Precisely Size‐Tunable Monodisperse Hairy Plasmonic Nanoparticles via Amphiphilic Star‐Like Block Copolymers

In situ precision synthesis of monodisperse hairy plasmonic nanoparticles with tailored dimensions and compositions by capitalizing on amphiphilic star‐like diblock copolymers as nanoreactors are reported. Such hairy plasmonic nanoparticles comprise uniform noble metal nanoparticles intimately and perpetually capped by hydrophobic polymer chains (i.e., “hairs”) with even length. Interestingly, amphiphilic star‐like diblock copolymer nanoreactors retain the spherical shape under reaction conditions, and the diameter of the resulting plasmonic nanoparticles and the thickness of polymer chains situated on the surface of the nanoparticle can be readily and precisely tailored. These hairy nanoparticles can be regarded as hard/soft core/shell nanoparticles. Notably, the polymer “hairs” are directly and permanently tethered to the noble metal nanoparticle surface, thereby preventing the aggregation of nanoparticles and rendering their dissolution in nonpolar solvents and the homogeneous distribution in polymer matrices with long‐term stability. This amphiphilic star‐like block copolymer nanoreactor‐based strategy is viable and robust and conceptually enables the design and synthesis of a rich variety of hairy functional nanoparticles with new horizons for fundamental research on self‐assembly and technological applications in plasmonics, catalysis, energy conversion and storage, bioimaging, and biosensors.     

Negative‐Tone Block Copolymer Lithography by In Situ Surface Chemical Modification

Negative‐tone block copolymer (BCP) lithography based on in situ surface chemical modification is introduced as a highly efficient, versatile self‐assembled nanopatterning. BCP blends films consisting of end‐functionalized low molecular weight poly(styrene‐ran‐methyl methacrylate) and polystyrene‐block‐Poly(methyl methacylate) can produce surface vertical BCP nanodomains on various substrates without prior surface chemical treatment. Simple oxygen plasma treatment is employed to activate surface functional group formation at various substrates, where the end‐functionalized polymers can be covalently bonded during the thermal annealing of BCP thin films. The covalently bonded brush layer mediates neutral interfacial condition for vertical BCP nanodomain alignment. This straightforward approach for high aspect ratio, vertical self‐assembled nanodomain formation facilitates single step, site‐specific BCP nanopatterning widely useful for various substrates. Moreover, this approach is compatible with directed self‐assembly approaches to produce device oriented laterally ordered nanopatterns.     

Interfacial Capillary‐Force‐Driven Self‐Assembly of Monolayer Colloidal Crystals for Supersensitive Plasmonic Sensors

Colloidal lithography technology based on monolayer colloidal crystals (MCCs) is considered as an outstanding candidate for fabricating large‐area patterned functional nanostructures and devices. Although many efforts have been devoted to achieve various novel applicatons, the quality of MCCs, a key factor for the controllability and reproducibility of the patterned nanostructures, is often overlooked. In this work, an interfacial capillary‐force‐driven self‐assembly strategy (ICFDS) is designed to realize a high‐quality and highly‐ordered hexagonal monolayer MCCs array by resorting the capillary effect of the interfacial water film at substrate surface as well as controlling the zeta potential of the polystyrene particles. Compared with the conventional self‐assembly method, this approach can realize the reself‐assembly process on the substrate surface with few colloidal aggregates, vacancy, and crystal boundary defects. Furthermore, various typical large‐scale nanostructure arrays are achieved by combining reactive ion etching, metal‐assisted chemical etching, and so forth. Specifically, benefiting from the as‐fabricated high‐quality 2D hexagonal colloidal crystals, the surface plasmon resonance (SPR) sensors achieve an excellent refractive index sensitivity value of 3497 nm RIU^?1, which is competent for detecting bovine serum albumin with an ultralow concentration of 10^?8 m . This work opens a window to prepare high‐quality MCCs for more potential applications.     

Supramolecular Materials via Block Copolymer Self‐Assembly

This review discusses the potential of block copolymer type macromolecular building blocks for the preparation of self‐assembled materials. Three different classes of block copolymer type architectures will be distinguished: (i) coil–coil diblock copolymers, (ii) rod–coil diblock copolymers, and (iii) rod–coil diblock oligomers. The basic principles that underlie the self‐assembly of each of these different building blocks will be discussed. These theoretical considerations are complemented with examples from recent literature that illustrate the potential of the different types of block copolymers to prepare (functional) supramolecular materials. Finally, several strategies will be presented that could allow the preparation of stimuli‐sensitive self‐assembled materials, i.e., materials whose properties can be reversibly manipulated under the action of appropriate external stimuli.     

Photopatterning of Cross‐Linkable Epoxide‐Functionalized Block Copolymers and Dual‐Tone Nanostructure Development for Fabrication Across the Nano‐ and Microscales

The self‐assembly of block copolymers in thin films provides an attractive approach to patterning 5–100 nm structures. Cross‐linking and photopatterning of the self‐assembled block copolymer morphologies provide further opportunities to structure such materials for lithographic applications, and to also enhance the thermal, chemical, or mechanical stability of such nanostructures to achieve robust templates for subsequent fabrication processes. Here, model lamellar‐forming diblock copolymers of polystyrene and poly(methyl methacrylate) with an epoxide functionality are synthesized by atom transfer radical polymerization. We demonstrate that self‐assembly and cross‐linking of the reactive block copolymer materials in thin films can be decoupled into distinct, controlled process steps using solvent annealing and thermal treatment/ultraviolet exposure, respectively. Conventional optical lithography approaches can also be applied to the cross‐linkable block copolymer materials in thin films and enable simultaneous structure formation across scales—micrometer scale patterns achieved by photolithography and nanostructures via self‐assembly of the block copolymer. Such materials and processes are thus shown to be capable of self‐assembling distinct block copolymers (e.g., lamellae of significantly different periodicity) in adjacent regions of a continuous thin film.     

Bionanosphere Lithography via Hierarchical Peptide Self‐Assembly of Aromatic Triphenylalanine

A nanolithographic approach based on hierarchical peptide self‐assembly is presented. An aromatic peptide of N‐(t‐Boc)‐terminated triphenylalanine is designed from a structural motif for the β‐amyloid associated with Alzheimer's disease. This peptide adopts a turnlike conformation with three phenyl rings oriented outward, which mediate intermolecular π–π stacking interactions and eventually facilitate highly crystalline bionanosphere assembly with both thermal and chemical stability. The self‐assembled bionanospheres spontaneously pack into a hexagonal monolayer at the evaporating solvent edge, constituting evaporation‐induced hierarchical self‐assembly. Metal nanoparticle arrays or embossed Si nanoposts could be successfully created from the hexagonal bionanosphere array masks in conjunction with a conventional metal‐evaporation or etching process. Our approach represents a bionanofabrication concept that biomolecular self‐assembly is hierarchically directed to establish a straightforward nanolithography compatible with conventional device‐fabrication processes.     

Flash Light Millisecond Self‐Assembly of High χ Block Copolymers for Wafer‐Scale Sub‐10 nm Nanopatterning

One of the fundamental challenges encountered in successful incorporation of directed self‐assembly in sub‐10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory–Huggins interaction parameter (χ). Herein, reliable, fab‐compatible, and ultrafast directed self‐assembly of high‐χ block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 °C) by flash light irradiation enables large grain growth of sub‐10 nm scale self‐assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self‐assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self‐assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self‐assembly of sub‐10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light‐absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll‐to‐roll processability.     

大分子自组装及其应用的研究与进展

综述了化学吸附、分子沉积、旋涂、慢蒸发溶剂和枝接成膜等 5种大分子自组装成膜方法 ,并介绍了其在液晶、非线性光学材料、聚合物表面改性等材料领域的应用及其表征研究。     

Templated Self‐Assembly of Block Copolymers: Top‐Down Helps Bottom‐Up

One of the key challenges in nanotechnology is to control a self‐assembling system to create a specific structure. Self‐organizing block copolymers offer a rich variety of periodic nanoscale patterns, and researchers have succeeded in finding conditions that lead to very long range order of the domains. However, the array of microdomains typically still contains some uncontrolled defects and lacks global registration and orientation. Recent efforts in templated self‐assembly of block copolymers have demonstrated a promising route to control bottom‐up self‐organization processes through top‐down lithographic templates. The orientation and placement of block‐copolymer domains can be directed by topographically or chemically patterned templates. This templated self‐assembly method provides a path towards the rational design of hierarchical device structures with periodic features that cover several length scales.     

Electrical Biomolecule Detection Using Nanopatterned Silicon via Block Copolymer Lithography

An electrical biosensor exploiting a nanostructured semiconductor is a promising technology for the highly sensitive, label‐free detection of biomolecules via a straightforward electronic signal. The facile and scalable production of a nanopatterned electrical silicon biosensor by block copolymer (BCP) nano­lithography is reported. A cost‐effective and large‐area nanofabrication, based on BCP self‐assembly and single‐step dry etching, is developed for the hexagonal nanohole patterning of thin silicon films. The resultant nanopatterned electrical channel modified with biotin molecules successfully detects the two proteins, streptavidin and avidin, down to nanoscale molarities (≈1 nm ). The nanoscale pattern comparable to the Debye screening length and the large surface area of the three‐dimensional silicon nanochannel enable excellent sensitivity and stability. A device simulation confirms that the nanopatterned structure used in this work is effective for biomolecule detection. This approach relying on the scalable self‐assembly principle offers a high‐throughput manufacturing process for clinical lab‐on‐a‐chip diagnoses and relevant biomolecular studies.     

Two Dimensional Nanoarrays of Individual Protein Molecules

Protein molecules on solid surfaces are essential to a number of applications, such as biosensors, biomaterials, and drug delivery. In most approaches for protein immobilization, inter‐molecular distances on the solid surface are not controlled and this may lead to aggregation and crowding. Here, a simple approach to immobilize individual protein molecules in a well‐ordered 2D array is shown, using nanopatterns obtained from a polystyrene‐block‐poly(2‐hydroxyethyl methacrylate) (PS‐b‐PHEMA) diblock copolymer thin film. This water‐stable and protein‐resistant polymer film contains hexagonally ordered PS cylindrical domains in a PHEMA matrix. The PS domains are activated by incorporating alkyne‐functionalized PS and immobilizing azide‐tagged proteins specifically onto each PS domain using “Click” chemistry. The nanometer size of the PS domain dictates that each domain can accommodate no more than one protein molecule, as verified by atomic force microscopy imaging. Immunoassay shows that the amount of specifically bound antibody scales with the number density of individual protein molecules on the 2D nanoarrays.     

Metal Ion‐Induced Self‐Assembly of a Multi‐Responsive Block Copolypeptide into Well‐Defined Nanocapsules

Protein cages are an interesting class of biomaterials with potential applications in bionanotechnology. Therefore, substantial effort is spent on the development of capsule‐forming designer polypeptides with a tailor‐made assembly profile. The expanded assembly profile of a triblock copolypeptide consisting of a metal ion chelating hexahistidine‐tag, a stimulus‐responsive elastin‐like polypeptide block, and a pH‐responsive morphology‐controlling viral capsid protein is presented. The self‐assembly of this multi‐responsive protein‐based block copolymer is triggered by the addition of divalent metal ions. This assembly process yields monodisperse nanocapsules with a 20 nm diameter composed of 60 polypeptides. The well‐defined nanoparticles are the result of the emergent properties of all the blocks of the polypeptide. These results demonstrate the feasibility of hexahistidine‐tags to function as supramolecular cross‐linkers. Furthermore, their potential for the metal ion‐mediated encapsulation of hexahistidine‐tagged proteins is shown.     

Directed Self‐Assembly of Star‐Block Copolymers by Topographic Nanopatterns through Nucleation and Growth Mechanism

Exploring the ordering mechanism and dynamics of self‐assembled block copolymer (BCP) thin films under confined conditions are highly essential in the application of BCP lithography. In this study, it is aimed to examine the self‐assembling mechanism and kinetics of silicon‐containing 3‐arm star‐block copolymer composed of polystyrene (PS) and poly(dimethylsiloxane) blocks as nanostructured thin films with perpendicular cylinders and controlled lateral ordering by directed self‐assembly using topographically patterned substrates. The ordering process of the star‐block copolymer within fabricated topographic patterns with PS‐functionalized sidewall can be carried out through the type of secondary (i.e., heterogeneous) nucleation for microphase separation initiated from the edge and/or corner of the topographic patterns, and directed to grow as well‐ordered hexagonally packed perpendicular cylinders. The growth rate for the confined microphase separation is highly dependent upon the dimension and also the geometric texture of the preformed pattern. Fast self‐assembly for ordering of BCP thin film can be achieved by lowering the confinement dimension and also increasing the concern number of the preformed pattern, providing a new strategy for the design of BCP lithography from the integration of top‐down and bottom‐up approaches.     

Self‐Healing Micellar Ion Gels Based on Multiple Hydrogen Bonding

Ion gels, composed of macromolecular networks filled by ionic liquids (ILs), are promising candidate soft solid electrolytes for use in wearable/flexible electronic devices. In this context, the introduction of a self‐healing function would significantly improve the long‐term durability of ion gels subject to mechanical loading. Nevertheless, compared to hydrogels and organogels, the self‐healing of ion gels has barely investigated been because of there being insufficient understanding of the interactions between polymers and ILs. Herein, a new class of supramolecular micellar ion gel composed of a diblock copolymer and a hydrophobic IL, which exhibits self‐healing at room temperature, is presented. The diblock copolymer has an IL‐phobic block and a hydrogen‐bonding block with hydrogen‐bond‐accepting and donating units. By combining the IL and the diblock copolymer, micellar ion gels are prepared in which the IL phobic blocks form a jammed micelle core, whereas coronal chains interact with each other via multiple hydrogen bonds. These hydrogen bonds between the coronal chains in the IL endow the ion gel with a high level of mechanical strength as well as rapid self‐healing at room temperature without the need for any external stimuli such as light or elevated temperatures.     

Inside Front Cover: Macroscopic Parallel Nanocylinder Array Fabrication Using a Simple Rubbing Technique (Adv. Mater. 17/2006)

A simple rubbing technique to macroscopically align nanocylinders in an amphiphilic diblock liquid‐crystalline copolymer is reported by Ikeda and co‐workers on p. 2213. The inside cover shows highly ordered arrays of nanocylinders parallel to the rubbing direction owing to supramolecular cooperative motions between mesogens and microphase‐separated domains. This opens a novel, convenient pathway for controlling defect‐free nanoscopic domains over large areas.     

A Hierarchically Ordered TiO2 Hemispherical Particle Array with Hexagonal‐Non‐Close‐Packed Tops: Synthesis and Stable Superhydrophilicity Without UV Irradiation

A hierarchical TiO₂ ordered hemispherical particle array with hexagonal‐non‐close‐packed (hncp) tops is prepared by pulsed laser deposition (PLD) using a polystyrene colloidal monolayer as a template. Compared with conventional lithography, the route presented has the advantage of low cost for producing hncp nanostructured arrays. This hierarchical particle array exhibits excellent superhydrophilicity with a water contact angle of 0° without further UV irradiation. The superhydrophilic property originates from oxygen defects or vacancies on the surface of the TiO₂ nanoparticles produced by PLD and the increased roughness of the hierarchical particle arrays. More importantly, this property is very stable for half a year and could be used in self‐cleaning surfaces and microfluidic devices.     

Metal‐Assisted Chemical Etching of Silicon: A Review

This article presents an overview of the essential aspects in the fabrication of silicon and some silicon/germanium nanostructures by metal‐assisted chemical etching. First, the basic process and mechanism of metal‐assisted chemical etching is introduced. Then, the various influences of the noble metal, the etchant, temperature, illumination, and intrinsic properties of the silicon substrate (e.g., orientation, doping type, doping level) are presented. The anisotropic and the isotropic etching behaviors of silicon under various conditions are presented. Template‐based metal‐assisted chemical etching methods are introduced, including templates based on nanosphere lithography, anodic aluminum oxide masks, interference lithography, and block‐copolymer masks. The metal‐assisted chemical etching of other semiconductors is also introduced. A brief introduction to the application of Si nanostructures obtained by metal‐assisted chemical etching is given, demonstrating the promising potential applications of metal‐assisted chemical etching. Finally, some open questions in the understanding of metal‐assisted chemical etching are compiled.     

Two dimensional nano-dot array engineering of block copolymer surface micelles on water surface

When an amphiphilic block copolymer is directly spread from an organic solution, the morphology of the surface micelles is not in general controlled because the structure is rapidly frozen after the solvent evaporation. In contrast, we have developed a new versatile method to generate highly regular ordered nanopatterns of the surface micelles on water, which involves the process of two dimensional (2D) hybridization with a polar liquid crystal molecule, 4′-pentyl-4-cyanobiphenyl (5CB) [Langmuir 22 (2006) 5233]. The present work extends this approach using a family of diblock copolymers of polystyrene-block-poly(4-vinylpyridine) changing the chain length of the two polymer blocks. It is found here that the dot-to-dot distance and the dot size can be precisely controlled on-demand by the length of the polymer blocks. Such structural regulations cannot be attained without the 5CB hybridization. Due to the high reproducibility of the morphology formation, this process should be of practical significance to ‘engineer’ the 2D patterns in the range of some tens of nanometers.     

Fabrication of Nanocomposites

A series of block copolymers containing polyesteramides as hard block and polyethylene glycol (PEG) or hydroxy terminated polybutadiene (HTPB) as soft block have been synthesized by different methods. These diblock copolymers are made into composite with metal salt and then assembled into ordered periodic structure at molecular level (∼5 to 50 nm). The polymers are characterized by solution viscosity, FTIR, ¹H-NMR spectroscopy, TGA, and Differential Scanning Calorimetry (DSC). The nanopatterns of the polymers as well as of the composites are studied under Scanning Electron Micrographs (SEM) and Transmission Electron Microscope (TEM). They can be used for fabricating biological and chemical sensor, engineering microelectronic and optoelectronic devices, light-wave communication systems, etc.     

Large area tunable arrays of graphene nanodots fabricated using diblock copolymer micelles

Nanostructured graphenes such as nanoribbons, nanomeshes, and nanodots have attracted a great deal of attention in relation to graphene-based semiconductor devices. The block copolymer micellar approach is a promising bottom-up technique for generating large area nanostructures of various materials without using sophisticated electron-beam lithography. Here we demonstrate the fabrication of an array of graphene nanodots with tunable size and inter-distance with the utilization of a monolayer of diblock copolymer micelles. Au nanoparticles were synthesized in the micellar cores and effectively worked as shielding nanostructures in generating graphene nanodots by oxygen plasma etching. We also controlled the radius and inter-distance of graphene nanodots simply through the molecular weight of the copolymers.