高质量二维光子晶体结构刻蚀掩膜版的制作方法

结合制作光子晶体结构的具体要求,研究了电子束曝光得到的电子束胶上(GaAs衬底)随实验条件变化的图形.结果表明,胶的厚度、曝光剂量、显影/定影时间等参数对图形的质量有重要影响.通过合理优化这些参数,我们得到了高质量的掩膜图形.     

高质量二维光子晶体结构刻蚀掩膜版的制作方法

结合制作光子晶体结构的具体要求,研究了电子束曝光得到的电子束胶上(GaAs衬底)随实验条件变化的图形.结果表明,胶的厚度、曝光剂量、显影/定影时间等参数对图形的质量有重要影响.通过合理优化这些参数,我们得到了高质量的掩膜图形.     

Large area nanosize array stamp for UV-based nanoimprint lithography fabricated by size reduction process

A novel size reduction process using electron beam lithography (EBL) combining with wet etching technique is developed as a possible solution for producing large area and low cost nanopattern stamp for UV-based nanoimprint lithography (UV-NIL). In the first step, a microstructure stamp with 1.4 μm periodical pore array and aspect ratio of 1:1 was formed over a 1 inch² area on a quartz substrate. This process was carried out using common electron beam lithography (EBL) equipment, which was easily available in the modern integrated circuits (IC) semiconductor factory. Afterwards, with a controlled wet etching technique, the pore array was changed into tip patterns with the line width below 100 nm and the period keeping as before. The uniformities and nanopattern accuracies were investigated to identify its possibility as a UV-NIL stamp by AFM and SEM. Finally, as a demonstration, the as obtained stamp was used as a positive stamp to replicate the nanotips into UV-curable resist successfully by a UV-NIL process. The method developed for the mold of nanoimprint lithography would be a simple and low price approach to fabricate large area UV-NIL stamp and the nanotip array structures would be widely used in two dimensional (2D) photonic crystal application.     

掺铒大模式面积单模光子晶体光纤放大器的数值分析

根据平面波展开法(PWEM)给出泵浦光和信号光本征模场分布,结合速率方程和功率传输方程设计一种大单模尺寸的实芯掺铒K9玻璃大模式面积单模光子晶体光纤,芯径为20 μm;分析其椭圆度容差为94.7%,最内层小孔最大允许偏移量为0.1 μm;分析了掺铒K9玻璃光子晶体光纤放大器的放大特性.进行数值计算后得到当铒离子浓度(Nt)为1×1026时,掺铒K9玻璃光纤放大器阈值为180 mW,最佳长度为0.26 m.     

Soft Imprinting: Creating Highly Ordered Porous Anodic Alumina Templates on Substrates for Nanofabrication

We demonstrate a “soft‐imprinting” method for the fabrication of highly ordered porous anodic alumina (HOPAA) templates on different substrates (such as Si, glass slides, and flexible polyimide films) over large areas (> 1.5 cm²). In this process, Ar plasma etching is employed to soft imprint an evaporated Al film on the substrates using a free‐standing HOPAA template as a mask, thus creating ordered nanoindentations on the Al surface. The ordered nanoindentations in turn guide the subsequent anodization of Al to generate HOPAA templates on the substrates (HOPAA–substrates), which inherit the pattern of the free‐standing HOPAA mask. This soft‐imprinting technique is also applicable to the fabrication of HOPAA on flexible polymer films. To demonstrate the potential uses of the HOPAA–substrates in nanofabrication, highly ordered Au nanowire arrays are fabricated on a Si substrate and TiO₂ nanotube arrays are prepared on a glass substrate via solution‐ and vapor‐based fabrication processes, respectively.     

An All-E-Beam Lithography Process for the Patterningof 2D Photonic Crystal Waveguide Devices

以光子晶体Fabry-Perot腔为例，提出了全电子束光刻制作光子晶体波导器件的解决方案. 曝光光子晶体区域时采用较小的曝光步长，同时引入额外的邻近效应补偿本征邻近效应，从而获得高质量的掩模图形. 曝光较长的输入、输出波导时，采用较大的曝光步长以提高电子束扫描速度，同时在波导的写场（write-field）过渡区引入一个锥形波导以减小写场拼接误差对光传输效率的影响. 实验结果证明，这种方法既能保持小孔制作需要的高精度，也能很大程度上提高光刻效率.     

全电子束光刻制造二维光子晶体波导器件解决方案

以光子晶体Fabry-Perot腔为例,提出了全电子束光刻制作光子晶体波导器件的解决方案.曝光光子晶体区域时采用较小的曝光步长,同时引入额外的邻近效应补偿本征邻近效应,从而获得高质量的掩模图形.曝光较长的输入、输出波导时,采用较大的曝光步长以提高电子束扫描速度,同时在波导的写场(write-field)过渡区引入一个锥形波导以减小写场拼接误差对光传输效率的影响.实验结果证明,这种方法既能保持小孔制作需要的高精度,也能很大程度上提高光刻效率.     

An efficient dose-compensation method for proximity effect correction

A novel simple dose-compensation method is developed for proximity effect correction in electron-beam lithography.The sizes of exposed patterns depend on dose factors while other exposure parameters(including accelerate voltage,resist thickness,exposing step size,substrate material,and so on) remain constant.This method is based on two reasonable assumptions in the evaluation of the compensated dose factor:one is that the relation between dose factors and circle-diameters is linear in the range under con...     

一种有效的邻近效应修正方法

本文介绍了在电子束光刻中修正邻近效应的一种有效的剂量补偿方法。在其它曝光参数一定的条件下（包括加速电压,抗蚀剂厚度,曝光步长大小及衬底材料等）图形尺寸由剂量大小决定。本方法基于两种合理的假设来确定补偿剂量因子。一是假设在特定实验范围内,剂量的大小和圆直径的关系可以看作是线性的。二是假设补偿剂量因子仅受最近邻图形的影响。四层六角光子晶体作为本实验方法的测试图形。比较没有修正的结构,修正后的结构中孔大小的一致性得到了显著的提高     

基于模式耦合的低弯曲损耗大模场带隙光纤研究

提出一种大模场带隙光纤,由排布在正方结构网 格中的高折射率介质柱形成导光机制。采用有 限元法分析了直光纤与弯曲光纤下的模式损耗与模场面积等特性。研究结果表明:这种光纤 具有较宽的带 隙,可同时支持基模和高阶模的传输,两种模式的泄漏损耗均低于1×10－3 dB/m。当光纤弯曲时,其包层会 产生具有强泄露损耗的包层模,并在一定的弯曲半径下与纤芯的高阶模发生强耦合。当弯曲 半径在15～20cm 之间时,基模弯曲损耗小于0.01dB/m,而高阶模损耗大于1dB/m, 因而光纤可以经弯曲实现大模场单模传 输。在1064nm波长处,其直光纤的基模模场面 积为1319.62μm², 而在弯曲状态下的模场仍可达到975.00μm²以上,因而可实现大 模场的低弯曲损耗传输。     

Dispersion-flattened Bragg photonic crystal fiber for large capacity optical communication system

A novelty dispersion ultra-flattened Bragg photonic crystal fiber (PCF) has been fabricated in this paper.The fiber is composed of compound cores and periodical claddings with 11 coaxial rings.It has flattened dispersion of 8.54±1.3 ps-(nm· km)-1 in the communication wavelength range of 1460-1625 nm.Its dispersion slope alters from -0.0428 to 0.0392ps·nm-2·km-1.The low attenuation of 0.52 dB/km and low bending loss of 0.09 dB at 1550 nm of the fiber are also achieved.The Bragg PCF has enormously potential application in the fields of dense wavelength division multiplexing systems because of its superior dispersion properties and easy splicing performances.     

Mechanical stabilisation and design optimisation of masks for stencil lithography: Numerical approach and experimental validation

This paper addresses mask deformation phenomenon that frequently occurs but is highly undesirable in stencil lithography. Previously, a technique for mechanical stabilisation of stencils was proposed [M.A.F. van den Boogaart, et al., Corrugated membranes for improved pattern definition with micro/nanostencil lithography, Sensors Actuators A 130-131 (2006) 568-574] and successfully validated for simple cantilever-like designs. In present work, the numerical approach to designing optimal geometry of stabilisation structures incorporated onto stencils is applied to complex experimental stencil designs and is validated both numerically and experimentally. Two types of stencil support structures are considered, namely corrugation (hollow rims) and solid silicon rims. Results confirm the effectiveness of the approach and show that up to a 94.5% reduction in stencil deformation with a corresponding improvement in reducing deposited pattern blurring can be achieved. Additionally, design guidelines for the optimal geometries of mechanically stabilised stencils are established. These guidelines can be applied to other types of mechanically unstable structures in need of stiffening to increase their resistance to deformation and improve critical performance characteristics.     

Enhanced Electro‐Optic Behavior for Shaped Polymer Cholesteric Liquid‐Crystal Flakes Made Using Soft Lithography

Polymer cholesteric liquid‐crystal (PCLC) flakes were investigated for their electro‐optical behavior under an applied alternating‐current field. Shaped flakes, fabricated using soft lithography and suspended in dielectric‐fluid‐filled cells, reoriented more uniformly than randomly shaped flakes made by fracturing of PCLC films. Extensive characterization found shaped flakes to be smooth and uniform in size, shape, and thickness. Reorientation in applied fields as low as tens of mV_rms μm^–1 was fastest for flakes with lateral aspect ratios greater than 1:1, confirming theoretical predictions based on Maxwell–Wagner polarization. Brilliant reflective colors and inherent polarization make shaped PCLC flakes of interest for particle displays.     

Cover Picture: Enhanced Electro‐Optic Behavior for Shaped Polymer Cholesteric Liquid‐Crystal Flakes Made Using Soft Lithography (Adv. Funct. Mater. 2/2005)

The cover shows a variety of shaped flakes fabricated from polymer cholesteric liquid‐crystal material using soft lithography. In work reported by Jacobs and co‐workers on p. 217, the micrometer‐sized flakes exhibit brilliant circularly polarized selective reflection colors without polarizers or color filters when placed in a fluid‐filled electro‐optic cell. With the application of a low‐magnitude alternating current field, the flakes reorient in hundreds of milliseconds and the colors disappear. Polymer cholesteric liquid‐crystal (PCLC) flakes were investigated for their electro‐optical behavior under an applied alternating‐current field. Shaped flakes, fabricated using soft lithography and suspended in dielectric‐fluid‐filled cells, reoriented more uniformly than randomly shaped flakes made by fracturing of PCLC films. Extensive characterization found shaped flakes to be smooth and uniform in size, shape, and thickness. Reorientation in applied fields as low as tens of mV_rms μm^–1 was fastest for flakes with lateral aspect ratios greater than 1:1, confirming theoretical predictions based on Maxwell–Wagner polarization. Brilliant reflective colors and inherent polarization make shaped PCLC flakes of interest for particle displays.     

Porous Silicon‐Based Optical Microsensors for Volatile Organic Analytes: Effect of Surface Chemistry on Stability and Specificity

Sensing of the volatile organic compounds (VOCs) isopropyl alcohol (IPA) and heptane in air using sub‐millimeter porous silicon‐based sensor elements is demonstrated in the concentration range 50–800 ppm. The sensor elements are prepared as one‐dimensional photonic crystals (rugate filters) by programmed electrochemical etch of p⁺⁺ silicon, and analyte sensing is achieved by measurement of the wavelength shift of the photonic resonance. The sensors are studied as a function of surface chemistry: ozone oxidation, thermal oxidation, hydrosilylation (1‐dodecene), electrochemical methylation, reaction with dicholorodimethylsilane and thermal carbonization with acetylene. The thermally oxidized and the dichlorodimethylsilane‐modified materials show the greatest stability under atmospheric conditions. Optical microsensors are prepared by attachment of the porous Si layer to the distal end of optical fibers. The acetylated porous Si microsensor displays a greater response to heptane than to IPA, whereas the other chemical modifications display a greater response to IPA than to heptane. The thermal oxide sensor displays a strong response to water vapor, while the acetylated material shows a relatively weak response. The results suggest that a combination of optical fiber sensors with different surface chemistries can be used to classify VOC analytes. Application of the miniature sensors to the detection of VOC breakthrough in a full‐scale activated carbon respirator cartridge simulator is demonstrated.