman),俄歇电子能谱(AES)以及X射线光电子能谱XPS等方法对样品进行研究。研究结果表明,低温PECVD法生长的Si1-x-yGexCy薄膜是一种亚稳结构,Ge/Si1-x-yGexCy/Si异质结构在650度下呈现不稳定性,薄膜中的Ge,C相对含量下降,且在界面处出现Ge,C原子的堆积,经过800度下退火20min的样品中C 含量基本为0,Ge相对含量下降至约20%左右,且薄膜的组分比较均匀。 相似文献