Influence of bias voltage on the optical and structural properties of nc-Si:H films grown by layer-by-layer (LBL) deposition technique

The effects of applying a positive bias of 25 to 100 V on the optical, structural and photoluminescence (PL) properties of hydrogenated nanocrystalline silicon (nc-Si:H) films produced by layer-by-layer (LBL) deposition technique has been studied. Optical characterization of the films has been obtained from UV-VIS-NIR spectroscopy measurements. Structural characterization has been performed using X-ray diffraction, micro-Raman spectroscopy and field emission scanning electron microscope (FESEM). PL spectroscopy technique has been used to investigate the PL properties of the films. In general, the films formed shows a mixed phase of silicon (Si) nanocrystallites embedded within an amorphous phase of the Si matrix. The crystalline volume fraction and grain size of the Si nanocrystallites have been shown to be strongly dependent on the applied bias voltage. High applied bias voltage enhances the growth rate of the films but reduces the refractive index and the optical energy gap of the films. Higher crystalline volume fraction of the films prepared at low bias voltages exhibits room temperature PL at around 1.8 eV (700 nm).     

A study of size dependent structure, morphology and luminescence behavior of CdS films on Si substrate

Size tunable cadmium sulfide (CdS) films deposited by a dip coating technique on silicon (100) and indium tin oxide/glass substrates have been characterized using X-ray diffraction, X-ray reflectivity, transmission electron microscopy, atomic force microscopy and photoluminescence spectroscopy. The structural characterization indicated growth of an oriented phase of cadmium sulfide. Transmission electron microscopy used to calculate the particle size indicated narrow size dispersion. The tendency of nanocrystalline CdS films to form ordered clusters of CdS quantum dots on silicon (100) substrate has been revealed by morphological studies using atomic force microscopy. The photoluminescence emission spectroscopy of the cadmium sulfide films has also been investigated. It is shown that the nanocrystalline CdS exhibit intense photoluminescence as compared to the large grained polycrystalline CdS films. The effect of quantum confinement also manifested as a blue shift of photoluminescence emission. It is shown that the observed photoluminescence behavior of CdS is substantially enhanced when the nanocrystallites are assembled on silicon (100) substrate.     

Optical properties and crystallinity of hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited by rf-PECVD

Hydrogenated nanocrystalline silicon (nc-Si:H) thin films prepared in a home-built radio-frequency (rf) plasma enhanced chemical vapour deposition (PECVD) system have been studied. The rf powers were fixed in the range of 5 W-80 W. The optical properties and crystallinity of the films were studied by X-ray diffraction (XRD), Micro-Raman scattering spectroscopy, high resolution transmission electron microscope (HRTEM), and optical transmission and reflection spectroscopy. The XRD and Micro-Raman scattering spectra were used to investigate the evidence of crystallinity in order to determine the crystallite sizes and crystalline volume fraction in the films. The HRTEM image of the film was used to correlate with the crystallinity that was determined from XRD and Micro-Raman scattering spectra. Optical constants such as refractive index, optical energy gap, Tauc slope, Urbach energy and ionic constants were obtained from the optical transmission and reflectance spectra. From the results, it was interesting to found that the optical constants showed a good correlation with the crystallinity within the variation of rf power. Also, the ionic constants of the films showed an indication of the degree of crystallinity in the films. The variation of the optical energy gap with the rf power based on structure disorder and the quantum confinement effect is discussed.     

Structural and optical properties of nc-Si:H thin films deposited by layer-by-layer technique

Hydrogenated nanocrystalline silicon (nc-Si:H) thin films deposited on c-Si and quartz substrates by layer-by-layer (LBL) technique using radio-frequency plasma enhanced chemical vapour deposition system. The effects of rf power on the interlayer elemental profiling, structural and optical properties of the films were investigated by Auger electron spectroscopy, Fourier transform infrared spectroscopy, Raman scattering spectroscopy, X-ray diffraction and optical transmission and reflection spectroscopy. The results revealed that the LBL deposition leads to a formation of different ranges of crystallite sizes of nc-Si corresponds 3–6 and 8–26 nm respectively. LBL deposition also demonstrated a capability to increase the crystalline volume fraction of nc-Si up to 65.3 % with the crystallite size in between 5 and 6 nm, at the rf power in between 80 and 100 W. However, the crystalline volume fraction decreased for the rf power above 100 W due to the growth of nc-Si was suppressed by the formation of SiO₂. In addition, the onset of crystallization of the films deposited on c-Si and quartz substrates are different with increase in the rf power. The effects of rf power on the growth of nc-Si, and the hydrogen content, structural disorder, crystallite size of nc-Si and oxygen diffusion into the LBL layer with the change of optical energy gap under the variation of rf power are also discussed.     

Annealing effect on the photoluminescence of Si nanocrystallites thin films

Si nanocrystallites thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition (PLD) using a Nd:YAG laser.After deposition, samples were annealed in several environmental gases at the temperature range from 400 to 800 °C. Strong violet-indigo photoluminescence has been observed at room temperature (RT) from nitrogen ambient-annealed Si nanocrystallites. The variation of photoluminescence (PL) properties of Si nanocrystallites thin films has been investigated depending on annealing temperatures. As the results of PL and high-resolution transmission electron microscope (HRTEM) measurements, we could suggest that the origin of violet-indigo PL from the films was related to the quantum size effect of Si nanocrystallites.     

On the relationship between the optical transmission and photoluminescence characteristics of porous silicon

The characteristics of free-standing porous silicon (por-Si) films were studied using their optical transmission, photoluminescence (PL), and photoluminescence excitation spectra. The transmission spectra exhibit no features within the emission bands or near PL excitation thresholds, which is evidence that nonluminescent por-Si fragments play a dominating role in the process of light absorption. This fact indicates that the optical transmission spectra cannot be used as a source of information on the bandgap energy of charge carriers in luminescent silicon nanocrystallites. The required energy spectrum parameters can be roughly evaluated using the PL excitation spectrum.     

Growth and optical properties of nanostructured ZnS:Mn films

Nanostructured ZnS:Mn films have been grown and their structure, optical properties, and photoluminescence have been studied. The nanostructured ZnS:Mn films have been grown on silicon and glass substrates via hydrochemical deposition from solution. The crystal structure and microstructure of the films have been studied by X-ray diffraction and atomic force microscopy. The band gap of the nanostructured ZnS:Mn films has been determined. The intensity of their photoluminescence bands has been shown to increase with decreasing nanoparticle size.     

Physical and electronic properties of ZnO:Al/porous silicon

UV, violet and blue-green photoluminescence has been achieved at room temperature (RT) from ZnO:Al (AZO) films deposited by radio frequency (rf) co-sputtering. As the ZnO target power increases from 100 W, the violet luminescence vanishes and the blue and green-blue luminescences appear. The most intense UV and blue-green luminescence is obtained for the films deposited at higher sputtering powers depending upon the stoichiometry of the films as well as the crystalline quality. The as-prepared porous silicon (PS) emission band lies in the blue-green spectral region and is blue shifted due to the AZO deposition. The current–voltage characteristics of AZO/PS heterostructures have been studied. The ideality factor is found to be 19 and the series resistance as determined from the forward characteristics is 36 MΩ.     

Optical and structural analysis of porous silicon coated with GZO films using rf magnetron sputtering

In the production of porous silicon (PS) to optoelectronic application one of the most significant constrains is the surface defects passivation. In the present work we investigate, gallium-doped zinc oxide (GZO) thin films deposited by rf magnetron sputtering at room temperature on PS obtained with different etching times. The X-ray diffraction (XRD), Fourier transform infrared (FTIR) and atomic force microscopy (AFM) analysis have been carried out to understand the effect of GZO films coating on PS. Further, the XRD analysis suggests the formation of a good crystalline quality of the GZO films on PS. From AFM investigation we observe that the surface roughness increases after GZO film coating. The photoluminescence (PL) measurements on PS and GZO films deposited PS shows three emission peaks at around 1.9 eV (red-band), 2.78 eV (blue-band) and 3.2 eV (UV-band). PL enhancement in the blue and ultraviolet (UV) region has been achieved after GZO films deposition, which might be originated from a contribution of the near-band-edge recombination from GZO.     

Growth of dielectric-embedded silicon nanocrystallites for light-emitting device application

Dielectric films with embedded silicon Si nanocrystallites (Si-Nc) have been recognized as promising light-emitting materials for future integrated photonics based on silicon technology. This work reports a novel method of making this kind of material by high-temperature annealing of Si-rich oxide or nitride films which gives rise to the phase separation reaction and the formation of crystalline silicon nanoclusters in the films. Various characteristics of these materials were studied in detail by using transmission electron microscope, X-ray photoelectron spectroscopy (XPS), Raman, and photoluminescence (PL). Strong transverse optical (TO) mode of Si-Nc at around 516 cm(-1) was found in the Raman spectra of the annealed dielectric films. XPS studies indicate that the Si 2p spectra could be transformed from a random bonding structure (as-deposited) to a random mixing of Si-Nc with stoichiometric oxide or nitride phase after the high-temperature annealing. The energy locations of PL were found to depend on the amount of rich Si and the annealing conditions. Longer and higher temperature annealing can result in the growth of the Si-Nc size and leads to a red-shift of PL. Direct correlation among the crystallite sizes with the PL peaks was found.     

Structural and photoluminescence investigation of ZnSe nanocrystals dispersed in organic and inorganic matrices

In this work, we report on the investigation of the effect of dispersion of zinc selenide (ZnSe) nanocrystallites into polystyrene (PS) and silica (SiO₂) thin films on their structural, morphological and photoluminescence properties. The ZnSe/PS nanocomposites thin films were synthesized by a direct dispersion of ZnSe crystallites into polymers solution, whereas the ZnSe–SiO₂ films were prepared on glass substrates by the sol–gel dip-coating technique. X-ray diffraction (XRD), Fourier transform infrared spectroscopy, scanning electron microscopy (SEM), energy-dispersive X-rays (EDX), UV–visible spectrophotometry and photoluminescence spectroscopy (PL) techniques have been used to study the structural, morphological and optical properties of the prepared nanocomposite thin films. XRD patterns have demonstrated the incorporation of cubic ZnSe in both organic and inorganic matrices. SEM micrographs have indicated that ZnSe dispersion in the films is homogeneous. UV–visible absorption spectra of the nanocomposite thin films have put into evidence that the dispersion of ZnSe nanocrystals in the thin film matrices improved their optical absorption. Room temperature PL spectra have shown that the addition of ZnSe enhanced the UV emission of PS and all the emission of SiO₂ thin films.     

HMDSO plasma polymerization and thin film optical properties

Thin films were deposited from hexamethyldisiloxane (HMDSO) in a glow discharge supplied with radiofrequency (rf) power. Actino-metric optical emission spectroscopy was used to follow trends in the plasma concentrations of the species SiH (414.2 nm), CH (431.4 nm), CO (520.0 nm), and H (656.3 nm) as a function of the applied rf power (range 5 to 35 W). Transmission infrared spectroscopy (IRS) was employed to characterize the molecular structure of the polymer, showing the presence of Si-H, Si-O-Si, Si-O-C and C-H groups. The deposition rate, determined by optical interferometry, ranged from 60 to 130 nm/min. Optical properties were determined from transmission ultra violet-visible spectroscopy (UVS) data. The absorption coefficient , the refractive index n, and the optical gap E₀₄ of the polymer films were calculated as a function of the applied power. The refractive index at a photon energy of 1 eV varied from 1.45 to 1.55, depending on the rf power used for the deposition. The absorption coefficient showed an absorption edge similar to other non-crystalline materials, amorphous hydrogenated carbon, and semiconductors. For our samples, we define as an optical gap, the photon energy E₀₄ corresponding to the energy at an absorption of 10⁴ cm⁻¹. The values of E₀₄ decreased from 5.3 to 4.6 as the rf power was increased from 5 to 35 W.     

Effect of heat treatment on the photoluminescence of CdS nanocrystallites in cadmium-rich organic Langmuir Blodgett matrix

CdS nanocrystallites were grown within an organic layered matrix by partial sulphidation of precursor cadmium arachidate LB multilayers. The cadmium arachidate–arachidic acid composite multilayers containing CdS nanocrystallites were enriched by intercalation with Cd²⁺ ions in aqueous solution of CdCl₂ and subsequently heat treated at different temperatures up to 300 °C, in air and in vacuum. CdS nanocrystallites within the composite multilayer have been found to exhibit treatment process dependent characteristic changes in optical absorption and luminescence. The optical data obtained at different stages/conditions of processing have been analyzed by considering changes in excitonic absorption and emission as well as contributions from surface and bulk defects related emission and a suitable energy level diagram has been proposed. The composition, microstructure and surface morphology of the composite multilayers were also studied at all stages of processing to develop a comprehensive understanding of the interaction of the organic matrix with CdS nanocrystallites and the consequent influence on the optical behavior of the nanocrystallites. These studies have shown that the organic moieties encapsulating the CdS nanocrystallites tend to restrict their growth and aggregation, while the presence of cadmium in the organic matrix is responsible for the passivation of surface defects as well as the reduction of bulk defects, and these factors have significant influence on the photoluminescence of CdS nanocrystallites.     

Study of optical properties and light induced effects on Inq3 thin film used in organic light emitting devices

In this report, the optical properties of tris-(8-hydroxyquinoline) metal complex Inq₃; used as light-emitting layer in electroluminescent (EL) devices are shown. The material has been synthesized and the thin films have been deposited by thermal evaporation on quartz and silicon substrates. The optical constants (n and k) of Inq₃ thin films have been determined using spectroscopic ellipsometry. Light induced effects on optical properties of films have been studied using ellipsometry, photoluminescence and UV–visible transmission measurements. Enhanced photoluminescence intensity with shift in peak position as well as modification in optical constants on light exposure in vacuum indicates phase transformation in Inq₃ films.     

双纳米硅p层优化非晶硅太阳能电池

采用等离子体增强化学气相沉积(Plasma Enhanced Chemical Vapor Deposition,PECVD)技术在高功率密度、高反应气压和低衬底温度下制备出不同氢稀释比RH的硅薄膜.高分辨透射电镜(High-Resolution Transmission Electron Microscopy,HRT...     

Silicon nano-crystalline structures fabricated by a sequential plasma hydrogenation and annealing technique

Silicon nano-crystalline structures have been prepared from amorphous silicon films on silicon substrates using direct-current plasma hydrogenation and annealing at temperatures about 450 °C. Plasma power densities about 5.5 W/cm² were found to be suitable for the creation of nano-porous layers. The nano-porous structures produced visible luminescence at room temperature as confirmed by photoluminescence spectroscopy. The effects of plasma power and annealing temperature on the grain size and luminescence properties of these layers have been investigated by scanning electron microscopy, transmission electron microscopy, Fourier transform infrared spectroscopy and photoluminescence. Lowering the temperature during the hydrogenation step led to an increase in the diameter of the grains. In addition, lowering the plasma power density caused the distribution of the porous surface structures to become less widely distributed and the formation of more packed structures resulted.     

Preparation and luminescence properties of spin-coated PMMA films containing Si nanocrystallites

We report on the synthesis of Si nanocrystallites by pulsed laser ablation in toluene followed by the preparation of composite films with PMMA and their luminescence studies. Transmission electron microscopy images show that the sizes of silicon nanocrystallites vary from about 4 nm down to below 1 nm. The composite films exhibit strong emissions with their spectral peaks continuously moving from 387 to 506 nm when the excitation wavelength varies from 300 to 440 nm, in accordance with the quantum confinement effect. Their time-resolved photoluminescence spectra reveal a multi-exponential decay, implying that the light emission may be also related to some surface states.     

Effect of oxygen plasma treatment on bonding states for columnar structured a-CNx thin films prepared by reactive sputtering

Amorphous carbon nitride (a-CN) thin films were deposited on silicon single crystal substrates by rf-reactive sputtering method using a graphite target and nitrogen gas. The substrate temperature was varied from room temperature (RT) to 853 K. After deposition, the effect of oxygen plasma treatment on bonding structures of the film surface has been studied by using an oxygen discharge at 16 Pa and rf power of 85 W. The chemical bonding states and film composition were analyzed by X-ray photoelectron spectroscopy (XPS), while film thickness was obtained from scanning electron microscopy (SEM) and ellipsometer. XPS study revealed that the films have NO₂ and NO₃ bonding structures when the films are deposited at temperatures higher than 673 K. After exposure to oxygen plasma, carbon in the film surface was etched selectively and this phenomenon was observed in all films. In contrast, the surface concentration of nitrogen was ket at constant values before and after oxygen plasma treatment. The NO₃ bonding state had dramatically increased after oxygen plasma treatment for films deposited at higher deposition temperatures. The film surfaces have been observed to change the function from hydrophobic to hydrophilic after oxygen plasma treatment.     

High performance multilayered nano-crystalline silicon/silicon-oxide light-emitting diodes on glass substrates

A low-temperature hydrogenation-assisted sequential deposition and crystallization technique is reported for the preparation of nano-scale silicon quantum dots suitable for light-emitting applications. Radio-frequency plasma-enhanced deposition was used to realize multiple layers of nano-crystalline silicon while reactive ion etching was employed to create nano-scale features. The physical characteristics of the films prepared using different plasma conditions were investigated using scanning electron microscopy, transmission electron microscopy, room temperature photoluminescence and infrared spectroscopy. The formation of multilayered structures improved the photon-emission properties as observed by photoluminescence and a thin layer of silicon oxy-nitride was then used for electrical isolation between adjacent silicon layers. The preparation of light-emitting diodes directly on glass substrates has been demonstrated and the electroluminescence spectrum has been measured.     

SiNx薄膜中硅纳米粒子的制备及表征

通过等离子增强化学气相沉积(PECVD)法, 以氨气和硅烷为反应气体, P型单晶硅和石英为衬底, 低温下(200℃)制备了含硅纳米粒子的非化学计量比氮化硅(SiN_x)薄膜. 经高温(范围500~950℃)退火处理优化了薄膜结构. 室温下测试了不同温度退火后含硅纳米粒子SiN_x薄膜的拉曼(Raman)光谱、光致发光(PL)光谱及傅立叶变换红外吸收(FTIR)光谱, 对薄膜材料的结构特性、发光特性及其键合特性进行了分析. Raman光谱表明. SiN_x薄膜内的硅纳米粒子为非晶结构. PL光谱显示两条与硅纳米粒子相关的光谱带, 随退火温度的升高此两光谱带峰位移动方向相同. 当退火温度低于800℃时, PL光谱峰位随退火温度的升高而蓝移. 当退火温度高于800℃时, PL光谱峰位随退火温度的升高而红移. 通过SiNx薄膜的三种光谱分析发现薄膜的光致发光源于硅纳米粒子的量子限制效应. 这些结果对硅纳米粒子制备工艺优化和硅纳米粒子光电器件的应用有重要意义.