Instructions for Manuscript Preparation

Plasma Science and Technology (PST) is a journal reporting novel experimental and theoretical results and progress of interdisciplinary and application sciences in the fields related to Plasma Physics. Specific interested areas include: basic plasma phenomena; magnetically confined plasma; inertially confined plasma; astrophysics and space plasma; low temperature plasma; plasma technology and fusion engineering. Published monthly by both the Institute of Plasma Physics, Chinese Academy     

聚变高功率RF技术在非聚变领域的应用

本文介绍了在几ＭＨｚ到几ＧＨｚ（微波频率）的频率范围内高功率射频技术应用的几个例子。所有例子都涉及到在用于许多重要的技术工艺时非聚变等离子体的ＲＦ产生。一些具体的项目是：用于此出离子束的感应驱动ＲＦ放电、射频板反应器以及最近发展起来的微波等离子体源。     

自持稳态托卡马克等离子体

本文介绍了国家球形环实验（ＮＳＴＸ）和球形环体积中子源（ＳＴ－ＶＮＳ）的自持稳态的托卡马克平衡,证明了压力梯度驱动电流的量与在这些装置中设计的电流条件相当,前者包括自举电流和抗磁电流。也说明了通过增加等离子体压力来启动的可能的程序。     

Kinetic simulation study of one dimensional collisional bounded plasma

A self-consistent kinetic simulation study of one dimensional collisional bounded plasma is presented.The formation of stable of stable sheath potential is investigated.It is found that mass ratio of electron and ion not only affects the level of sheath potential.but also affects the ion temnperature of system.It is clarified that the effects of secondary emission electron on both the total potential drop and the temperature are not important.     

Instructions for Manuscript Preparation

Plasma Science and Technology （PST） is a joumal reporting novel experimental and theoretical results and progress of interdisciplinary and application sciences ...     

Instructions for Manuscript Preparation

Plasma Science and Technology （PST） is a joumal reporting novel experimental and theoretical results and progress of interdisciplinary and application sciences ...     

Instructions for Manuscript Preparation

Plasma Science and Technology （PST） is a joumal reporting novel experimental and theoretical results and progress of interdisciplinary and application sciences in the fields related to Plasma Physics. Specific interested areas include： basic plasma phenomena; magnetically confined plasma; inertially confined plasma; astrophysics and space plasma; low temperature plasma; plasma technology and fusion engineering.     

Instructions for Manuscript Preparation

Plasma Science and Technology （PST） is a journal reporting novel experimental and theoretical results and progress of interdisciplinary and application sciences in the fields related to Plasma Physics. Specific interested areas include： basic plasma phenomena; magnetically confined plasma; inertially confined plasma; astrophysics and space plasma; low temperature plasma; plasma technology and fusion engineering.     

Effects of Ion Temperature on Collisionless and Collisional RF Sheath

A numerical two-fluid simulation of the non-ionized radio frequency （rf） sheath model, has been carried out. This model is ＂global＂ and thus applicable to the sheath, pre-sheath and plasma regions, In the model all variables in the ion force balance equation, including the electrical force, ion pressure and neutral particle friction, are considered. The model is solved through a finite difference scheme and sheath characteristics are obtained. The effects of the ion temperature on both the collisionless and collisional sheath characteristics are discussed. Then it is concluded that 1） the model is in a good agreement with Bohm Theorem; 2） the ion temperature has significant effects on the rf sheath characteristics. The effects are far more significant on a collisional rf sheath than on a collisionless sheath.     

等离子体加工用的感应等离子体

因为在单一晶片蚀刻工具中要求高等离子体密度和低压力，所以已经和正在研制大量商业出售的感应蚀刻装置。本文回顾低压力感应等离子体的一些历史，给出感应等离子体的特性。限制及校正，并介绍等离子体加工的用途，也讨论了趋肤深度，ｒｆ线圈阻抗和效率的理论。     

休斯研究实验室的等离子体离子植入技术

在休斯研究实验室（ＨＲＬ）的等离子体离子植入（ＰＩＩ）项目的一个主要目的是评价和应用ＰＩＩ技术，以改进在航空航天、防御和工业应用中的金属和非金属材料的摩擦性能。ＨＲＬ ＰＩＩ设备包括一个直径４ｆｔ长度８ｆｔ的真空室（能植入重达７０００Ｉｂ的物体）和一个提供植入脉冲电压的高功率（１００ｋＷ）、高电压（１００ｋＶ）脉冲调制器。已研制了先进的等离子体源来产生原子及分子的氮和氧离子，并开发了ＰＩＩ工艺来处     

用微波等离子体源SLANⅡ的远距离清洗和直接清洗

有一个用作等离子体室的石英管的２．４５ＧＨｚ窄缝天线微波等离子体源已用于从远距离等离子体中的玻璃基体去除有机润滑剂，有选择地用一个无距离笼把直接在石英管壁的初始放电与工艺室中的扩散本体等离子体开来，地于有和没有远距离笼的源型，研究了离子浓度的径向和轴向分布和去除率。一般的工艺条件是：功率为４ｋＷ、压强为－２５Ｐａ氧流率１００ｓｃｃｍ。对于直接等离子体和远距离等离子体。测得的离子浓度分别为８×１０６