Microstructure and mechanical properties of quaternary Cr–Si–O–N films by a hybrid coating system

Quaternary Cr–Si–O–N films were deposited by a hybrid coating system using a Cr cathodic arc target and a Si sputtering target in an Ar/N₂/O₂ gaseous mixture. The influence of oxygen flux rate on the microstructure and properties of the Cr–Si–O–N films were investigated. The results indicated that the oxygen-free Cr–Si–N film exhibited nanocolumnar microstructure containing CrN nano columns and amorphous Si₃N₄ phase. The Cr–Si–O–N films exhibit equiaxed CrN nanocrystallites likely surrounded by amorphous SiO₂ and Si₃N₄ phases. Further increasing the oxygen content gives films containing Cr₂O₃ crystallites. The hardness first increases from 30 GPa for the Cr–Si–N film to a maximum value of approximately 50 GPa for the oxygen content of 16 at.% and then decreases for larger oxygen content. All the Cr–Si–O–N films exhibit low friction coefficient (0.22–0.26) and low residual stress (− 0.03–0.08 GPa). The influence of the oxygen content on the microstructure and mechanical properties of the Cr–Si–O–N films is discussed.     

Cross-linked graphene layer embedded carbon film prepared using electron irradiation in ECR plasma sputtering

A new path to prepare cross-linked graphene layers embedded carbon (GLEC) films has been reported by introducing electron irradiation during the mirror-confinement electron cyclotron resonance (ECR) plasma sputtering process. The electron irradiation in the ECR plasma was identified by using Langmuir single probe equipped with a designed simulated substrate and the irradiation mode was found to be controlled directly by altering the substrate bias voltage. Cross-linked GLEC film was prepared using the electron irradiation in the pressure of 0.04 Pa and positive bias voltage of 50 V, and the nanostructure and binding configuration of the film were analyzed by high resolution transmission electron microscope (HRTEM) and X-ray photoelectron spectroscopy (XPS). The results showed that GLEC film contains cross-linked graphene layers grown normally to the substrate surface when the content of sp² hybridized carbon atoms in the film is more than 70%. The tribological behaviors of both cross-linked GLEC films and amorphous carbon films were compared using a Pin-on-Disk tribometer, and the mechanism for low friction coefficient was discussed by using HRTEM observation on wear track. The HRTEM results indicated that the cross-linked GLEC film has the potential to achieve low friction at the beginning of the friction.     

含硅无氢非晶碳基薄膜的摩擦磨损性能

为了研究Si掺杂对无氢非晶碳基薄膜摩擦磨损性能的影响,利用直流磁控溅射技术在单晶硅和304不锈钢基底上沉积不同Si含量的无氢非晶碳基薄膜。采用SEM、Raman光谱、纳米压痕仪等分析手段对薄膜的成分、结构和力学性能进行表征。利用球盘式往复摩擦试验机测试薄膜在无润滑条件下的滑动摩擦磨损性能。结果表明:Si掺杂能降低薄膜内应力和促进sp3杂化,高于10%的Si原子导致薄膜硬度增加。在不同湿度条件下,Si掺杂并未明显影响溅射无氢非晶碳基薄膜的摩擦因数;相反,含Si薄膜在不同测试条件下都具有较高的磨损速率。薄膜磨损速率随相对湿度增加而减小,随Si含量增加而增加;高Si含量薄膜在低湿度条件下具有明显不稳定的摩擦因数和显著增加的磨损速率。这意味着在设计和发展性能优异的无氢非晶碳基摩擦学涂层时,应充分考虑Si掺杂导致的性能损失。     

溅射靶功率对W-C:H薄膜结构与摩擦学性能的影响

目的研究不同溅射功率对W-C:H涂层结构与摩擦学性能的影响。方法用非平衡磁控溅射(UBMS)+等离子体增强化学气相沉积法(PECVD),以WC靶作为溅射靶,C2H2为反应气体,通过调制溅射靶功率,在316不锈钢与Si(100)基体上制备了W-C:H系列薄膜。通过场发射电镜(FESEM)、X射线衍射仪(XRD)、拉曼光谱对薄膜的微观结构和成分进行了表征。用UMT-3MT多功能摩擦机对薄膜的摩擦学性能进行了分析。结果 W-C主要以β-WC1-x纳米晶的形式均匀分布在非晶碳中,并表现出(200)面择优生长。随着溅射靶功率的上升,薄膜内W含量逐渐升高,(200)面衍射峰逐渐增强,sp2含量先降低后升高。靶功率在1.4 k W时具有较好的摩擦学性能,摩擦系数为0.15,磨损率为3.92×10-7 mm~3/(N·m)。结论随着溅射靶功率逐渐升高,柱状晶逐渐变粗,涂层的致密性逐渐降低,薄膜摩擦学性能与WC含量密切相关。     

不同掺杂对类金刚石薄膜的影响

目的研究单掺Si和共掺Ag、Si对类金刚石薄膜的结构、摩擦学性能和耐腐蚀性能的影响。方法以高纯石墨靶、石墨与金属复合靶、Si靶作为靶材,采用射频增强磁控溅射技术制备不同掺杂种类的薄膜。通过XPS、拉曼光谱仪对薄膜的化学组成和结构进行分析,通过纳米压痕仪、摩擦磨损试验机、电化学工作站等,对薄膜的力学性能、摩擦学性能及耐腐蚀性能进行了系统研究。结果 Si元素单掺DLC会引起薄膜中sp~3C含量增加。Ag、Si共掺DLC后,由于Ag以金属相分布在薄膜中,并促进sp~2相的形成,导致sp~3C含量降低。掺杂元素后的DLC薄膜,硬度下降,但韧性提高,其中Ag、Si共掺的DLC薄膜的弹性恢复系数达到79%。此外,Ag、Si共掺DLC薄膜在多种气氛(Ar、O_2、N_2)中都具有优异的摩擦学性能,磨损寿命均超过30 min,其中在N_2气中的摩擦系数最低(0.1),并在NaCl溶液中的腐蚀电流密度比304不锈钢基体降低了近2个数量级,具有良好的耐腐蚀性。结论 Si与Ag共掺DLC薄膜较Si单掺薄膜具有更好的摩擦环境适应性和耐腐蚀性能。     

预沉积ZnO薄膜对ZnO−MoS2/ZnO复合涂层结构与性能影响

目的 通过优化原子层沉积工艺获取不同厚度ZnO薄膜,研究ZnO薄膜晶体取向对ZnO?MoS2涂层生长结构的影响,获得具有优异摩擦学性能的ZnO?MoS2/ZnO复合涂层。方法 采用原子层沉积法在不锈钢基体上预沉积不同厚度的ZnO薄膜,再用射频磁控溅射技术继续沉积ZnO?MoS2涂层,制备ZnO?MoS2/ZnO固体润滑复合涂层。结果 X射线衍射分析发现,预沉积ZnO薄膜有诱导后续ZnO?MoS2涂层沉积生长的作用,预沉积100 nm厚ZnO薄膜的ZnO?MoS2/ZnO复合涂层显示出宽化的MoS2 (002)馒头峰,其截面形貌显示为致密的体型结构,获得的摩擦因数最低(0.08),纳米硬度最高(2.33 GPa),硬度/模量比显示该复合涂层的耐磨损性能得到提升;X射线光电子能谱分析结果表明,复合涂层表面游离S与空气中水发生反应程度大约为原子数分数5%,显示复合涂层耐湿性能较好;基于原子层沉积ZnO薄膜生长及其对后续ZnO?MoS2涂层生长的影响分析,提出了ZnO?MoS2/ZnO复合涂层磨损模型,阐明了ZnO薄膜对复合涂层结构及摩擦学性能的影响,并以该模型解释了200 nm厚 ZnO薄膜上沉积ZnO?MoS2涂层出现的摩擦因数由高到低的变化趋势及最终磨损失效现象。结论 合适的原子层沉积制备的ZnO薄膜有利于MoS2 (002)取向生长,可有效提升ZnO?MoS2/ZnO复合涂层的摩擦学性能;控制ZnO薄膜厚度,可实现ZnO薄膜与基底及ZnO?MoS2层间界面之间的优化结合,以制得具有较好摩擦学性能及使用寿命的ZnO?MoS2/ZnO复合涂层。     

磁控溅射MoS2-Ni复合膜的结构与性能研究

目的提高MoS_2薄膜在大气环境下的摩擦学性能。方法采用离子源复合磁控溅射技术制备了Mo S2-Ni复合膜,通过改变Ni靶功率获得不同Ni掺杂量的复合膜,研究不同Ni掺杂量对复合膜结构及摩擦学性能的影响。采用扫描电镜(SEM)、X射线衍射仪(XRD)、显微硬度计、洛氏硬度计、球-盘式摩擦磨损试验机以及3D轮廓仪,对复合膜显微结构和性能进行研究。结果复合膜以柱状晶结构生长,增加Ni含量可以细化晶粒,使复合膜的结构更加致密。复合膜硬度在250~446HV之间,且随Ni含量的增加,复合膜的硬度提高。复合膜具有良好的膜/基结合力,结合力达到HF1级。MoS_2-Ni复合膜的摩擦系数在0.10~0.23之间,随Ni含量的增加,虽然复合膜的摩擦系数增加,但由于磨损过程形成稳定的转移膜粘着在对磨球表面,因而使得磨损率降低,耐磨寿命提高。结论 Ni掺杂可以提高复合膜的致密度、硬度以及结合力,增强复合膜的耐磨性能。     

SiC靶功率密度对无氢掺硅类金刚石薄膜摩擦学性能的影响

采用直流磁控溅射石墨靶、中频磁控溅射碳化硅靶以及离子源辅助的复合沉积技术,制备出膜层质量优异、摩擦因数和磨损率较低的具有不同Si含量的无氢掺硅类金刚石薄膜。使用XPS、拉曼光谱仪、台阶仪、纳米硬度计、SEM、EDS以及球盘式摩擦磨损试验仪测试并表征薄膜的微观结构、力学性能和摩擦学性能。研究表明,该技术能够成功制备出无氢掺硅类金刚石薄膜;随着SiC靶功率密度的增加,薄膜中Si的含量和sp3键的含量逐渐增加,其纳米硬度和弹性模量先增大后减小,摩擦因数由0.277降低至0.066,但其磨损率从6.29×10-11 mm3/Nm增加至1.45×10-9 mm3/Nm;当SiC靶功率密度为1.37W/cm2时,薄膜的纳米硬度与弹性模量分别达到最大值16.82GPa和250.2GPa。     

DLC and UHMWPE as hard/soft composite film on Si for improved tribological performance

The main purpose of this study is to explore the advantages of using a composite thin film of ultra high molecular weight polyethylene (UHMWPE) on a hard diamond like carbon (DLC) coating deposited on Si, for high wear life and low coefficient of friction. The experiments are carried out using a ball-on-disc tribometer at a constant linear speed of 0.052 m/s. A 4 mm diameter silicon nitride ball with a normal load of 40 mN is used as the counterface. The tribological results are discussed on the basis of hardness, elastic modulus, contact area, contact pressure and optical images of surface films. As a result of higher load carrying capacity (high hardness and elastic modulus), the wear life of Si/DLC/UHMWPE coated layer is approximately five times greater than that of Si/UHMWPE. Looking at the film thickness effect, UHMWPE film shows maximum wear resistance when the film is of optimum thickness (6.2 μm-12.3 μm) on DLC. Wear mechanisms of different UHMWPE thicknesses for Si/DLC/UHMWPE film are explained using optical microscopy of worn surfaces. Further, the use of perfluoropolyether (PFPE) ultra-thin film as the top layer on the composite coatings reduces the coefficient of friction to very low values (0.06-0.07) and increases the wear life of the films by several folds.     

磷嗪X-1P添加剂对硬脂酸钾固体润滑薄膜摩擦学性能的影响

采用浸渍嵌拉方法制备了磷嗪X1-P和硬脂酸钾复合固体润滑薄膜并且用DF-PM型静-动摩擦磨损试验机考察了复合薄膜在低速滑动条件下的摩擦学性能，采用扫描电子显微镜和X射线能量散射仪观察分析了偶件钢球表面的磨损形貌及典型元素面分布。结果表明，在相对较低的载荷下，复合薄膜比硬脂酸钾薄膜具有更好的摩擦学性能。随着薄膜中磷嗪X1-P含量的提高，更有利于在对偶钢球表面形成有效的转移薄膜，摩擦学性能有逐渐变好的趋势。     

Si含量对Si-GLC薄膜在海洋环境中摩擦学行为的影响

目的 为改善类石墨(Graphite-like Carbon，GLC)薄膜在海洋工程中的摩擦学行为，扩展此类薄膜的进一步应用。 方法 采用磁控溅射技术制备了不同Si含量的Si-GLC薄膜。采用扫描电镜(SEM)、拉曼光谱设备对薄膜的形貌、成分和结构进行了分析，并用海水盐雾、高低温交变试验模拟海洋环境对薄膜的腐蚀作用，利用纳米压痕、往复式摩擦磨损试验机对薄膜的机械性能进行了评价。结果 Si-GLC薄膜结构致密，受限于沉积方法，制备的Si-GLC薄膜具有富Si层和富C层交替生长的“伪多层”结构。随着Si含量的增加，C—Si单键的数量逐渐增多，Si-GLC薄膜中sp³杂化键的含量逐步增加。Si-GLC薄膜中sp³杂化键的含量随Si含量的增加而逐步上升，薄膜的硬度与弹性模量在Si质量分数为64.51%时到达最大值，分别为21.3 GPa和245.9 GPa。同时，Si含量较高的薄膜具有更好的耐盐雾、耐高低温交变特性，表现出更好的海洋环境适应性。结论 Si质量分数为48.11%时Si-GLC表现出最佳的海洋环境适应性摩擦学性能，在不同试验条件下均具有较低(约0.1)且稳定的摩擦因数，证明在GLC薄膜中掺入适量的Si元素能够起到稳定薄膜内的单键结构，避免薄膜在摩擦过程中发生石墨化，达到提升薄膜耐磨性能的目的。     

The nanostructured phase transition and thermal stability of superhard f-TiN/h-AlSiN films

The superhard Ti–Al–Si–N films were synthesized by multi-arc ion plating technology and the influence of vacuum annealing on the structures and properties of the films was investigated. Transmission electron microscopy observation confirmed that the as-deposited Ti–Al–Si–N films were consisted of fcc-TiN/hcp-AlSiN multilayers with a period of 8 nm. The result also showed that a minute layer of cubic structure was observed in hcp-AlSiN layer at the interface between TiN layers and AlSiN layers, which resulted in an epitaxial growth between TiN layers and AlSiN layers. The annealing experiment of the Ti–Al–Si–N films was performed in vacuum furnace for 2 h at temperatures ranging from 700 to 1100 °C. With increasing annealing temperatures, no novel phases were observed indicating that the film retained the sharp interfaces. The grains of the film coarsened and showed mixed orientations at 1100 °C. The transformation of h-AlSiN into h-AlN and Al-depleted AlSiN_x and partial crystalline SiN_x was speculated during the annealing process by the XPS and DSC results. The film retained super hardness of above 47 GPa even at 1100 °C due to the formation of crystalline SiN_x and the minute c-(Al, Si)N layer between c-TiN layers and h-AlSiN layers which delayed the transformation of (Al, Si)N from cubic phase to hexagonal phase. The adhesion strength of the film was also discussed and that vacuum annealing could improve the adhesion strength.     

Characteristics and tribological performance of DLC and Si-DLC films deposited on nitrile rubber

The characteristics and tribological performance of DLC and Si-DLC films with and without Si–C interlayers were studied in this paper. The films were deposited on nitrile rubber using a closed field unbalanced magnetron sputtering ion plating system. The film properties and characteristics were determined by scanning electron microscopy (SEM), hydrophobicity studies, Raman spectroscopy and tribological investigations. Tribological performance of these films was investigated using a pin-on-disc tribometer under applied loads of 1 N and 5 N under conditions of dry and wet sliding. The effect of immersing the films in water on tribological performance was also examined. The results show that the morphology of the films had a crack-like network. At a substrate bias of − 30 V, the coatings were characterised by a very dense non-columnar microstructure. The highest value of the ratio of intensities of the D and G peaks (I_D/I_G) was 1.2 for Si-DLC film with Si–C interlayer. The lowest value of 0.7 was observed for DLC film. The contact angle (CA) of water droplets showed that the films were hydrophobic. These results are interpreted in terms of hybridisation of carbon in these coatings. The tribological investigation showed a dependence on both the tribological condition under investigation and the atomic percentage of Si in the films. At 5 N normal load the lowest wear depth was observed for DLC films.     

CoCrMo合金表面掺金属类金刚石薄膜的摩擦学性能

采用非平衡磁控溅射结合阳极型气体离子源技术在CoCrMo合金表面制备掺钨类金刚石薄膜(WDLC)和掺钛类金刚石薄膜(Ti-DLC)。利用努氏显微硬度计、结合力划痕仪、摩擦磨损试验机、表面形貌仪和洛氏硬度计表征膜层的力学性能,并用扫描电镜分析磨损形貌,探讨薄膜磨损机理。结果表明:所制备的2种薄膜均具有典型的DLC薄膜特征,W-DLC薄膜的硬度、结合力和摩擦磨损性能均优于Ti-DLC薄膜,更适合于CoCrMo合金的表面强化处理;CoCrMo合金的磨损机制主要为粘着磨损和磨粒磨损,而Ti-DLC/CoCrMo和W-DLC/CoCrMo的磨损机制以滑动磨损为主伴随极少量的磨粒磨损;经DLC薄膜处理,摩擦因数从CoCrMo合金的0.578降低到0.2以下,磨损率也降低了2个数量级,大幅度地提高了CoCrMo合金的摩擦磨损性能。     

Microstructure and mechanical property evaluation of pulsed DC magnetron sputtered Cr–B and Cr–B–N films

CrB₂ and four Cr–B–N films with high Cr/B ratio and various nitrogen contents were deposited by a co-sputtering process using a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The structures and BN bonding nature of the thin films were characterized by X-ray diffraction (XRD) and Fourier transform infrared spectroscopy (FTIR), respectively. The surface and cross sectional morphologies of the thin films were examined by scanning electron microscopy (SEM) and transmission electron microscopy (TEM). The surface roughness of the thin films was explored by atomic force microscopy (AFM). Nanoindentation, microscratch and ball-on-disk wear techniques were used to evaluate the hardness, and tribological properties of the thin films, respectively.The microstructure of the Cr–B–N thin films changed from a coarse columnar structure to a glassy and featureless morphology as the nitrogen content increased from 15.2 at.% to 54.5 at.%, whereas the corresponding structure developed from an amorphous state to a nanocomposite structure consisting of CrN nanograins and amorphous BN phases. It was found that high hardness, good tribological and brittle properties were obtained for the CrB₂ coating. The hardness and elastic modulus of the Cr–B–N thin films decreased with increasing nitrogen content until the nanocomposite structure of nanocrystalline CrN grains and an amorphous BN matrix was formed. However, the hardening effect induced by the nanocomposite structure was limited due to the fact that the small CrN nanograins were surrounded by a thick intergranular soft amorphous BN layer. On the other hand, the fracture toughness and resistance against elastic strain to failure of the Cr–B–N coatings were effectively enhanced by the addition of nitrogen.     

Mechanical and tribological properties of coatings sputtered from SiC target in the presence of CH4 gas

Amorphous hydrogen-free silicon carbide (a-SiC) coatings demonstrate good adhesion to different steel substrates, low intrinsic stress and high hardness however show quite high coefficient of friction in comparison with carbon-based coatings. Some addition of carbon to SiC can promote the decrease of friction coefficient.In the present work the amorphous hydrogenated silicon-carbide (a-SiC:H) films with different C/Si ratio were prepared at room temperature using DC magnetron sputtering in two ways: (i) sputtering of silicon target; (ii) sputtering of SiC target, both in the gas mixture of Ar and CH₄. In the latter case the films contained less hydrogen at the same C/Si ratio. The mechanical and tribological properties of these films were studied to find their optimum combination.The hardness, elastic modulus (nanoindentation), intrinsic stress (Stoney's formula) and coefficient of friction (pin on disc tribometer) were examined in dependence on the technological parameters, film structure and composition (Raman spectra, electron probe microanalysis). An increase of carbon in the films from 50 to 70 at.% resulted in decrease of hardness and friction coefficient. In the first case (i) the hardness decreased from 13 to10 GPa and in the second case (ii) from 23 to 16 GPa. Thus sputtering of SiC target in the gas mixture of Ar and CH₄ allows obtaining at room temperature the films with C/Si > 1 in which relatively high hardness (16-18 GPa) and low friction coefficient (~ 0.15) are combined.     

类富勒烯/非晶多层碳膜的制备及性能

针对碳基薄膜存在的高应力问题,利用单极脉冲等离子体增强化学气相沉积技术在单晶硅衬底上制备了含氢类富勒烯/非晶层交替构成的类金刚石多层膜。采用高分辨透射电子显微镜和激光拉曼光谱仪分析了多层膜的结构特征;用X射线光电子能谱分析了薄膜的化学键状态;用纳米压痕仪测定了薄膜的硬度和弹性模量;在CSM往复式摩擦磨损试验机上考察了薄膜在大气下的摩擦学性能,同时比较了多层膜与非晶、类富勒烯薄膜的力学性能和摩擦磨损性能。结果表明:多层膜的硬度高于非晶和类富勒烯单层薄膜,达到28.78GPa;在大气环境下与Si3N4球对摩时平均摩擦因数略低于类富勒烯单层膜,耐磨性明显优于单层非晶和类富勒烯薄膜。     

Ti-Si-N纳米复合薄膜的制备及其力学性能

采用离子束溅射与磁过滤阴极弧共沉积技术在单晶硅片(400)表面制备Si含量(摩尔分数)为3.2%~15.5%范围内的TiSiN薄膜。采用X射线光电子能谱(XPS)、电子散射谱(EDS)、X射线衍射仪(XRD)研究TiSiN薄膜的显微结构和力学性能。结果表明:低Si含量的薄膜以面心立方晶型的Ti(Si)N固溶体形式存在,择优晶面为(200)面;当Si含量饱和后,出现Ti(Si)N和Si3N4非晶相,形成Ti(Si)N/Si3N4纳米复合结构。薄膜硬度范围在22~26GPa,采用Si3N4小球为对偶时薄膜的摩擦因数均维持在0.13~0.17之间。Si含量为10.9%时,硬度达最大值,结合较低的粗糙度,使其摩擦因数和磨损率达到最低值。     

高熵合金薄膜微观结构与摩擦学性能的研究综述

在机械系统运行中存在的摩擦磨损问题直接影响系统的工作效率、运行可靠性和使用寿命。如何降低摩擦磨损对机械系统运行的影响至关重要。通过特殊的表面处理工艺在关键工件表面沉积耐磨损、自润滑的薄膜在众多的减摩降损方法中效果突出。相较于传统薄膜,高熵合金薄膜具有独特的微观结构和优异的力学性能,在摩擦领域表现出极佳的发展潜力。概述了近年来有关高熵合金薄膜的研究进展。首先介绍了高熵合金薄膜的基本概念和制备方法,论述了这些制备方法的原理、优缺点和适用领域。其中,通过磁控溅射法制备的高熵合金薄膜的表面光滑致密、成分均匀性好、膜基结合强度较高、组织结构可控,该方法已成为高熵合金薄膜最常用的制备方法。重点论述了采用磁控溅射法来调节元素组分、工艺参数、界面结构对高熵合金薄膜的微观结构和摩擦性能的影响,并从耐磨损性和减摩自润滑性等方面分析改善高熵合金薄膜摩擦学性能的关键因素。高熵合金薄膜具有硬质的组织结构、表面光滑致密、膜基结合牢固等特点,这是提升耐磨损性能的关键。通过复合自润滑相或氧化磨损诱导生成致密的润滑膜,可显著改善其减摩性能。总结了目前研究中存在的问题和不足,并就未来高熵合金薄膜在摩擦领域的研究方向进行了展望。     

溅射功率对La-Ti/WS2 复合薄膜高温摩擦学行为的影响

高温条件下WS₂易于氧化生成WO3,导致WS₂固体润滑薄膜的摩擦学性能受到较大影响。为改善WS₂固体润滑薄膜在高温条件下的摩擦学性能,采用非平衡磁控溅射技术制备了共掺杂La-Ti/WS₂复合薄膜,研究了靶功率对磁控溅射La-Ti/WS₂复合薄膜结构和高温摩擦学性能的影响。利用扫描电镜(SEM)、X射线衍射仪(XRD)、纳米压痕仪和X射线光电子能谱仪(XPS)分析了薄膜微观形貌、成分、力学性能、微观结构。利用高温摩擦磨损试验机研究了复合薄膜的高温摩擦学性能。结果表明,高温环境下,靶功率为20W时La-Ti/WS₂复合薄膜表现出优异的摩擦学性能。此时,复合薄膜H/E值最大,摩擦系数最小,平均为0.012,磨损率最低为1.56×10^-8mm³/N·m,这主要归因于高温下摩擦界面产生的稀土氧化物,促使La-Ti/WS₂复合薄膜的摩擦磨损机制发生了改变,使得WS₂在高温受破坏的情...