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提出了一种面向系统级封装(SiP)的片上和板级协同设计方案,提升了电路的ESD性能。该SiP系统集成了若干驱动放大器、ADC和电阻电容。虽然集成的芯片引脚均可满足2 000 V的HBM ESD能力,但因为封装尺寸为0402的高精度薄膜电阻会受到损伤,所以SiP仅能承受600 V的ESD冲击。在SiP中增加了高速开关二极管1N4148,以泄放ESD冲击电流,使得该SiP集成电路系统的ESD能力从600 V提升至2 500 V。片上与板级协同设计方法能显著提升产品的可靠性,可广泛应用于SiP产品中。 相似文献
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为解决通过更改器件设计来提升电路抗静电放电(ESD)能力时成本高的问题,从栅控二极管的工艺出发,研究CAN总线电路抗ESD能力提升方法。通过TCAD仿真,评估了沟道掺杂对于栅控二极管抗ESD能力的影响,发现调整ESD离子注入工艺可以优化栅控二极管导通电阻,提高ESD保护窗口内的泄流能力,将电路抗ESD能力从2 000 V提高到3 000 V,为电路级芯片的失效问题提供了一种解决方案。 相似文献
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《现代电子技术》2015,(24):128-131
金属氧化物半导体(MOS)器件的缩放技术使集成电路芯片面临着严重的静电放电(ESD)威胁,而目前采用的ESD保护电路由于电流集边效应等原因,普遍存在着抗静电能力有限、占用较大芯片面积等问题。根据全芯片ESD防护机理,基于SMIC 0.18μm工艺设计并实现了一种新型ESD保护电路,其具有结构简单、占用芯片面积小、抗ESD能力强等特点。对电路的测试结果表明,相对于相同尺寸栅极接地结构ESD保护电路,新型ESD保护电路在降低35%芯片面积的同时,抗ESD击穿电压提升了32%,能够有效保护芯片内部电路免受ESD造成的损伤和降低ESD保护电路的成本。 相似文献
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深亚微米CMOS IC全芯片ESD保护技术 总被引:3,自引:0,他引:3
CMOS工艺发展到深亚微米阶段,芯片的静电放电(ESD)保护能力受到了更大的限制。因此,需要采取更加有效而且可靠的ESD保护措施。基于改进的SCR器件和STFOD结构,本文提出了一种新颖的全芯片ESD保护架构,这种架构提高了整个芯片的抗ESD能力,节省了芯片面积,达到了对整个芯片提供全方位ESD保护的目的。 相似文献
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基于提升GaAs低噪声放大器(LNA)的抗静电(ESD)能力的需求,且实现器件小型化轻量化,设计了一种S波段GaAs低噪声放大器的ESD防护电路,该电路利用1/4波长线的微波特性,通过1/4波长微带线并联在GaAs芯片的输入输出端,瞬态二极管(TVS)并联在芯片的电源端,不改变器件原有封装尺寸的条件下构成保护结构.基于ESD人体模型,运用静电模拟仪器对低噪声放大器进行了模拟试验,并对其性能进行了测试.结果表明,在6.5 mm×6.5 mm×2.4 mm的封装尺寸下,器件的抗静电能力从250 V提高到了1 000 V,在频率为2.6~3.7 GHz,带内增益大于25 dB,增益平坦度小于-±0.5 dB,噪声系数小于1.5 dB,满足高可靠领域应用的要求. 相似文献
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对采用多指条形GGNMOS结构的ESD保护电路的工作原理进行分析,并对其进行ESD测试实验.理论分析了影响ESD性能的一些因素,提出一种栅耦合技术保护电路方案,并达到了设计要求.实验结果显示,其性能已达到人体放电模式(HBM)的2级标准(2 000~4 000 V). 相似文献
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双界面智能卡芯片静电放电(ESD)可靠性的关键是模拟前端(AFE)模块的ESD可靠性设计,如果按照代工厂发布的ESD设计规则设计,AFE模块的版图面积将非常大.针对双界面智能卡芯片AFE电路结构特点和失效机理,设计了一系列ESD测试结构.通过对这些结构的流片和测试分析,研究了器件设计参数和电路设计结构对双界面智能卡芯片ESD性能的影响.定制了适用于双界面智能卡芯片AFE模块设计的ESD设计规则,实现对ESD器件和AFE内核电路敏感结构的面积优化,最终成功缩小了AFE版图面积,降低了芯片加工成本,并且芯片通过了8 000 V人体模型(HBM) ESD测试. 相似文献
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ESD是集成电路设计中最重要的可靠性问题之一。IC失效中约有40%与ESD/EOS(电学应力)失效有关。为了设计出高可靠性的IC,解决ESD问题是非常必要的。文中讲述一款芯片ESD版图设计,并且在0.35μm 1P3M 5V CMOS工艺中验证,成功通过HBM-3000V和MM-300V测试。这款芯片的端口可以被分成输入端口、输出端口、电源和地。为了达到人体放电模型(HBM)-3000V和机器放电模型(MM)-300V,首先要设计一个好的ESD保护网络。解决办法是先让ESD的电荷从端口流向电源或地,然后从电源或地流向其他端口。其次,给每种端口设计好的ESD保护电路,最后完成一张ESD保护电路版图。 相似文献
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对一种CMOS/SOI 64Kb静态随机存储器进行了研究,其电路采用8K×8的并行结构体系.为了提高电路的速度,采用地址转换监控(Address-Translate-Detector,ATD)、两级字线(Double-Word-Line,DWL)和新型的两级灵敏放大等技术,电路存取时间仅40ns;同时,重点研究了SOI静电泄放(Electrostatic-Discharge,ESD)保护电路和一种改进的灵敏放大器,设计出一套全新ESD电路,其抗静电能力高达4200—4500V.SOI 64Kb CMOS静态存储器采用1.2μm SOI CMOS抗辐照工艺技术,芯片尺寸为7.8mm×7.24mm. 相似文献
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《Microwave Theory and Techniques》2009,57(2):298-305
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《IEE Review》2004,50(12):40-43
System in package (SiP), as it is being called, is a combination of two or more die stacked together on an interconnection substrate, all within a single package. Typically, there is some sort of processor chip coupled to either memory, a high-performance analogue IC, or to a micro-electro-mechanical system (MEMS) device. A SiP, though, could contain all these elements. This article discusses the challenges faced in SiP technology. 相似文献
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Ming-Dou Ker Tung-Yang Chen 《Solid-State Circuits, IEEE Journal of》2003,38(2):295-302
A substrate-triggered technique is proposed to improve electrostatic discharge (ESD) protection efficiency of ESD protection circuits without extra salicide blocking and ESD-implantation process modifications in a salicided shallow-trench-isolation CMOS process. By using the layout technique, the whole ESD protection circuit can be merged into a compact device structure to enhance the substrate-triggered efficiency. This substrate-triggered design can increase ESD robustness and reduce the trigger voltage of the ESD protection device. This substrate-triggered ESD protection circuit with a field oxide device of channel width of 150 /spl mu/m can sustain a human-body-model ESD level of 3250 V without any extra process modification. Comparing to the traditional ESD protection design of gate-grounded nMOS (ggnMOS) with silicide-blocking process modification in a 0.25-/spl mu/m salicided CMOS process, the proposed substrate-triggered design without extra process modification can improve ESD robustness per unit silicon area from the original 1.2 V//spl mu/m/sup 2/ of ggnMOS to 1.73 V//spl mu/m/sup 2/. 相似文献
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In this paper, a new structure for an advanced high holding voltage silicon controlled rectifier (AHHVSCR) is proposed. The proposed new structure specifically for an AHHVSCR‐based electrostatic discharge (ESD) protection circuit can protect integrated circuits from ESD stress. The new structure involves the insertion of a PMOS into an AHHVSCR so as to prevent a state of latch‐up from occurring due to a low holding voltage. We use a TACD simulation to conduct a comparative analysis of three types of circuit — (i) an AHHVSCR‐based ESD protection circuit having the proposed new structure (that is, a PMOS inserted into the AHHVSCR), (ii) a standard AHHVSCR‐based ESD protection circuit, and (iii) a standard HHVSCR‐based ESD protection circuit. A circuit having the proposed new structure is fabricated using 0.18 μm Bipolar‐CMOS–DMOS technology. The fabricated circuit is also evaluated using Transmission‐Line Pulse measurements to confirm its electrical characteristics, and human‐body model and machine model tests are used to confirm its robustness. The fabricated circuit has a holding voltage of 18.78 V and a second breakdown current of more than 8 A. 相似文献
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On-Chip Transient Detection Circuit for System-Level ESD Protection in CMOS Integrated Circuits to Meet Electromagnetic Compatibility Regulation 总被引:1,自引:0,他引:1
Ming-Dou Ker Cheng-Cheng Yen Pi-Chia Shih 《Electromagnetic Compatibility, IEEE Transactions on》2008,50(1):13-21
A new on-chip transient detection circuit for system-level electrostatic discharge (ESD) protection is proposed. The circuit performance to detect different positive and negative fast electrical transients has been investigated by the HSPICE simulator and verified in a silicon chip. The experimental results in a 0.13-m CMOS integrated circuit (IC) have confirmed that the proposed on-chip transient detection circuit can be used to detect fast electrical transients during the system-level ESD events. The proposed transient detection circuit can be further combined with the power-on reset circuit to improve the immunity of the CMOS IC products against system-level ESD stress. 相似文献
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In order to design a robust electrostatic discharge (ESD) protected RF amplifier in InGaP/GaAs HBTs, a comprehensive assessment of device vulnerability to ESD events in both active transistors and passive components of the HBT technology is presented in this paper. The results include not only the intrinsic HBT's ESD robustness performance, but also its dependence on device layout, ballast resistor, and process. Acknowledging the ESD constraints imposed on InGaP/GaAs HBT technology, a 5.4-6.0-GHz power amplifier (PA) with a compact 2000 V/sub ESD/ (human body model) on-chip ESD protection circuit that has a low loading capacitance of less than 0.1 pF and that does not degrade RF and output power performance is developed for wireless local area network application. A diode triggered Darlington pair is implemented as the ESD protection circuit instead of the traditional diode string. Its operation principle, ESD protection performance, and PA performance are also illustrated in this paper. 相似文献
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深亚微米CMOS电路具有器件特征尺寸小、复杂度高、面积大、数模混合等特点,电路全芯片ESD设计已经成为设计师面临的一个新的挑战。多电源CMOS电路全芯片ESD技术研究依据工艺、器件、电路三个层次进行,对芯片ESD设计关键点进行详细分析,制定了全芯片ESD设计方案与系统架构,该方案采用SMIC0.35μm 2P4M Polycide混合信号CMOS工艺流片验证,结果为电路HBM ESD等级达到4 500 V,表明该全芯片ESD方案具有良好的ESD防护能力。 相似文献