类金刚石薄膜作为HgCdTe红外器件增透膜和钝化膜的研究

采用高频等离子体化学气相色沉积法（ＲＦＣＶＤ）在ＨｇＣｄＴｅ红外器件上沉积类金刚石薄膜，俄歇电子能谱对ＤＬＣ／ＨｇＣｄＴｅ界面分析结果表明类金刚石薄膜中的碳原子对衬底材料影响较小，７０ｎｍ的类金刚石薄膜抑制衬底组份的外扩散，而且具有纯度较高的类金刚石薄膜外表面层，是一种理想的钝化膜材料，红外透射光谱测试结果表明类金刚石薄膜在较宽的波长范围内（４－１２μｍ）具有明显的增透效应。     

γ射线辐照对类金刚石薄膜结构与特性的影响

用射频等离子体方法在玻璃基底上制备了类金刚石薄膜。分析了γ射线辐照类金刚石薄膜（以下简称ＤＬＣ薄膜）的结构与特性改变。采用Ｒａｍａｎ及红外光谱进行结构分析表明：随辐照剂量的增加，在膜中出现ＳＰ３Ｃ—Ｈ及 ＳＰ２Ｃ—Ｈ 键的断裂与减少，ＳＰ３Ｃ—Ｃ键的略微增加．当辐照剂量达 １０ ×１０４Ｇｙ时，ＳＰ３Ｃ—Ｈ键减少约５０％，与此同时，出现膜中氢的重新键合，并从中释出。γ射线辐照使ＤＬＣ薄膜的电阻率呈上升趋势，膜的类金刚石特征更加明显，结构得到改善。本文对γ射线对ＤＬＣ薄膜的辐照机制进行了简要的讨论。     

新型红外增透膜和保护膜EI

介绍了类金刚石碳（ＤＬＣ）膜和碳化锗（Ｇｅ＿ｘＣ＿（１－ｘ））簿膜的沉积方法、特性和在红外光学镀膜中的应用进展。     

类金刚石薄膜中杂质Fe对其力学性能的影响

描述了利用射频等离子体溅射法采用不同阴极在衬底Ｓｉ片上形成类金刚石薄膜的杂质含量及杂质对厚度和硬度的影响分析与结果,比较了ＤＬＣ膜的力学性能在有无金属杂质情况下的异同,分析和计算了其硬度与硬度与制备参数间的关系,得出利用石墨作电极能制备出质量较好的ＤＬＣ膜,初步探讨在Ｓｉ衬底上沉积高硬度和强附着度类金刚石薄膜的有关工艺条件,并在理论上对这一结果进行了解释。     

CVD金刚石薄膜抛光技术的研究进展

采用化学气相沉积方法在非金刚石衬底上沉积的金刚石薄膜,本质上为多晶,而且表面粗糙。本文论述了目前国际上出现的抛光ＣＶＤ金刚石薄膜的主要方法,包括机械抛光法、热－化学抛光法、化学－＝机械抛光法、等离子体／离子束抛光法以及激光抛光法等。     

液相电沉积金刚石薄膜的研究进展

评述了液相沉积(类)金刚石薄膜的研究现状,介绍了液相合成(类)金刚石薄膜的装置、液态源及薄膜的性能,分析了如何更好地提高(类)金刚石薄膜质量,并在此基础上提出了一种可能制备出高质量金刚石薄膜的脉冲电弧放电沉积装置.     

WC-Co硬质合金表面MW-PCVD制备金刚石薄膜去钴预处理的研究

研究了ＷＣ－Ｃｏ硬质合金刀具表面微波等离子体化学气相沉积（ＭＷ－ＰＣＶＤ）制备金刚石薄膜时不同的去钴预处理方式的影响。扫描电子显微镜形貌观察和喇曼谱分析表明，利用氢－氧等离子体处理方式有显著的去钴效果，相应沉积获得的金刚石薄膜质量相对较高。与酸腐蚀处理相比，微波等离子体化学气相沉积装置中实现氢－氧等离子体处理方式具有独特的优越性。     

DMF中电沉积制备Yb-Co合金膜

研究了于室温下含有少量水的ＹｂＣｌ３－ＣｏＣｌ２－ＤＭＦ溶液中电沉积制备Ｙｂ－Ｃｏ合金膜。ＥＤＡＸ和ＸＲＤ分析表面：在０．１０ｍｏｌ／Ｌ ＹｂＣｌ３－０．１０ｍｏｌ／Ｌ ＣｏＣｌ２的ＤＭＦ电镀液中,以控制电位为－２．７５Ｖ（ＳＣＥ）进行恒电位电解,以控制电流密度为１００Ａ／ｍ＾２进行恒电流电解或以控制脉冲电流密度为１５０Ａ／ｍ＾２进行脉冲电解,可以得到不同形态和Ｙｂ含量的共沉积合金膜,且膜层光滑、     

类金刚石薄膜的辐照及其发展

类金刚石薄膜（以下简称ＤＬＣＦ）是一种极有发展前途的材料,其用途非常广泛。介绍ＤＬＣＦ辐照的现状,指出ＤＬＣＦ辐照效应的研究对其在空间、核聚变反应等辐照环境下应用的必要性和重要性,预测了其发展方向和应用前景。     

WC—Co硬质合金表面MW—PCVD制备金刚石薄膜去钴预处理的研究

研究了ＷＣ－Ｃｏ硬质合金刀具表面微波等离子体化学气相沉积（ＭＷ－ＰＣＶＤ）制备金刚石薄膜时不同的去钴预处理方式的影响。扫描电子显微镜形貌观察和喇曼谱分析表明，利用氢－氧等离子体处理方式有显著的去钴效果，相应沉积获得的金刚石薄膜质量相对较高。与酸腐蚀处理相比，微波等离子体化学气相沉积装置中实现氢－氧等离子体处理方式具有独特的优越性。     

Aroused problems in the deposition of diamond-like carbon films by using the liquid phase electrodeposition technique

Hydrogenated diamond-like carbon (DLC) films were prepared by using liquid phase electrodeposition technique. The effects of the applied potential and the carbon sources on the deposition process and film structures were studied. It has been found that the organic liquids with high dielectric constants, small viscosities and the methyl group bonding to the polar group are appropriate carbon sources. The increasing of potential improves the formation of sp³ carbon during the deposition process. In a high electric field, organic molecules are polarized and reacted on the surface of the electrode, turning out DLC and other products. It is believed that the reaction follows a polarization-reaction mechanism.     

Hochleistungsplasmen zur Synthese diamantähnlicher Kohlenstoffschichten

HPPMS high‐performance plasmas for the deposition of diamond‐like carbon coatings Diamond‐like carbon (DLC) coatings Diamond‐like carbon (DLC) coatings can be used in many different applications, due to their adjustable properties like hardness as wear reduction. Regarding to the synthesis of these coatings, research is upon the High Power Pulsed/Impulse Magnetron Sputtering (HPPMS/HiPIMS), which in contrast to conventional processes like the Pulsed Laser Deposition (PLD) provides smooth coatings and therefore less postprocessing. Previous to the coating deposition in‐situ plasma analysis can be utilized to identify the process parameters. The aim relevantof this work was to identify process parameters which enable to generate a high amount and energy of carbon ions, which are required to synthesize hard DLC coatings. Regarding to the carbon ionization the promising process parameters mixture and pressure of the process gas as well as the HPPMS pulse parameters were varied. Finally, process parameters for the DLC coating deposition could be derived from these investigations.     

Abscheidung superharter Kohlenstoffschichten mittels Laser‐Arco® auf dem Weg vom Labor in die industrielle Serienfertigung

Superhard carbon film deposition by means of Laser‐Arco® on the way from the Laboratory into the industrial series coating Diamond‐like carbon films (DLC) are more and more applied as wear protection coatings for components and tools due to their unique combination of high hardness, low friction and sticking tendency to metallic counter bodies. Up to now applied DLC films are hydrogen containing (a‐C:H) or metal carbon films (Me‐C:H) deposited by a plasma assisted CVD process from carbon‐hydrogen gas mixtures. Their wide industrial effort results from that the can be deposited with slowly modified coating machines for classical hard coating (e.g. TiN or CrN). A new generation DLC films are the hydrogen‐free ta‐C films (ta‐C = tetrahedral bounded amorphous carbon) with a between two and three‐times higher hardness and with a resulting higher wear resistance under extreme condition than classical DLC films. They have excellent emergency running properties at lubrication break down. Their industrial application is more difficult due to that they cannot deposited with modified coating machines for classical hard and DLC coating and a new technology with corresponding equipment was not available up to now. The laser controlled, pulsed arc deposition technology (Laser‐Arco®) of the Fraunhofer IWS Dresden has this potential. In kind of a Laser‐Arc‐Module‐source the ta‐C film deposition can be integrated in every industrial used deposition machine.     

Oxygen plasma etching of silver-incorporated diamond-like carbon films

Diamond-like carbon (DLC) film as a solid lubricant coating represents an important area of investigation related to space devices. The environment for such devices involves high vacuum and high concentration of atomic oxygen. The purpose of this paper is to study the behavior of silver-incorporated DLC thin films against oxygen plasma etching. Silver nanoparticles were produced through an electrochemical process and incorporated into DLC bulk during the deposition process using plasma enhanced chemical vapor deposition technique. The presence of silver does not affect significantly DLC quality and reduces by more than 50% the oxygen plasma etching. Our results demonstrated that silver nanoparticles protect DLC films against etching process, which may increase their lifetime in low earth orbit environment.     

不同等离子源形成的DLC涂层对NiTi合金腐蚀行为的影响

采用等离子浸没离子注入和沉积(PIIID)法分别以C2H2和石墨为等离子源在NiTi合金表面形成DLC涂层来提高该合金的耐腐蚀性.利用Raman光谱和扫描电镜分析膜层结构.利用电化学测试和原子吸收光谱测试涂层前后基体的耐腐蚀性和Ni离子析出.结果表明:采用等离子浸没离子注入和沉积法以乙炔和石墨为等离子源在NiTi合金表面形成均匀致密、结合力良好的DLC涂层.两种涂层都明显地提高了NiTi合金的耐腐蚀性能和有效地抑制了Ni离子的溶出.     

等离子体化学气相沉积类金刚石碳膜的特性及应用

类金刚石（DLC）膜是含有sp^3杂化态的亚稳态非晶碳膜，是具有极高的硬度、化学稳定性和光学透明性的半导体材料。这篇综述介绍了用等离子体化学气相沉积DLC膜的沉积方法、所制备薄膜的特性及应用，最后展望了DLC膜的发展趋势。     

Study of the ability to field emission from diamond-like carbon layers and carbon nanotubes

The aim of this work was to study the relationship between parameters of the electron field emission and the film deposition method. In this study two methods were applied: classical radio frequency plasma-assisted chemical vapor deposition (RF PACVD) to produce diamond-like carbon (DLC) layers and chemical vapor deposition (CVD) to produce carbon nanotubes (CNT). DLC layers were grown on n-type silicon substrates and CNT were grown on n-type and p-type silicon substrates.Atomic force microscopy (AFM) and Raman spectroscopy were used to investigate the physical and chemical parameters of DLC films after deposition process. The electrical parameters of capacitors with the DLC layer as an insulator were extracted from the capacitance-voltage (C-V) and current-voltage (I-V) characteristics. Measurements of the field emission were performed after characterization of the layer properties.     

类金刚石薄膜在不锈钢表面结合强度及耐腐蚀性研究

类金刚石(DLC)薄膜与不锈钢的结合强度是DLC薄膜应用于血管支架表面改性的关键技术问题.利用磁过滤阴极真空弧源沉积方法在316L不锈钢表面沉积DLC薄膜,研究沉积时基体偏压、薄膜厚度以及钛过渡层对DLC薄膜与基体结合强度的影响.研究结果表明,316L表面制备相同厚度的DLC薄膜,采用-1000V脉冲偏压制备的薄膜结合强度明显优于-80V直流偏压下制备的DLC薄膜;随着DLC薄膜厚度的增大,DLC薄膜与316L基体的结合力下降;316L不锈钢表面制备一层100nm的钛过渡层之后可以改善DLC薄膜的结合状况,并且经过20%的拉伸变形后,DLC薄膜完整,耐蚀性优于未表面处理的316L不锈钢.以上研究结果表明,磁过滤阴极真空弧源方法制备DLC薄膜与316L结合强度高,可以有效的提高316L的耐腐蚀性,是一种具有应用前景的血管支架表面改性方法.     

H13钢离子渗氮(PN)与类金刚石(DLC)复合处理的摩擦磨损性能研究

采用阳极层流离子源与非平衡磁控溅射结合的沉积方法在H13钢基体表面沉积出类金刚石膜(DLC),并对H13钢经不同表面预处理对后沉积的DLC膜的摩擦学性能进行了对比研究.结果表明:DLC膜结构致密,且DLC膜与梯度过渡层及基体三者之间结合牢固;H13钢经离子氮化后,梯度过渡层与氮化层间结合紧密,提高了膜与基体的承载能力;在保持相同摩擦速率的条件下,摩擦系数随着载荷的增加先增大后减小;H13钢离子渗氮处理后沉积的DLC膜其摩擦系数远小于未采用离子渗氮处理沉积的DLC薄膜.     

Studies of diamond-like carbon films prepared by ion beam-assisted deposition

Ion beam-assisted deposition offers a novel and unique process to prepare diamond-like carbon (DLC) films at room temperature, with particularly good interface adhesion. This advantage was explored in this study to deposit highly wear-resistant coating on bearing 52100 steel. Both dual ion beam sputtering and ion beam deposition were employed. Various bombarding species and energy were investigated to optimize the process. Raman, X-ray photoelectron and Auger electron spectroscopy were used to characterize the bonding structure of DLC. Extensive experiments were carried out to examine the tribological behaviour of the DLC/52100 system. A metal intermediate layer can help tremendously in wear resistance. The results are optimistic and may lead to useful applications.