Multiferroic Bi0.7Dy0.3FeO3 thin films directly integrated on Si for integrated circuit compatible devices

Magnetoelectric multiferroic Bi_0.7Dy_0.3FeO₃ (BDFO) thin films deposited on p-type Si (100) substrate using pulsed laser deposition technique demonstrated a saturated ferroelectric and ferromagnetic hysteresis loop at room temperature. More interestingly, the observed change in electric polarization with applied magnetic field in these films indicated the presence of room temperature magnetoelectric coupling behavior. Using high-frequency capacitance-voltage measurements, the fixed oxide charge density, interface trap density and dielectric constant were estimated on Au/BDFO/Si capacitors. These results suggest the integrated circuit compatible application potential of BDFO films in the field of micro-electro-mechanical systems and non-volatile memories.     

The thickness effect of Bi3.25La0.75Ti3O12 buffer layer in PbZr0.58Ti0.42O3/Bi3.25La0.75Ti3O12 (PZT/BLT) multilayered ferroelectric thin films

A series of PbZr_0.58Ti_0.42O₃ (PZT) thin films with various Bi_3.25La_0.75Ti₃O₁₂ (BLT) buffer layer thicknesses were deposited on Pt/TiO₂/SiO₂/p-Si(100) substrates by RF magnetron sputtering. The X-ray diffraction measurements of PZT film and PZT/BLT multilayered films illustrate that the pure PZT film shows (111) preferential orientation, and the PZT/BLT films show (110) preferential orientation with increasing thickness of the BLT layer. There are no obvious diffraction peaks for the BLT buffer layer in the multilayered films, for interaction effect between the bottom BLT and top PZT films during annealing at the same time. From the surface images of field-emission scanning electron microscope, there are the maximum number of largest-size grains in PZT/BLT(30 nm) film among all the samples. The growth direction and grain size have significant effects on ferroelectric properties of the multilayered films. The fatigue characteristics of PZT and PZT/BLT films suggest that 30-nm-thick BLT is just an effective buffer layer enough to alleviate the accumulation of oxygen vacancies near the PZT/BLT interface. The comparison of these results with that of PZT/Pt/TiO₂/SiO₂/p-Si(100) basic structured film suggests that the buffer layer with an appropriate thickness can improve the ferroelectric properties of multilayered films greatly.     

Enhancement on effective piezoelectric coefficient of Bi3.25Eu0.75Ti3O12 ferroelectric thin films under moderate annealing temperature

Bi_3.25Eu_0.75Ti₃O₁₂ (BET) thin films were deposited on Pt/Ti/SiO₂/Si(111) substrates by a metal-organic decomposition method. The effects of annealing temperatures 600-800 °C on microstructure, ferroelectric, dielectric and piezoelectric properties of BET thin films were studied in detail. The spontaneous polarization (87.4 × 10^− 6 C/cm² under 300 kV/cm), remnant polarization (65.7 × 10^− 6 C/cm² under 300 kV/cm), the dielectric constant (992.9 at 100 kHz) and the effective piezoelectric coefficient d₃₃ (67.3 pm/V under 260 kV/cm) of BET thin film annealed at 700 °C are better than those of the others. The mechanisms concerning the dependence of the enhancement d₃₃ are discussed according to the phenomenological equation, and the improved piezoelectric performance could make the BET thin film a promising candidate for piezoelectric thin film devices.     

Enhancement of fatigue endurance and retention characteristic in Bi3.25Eu0.75Ti3O12 thin films

The effects of moderate annealing temperature (600–800 °C) on the microstructure, fatigue endurance, retention characteristic, and remnant polarization (2P_r) of Bi_3.25Eu_0.75Ti₃O₁₂ (BET) thin films prepared by metal-organic decomposition (MOD) were studied in detail. 2P_r (66 µC/cm² under 300 kV/cm), fatigue endurance (3% loss of 2P_r after 1.2 × 10¹⁰ switching cycles), and retention characteristic (no significant polarization loss after 1.8 × 10⁵s) for BET thin film annealed at 700 °C are better than those for thin films annealed at other temperature. The mechanisms concerning the dependence of microstructure and ferroelectric properties on the annealing temperature were discussed.     

Enhanced ferroelectric properties of Pb(Zr0.80Ti0.20)O3/PbO thin films prepared by radio frequency magnetron sputtering

The Pb(Zr_0.80Ti_0.20)O₃ (PZT) thin films with and without a PbO buffer layer were deposited on the Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates by radio frequency (rf) magnetron sputtering method. The PbO buffer layer improves the microstructure and electrical properties of the PZT thin films. High phase purity and good microstructure of the PZT thin films with a PbO buffer layer were obtained. The effect of the PbO buffer layer on the ferroelectric properties of the PZT thin films was also investigated. The PZT thin films with a PbO buffer layer possess better ferroelectric properties with higher remnant polarization (P_r = 25.6 μC/cm²), and lower coercive field (E_c = 60.5 kV/cm) than that of the films without a PbO buffer layer (P_r = 9.4 μC/cm², E_c = 101.3 kV/cm). Enhanced ferroelectric properties of the PZT thin films with a PbO buffer layer is attributed to high phase purity and good microstructure.     

Structural and electrical properties of LuMnO3 thin film prepared by chemical solution method

Hexagonal LuMnO₃ thin films have been prepared based on a chemical solution deposition method. These films were deposited by spin-coating technique and annealed at different temperatures from 750 °C up to 850 °C, based on the thermogravimetric and differential thermal analysis results. An amorphous phase is observed in the film annealed at 750 °C, while a pure LuMnO₃ hexagonal phase is reached in the films annealed at 800 °C and 850 °C, along with a visible enhancement in the grain morphology as the annealing temperature increase. Low temperature magnetic analysis of the LuMnO₃ films annealed at 850 °C reveals several magnetic transitions, which are consistent with those reported for both LuMnO₃ ceramics and single crystals. Moreover, the emergence of a canted spin arrangement was evidenced from the temperature dependence of the specific induced magnetization and magnetic hysteretic cycles. No significant effect of the substrate on the magnetic properties was also sorted out. Dielectric measurements reveal the existence of a complex frequency behavior of the dielectric permittivity, which can be associated with relaxation processes arising from the interfaces film/electrodes.     

Effect of Gd substitution on ferroelectric and magnetic properties of Bi4Ti3O12

Polycrystalline samples Bi_4 − xGd_xTi₃O₁₂ (x = 1, 1.5, 2) were investigated by X-ray diffraction, piezoresponse force microscopy and SQUID-magnetometry techniques. Increasing the gadolinium content was shown to suppress the spontaneous polarization in Bi_4 − xGd_xTi₃O₁₂, resulting in a polar-to-nonpolar phase transition near x = 1.5. In contrast to previous expectations, all these samples were found to be paramagnets. It was thus proven that introducing magnetically-active Gd ions into the lattice of the ferroelectric Aurivillius-type compound should not be considered as an effective way to achieve multiferroic behavior.     

Effect of thermal stress on magnetic domain patterns of multiferroic Bi1-xDyxFeO3 thin films

Effect of temperature on magnetic domain structure of Bi_0.7Dy_0.3FeO₃ (BDFO) multiferroic thin films is studied in situ using magnetic force microscopy (MFM). Initially, as the temperature increases the domains start aligning from irregular to more distinct stripe pattern. However, above 250 °C, the domain alignment is disturbed. The systematic change in the domain configuration with temperature, suggests a strong thermal history of the system. The randomness in domain alignment caused above 250 °C is correlated to internal stress developed during ferromagnetic to paramagnetic phase transition occurring in BDFO. Indirect experimental evidence is given to support the explanation based on stress.     

Effect of annealing ambient on structure and ferroelectric properties of Pb(Zr0.4Ti0.6)O3 thin films on LaNiO3 coated Si substrates

Pb(Zr_0.4Ti_0.6)O₃ [PZT(40/60)] thin films were deposited onto LaNiO₃ (LNO) coated Si substrates by sol-gel technique. Three kinds of gases, air, O₂ and N₂, were used as the annealing ambient. The effect of the annealing ambient on their structure and ferroelectric properties was investigated. The results showed that both the films annealed in air and O₂ were the complete perovskite phase with (1 0 0) preferential orientation, while those annealed in N₂ were random orientation including some pyrochlore phases. As compared with the air ambient, either too much O₂ or too much N₂ was detrimental to the ferroelectric properties of PZT films. The difference in structure and ferroelectric properties was mainly associated with the intermediate phases and the concentration of domain pinning centers in the films.     

Crystal texture selection in epitaxies of orthorhombic antiferromagnetic YMnO3 films

The orthorhombic phase of YMnO₃ has been epitaxially stabilized on SrTiO₃ single crystal substrates. Changing the substrate orientation, the out-of-plane orientation of the epitaxial films can be tuned to (001), (101), or (100). Depending on the orientation, the films present varied crystal domain structures and lattice strains. Single domain YMnO₃(100) films have been grown on SrTiO₃(110) substrates, whereas they present two and three crystal variants on SrTiO₃(001) and SrTiO₃(111), respectively. Epitaxial stress in each domain is anisotropic, tensile in one direction and compressive in the other. It has consequences in the texture selection when domains with different out-of-plane orientation can grow epitaxially. Antiferromagnetism of YMnO₃ films has been confirmed by measuring the exchange bias field induced in an underlying ferromagnetic SrRuO₃ layer.     

Size effects of polycrystalline lanthanum modified Bi4Ti3O12 thin films

The film thickness dependence on the ferroelectric properties of lanthanum modified bismuth titanate Bi_3.25La_0.75Ti₃O₁₂ was investigated. Films with thicknesses ranging from 230 to 404 nm were grown on platinum-coated silicon substrates by the polymeric precursor method. The internal strain is strongly influenced by the film thickness. The morphology of the film changes as the number of layers increases indicating a thickness dependent grain size. The leakage current, remanent polarization and drive voltage were also affected by the film thickness.     

Multiferroic properties of BiFeO3/Bi4Ti3O12 double-layered thin films fabricated by chemical solution deposition

Multiferroic BiFeO₃/Bi₄Ti₃O₁₂ (BFO/BTO) double-layered film was fabricated on a Pt(111)/Ti/SiO₂/Si(100) substrate by a chemical solution deposition method. The effect of an interfacial BTO layer on electrical and magnetic properties of BFO was investigated by comparing those of pure BFO and BTO films prepared by the same condition. The X-ray diffraction result showed that no additional phase was formed in the double-layered film, except BFO and BTO phases. The remnant polarization (2P_r) of the double-layered film capacitor was 100 μC/cm² at 250 kV/cm, which is much larger than that of the pure BFO film capacitor. The magnetization-magnetic field hysteresis loop revealed weak ferromagnetic response with remnant magnetization (2M_r) of 0.4 kA/m. The values of dielectric constant and dielectric loss of the double-layered film capacitor were 240 and 0.03 at 100 kHz, respectively. Leakage current density measured from the double-layered film capacitor was 6.1 × 10^− 7 A/cm² at 50 kV/cm, which is lower than the pure BFO and BTO film capacitors.     

Testing field and annealing temperature dependence of leakage properties in Bi3.25La0.75Ti3O12 thin films

Ferroelectric Bi_3.25La_0.75Ti₃O₁₂ thin films annealed at different temperatures were prepared on Pt/Ti/SiO₂/Si substrates by metalorganic decomposition method. The leakage current behavior and the current conduction mechanism were investigated. For all films, the leakage current density − electric field (J−E) characteristic is confined within a “triangle” in the log (J)− log (E) plane bounded by three limiting curves: Ohm's law (J ∝ E), trap-filled-limit (J ∝ E^a, a > 1), and Child's law (J ∝ E²). At high field region, Bi_3.25La_0.75Ti₃O₁₂ thin films with grains of rod-like show higher leakage current, while films with grains of spherical- or planar-like exhibit lower leakage current.     

Dielectric and optical properties of CaCu3Ti4O12 thin films containing Ag nanoparticles

Simple sol-gel techniques are used to prepare thin films of a high dielectric constant perovskite CaCu₃Ti₄O₁₂, containing different amounts of metallic silver nanoparticles. The formations of the silver nanoparticles are verified by X-ray diffraction, scanning electron microscopy, transmission electron microscopy and optical absorption studies. The dielectric properties are found to be significantly affected by the presence of the silver nanoparticles. A maximum in the dielectric constant is observed at an intermediate metal particle concentration. This is explained in terms of the polarization at the particle-dielectric interface and the internal barrier layer capacitor effect. The optical absorption spectrum is compared with Mie theory in electrodynamics for the optical absorption of small particles to extract the particle size of the silver particle. Non-uniform distributions of Ag particles through the thickness of the thin films are reported.     

The optical properties of Bi3.25La0.75Ti3O12 thin films with different thickness prepared by chemical solution deposition

Bi_3.25La_0.75Ti₃O₁₂(BiLT) thin films with different thickness were successfully deposited onto fused quartz by chemical solution deposition. X-ray diffraction analysis shows that BiLT thin films are polycrystalline with (0 0 2)-preferred orientation. The dispersion of refractive indices of the BiLT thin films was investigated by the optical transmittance spectrum. The optical band gap energy was estimated from the graph of (hνα)² versus hν. The results show that the refractive index and band-gap energy of the BiLT thin films decrease with the films thickness.     

Enhancement on effective piezoelectric coefficient d33 of Bi3.15Dy0.85Ti3O12 ferroelectric thin films

Effects of annealing temperature (600-800 °C) on microstructure, ferroelectric and piezoelectric properties of Bi_3.15Dy_0.85Ti₃O₁₂ (BDT) thin films prepared by metal-organic decomposition were studied. The remnant polarization 2P_r and spontaneous polarization 2P_s (16.2 µC/cm² and 23.3 µC/cm² under 690 kV/cm), effective piezoelectric coefficient d₃₃ (63 pm/V under the bipolar driving field of 310 kV/cm) of BDT thin film annealed at 700 °C are better than those of others. The higher 2P_s and relatively permittivity ε_r induced by moderate annealing temperature should be responsible for the enhancement of piezoelectric properties. The improved d₃₃ may make BDT a promising candidate for piezoelectric thin film devices.     

Polarization fatigue and photoinduced current in (Pb0.72La0.28)Ti0.93O3 buffered Pb(Zr0.52Ti0.48)O3 films on platinized silicon

We report a study on the fatigue behavior of Pb(Zr_0.52Ti_0.48)TiO₃ (PZT) films deposited on Pt/Ti/SiO₂/Si substrates by a sol-gel method with single- and double-sided (Pb_0.72La_0.28)Ti_0.93O₃ (PLT) buffer layers, with an attempt to clarify the role of the top and bottom PLT buffer layers on the fatigue endurance (FE) of the PZT films. It is revealed that the existence of the PLT buffer layer and the level of driving alternating-current electric switching field strongly influence the fatigue properties. In terms of the existence of an asymmetric built-in electric field near the top and bottom interfaces between the film and metal electrode, we explain the observed fatigue properties.     

Effects of ferroelectric-poling-induced strain on the electronic transport and magnetic properties of (001)- and (111)-oriented La0.5Ba0.5MnO3 thin films

We epitaxially grew La_0.5Ba_0.5MnO₃ (LBMO) films on (001)- and (111)-oriented ferroelectric single-crystal substrates and reduced the in-plane tensile strain of LBMO films by poling the ferroelectric substrates along the 〈001〉$〈001〉$ or 〈111〉$〈111〉$ direction. Upon poling, a large decrease in the resistance and a considerable increase in the magnetization, Curie temperature, and magnetoresistance were observed for the LBMO film, which are driven by interface strain coupling. Such strain effects can be significantly enhanced by the application of a magnetic field. An overall analysis of the findings reveals that the mutual interaction between the strain and the magnetic field is mediated by the electronic phase separation which is sensitive to both strain and magnetic field. Our findings highlight that the electronic phase separation is crucial in understanding the electric-field-manipulated strain effects in manganite film/ferroelectric crystal heterostructures.     

Insulating properties of rapid thermally processed Bi2Ti2O7 thin films by a chemical solution decomposition technique

Crack-free Bi₂Ti₂O₇ thin films on silicon substrates were prepared using chemical solution decomposition technique, and then treated by rapid thermal annealing. The microstructure of the films was studied by scanning electron microscopy. The effects of different fabricating procedures and various annealing temperatures and times on the leakage current density were investigated. The results show that the leakage current density decreases with increasing annealing temperature, while increases with increasing annealing time. Annealing temperature has a much stronger effect on the insulating properties of Bi₂Ti₂O₇ thin films than that of annealing time.     

The influence of annealing temperatures on the properties of Bi2VO5.5/LaNiO3/Si thin films

Bi₂VO_5.5 ferroelectric thin films were fabricated on LaNiO₃/Si(100) substrate via chemical solution deposition. Ferroelectric and dielectric properties of the thin films annealed at 500-700 °C were studied. The thin film annealed at 700 °C exhibited more favorable ferroelectric and dielectric properties than those annealed at lower temperatures. The values of remnant polarization 2P_r and coercive field E_c for the film annealed at 700 °C are 10.62 µC/cm² and 106.3 kV/cm, respectively. The leakage current of the film is about 1.92 × 10^− 8 A/cm² at 6 V. The possible mechanism of the dependence of electrical properties of the films on the annealing temperature was discussed.