Effect of swift heavy ion irradiation on spray deposited CdX (X = S, Te) thin films

Cadmium sulfide and cadmium telluride thin films are irradiated with high energy heavy ion beam to study the irradiation induced effects in these films. The polycrystalline thin film samples deposited by spray pyrolysis are irradiated with 60 MeV Oxygen ions using tandem Pelletron accelerator. The X-ray diffraction patterns exhibit a reduction in peak intensities in both CdS and CdTe films. The grain size decrease with fluence is observed for both CdS and CdTe films, with more decrease for CdTe films. The AFM results support this observation. The films show opposite trend in the variation of electrical resistivity with irradiation fluence. A decrease in resistivity is observed for CdS films due to an increase of carrier concentration arising by the creation of sulfur vacancies during the irradiation. The creation of sulfur vacancies is confirmed by XPS studies. The stoichiometric changes seen from XPS studies support this observation. An enhancement of grain boundary scattering due to the reduction of grain size leads to the increase of electrical resistivity for CdTe films.     

Electron irradiation effects on the Schottky diode characteristics of p-Si

Particle irradiation can induce transient and permanent changes in the electrical properties of semiconductor devices in radiation environments. The effects of electron irradiation on the device properties of Al/p-Si Schottky diodes are reported here. Schottky diodes were exposed to a maximum cumulative dose of 100 kGy at room temperature. Their forward and reverse current-voltage (I-V) characteristics were studied at room temperature. The diode parameters such as ideality factor, reverse saturation current, barrier height and series resistance were calculated from the forward I-V characteristics. An increase in the values of the ideality factor and a decrease in the barrier height values were observed over this dose range. Also, the reverse current was found to increase with increasing dose.     

Secondary electron yield of Au and Al2O3 surfaces from swift heavy ion impact in the 2.5-7.9 MeV/amu energy range

We report on the secondary electron yields of Au and oxidized aluminum (Al₂O₃) by impact of heavy ions with energies ranging from 7.92 MeV/amu (¹²C₆) to 2.54 MeV/amu (¹⁰⁷Ag₄₇). The obtained results, the first in this energy range using medium-heavy ions, extend the validity of proposed scaling laws obtained with lighter ions. Measurements have been performed using the SIRAD irradiation facility at the 15 MV Tandem of the INFN Laboratory of Legnaro (Italy), to evaluate the performance of ion electron emission microscopy at SIRAD.     

Implantation effects of low energy H and D ions in germanium at −120 °C and room temperature

Germanium was implanted with 5 keV H and D ions at −120 °C or room temperature and thermally annealed in several steps. The samples were analysed at various stages by atomic force microscopy, ion channeling and Raman spectroscopy of Ge-H/D local vibration modes. The results are discussed in comparison with those in the well studied silicon. In general, the evolution of the different types of defects, in germanium at a given temperature, tends to be similar to that of the corresponding defects in silicon at 100-300 °C higher temperature. However, the behaviour of the defects detected by ion channeling (interstitials, lattice distortions) often appears unrelated to the chemical evolution measured by Raman scattering and to the temperature and isotope dependence of blistering.     

Ag/Fe:TiO2 nano-catalysts prepared by Fe ion implantation and Ag nanoparticle deposition by electron beam irradiation

TiO₂ nano-catalysts made by the sol-gel method were modified by ion implantation and electron beam irradiation to obtain a more efficient photocatalytic function. The results of photodegradation of methyl orange in aqueous solution demonstrate firstly that the films have a photocatalytic activity which responds to visible light. Secondly, it demonstrates that under ultraviolet excitation the sample with a fluence of 6 × 10¹⁵ ions/cm² and electron beam irradiated with concentration of AgNO₃ aqueous solution at 1 × 10⁻³ M gives a more efficient photodegradation ability than pure TiO₂ film and other Fe-doped films display almost the same photodegradation ability as TiO₂ film. Thirdly it demonstrates that under sunlight, all modified films exhibit more photodegradation activity than TiO₂ film.     

Change in magnetic properties of MgB2 thin films after irradiation by 200 MeV Au ion beam

The SHI irradiation induced effects on magnetic properties of MgB₂ thin films are reported. The films having thickness 300-400 nm, prepared by hybrid physical chemical vapor deposition (HPCVD) were irradiated by 200 MeV Au ion beam (S_e ∼ 23 keV/nm) at the fluence 1 × 10¹² ion/cm². Interestingly, increase in the transition temperature T_c from 35.1 K to 36 K resulted after irradiation. Substantial enhancement of critical current density after irradiation was also observed because of the pinning provided by the defects created due to irradiation. The change in surface morphology due to irradiation is also studied.     

Strain-driven (0 0 2) preferred orientation of ZnO nanoparticles in ion-implanted silica

We present an experimental and theoretical study on the structural properties of ZnO nanoparticles embedded in silica. The ZnO-SiO₂ nanocomposite was prepared by ion implanting a Zn⁺ beam in a silica slide and by annealing in oxidizing atmosphere at 800 °C. From an experimental point of view, the structural properties of the ZnO-SiO₂ nanocomposite were studied by using glancing incidence X-ray diffraction. According to the results, zinc crystalline nanoclusters with an average diameter of 13 nm are in the as-implanted sample. The annealing in oxidizing atmosphere promotes the total oxidation of the Zn nanoclusters and increases their size until to an average of 22 nm. Moreover, the formed ZnO nanocrystals have a preferential (0 0 2) crystallographic orientation. From a theoretical point of view, the preferential orientation of the ZnO nanoparticles can be explained satisfactory by the minimization of the strain energy of the nanoparticles placed in proximity of the surface of the matrix.     

380 keV proton irradiation effects on photoluminescence of Eu-doped GaN

The effect of 380 keV proton irradiation on the photoluminescence (PL) properties has been investigated for undoped and Eu-doped GaN. As the proton irradiation exceeds , a drastic decrease of PL intensity of the near band-edge emission of undoped GaN was observed. On the other hand, for Eu-doped GaN, the PL emission corresponding to the ⁵D₀→⁷F₂ transition in Eu³⁺ kept the initial PL intensity after the proton irradiation up to . Present results, together with our previous report on electron irradiation results, suggest that Eu-doped GaN is a strong candidate for light emitting devices in high irradiation environment.     

Oxygen defects created in CeO2 irradiated with 200 MeV Au ions

CeO₂ films were irradiated with 200 MeV Au ions in order to investigate the damages created by electronic energy deposition. In the Raman spectra of the ion-irradiated films, a broad band appears at the higher frequency side of the F_2g peak of CeO₂. The band intensity increases as ion fluence increases. Furthermore, the F_2g peak becomes asymmetric with a low-frequency tail. In order to understand the origin of these spectral changes, an unirradiated CeO₂ film was annealed in vacuum at 1000 °C. By comparing the results for the irradiation and for the annealing, it is concluded that the broad band obtained for irradiated samples contains the peak observed for the annealed sample. The F_2g peak becomes asymmetric with a low-frequency tail by the irradiation as well as the annealing. Therefore, the above-mentioned changes in the Raman spectra caused by 200 MeV Au irradiation is closely related to the creation of oxygen vacancies.     

Electronic stopping power for proton in amino acids and protein in 0.05-10 MeV range

The stopping powers for 0.05-10 MeV protons in a group of 15 amino acids and a protein have been systematically calculated. The calculations are based on Ashley’s dielectric model. An approach of evaluating the optical energy loss function is incorporated into the Ashley’s model because no experimental optical data are available for these bioorganic compounds. The Barkas-effect correction and Bloch correction are included and an empirical minimum impact parameter a is used for the Barkas-effect correction. The proton stopping powers for the 15 amino acids and the protein in the energy range from 0.05 to 10 MeV are presented here for the first time and might be useful for studies of various radiation effects in these materials.     

Spectroscopic and thermal studies of 8 MeV electron beam irradiated HPMC films

Radiation-induced changes in hydroxypropyl methylcellulose (HPMC) films under electron irradiation were investigated and correlated with dose. Polymer samples were irradiated in air at room temperature by an electron beam accelerator in the range of 0-100 kGy. Various properties of the irradiated films were studied using a Ultraviolet-Visible spectrophotometer and Fourier transform infrared spectroscopy and thermogravimetric analysis. Electron irradiation was found to induce changes in the physical, chemical and thermal properties, depending on the irradiation dose.     

Effect of 200 MeV Ag ion irradiation on structural and electrical transport properties of Fe3O4 thin films

Thin films of Fe₃O₄ have been deposited on single crystal MgO(1 0 0) and Si(1 0 0) substrates using pulsed laser deposition. Films grown on MgO substrate are epitaxial with c-axis orientation whereas, films on Si substrate are highly 〈1 1 1〉 oriented. Film thicknesses are 150 nm. These films have been irradiated with 200 MeV Ag ions. We study the effect of the irradiation on structural and electrical transport properties of these films. The fluence value of irradiation has been varied in the range of 5 × 10¹⁰ ions/cm² to 1 × 10¹² ions/cm². We compare the irradiation induced modifications on various physical properties between the c-axis oriented epitaxial film and non epitaxial but 〈1 1 1〉 oriented film. The pristine film on Si substrate shows Verwey transition (T_V) close to 125 K, which is higher than generally observed in single crystals (121 K). After the irradiation with the 5 × 10¹⁰ ions/cm² fluence value, T_V shifts to 122 K, closer to the single crystal value. However, with the higher fluence (1 × 10¹² ions/cm²) irradiation, T_V again shifts to 125 K.     

Behavior of crystalline silicon under huge electronic excitations: A transient thermal spike description

Recent experimental works devoted to the phenomena of mixing observed at metallic multilayers Ni/Si irradiated by swift heavy ions irradiations make it necessary to revisit the insensibility of crystalline Si under huge electronic excitations. Knowing that Ni is an insensitive material, such observed mixing would exist only if Si is a sensitive material. In order to extend the study of swift heavy ion effects to semiconductor materials, the experimental results obtained in bulk silicon have been analyzed within the framework of the inelastic thermal spike model. Provided the quenching of a boiling (or vapor) phase is taken as the criterion of amorphization, the calculations with an electron-phonon coupling constant g(300 K) = 1.8 × 10¹² W/cm³/K and an electronic diffusivity D_e(300 K) = 80 cm²/s nicely reproduce the size of observed amorphous tracks as well as the electronic energy loss threshold value for their creation, assuming that they result from the quenching of the appearance of a boiling phase along the ion path. Using these parameters for Si in the case of a Ni/Si multilayer, the mixing observed experimentally can be well simulated by the inelastic thermal spike model extended to multilayers, assuming that this occurs in the molten phase created at the Ni interface by energy transfer from Si.     

10 MeV Au ion irradiation effects in an MgO-HfO2 ceramic-ceramic (CERCER) composite

Room temperature ion irradiation damage studies were performed on a ceramic composite intended to emulate a dispersion nuclear fuel. The composite is composed of 90-mole% MgO and 10-mole% HfO₂. The as-synthesized composite was found to consist of Mg₂Hf₅O₁₂ (and some residual HfO₂) particles embedded in an MgO matrix. X-ray diffraction revealed that nearly all of the initial HfO₂ reacted with some MgO to form Mg₂Hf₅O₁₂. Ion irradiations were performed using 10 MeV Au³⁺ ions at room temperature over a fluence range of 5 × 10¹⁶-5 × 10²⁰ Au/m². Irradiated samples were characterized using both grazing incidence X-ray diffraction (GIXRD) and transmission electron microscopy (TEM), the latter using both selected-area electron diffraction (SAED) and micro-diffraction (μD) on samples prepared in cross-sectional geometry. Both GIXRD and TEM electron diffraction measurements on a specimen irradiated to a fluence of 5 × 10²⁰ Au/cm², revealed that the initial rhombohedral Mg₂Hf₅O₁₂ phase was transformed into a cubic-Mg₂Hf₅O₁₂ phase. Finally, it is important to note that at the highest ion fluence used in this investigation (5 × 10²⁰ Au/m²), both the MgO matrix and the Mg₂Hf₅O₁₂ second phase remained crystalline.     

Radiation damage in ZnO ion implanted at 15 K

Commercial O-face (0 0 0 1) ZnO single crystals were implanted with 200 keV Ar ions. The ion fluences applied cover a wide range from 5 × 10¹¹ to 7 × 10¹⁶ cm⁻². The implantation and the subsequent damage analysis by Rutherford backscattering spectrometry (RBS) in channelling geometry were performed in a special target chamber at 15 K without changing the target temperature of the sample. To analyse the measured channelling spectra the computer code DICADA was used to calculate the relative concentration of displaced lattice atoms.Four stages of the damage evolution can be identified. At low ion fluences up to about 2 × 10¹³ cm⁻² the defect concentration increases nearly linearly with rising fluence (stage I). There are strong indications that only point defects are produced, the absolute concentration of which is reasonably given by SRIM calculations using displacement energies of E_d(Zn) = 65 eV and E_d(O) = 50 eV. In a second stage the defect concentration remains almost constant at a value of about 0.02, which can be interpreted by a balance between production and recombination of point defects. For ion fluences around 5 × 10¹⁵ cm⁻² a second significant increase of the defect concentration is observed (stage III). Within stage IV at fluences above 10¹⁶ cm⁻² the defect concentration tends again to saturate at a level of about 0.5 which is well below amorphisation. Within stages III and IV the damage formation is strongly governed by the implanted ions and it is appropriate to conclude that the damage consists of a mixture of point defects and dislocation loops.     

HRXRD and Raman study of irradiation effects in InGaN/GaN layers induced by 2.3 MeV Ne and 5.3 MeV Kr ions

In_0.15Ga_0.85N/GaN bilayers irradiated with 2.3 MeV Ne and 5.3 MeV Kr ions at room temperature were studied by high-resolution X-ray diffraction (HRXRD) and micro-Raman scattering. The Ne ion fluences were in the range from 1 × 10¹² to 1 × 10¹⁵ cm⁻², and the Kr ion fluences were in the range from 1 × 10¹¹ to 1 × 10¹³ cm⁻². Results show that the structures of both In_0.15Ga_0.85N and GaN layers remained almost unchanged for increasing fluences up to 1 × 10¹³ and 1 × 10¹² cm⁻² for Ne and Kr ion irradiations, respectively. After irradiation to higher fluences, the GaN layer was divided into several damaged layers with different extents of lattice expansion, while the In_0.15Ga_0.85N layer exhibited homogenous lattice expansion. The layered structure of GaN and the different responses to irradiation of the GaN and In_0.15Ga_0.85N layers are discussed.     

Studies of InP nano dots formation after keV Ar irradiation

Temporal evolution of nano dots fabricated, in off-normal geometry but in the absence of rotation, on InP(1 1 1) surfaces by 3 keV Ar ion sputtering is reported here. After 10 min of sputtering, self-assembled nano dots with mean diameter of 24 ± 4 nm display square short range weak ordering. Fully developed square celled arrays of dots with mean diameter of 90 ± 26 nm, are seen beyond the non-linear coarsening regime at the critical time of 40 min. Inverse coarsening of dots in conjunction with surface smoothening, never seen in earlier studies of dot evolution, is observed beyond the critical time.     

8 MeV electron irradiation effect on the dielectric and optical properties of iminodiacetic acid doped ferroelectric triglycine sulphate crystals

Single crystal of iminodiacetic acid (5 mol%) doped Tri Glycine Sulphate (IDATGS) was grown by slow evaporation from its aqueous solution at constant temperature, using solution growth method. The dielectric constant (ε′) and pyroelectric current (I_P) were measured over the temperature range of 30-60 °C in the ferroelectric direction. The measured values of ε′ and I_P were found to be smaller compared to pure triglycine sulphate (TGS) crystal parameters. But increased transition temperature was observed for doped crystals. Curie Weiss constants C_P and C_f in the paraelectric and ferroelectric phases were also determined. The doped crystal was irradiated with graded dosages from 5 to 80 kGy of electron beam from 8 MeV Microtron at room temperature and radiation effects on optical and dielectric properties were studied. The UV-Vis absorption spectrum indicates that the UV lower cutoff shifts towards the higher wavelength region (red shift) and the optical band gap is found to be decreasing with the increase of electron dose. It is also observed that the electron irradiation effects in pure and doped TGS were found to be long lasting. The dielectric study shows that there is a gradual reduction in dielectric constant at T_C and shifting of Curie temperature towards lower temperature region with the increase in electron radiation dose. The material figures of merit were found increased after the crystal was irradiated. Induced changes in the physical and optical properties due to irradiation may help one to tailor the device quality and characteristics.     

Structural, thermal and optical behavior of 84 MeV oxygen and 120 MeV silicon ions irradiated PES

In order to study structural, thermal and optical behavior, thin flat samples of polyethersulfone were irradiated with oxygen and silicon ions. The changes in properties were analyzed using different techniques viz: X-ray diffraction, thermo-gravimetric analysis, Fourier transform infrared, UV-visible and photoluminescence spectroscopy. A noticeable increase in the intensity of X-ray diffraction peaks was observed after irradiation with 84 MeV oxygen ions at low and medium fluences, which may be attributed to radiation-induced cross-linking in polymer. Fourier transform infrared and thermo-gravimetric analysis corroborated the results of X-ray diffraction analysis. No noticeable change in the Fourier transform infrared spectra of oxygen ion irradiated polyethersulfone were observed even at the highest fluence of 1 × 10¹³ ions cm⁻², but after irradiation with silicon ions, a reduction in intensity of almost all characteristic bands was revealed. An increase in the activation energy of decomposition of polyethersulfone was observed after irradiation with 84 MeV oxygen ions up to medium fluences but degradation was revealed at higher fluences. Similar trends were observed by photoluminescence analysis.     

Interferences in electron emission from O2 by 30 MeV O impact

Interference structures in the ejected electron spectra for 30 MeV O^5,8+ + O₂ are investigated. The measured electron yields were studied for electron energies from 5 to 400 eV and observation angles of 30°, 60°, 90°, 120° and 150° with respect to the incident beam direction. Experimental molecular cross-sections were normalized to theoretical molecular one-center cross-sections revealing oscillatory structures suggestive of secondary interferences as evidenced by the independence on the observation angle. An oscillation interval for 30 MeV O^5,8+ + O₂ of Δk ∼ 4 a.u. is found, a value two times larger than that previously observed for 3 MeV H⁺ + N₂. No obvious evidence for primary Young-type interferences was seen.