Zn(1-x)Mg(x)Te nanowires grown by solid source molecular beam epitaxy

This paper reports on the epitaxial growth of single-crystalline ternary Zn(1-x)Mg(x)Te nanowires covering a broad compositional range of molar fraction 0≤x≤0.75. The nanowires were grown on (100), (110), and (111) GaAs substrates using a vapor-liquid-solid mechanism. Solid source molecular beam epitaxy and an Au-based nanocatalyst were used for these purposes. The composition of nanowires can be adjusted by changing the ratio of Mg to Zn molecular beam fluxes. Electron microscopy images show that the nanowires are smooth and slightly tapered. The diameters of the obtained nanowires are from?30 to 70?nm and their length is around 1?μm. X-ray diffraction analysis and transmission electron microscopy reveal that the nanowires have a zinc-blende structure throughout the whole range of obtained compositions, and have a [Formula: see text] growth axis. The Raman measurements reveal both the expected splitting and shift of phonon lines with increasing Mg content, thus proving the substitutional incorporation of Mg into metallic sites of the ZnTe lattice.     

Anisotropic interface induced formation of Sb nanowires on GaSb(111)A substrates

The growth of Sb nanowires on GaSb(111)A substrates is studied by in?situ azimuthal scan reflection high-energy electron diffraction (ARHEED). Bulk and layer contributions can be distinguished in the ARHEED transmission pattern through the Sb nanowires. The three-dimensional structure of the growing Sb nanowires is identified by post-growth atomic force microscopy (AFM) and x-ray diffraction (XRD). The lattice match of the Sb crystal along the [Formula: see text] and the GaSb crystal along [Formula: see text] directions lead to a preferential orientation of the Sb nanowires. The Sb adsorption and desorption kinetics is studied by thermal desorption spectroscopy.     

Ag-assisted CBE growth of ordered InSb nanowire arrays

We present growth studies of InSb nanowires grown directly on [Formula: see text] and [Formula: see text] substrates. The nanowires were synthesized in a chemical beam epitaxy (CBE) system and are of cubic zinc blende structure. To initiate nanowire nucleation we used lithographically positioned silver (Ag) seed particles. Up to 87% of the nanowires nucleate at the lithographically pre-defined positions. Transmission electron microscopy (TEM) investigations furthermore showed that, typically, a parasitic InSb thin film forms on the substrates. This thin film is more pronounced for InSb((111)B) substrates than for InAs((111)B) substrates, where it is completely absent at low growth temperatures. Thus, using InAs((111)B) substrates and growth temperatures below 360?°C free-standing InSb nanowires can be synthesized.     

Observation of Ga droplet formation on (311)A and (511)A GaAs surfaces

Using (100) GaAs substrates as a reference, we present a study of the formation of Ga droplets on (311)A and (511)A GaAs substrates in which the effect of both the substrate temperature and the amount of Ga supplied on the droplet density and height for the three different surfaces have been investigated. Droplets on (100) substrates show a round shape; however, they appear as elongated balls with tails along the [Formula: see text] direction of the (311)A substrate and the [Formula: see text] direction of the (511)A substrate. It has been found that the Ga droplets on (511)A surfaces have lower densities and higher heights than those on (100) substrates. In contrast, Ga droplets on (311)A surfaces have lower heights and much higher densities compared to those for both (100) and (511)A. We observed that the decrease in the droplet density with increasing growth temperature for both (311)A and (511)A is more than twice that for the (100)GaAs surface due to the larger drop in the nucleation rate. Based on these observations, we offer a physical explanation based on the thermodynamics and the anisotropy of the high-index surfaces.     

Single-crystalline Ni2Ge/Ge/Ni2Ge nanowire heterostructure transistors

In this study, we report on the formation of a single-crystalline Ni(2)Ge/Ge/Ni(2)Ge nanowire heterostructure and its field effect characteristics by controlled reaction between a supercritical fluid-liquid-solid (SFLS) synthesized Ge nanowire and Ni metal contacts. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) studies reveal a wide temperature range to convert the Ge nanowire to single-crystalline Ni(2)Ge by a thermal diffusion process. The maximum current density of the fully germanide Ni(2)Ge nanowires exceeds 3.5 × 10(7) A cm(-2), and the resistivity is about 88 μΩ cm. The in situ reaction examined by TEM shows atomically sharp interfaces for the Ni(2)Ge/Ge/Ni(2)Ge heterostructure. The interface epitaxial relationships are determined to be [Formula: see text] and [Formula: see text]. Back-gate field effect transistors (FETs) were also fabricated using this low resistivity Ni(2)Ge as source/drain contacts. Electrical measurements show a good p-type FET behavior with an on/off ratio over 10(3) and a one order of magnitude improvement in hole mobility from that of SFLS-synthesized Ge nanowire.     

Wurtzite ZnSe nanowires: growth, photoluminescence, and single-wire Raman properties

Wurtzite ZnSe nanowires were prepared on GaAs substrates in a metal-organic chemical vapour deposition system. Electron microscopy shows that they are smooth and uniform in size. Both transmission electron microscopy and x-ray diffraction reveal the wurtzite structure of the nanowires, which grows along the [Formula: see text] direction. Raman scattering studies on individual nanowires were performed in the back-scattering geometry at room temperature. Besides the commonly observed longitudinal and transverse optical phonon modes, a possible surface mode located at 233?cm(-1) is also observed in the Raman spectrum. A peak located at 2.841?eV was clearly observed in the photoluminescence spectra of the nanowires, which can be assigned to near band edge emissions of wurtzite ZnSe.     

Longer InN phonon lifetimes in nanowires

We present a Raman scattering study of the anharmonic phonon decay of the [Formula: see text], [Formula: see text] and E(1)(LO) phonons in InN nanowires over the 80-400?K temperature range. While the temperature-dependent anharmonic decay in the nanowires is similar to that found for bulk InN, the background contribution to the phonon lifetime is strongly reduced as a result of the improved crystalline quality. High-resolution measurements reveal a remarkably long lifetime of the [Formula: see text] mode. From the comparison between the [Formula: see text] frequencies measured in the nanowires with those of the thin film we obtain the deformation potentials for the [Formula: see text] mode.     

Growth characteristics of GaAs nanowires obtained by selective area metal-organic vapour-phase epitaxy

GaAs nanowires were selectively grown by metal-organic vapour-phase epitaxy within a SiO(2) mask window pattern fabricated on a GaAs(111)B substrate surface. The nanowires were 100-3000?nm in height and 50-300?nm in diameter. The height decreased as the mask window diameter was increased or the growth temperature was increased from 700 to 800?°C. The dependence of the nanowire height on the mask window diameter was compared with a calculation, which indicated that the height was inversely proportional to the mask window diameter. This suggests that the migration of growth species on the nanowire side surface plays a major role. Tetrahedral GaAs grew at an early stage of nanowire growth but became hexagonal as the growth process continued. The calculated change in Gibbs free energy for nucleation growth of the crystals indicated that tetrahedra were energetically more favourable than hexagons. Transmission and scanning electron microscopy analyses of a GaAs nanowire showed that many twins developed along the [Formula: see text] B direction, suggesting that twins had something to do with the evolution of the nanowire shape from tetrahedron to hexagon.     

Preferred growth orientation of metallic fcc nanowires under direct and alternating electrodeposition conditions

Gold and copper nanowires were generated through electrochemical deposition into nanoporous polymeric templates. Depending on the growth conditions, such wires exhibited a distinct textured structure as evidenced by x-ray diffraction. The preferred growth orientation is explained by applying the broken-bond model in combination with surface-energy anisotropy and energy minimization. During the growth process, the aspect ratio of the cylindrical nanowire and thus the area of the mantle surface and its contribution to the total surface energy increase. Under direct current deposition conditions, [Formula: see text] textured metallic fcc nanowires represent the configuration of lowest surface energy at aspect ratios above?1. Under alternating current deposition conditions, {110} nanowire base surfaces vanish due to their high surface energy, leading to successive development of a [Formula: see text] texture as the configuration of lowest energy at aspect ratios above 5.     

Nanostructural control in solution-derived epitaxial Ce(1-x)Gd(x)O(2-y) films

A novel mechanism based on aliovalent doping, allowing fine tuning of the nanostructure and surface topography of solution-derived ceria films, is reported. While under reducing atmospheric conditions, non-doped ceria films are inherently polycrystalline due to an interstitial amorphous Ce(2)C(3) phase that inhibits grain growth, a high quality epitaxial film can be achieved simply by doping with Gd(3+) cations. Gd(3+) [Formula: see text] Ce(4+) substitutions within the lattice are accompanied by charge-compensating oxygen vacancies throughout the volume of the crystallites acting as an efficient vehicle to reduce the barrier for grain boundary motion caused by interstitial Ce(2)C(3). In this way, the original nanostructure is self-purified by pushing the amorphous Ce(2)C(3) phase towards the free surface of the film. Once a full epitaxial cube-on-cube oriented ceria film is obtained, its surface morphology is dictated by the interplay between faceting on low energy {110} and/or {111} pyramidal planes and truncation of those pyramids by (001) ones. The development of the latter requires the suppression of their polar character which is thought to be achieved by charge compensation between the dopand and oxygen along [Formula: see text] directions.     

Facet and in-plane crystallographic orientations of GaN nanowires grown on Si(111)

We have determined the in-plane orientation of GaN nanowires relative to the Si (111) substrate on which they were grown. We used x-ray diffraction pole figure measurements to evidence two types of crystallographic orientation, all the nanowires having [Formula: see text] lateral facets. The proportion of these two orientations was determined and shown to be influenced by the pre-deposition of Al(Ga)N intermediate layers. In the main orientation, the GaN basal [Formula: see text] directions are aligned with the [Formula: see text] directions. This orientation corresponds to an in-plane coincidence of GaN and Si lattices.     

Unique electronic band structures of hydrogen-terminated [Formula: see text] silicon nanowires

Band structure mutation from an indirect to a direct gap is a well-known character of small hydrogen-terminated [Formula: see text] and [Formula: see text] silicon nanowires (SiNWs), and suggests the possible emission of silicon. In contrast, we show that hydrogen-terminated [Formula: see text] SiNWs consistently present indirect band gaps even at an extremely small size, according to our calculations using density functional theory. Interestingly, the band gap of [Formula: see text] SiNWs shows a quasi-direct feature as the wire size increases, suggesting the possibility of using medium SiNWs in optoelectronic devices. This result also indicates that the electronic structures of SiNWs are strongly orientation dependent.     

Epitaxial growth of tungsten nanoparticles on alumina and spinel surfaces

Isolated tungsten nanoparticles (α-W and β-W phase) were synthesized and epitaxially grown on alumina and spinel particle surfaces with an average tungsten size of ≤20?nm for a low tungsten content (of ≤1.5?vol%). Using tungsten (VI) ethoxide alcoholic solutions, tungsten trioxide hydrated precursors were attached to a ceramic grains surface as a nanoparticle coating. High-resolution transmission electron microscopy (HRTEM) micrographs showed epitaxial interfaces between alumina, spinel and metallic tungsten. This epitaxial growth is assumed to be due to the effect of water vapour on the sublimation of ortho-tungstic acid during the reduction process in a hydrogen atmosphere. The planes involved in the epitaxy were found to be [Formula: see text] and [Formula: see text].     

Analogous mechanical behaviors in [Formula: see text] and [Formula: see text] directions of Cu nanowires under tension and compression at a high strain rate

This study analyzes the plastic deformation on the atomic scale of Cu nanowires (NWs) with [Formula: see text] and [Formula: see text] orientations during uniaxial tension and compression, using a molecular dynamic simulation. The maximum local stress (MLS) method is employed to evaluate mechanical behavior during deformation. Following yielding, the flow stress strongly depends on the variation in the degree of orientation caused by twinning. Both the tension of the [Formula: see text] NW and the compression of the [Formula: see text] NW cause twin deformation and consequent geometrical softening. In contrast, the compression of the [Formula: see text] NW and the tension of the [Formula: see text] NW form twin bands and cause geometrical hardening. These behaviors result in the stress-strain curves that reveal the pseudo-skew-symmetry characteristic. With respect to the difference between the critical resolved shear stress (τ(c)) associated with the distinct orientations, τ(c) depends strongly on the surface critical resolved stress (τ(sc)). Under tension, τ(sc) depends on the degree of lattice distortion. A larger lattice distortion (pre-tensile stress) corresponds to higher τ(sc). However, under compression, a geometrical factor can be used to describe the difference in τ(sc) between the different orientations. A larger geometrical factor corresponds to a larger τ(sc).     

Fabrication, structural characterization and photoluminescence of single-crystal Zn(x)Cd(1-x)S zigzag nanowires

Large-scale synthesis of ternary Zn(x)Cd(1-x)S zigzag nanowires was achieved in a one-step metal-organic chemical vapour deposition (MOCVD) process with co-fed single precursors of ZnS and CdS. Their morphologies, structures and optical properties were characterized and confirmed by scanning electron microscopy, high-resolution transmission electron microscopy, x-ray spectroscopy, and photoluminescence. The Zn(x)Cd(1-x)S zigzag nanowires are single crystalline, with axis [001], by changing the growth direction from [Formula: see text] to [Formula: see text]. Regarding the formation of zigzag nanowires, we suggest that the shear strain and slight fluctuation of the reaction conditions may be the major factors that make the nanowires change growth direction. In addition, because of the lower temperature and versatility, this new fabrication method might present a new and facile way to form other ternary nanomaterials. Furthermore, the green emission of the nanowires may have potential applications in electronic/optical nanodevices.     

Observation of hole accumulation in Ge/Si core/shell nanowires using off-axis electron holography

Hole accumulation in Ge/Si core/shell nanowires (NWs) has been observed and quantified using off-axis electron holography and other electron microscopy techniques. The epitaxial [110]-oriented Ge/Si core/shell NWs were grown on Si (111) substrates by chemical vapor deposition through the vapor-liquid-solid growth mechanism. High-angle annular-dark-field scanning transmission electron microscopy images and off-axis electron holograms were obtained from specific NWs. The excess phase shifts measured by electron holography across the NWs indicated the presence of holes inside the Ge cores. Calculations based on a simplified coaxial cylindrical model gave hole densities of (0.4 ± 0.2) /nm(3) in the core regions.     

Lateral, Ge, nanowire growth on SiO2

Vapor-liquid-solid (VLS) nanowires (NWs) typically grow in [111] directions. Previously, the authors have demonstrated guided Si NW growth, engineering the VLS NWs to grow in a [110] direction against a SiO(2) surface. In this work, the authors demonstrate guided high-quality Ge nanowire growth against a SiO(2) surface in the substrate plane to bridge between two Si mesas. The authors explore the interfaces between a Ge NW and the two Si device-layer mesas and report high-quality, epitaxial interfaces between the Ge NW and both Si mesas.     

Germanium nanowire epitaxy: shape and orientation control

Epitaxial growth of nanowires along the 111 directions was obtained on Ge(111), Ge(110), Ge(001), and heteroepitaxial Ge on Si(001) substrates at temperatures of 350 degrees C or less by gold-nanoparticle-catalyzed chemical vapor deposition. On Ge(111), the growth was mostly vertical. In addition to 111 growth, 110 growth was observed on Ge(001) and Ge(110) substrates. Tapering was avoided by the use of the two-temperature growth procedure, reported earlier by Greytak et al.     

Observation of free surface-induced bending upon nanopatterning of ultrathin strained silicon layer

We provide evidence of nanopatterning-induced bending of an ultrathin tensile strained silicon layer directly on oxide. This strained layer is achieved through the epitaxial growth of silicon on a Si(0.84)Ge(0.16) virtual substrate and subsequent transfer onto a SiO(2)-capped silicon substrate by combining hydrophilic wafer bonding and the ion-cut process. Using high resolution transmission electron microscopy, we found that the upper face of the strained silicon nanostructures fabricated from the obtained heterostructure using electron beam lithography and dry reactive ion etching displays a concave shape. This bending results from the free-surface-induced strain relaxation, which implies lattice out-of-plane expansion near the edges and concomitant contraction at the center. For a ～ 110 nm × 400 nm × 20 nm nanostructure, the bending is associated with an angle of 1.5° between the [Formula: see text] vertical atomic planes at the edges of the ～ 110 nm side. No bending is, however, observed at the strained Si/SiO(2) interface. This phenomenon cannot be explained by the classical Stoney's formula or related formulations developed for nanoscale thin films. Here we employed a continuum mechanical approach to describe these observations using three-dimensional numerical calculations of relaxation-induced lattice displacements.     

Template synthesis and forming electrical contacts to single Au nanowires by focused ion beam techniques

Metallic Au nanowires were electrochemically synthesized in 20?μm thick ion track etched polycarbonate membranes with the nominal pore diameter of 200?nm. Scanning and transmission electron microscopy analysis and x-ray diffraction of samples revealed that the nanowires are dense with a fcc [Formula: see text] texturing. The I-V characteristics of a single Au nanowire were investigated using a four-point microprobe set-up. The Au nanowire was placed in electrical contact with electrodes patterned on planar substrates using a dual-beam focused ion beam technique. The resistivity of the Au nanowires was found to be 2.8 × 10(-4)?Ω?cm.