Full wafer scale nanoimprint lithography for GaN-based light-emitting diodes

A UV-imprinting process for a full wafer was developed to enhance the light extraction of GaN-based green light-emitting diodes (LEDs). A polyvinyl chloride flexible stamp was used in the imprinting process to compensate for the poor flatness of the LED wafer. Two-dimensional photonic crystal patterns with pitches ranging from 600 to 900 nm were formed on the p-GaN top cladding layer of a 2 inch diameter wafer using nanoimprint and reactive ion etching processes. As a result, the optical output power of the patterned LED device was increased by up to 44% at a driving current of 20 mA by suppressing the total internal reflection and enhancing the irregular scattering of photons at the patterned p-GaN surface.     

Durability of nitrided fluorocarbon polymer films for nanoimprint lithography

Hydrophobic fluorocarbon polymer films have been used as anti-sticking and releasing coatings for templates in nano-imprint lithography, but have poor durability against repeated high pressure pressing processes. The addition of nitrogen into fluorocarbon-based gas plasma can provide nitrided fluorocarbon polymer films, as confirmed by Fourier-transform infrared spectroscopy. Fluorocarbon and nitrided fluorocarbon films have almost the same 110.0° contact angle with water drops. The nitrided fluorocarbon films are harder and significantly enhance durability as anti-sticking layers. Durability enhancement has been confirmed by fabricating replicas with silicon templates using nitrided fluorocarbon anti-sticking layers.     

Fabrication of fluorine-doped diamond-like carbon stamps for UV nanoimprint lithography

Two fluorine-doped diamond-like carbon (F-DLC) stamps with sub-100 nm line patterns were fabricated using a direct etching method. These were applied successfully to ultraviolet (UV) nanoimprint lithography without requiring an anti-adhesion layer coating. Tests were performed to determine the optimum fluorine concentration for the F-DLC stamps. The ideal stamp material consisted of 25?at.% F-DLC with a contact angle of 85°, UV transmittance of 16.4-26.8%, and hardness of 4.5?GPa. The O(2) plasma etch rate of the DLC was increased considerably by the fluorine doping, making it comparable to the etch rate of polymethyl methacrylate (PMMA). Thus, only PMMA was used as the etch mask in the fabrication of the stamps.     

Fabrication and application of polyimide plastic molds for nanoimprint lithography

In this work, we have developed low-cost, high modulus, flexible, and UV transparent polyimide plastic molds for nanoimprint lithography (NIL). Different structures of poly(amic acids) (PAA) and polyimides (PI) have been synthesized. By casting the PAA or PI solutions on a silicon master, flexible but still rigid plastic molds can be produced. The advantages of the PI molds are: (1) high glass-transition temperatures (Tg) up to 310 degrees C, (2) high thermal stability over 500 degrees C, (3) high tensile modulus, and (4) UV transparency for use in UV-NIL. Various micrometer and nanometer scale patterns could be obtained from the PI molds on a large area (4 inch wafer). The imprinting results showed that the PI molds could be faithfully used for both hot embossing NIL and UV-NIL.     

Thermal expansion and contraction of an elastomer stamp causes position-dependent polymer patterns in capillary force lithography

It is often observed that polymer patterns fabricated by capillary force lithography (CFL) are not identical, position-dependent even in one sample. The drawback has not been successfully explained so far. This paper reveals that the position-dependent pattern is mainly caused by the volume expansion and contraction of the elastomer stamp during heating and cooling in the CFL process. The stamp expands on a polymer liquid on heating, accumulating the polymer at one side-wall of each pattern of the stamp. And the stamp shrinks back to the initial position, accumulating the polymer at the opposite wall of the stamp pattern. For crystalline polymers, the morphology was mainly determined by the annealing temperature, that is, the degree of expansion. The position-dependence of the morphology was enhanced as the annealing temperature was increased. For amorphous polymers, the morphology was sensitive to cooling rate. Fast cooling led to a frozen morphology generated at the hot annealing temperature, while slow cooling produced an opposite morphology from the one at the annealing. The experimental results were theoretically explained by analyzing thermal expansion of the stamp and the shear stress exerted in the polymer layer. In the conclusion, we added our suggestions to avoid the nonuniformity in the polymer pattern by CFL process.     

Detection of dopamine using a silicon nanowire patterned by nanoimprint lithography

Dopamine is one of the most important catecholamine neurotransmitter in the nucleus accumbens of wide variety of animals, including humans. In this study, silicon nanowire FET device was fabricated by UV-assisted NIL method and dopamine was successfully measured by conductance versus time characteristics within 10 pM to 100 nM.     

Combined laser interference and photolithography patterning of a hybrid mask mold for nanoimprint lithography

A lithography technique that combines laser interference lithography (LIL) and photolithography, which can be a valuable technique for the low cost production of microscale and nanoscale hybrid mask molds, is proposed. LIL is a maskless process which allows the production of periodic nanoscale structures quickly, uniformly, and over large areas. A 257 nm wavelength Ar-Ion laser is utilized for the LIL process incorporating a Lloyd's mirror one beam inteferometer. By combining LIL with photolithography, the non-selective patterning limitation of LIL are explored and the design and development of a hybrid mask mold for nanoimprint lithography process, with uniform two-dimensional nanoscale patterns are presented. Polydimethylsiloxane is applied on the mold to fabricate a replica of the stamp. Through nanoimprint lithography using the manufactured replica, successful transfer of the patterns is achieved, and selective nanoscale patterning is confirmed with pattern sizes of around 180 nm and pattern aspect ratio of around 1.44:1.     

Ion beam synthesis of the diamond like carbon films for nanoimprint lithography applications

Ion beam deposited hydrogenated undoped as well as SiO_x (SiO_x + N₂, SiO_x + Ar) doped DLC thin films were deposited and evaluated as possible anti-adhesive layers for nanoimprint lithography. Film surface contact angle with water was investigated as a measure of the surface free energy and anti-sticking properties. Contact angle of the DLC films was independent of SiO_x doping and ion beam energy. Air-annealing resistance in terms of the contact angle with water of the synthesized diamond like carbon films was investigated. Optical transmittance spectra of the DLC films in UV-VIS range were measured to investigate it as possible anti-sticking layers for UV imprint lithography applications. DLC films with the most promising combination of the UV absorption and anti-sticking properties were revealed. Preliminary imprint tests with uncoated and thin DLC film coated hot imprint stamps were performed.     

Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices

A step and repeat UV nanoimprint lithography process on pre-spin coated resist film is demonstrated for patterning a large area with features sizes down to sub-15 nm. The high fidelity between the template and imprinted structures is verified with a difference in their line edge roughness of less than 0.5 nm (3σ deviation value). The imprinted pattern's residual layer is well controlled to allow direct pattern transfer from the resist into functional materials with very high resolution. The process is suitable for fabricating numerous nanodevices.     

Fabrication of silicon nanowire for detecting p-amyloid (1-42) by nanoimprint lithography

Ultraviolet nanoimprint lithography (UV-NIL) is a high volume and cost-effective patterning technique with sub-10 nm resolution. It has great potential as a candidate for next generation lithography. Using UV-NIL, nanowire patterns were successfully fabricated on a four-inch silicon-on-insulator (SOI) wafer under moderate conditions. The fabricated nanowire patterns were characterized by FE-SEM. Its electrical properties were confirmed by semiconductor parameter analysis. Monoclonal antibodies against beta-amyloid (1-42) were immobilized on the silicon nanowire using a chemical linker. Using this fabricated silicon nanowire device, beta-amyloid (1-42) levels of 1 pM to 100 nM were successfully determined from conductance versus time characteristics. Consequently, the nanopatterned SOI nanowire device can be applied to bioplatforms for the detection of proteins.     

Inherently reproducible fabrication of plasmonic nanoparticle arrays for SERS by combining nanoimprint and copolymer lithography

We present an inherently reproducible route to realizing high-performance SERS substrates by exploiting a high-throughput top-down/bottom-up fabrication scheme. The fabrication route employs self-assembly of amphiphilic copolymers to create high-resolution molds for nanoimprint lithography (NIL) spanning entire 100 mm Si wafers. The nanoporous polymer templates obtained upon NIL are subjected to galvanic displacement reactions to create gold nanorod arrays. Nanorods are subsequently converted to nanodiscs by thermal annealing. The nanodiscs were found to perform as robust SERS substrates as compared with the nanorods. The SERS performance of these substrates and its generality for catering to diverse molecules is demonstrated through the excellent Raman peak resolution and intensity for three different molecules, exhibiting different interaction modes on surface. Numerical simulations using FDTD shows plasmonic coupling between the particles and also brings out the influence due to size distribution. The approach combines distinct advantages of high-precision and repeatability offered by NIL with low-cost fabrication of high-resolution NIL molds by copolymer self-assembly.     

Tuning stamp surface energy for soft lithography of polar molecules to fabricate bioactive small-molecule microarrays

Soft-lithography-based techniques are widely used to fabricate microarrays. Here, the use of microcontact insertion printing is described, a soft-lithography method specifically developed for patterning at the dilute scales necessary for highly selective biorecognition. By carefully tuning the polar surface energy of polymeric stamps, problems associated with patterning hydrophilic tether molecules inserted into hydrophilic host self-assembled monolayers (SAMs) are surmounted. Both prefunctionalized tethers and on-chip functionalization of SAMs patterned by microcontact insertion printing enable the fabrication of small-molecule microarrays. Substrates patterned with the neurotransmitter precursor 5-hydroxytryptophan selectively capture a number of different types of membrane-associated receptor proteins, which are native binding partners evolved to recognize free serotonin. These advances provide new avenues for chemically patterning small molecules and fabricating small molecule microarrays with highly specific molecular recognition capabilities.     

Replication of a thin polydimethylsiloxane stamp and its application to dual-nanoimprint lithography for 3D hybrid nano/micropatterns

This paper presents the fabrication of a thin and flexible polydimethylsiloxane (PDMS) stamp with a thickness of a few tens of um and its application to nanoimprint lithography (NIL). The PDMS material generally has a low elastic modulus and high adhesive characteristics. Therefore, after being treated, the thin PDMS stamp is easily deformed and torn, adhering to itself and other materials. This paper introduces the use of a metal ring around the flange of a thin PDMS stamp to assist with the handling of this material. A PDMS stamp with a motheye pattern in nanometer scale was inserted between a substrate and a microstamp with concave patterns in micrometer scale. Subsequently, three-dimensional (3D) hybrid nano/micropatterns were fabricated by pressing these two stamps and curing the resist. The fabricated hybrid patterns were measured and verified in both the microscale and nanoscale. The process, termed "dual NIL," can be applied to the fabrication of optical components or bio-sensors that require repetitive nanopatterns on micropatterns.     

Enhanced light output from a nitride-based power chip of green light-emitting diodes with nano-rough surface using nanoimprint lithography

Enhanced light extraction from a GaN-based power chip (PC) of green light-emitting diodes (LEDs) with a rough p-GaN surface using nanoimprint lithography is presented. At a driving current of 350?mA and with a chip size of 1?mm × 1?mm packaged on transistor outline (TO)-cans, the light output power of the green PC LEDs with nano-rough p-GaN surface is enhanced by 48% when compared with the same device without a rough p-GaN surface. In addition, by examining the radiation patterns, the green PC LED with nano-rough p-GaN surface shows stronger light extraction with a wider view angle. These results offer promising potential to enhance the light output powers of commercial light-emitting devices by using the technique of nanoimprint lithography under suitable nanopattern design.     

Improvement on the interface properties of p-GaAs/n-InP heterojunction for wafer bonded four-junction solar cells

The p-GaAs/n-InP heterojunction was fabricated by direct wafer bonding technology. The optimized atomic level contact between GaAs and InP is critical for getting good ohmic contact and removing the bubbles or voids at the interface, which is helpful to enhance the efficiency of wafer bonded multi-junction solar cells. Through the surface megasonic cleaning and the plasma treatment, we have achieved the high quality bonding interface without bubbles or voids and with interface resistivity of about 0.1 ohms/cm². A GaInP/GaAs//InGaAsP/InGaAs 4-junction solar cell was prepared with the high efficiency of 34.4% (AM0) at 1 sun.     

Development of a resin curing model for UV nanoimprint

UV nanoimprint lithography uses UV light as an energy source. It is performed at room temperature and low pressure, and has its own merits as compared to thermal nanoimprint. In this paper, a measurement system was developed to measure the degree of resin curing in UV nanoimprint to improve our understanding of the resin solidification phenomenon. A curing model was then established based on the measurement results. The measurement system measured the degree of cure in real time and was composed of a Fourier transform infrared spectroscopy system, a UV light source, and an optical guide. Also, new UV-curable resins that had low viscosity values were developed for the UV nanoimprint process, and imprint tests using these resins were performed successfully. The curing model considered the UV irradiation time, power, and curing temperature, which are important parameters in the UV nanoimprint process. The degree of cure had an exponential relation to UV irradiation time, power, and temperature; thus, the curing model was expressed as an exponential function of the UV irradiation time, power, and temperature. The developed model was verified for various UV-curable resins.     

Quantitative force and dissipation measurements in liquids using piezo-excited atomic force microscopy: a unifying theory

The use of a piezoelectric element (acoustic excitation) to vibrate the base of microcantilevers is a popular method for dynamic atomic force microscopy. In air or vacuum, the base motion is so small (relative to tip motion) that it can be neglected. However, in liquid environments the base motion can be large and cannot be neglected. Yet it cannot be directly observed in most AFMs. Therefore, in liquids, quantitative force and energy dissipation spectroscopy with acoustic AFM relies on theoretical formulae and models to estimate the magnitude of the base motion. However, such formulae can be inaccurate due to several effects. For example, a significant component of the piezo excitation does not mechanically excite the cantilever but rather transmits acoustic waves through the surrounding liquid, which in turn indirectly excites the cantilever. Moreover, resonances of the piezo, chip and holder can obscure the true cantilever dynamics even in well-designed liquid cells. Although some groups have tried to overcome these limitations (either by theory modification or better design of piezos and liquid cells), it is generally accepted that acoustic excitation is unsuitable for quantitative force and dissipation spectroscopy in liquids. In this paper the authors present a careful study of the base motion and excitation forces and propose a method by which quantitative analysis is in fact possible, thus opening this popular method for quantitative force and dissipation spectroscopy using dynamic AFM in liquids. This method is validated by experiments in water on mica using a scanning laser Doppler vibrometer, which can measure the actual base motion. Finally, the method is demonstrated by using small-amplitude dynamic AFM to extract the force gradients and dissipation on solvation shells of octamethylcyclotetrasiloxane (OMCTS) molecules on mica.