共查询到17条相似文献,搜索用时 203 毫秒
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用于大面积周期性图形制造的激光干涉光刻 总被引:13,自引:5,他引:8
用两束或多束相干激光束以不同的组合形式对光致抗蚀剂曝光,可在大面积范围内产生精细的二维周期性图形,这个方法特别适合于产生光电子器件和生电子器件的周期性结构。介绍激光干涉光刻的基本原理,对几种光束组合干涉方法给出了理论推导结果,并进行了计算机模拟。初步的实验结果表明,用激光干扰光刻技术产生大面积的亚微米级周期性孔、柱、锥图形是可行的。该方法不需要掩模、昂贵的光刻成像透镜、新的短波长光源和新型的抗蚀剂,提供了得到高分辨、无限焦深、大面积光刻的可能性。 相似文献
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讨论了相移掩模提高光刻分辨力的基本原理,提出了一种抗蚀剂相移器制作衰减相移掩模的新方法,利用自行设计、建立的KrF准分子激光投影光刻实验曝光系统进行了实验研究,给出了实验结果,并与传统光刻方法作了比较。 相似文献
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Bowen AM Ritchey JA Moore JS Nuzzo RG 《Small (Weinheim an der Bergstrasse, Germany)》2011,7(23):3350-3362
A method for fabricating chemical gradients on planar and nonplanar substrates using grayscale lithography is reported. Compliant grayscale amplitude masks are fabricated using a vacuum-assisted microfluidic filling protocol that employs dilutions of a carbon-black-containing polydimethylsiloxane emulsion (bPDMS) within traditional clear PDMS (cPDMS) to create planar, fully self-supporting mask elements. The mask is then placed over a surface functionalized with a hydrophobic coumarin-based photocleavable monolayer, which exposes a polar group upon irradiation. The mask serves to modulate the intensity of incident UV light, thereby controlling the density of molecules cleaved. The resulting molecular-level grayscale patterns are characterized by condensation microscopy and imaging mode time-of-flight secondary-ion mass spectrometry (ToF-SIMS). Due to the inherent flexibility of this technique, the photofuse as well as the gradient patterns can be designed for a wide range of applications; in this paper two proof-of-concept demonstrations are shown. The first utilizes the ability to control the resulting contact angle of the surface for the fabrication of a passive pressure-sensitive microfluidic gating system. The second is a model surface modification process that utilizes the functional groups deprotected during the photocleavage to pattern the deposition of moieties with complementary chemistry. The spatial layout, resolution, and concentration of these covalently linked molecules follow the gradient pattern created by the grayscale mask during exposure. The programmable chemical gradient fabrication scheme presented in this work allows explicit engineering of both surface properties that dictate nonspecific interactions (surface energy, charge, etc.) and functional chemistry necessary for covalent bonding. 相似文献
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通过对接近式光刻中光通过掩模版后的近场衍射特性的计算机模拟分析和曝光实验,提出了一种新型的接近式衍射小曝光方法,适用于紫外和X射线的接近曝光技术条件下,实现缩小曝光,可使实现亚半微米线宽图形的曝光和使基掩模版制作更为容易;并且具有等量缩小和焦深大的特点。 相似文献
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纳米光刻中莫尔对准模型与应用 总被引:1,自引:1,他引:0
在纳米光刻中,采用周期相差不大的两光栅分别作为掩模和硅片上的对准标记.当对准光路通过这两个标记光栅时受到两次调制,发生双光栅衍射及衍射光的干涉等复杂现象,最后形成有规律、且呈一定周期分布的莫尔条纹.周期相对光栅周期被大幅度放大,条纹移动可表征两标记的相对位移,具有很高探测灵敏度,可用于纳米级高精度对准.从傅里叶光学角度分析推导了对准应用中,两频率接近的光栅重叠时莫尔条纹振幅空间近似分布规律.并设计了一组对准标记,能继续将灵敏度提高一倍.通过仿真分析,从大致上定量地验证条纹复振幅分布的近似数学模型以及光刻对准应用中的条纹对准过程. 相似文献
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Higher resolution can be achieved in lithography by decreasing the wavelength of the exposure source. However, resist material
and their processing are also important when we move to a shorter wavelength lithography technology. This paper reviews the
recent development and challenges of deep-UV photoresists and their processing technology. 相似文献
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Recent technological advances in very large scale integration (VLSI) are beginning to outstrip the technology used to produce these circuits. Ultraviolet and optical lithography techniques are producing resist patterns with resolutions approaching the expected minimum. Application needs demand that this minimum be improved to achieve more features per unit area of circuit. We have achieved a potentially major breakthrough towards improving the resolution of resist patterns. Through the use of monomer/polymer multilayers, line resolutions produced by way of a novel computer-controlled electron beam technique is now possible. The relative ease and high reliability of multilayer formation ensures uniform films of a thickness an order of magnitude less than spin cast film thicknesses. The high electron sensitivities of these films enables excellent degradation (or polymerization) upon exposures to an electron beam. Final pattern resolution, for both positive and negative resists, is an order of magnitude higher than conventional resist resolutions, offering possible improvement in circuit capability. Morphological studies of these multilayer films provide unique information on domain size and structure. The ultimate morphology of these films is shown to be dependent on deposition conditions as well as the substrate used. 相似文献
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Naulleau PP 《Applied optics》2004,43(20):4025-4032
The control of line-edge roughness (LER) of features printed in photoresist poses significant challenges to next-generation lithography techniques such as extreme-ultraviolet (EUV) lithography. Achieving adequately low LER levels requires accurate resist characterization as well as the ability to separate resist effects from other potential contributors to LER. One potentially significant contributor to LER arises from roughness on the mask coupling to speckle in the aerial image and consequently to LER in the printed image. Here I numerically study mask surface roughness and phase roughness to resist LER coupling both as a function of illumination coherence and defocus. Moreover, the potential consequences of this mask effect for recent EUV lithography experiments is studied through direct comparison with experimental through-focus printing data collected at a variety of coherence settings. Finally, the effect that mask roughness will play in upcoming 0.3-numerical-aperture resist testing is considered. 相似文献