Analog performance of double gate junctionless tunnel field effect transistor

For the first time, we investigate the analog performance of n-type double gate junctionless tunnel field effect transistor （DG-JLTFET） and the results are compared with the conventional n-type double gate tunnel field effect transistor （DG-TFET） counterpart. Using extensive device simulations, the two devices are compared with the following analog performance parameters, namely transconductance, output conductance, output resistance, intrinsic gain, total gate capacitance and unity gain frequency. From the device simulation results, DG-JLTFET is found to have significantly better analog performance as compared to DG-TFET.     

Dynamic threshold voltage operation in Si and SiGe source junctionless tunnel field effect transistor

We propose a dynamic threshold voltage junctionless tunnel FET(DT-JLTFET) in which the threshold voltage can be dynamically adjusted,resulting in higher ON-current.Through 2D numerical simulations,it is presented that the threshold voltage in the DT-JLTFET can be adjusted by applying a voltage to the adjust gate.The impact of the threshold voltage shift on the overall performance of the device is also studied.A comparison is made between the dynamic threshold voltage characteristics of a silicon JLTFET and a Si0:7Ge0:3 source JLTFET.     

High air stability of threshold voltage on gate bias stress in pentacene TFTs with a hydroxyl-free and amorphous fluoropolymer as gate insulators

We investigated the air stabilities of threshold voltages (V_th) on gate bias stress in pentacene thin-film transistors (TFTs) with a hydroxyl-free and amorphous fluoropolymer as gate insulators. The 40-nm-thick thin films of spin-coated fluoropolymer had excellent electrical insulating properties, and the pentacene TFTs exhibited negligible current hysteresis, low leakage current, a field-effect mobility of 0.45 cm²/Vs and an on/off current ratio of 3 × 10⁷ when it was operated at −20 V in ambient air. After a gate bias stress of 10⁴ s, a small V_th shift below 1.1 V was obtained despite non-passivation of the pentacene layer. We have discussed that the excellent air stability of V_th was attributed to the insulator surface without hydroxyl groups.     

老练电压对铝电解电容器容量和漏电流的影响

老练电压对铝电解电容器的容量和漏电流有一定影响,对于低压（≤１６Ｖ）产品要确保老练电压的准确性;对高压（≤１００Ｖ）小容量产品,若容量偏差过大,可适当加高老练电压使其降低。老练后漏电流大的产品,加高老练电压也有良好效果。     

The effect of pH and DNA concentration on organic thin-film transistor biosensors

Organic electronics are beginning to attract more interest for biosensor technology as they provide an amenable interface between biology and electronics. Stable biosensor based on electronic detection platform would represent a significant advancement in technology as costs and analysis time would decrease immensely. Organic materials provide a route toward that goal due to their compatibility with electronic applications and biological molecules. In this report, we detail the effects of experimental parameters, such as pH and concentration, toward the selective detection of DNA via surface-bound peptide nucleic acid (PNA) sequences on organic transistor biosensors. The OTFT biosensors are fabricated with thin-films of the organic semiconductor, 5,5′-bis-(7-dodecyl-9H-fluoren-2-yl)-2,2′-bithiophene (DDFTTF), in which they exhibit a stable mobility of 0.2 cm² V⁻¹ s⁻¹ in buffer solutions (phosphate-buffer saline, pH 7.4 or sodium acetate, pH 7). Device performance were optimized to minimize the deleterious effects of pH on gate-bias stress such that the sensitivity toward DNA detection can be improved. In titration experiments, the surface-bound PNA probes were saturated with 50 nM of complementary target DNA, which required a 10-fold increase in concentration of single-base mismatched target DNA to achieve a similar surface saturation. The binding constant of DNA on the surface-bound PNA probes was determined from the concentration-dependent response (titration measurements) of our organic transistor biosensors.     

基于FDSOI的TFET和MOSFET总剂量效应仿真

对基于全耗尽绝缘体上硅(FDSOI)的隧穿场效应晶体管(TFET)器件和金属氧化物半导体场效应晶体管(MOSFET)器件进行了总剂量(TID)效应仿真,基于两种器件不同的工作原理,研究了总剂量效应对两种器件造成的电学影响,分析了辐照前后TFET和MOSFET的能带结构、载流子密度等关键因素的变化。仿真结果表明:两种器件在受到较大辐射剂量时(1 Mrad (Si)),TFET受辐射引起的固定电荷影响较小,仍能保持较好的开关特性、稳定的阈值电压;而MOSFET则受固定电荷的影响较大,出现了背部导电沟道,其关态电流增加了几个数量级,开关特性发生了严重退化,阈值电压也严重地向负电压偏移。此外,TFET的开态电流会随着辐照剂量的增加而减小,这与MOSFET的表现恰好相反。因此TFET比MOSFET有更好的抗总剂量效应能力。