双脉冲电源参数对电铸金刚石-镍复合膜品质的影响

采用电铸法制备了金刚石-镍复合膜,研究了平均电流密度、正向脉冲频率、正向脉冲占空比、反向脉冲占空比等双脉冲电源参数对镀层厚度的均匀性、沉积速率、硬度、表面形貌的影响.结果表明:随着平均电流密度的增加,沉积速率增大并趋于稳定,复合膜硬度先增大后减小,厚度的均匀性变差;随着正向脉冲频率的增加,沉积速率和硬度都增大,厚度的均...     

纯钛表面镀铜工艺的对比研究

采用脉冲电化学法和阴极沉积法在纯钛表面镀铜,并通过加入铜的络合物氨水对脉冲电化学法的镀液进行改进。利用扫描电镜、X射线能量色散谱仪、轮廓仪、显微硬度计对镀层形貌进行表征。结果表明,与阴极沉积法制备的镀层相比,脉冲电化学法制得的镀层组织更加均匀致密,表面光滑、硬度高,对镀液配方改进后得到的镀层质量进一步提高。     

磁场方向对脉冲电沉积制备Ni-ZrO2 纳米复合镀层性能的影响

目的 研究有无磁场条件和垂直、平行两种磁场方向对脉冲电沉积制备Ni-ZrO2纳米复合镀层性能的影响。方法 以45#钢作为基体,采用脉冲电沉积和磁场-脉冲电沉积法成功制备Ni-ZrO2纳米复合镀层。利用扫描电镜（SEM）、能谱仪（EDS）、X射线衍射仪（XRD）、原子力显微镜（AFM）观察纳米复合镀层的表面形貌、微观结构和表面粗糙度,利用显微硬度计、划痕仪、摩擦磨损试验机对纳米复合镀层进行显微硬度、结合力和摩擦磨损性能等力学性能研究。结果 相同工艺条件下,垂直磁场-脉冲电沉积条件制备的Ni-ZrO2纳米复合镀层的晶粒形状为金子塔状,镀层表面粗糙度有所改善,复合镀层显微硬度值最高,为370HV。平行磁场-脉冲电沉积条件下制备的Ni-ZrO2纳米复合镀层表面平整,均匀致密,复合镀层中Zr的质量分数为8.27%,表面粗糙度Ra和Rq值分别为82 nm和105 nm,镀层结合力为337 N,磨损量低于其他两种镀层的磨损量。结论 施加磁场后,在磁场MHD效应作用下,纳米复合镀层表面形貌平整,均匀致密,显微硬度提高,并且与基体结合性能和耐磨性都优于无磁场条件下制备的纳米复合镀层。平行方向磁场对Ni-ZrO2纳米复合镀层的力学性能有更明显的促进作用。     

双脉冲参数对金属锰电沉积行为的影响

采用双向脉冲电沉积法制备金属锰,研究双脉冲电源的正向平均电流密度、反向脉冲系数、一组正向脉冲工作时间和反向脉冲工作时间系数对电流效率、单位功耗、阴极金属锰和阳极泥的微观形貌的影响。结果表明:双脉冲电流可有效消除浓差极化,抑制析氢反应,反向电流可溶解镀层表面的枝晶;脉冲参数过高或者过低都会造成金属锰层微观缺陷不断增加,镀层表面平整度与光亮度下降;而反向周期性电流的增大或者施加时间的延长可有效地防止阳极钝化,减少阳极泥的产生量。双脉冲电源的优化参数为:当正向平均电流密度为350 A/m2、反向脉冲系数α=1/10、一组正向脉冲工作时间为150 ms、反向脉冲工作时间系数为1/15时,电沉积2 h的电流效率最高为80.25%,阳极泥的产生量最低为2.93 g,而且金属锰镀层致密均匀、气孔少、基本无枝晶产生。     

化学镀非晶态Ni-P镀层孔隙率及其结构研究

运用化学镀技术在碳钢表面沉积了非晶态Ni-P镀层。系统研究了镀液周期对各项参数的影响，镀液使用寿命可达6个周期。优化了施镀工艺，分析了稳定剂对镀层孔隙率的影响，稳定剂加入量质量分数为原镀液体系1．5倍时孔隙率提高一个等级。得出厚度与孔隙率间关系，确定了镀导厚度为40μm时可改善镀层在海水中的防腐性能。应用X射线衍射仪（XRD）及扫描电镜（SEM）分析了其相结构、元素分布。镀层结构均匀，致密，为典型的非晶态结构。     

直流与脉冲电沉积Ni-Cr合金镀层的结构及耐蚀性

用直流电沉积(DC)、脉冲电沉积(PC)技术在低碳钢表面制备Ni-Cr合金镀层,采用X射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)等方法,研究了电沉积方式对合金镀层晶粒结构和表面形貌的影响;用浸泡法和电化学极化法测试了合金镀层在3.5%(质量分数)Na Cl溶液中的耐蚀性。结果表明,电沉积方式对镀层结构和性能有较大影响:PC方式得到的合金镀层,其纳米晶尺寸更小(由45 nm减小为26 nm),镀层表面致密性更高;表现在性能上,与DC相比,PC合金镀层的显微硬度更大(由7000 MPa增加到8250 MPa),耐蚀性更好(自腐蚀电位由–0.624V正移到–0.477 V,腐蚀电流密度由1.911×10~(-4)A/cm~2减小到2.587×10~(-5) A/cm~2)。     

文摘辑要

高频脉冲复合电镀（Ni-Co）-SiC复合镀层的耐蚀性研究 用高频脉冲复合电镀方法制备了（Ni-Co）-SiC复合镀层。研究了脉冲频率对镀层硬度及耐蚀性的影响。结果表明：随着脉冲频率的增加,复合镀层表面更加致密、均匀,硬度提高。在3.5%NaCl溶液和15%H2SO4溶液中,（Ni—Co）-SiC复合镀层的自腐蚀电位均发生正移,腐蚀失重速率变慢。与Ni-Co合金镀层相比,复合镀层具有较高的硬度和耐蚀性。     

无氰脉冲电镀金-钯-铜合金工艺

研究了一种以亚硫酸钠为主配位剂的无氰脉冲电镀金-钯-铜合金工艺。综合考虑镀层表面形貌和镀液沉积速率,得出优选电镀工艺参数为:电流密度0.25 A/dm~2、占空比10%、脉冲频率900 Hz、电镀温度60℃。利用超景深显微镜对镀层表面形貌进行观察分析;利用X射线衍射对镀层物相成分进行分析;同时采用热震法、弯折法检测了镀层结合力;利用维式硬度计测量了镀层硬度。表征结果表明:所得镀层除金、钯、铜元素外,无其它杂质元素;镀层表面细致均匀,孔隙率低,平整性好,无裂纹;镀层硬度高,镀层结合力好。     

电沉积方式对Ni-SiC纳米复合镀层性能的影响

目的通过研究电沉积方式对Ni-SiC纳米复合镀层性能的影响,进而改善Ni-SiC纳米复合镀层的性能。方法采用直流电沉积和脉冲电沉积分别制备Ni和Ni-SiC纳米复合镀层,使用扫描电镜和能谱仪研究镀层的表面形貌和成分,通过测量施镀前后镀件质量差计算沉积速率,采用硬度计测量了镀层的硬度,利用极化曲线和电化学阻抗方法研究镀层在3.5%NaCl水溶液中的耐腐蚀性能,分析了直流电沉积方式和脉冲电沉积方式对镀层各项性能的影响。结果脉冲电沉积方式制备的Ni-SiC纳米复合镀层的表面形貌更加致密、均匀、光滑,镀层硬度为616.3HV,自腐蚀电流为9.56×10~(-6) A,比直流电沉积制备的Ni-SiC纳米复合镀层的硬度和耐蚀性能均有所提高。结论电沉积方式对复合镀层的性能有很大影响,脉冲电沉积方式制备的Ni-SiC纳米复合镀层具有更好的性能。     

电流密度对铌表面熔盐脉冲电沉积渗硅的影响

采用熔盐脉冲电沉积法在纯铌表面渗硅,利用辉光放电光谱仪（GDOES）、扫描电镜（SEM）和能谱仪（EDS）、X射线衍射仪（XRD）分析不同电流密度对渗硅层厚度、成分、组织及相结构的影响,并对渗硅层的抗氧化性进行了研究。结果表明,渗硅层厚度随电流密度的增大而增加,超过100 mA/cm2厚度增加缓慢。渗硅层晶粒随电流密度的增加由粗大变得细小。渗层与基体结合紧密,渗层组织较均匀整齐,致密无孔洞。渗硅层由单相NbSi2组成,在（110）和（200）晶面上择优生长。NbSi2渗层提高了纯铌的抗氧化性。     

Ni/n-SiO2 Composite Coating Prepared by Brush Plating with Pulse Current

Nickel and silicon dioxide nanoparticle composite coatings were prepared by brush plating with direct and pulse current.The surface morphology,microstructure,hardness and wear resistance of the coatings were investigated by scanning electron microscope(SEM),transmission electron microscope(TEM),mirohardness tester and ball-on-disk tribotester.The results show that the technical parameters,pulse current,duty circle and frequency,are of great influence on the growth of crystalline and properties of the coating.Compared with the coating plated with direct current,the coatings plated with pulse currents have smaller nanocrystalline,contain more SiO2 nanoparticle and have higher hardness and wear resistance.     

Pulse electroplating of Ni-W-P coating and its anti-corrosion performance

Ni-W-P coatings were electrodeposited on copper substrates by pulse electroplating. Effects of electrolyte pH (1-3), temperature (40–80 °C), average current density (1–7 A/dm²) and pulse frequency (200–1000 Hz) on deposition rate, structure and corrosion resistance performance of Ni-W-P coatings were studied by single factor method. Surface morphology, crystallographic structure and composition of Ni-W-P coatings were investigated by means of scanning electron microscopy, X-ray diffractometry and energy dispersive X-ray spectroscopy, respectively. Corrosion resistance performances of Ni-W-P coatings were studied by potentiodynamic polarization and electrochemical impedance spectroscopy in 3.5% NaCl solution (mass fraction) and soil-containing solution. It was found that the pulse electroplated Ni-W-P coatings have superior corrosion resistance performance and the electroplating parameters significantly affect the structure and corrosion resistance performance of Ni-W-P coatings. The optimized parameters of pulse electroplating Ni-W-P coatings were as follows: pH 2.0, temperature 60 °C, average current density 4 A/dm², and pulse frequency 600 Hz. The Ni-W-P coating prepared under the optimized parameters has superior corrosion resistance (276.8 kΩ) and compact surface without any noticeable defect.     

Effect of Pulse Width and Frequency of Bias DC Voltage on the Microstructure of Pure Cr Coatings by Magnetron Sputter Ion Plating

Pure Cr coatings were deposited onto the pieces of silicon wafer at different pulse width and frequency of bias voltage by magnetron sputter ion plating.The microstructure and preferential orientation of pure Cr coatings were analyzed by SEM and XRD respectively.Results show that the diffusion ability of atoms on the coating surface was improved due to the substrate temperature rise effect caused by the ion bombardment with the pulse width increased.However,the effect of frequency of bias DC voltage on the microstructure of pure Cr coatings was particularly significant.The bombardment ions action on the coating surface were more uniformly and more dispersed compared with the nucleation rate of Cr atoms and the density of pure Cr coatings both improved with the frequency increased are the main reasons that the microstructure of pure Cr coatings changed from dense,granular columnar grain outcrops to uniformity,small nano-crystalline particles.     

The influence of pulse parameters on Zn-Ni alloy coatings plated on AZ91 magnesium alloy

The influence of pulse parameters on zinc-nickel coatings plated on AZ91 magnesium alloy is investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The particles of zinc-nickel alloy plated on AZ91 magnesium alloy become smaller and the surface roughness decreases with the increase of current density and frequency. However, long plating times and a high ratio of t_on/t_off have decremental effects on the particles and surface roughness. The contents of crystal phases of zinc-nickel alloy coatings are higher under pulse current deposition than under direct current. The frequency, current density, plating time and ratio of t_on/t_off have different impacts on the thickness and Ni content of zinc-nickel coatings.     

Characterisation of tungsten coatings by pulsed current plating from molten salt in air atmosphere

Pure and compact tungsten coatings with high (200)-orientation were successfully electrodeposited from Na₂WO₄–WO₃ binary oxide molten salt by direct and pulse current techniques on copper based alloy substrate in air atmosphere at 1173 K. The tungsten coatings and copper alloy substrates combined well with no obvious voids and cracks. In addition, the influence of pulse plating on the microstructure, crystal structure and Vickers microhardness of coatings, adhesive strength between coatings and substrates as well as the current efficiency was investigated. It was also observed that applied pulse current led to tungsten coatings with better mechanical properties than those obtained by direct current plating. In addition, a tungsten coating of 500 μm which had lower oxygen content and higher adhesive strength than the coating obtained by the plasma spray method was obtained.     

脉冲换向电刷镀镍基纳米SiO2复合镀层的耐腐蚀性能研究

采用脉冲换向电刷镀方法制备了Ni/n-SiO2复合镀层,应用SEM对镀层表面形貌进行了分析,测试了镀层的孔隙率,以及镀层在海水浸泡条件下的耐腐蚀性能,讨论了镀层的耐腐蚀机理.实验结果表明:与直流工艺条件下的电刷镀镀层相比,脉冲换向电刷镀工艺得到的Ni/n-SiO2复合镀层具有致密精细的表面、较小的孔隙率和较高的耐腐蚀性能.     

无氰镀银层高温防变色性能初步探究

目的探寻无氰镀银层高温变色的原因,以增强无氰镀银层的防高温变色性能。方法采用硫代硫酸盐体系在紫铜片上镀银,并进行无惰性气体保护的300℃×1 h烘烤。借助扫描电镜(SEM)观察镀层高温烘烤后的微观形貌,采用能谱仪(EDS)检测镀层中各元素的含量与分布,探讨银层厚度、供电方式、后处理工艺对镀层防高温变色性能的影响。结果当直流电镀层厚度达到9μm,脉冲电镀层厚度达到6μm时,镀层经高温烘烤后不变色。而经水溶性银保护剂、重铬酸钾、PMTA处理后的镀层(厚6μm)均在高温烘烤后发生了变色情况。扫描电镜观察显示,高温变色镀层表面有凸起状裂纹,能谱仪检测到有铜原子外渗现象。结论高温下铜原子的外渗导致了镀层变色。采用脉冲方式进行电镀,可以使镀银层孔隙率降低。通过增加镀银层厚度和采用脉冲电镀,能够提高镀银层的防高温变色性能。     

脉冲镀金工艺研究进展

金镀层具有良好的耐腐蚀性、抗氧化性、导电性及延展性,广泛应用于精密微纳元器件制造。电化学镀金是实现微纳元器件镀金的主要工艺之一,主要分为直流镀金工艺和脉冲镀金工艺。相较于直流镀金工艺,脉冲镀金工艺可通过控制脉冲波形、频率、占空比及电流密度等脉冲参数,改变金属离子电沉积过程中的电化学极化和浓差极化,灵活调控镀层的物理化学性能。近年来,国内外在微纳元器件脉冲镀金工艺领域开展了系列研究工作,并取得了不错的进展。综述了电化学脉冲镀金的基本原理,描述了电镀金试验中金由离子形态转化为金属的过程。此外,还综述了占空比、频率、电流密度、脉冲导通时间、脉冲关断时间等脉冲参数对金镀层形成的影响,以及镀层性能评价方式;另外,介绍了无氰和有氰两大典型镀液获得金镀层的基本情况,分析了它们各自的优缺点,主要表现为有氰镀液稳定性好,所得金镀层较均匀,而无氰镀液的突出优势为无毒,但其稳定性有待进一步提高。最后,展望了脉冲镀金工艺的发展方向,可为发展新型脉冲镀金工艺及应用拓展提供有益的参考和启示。     

Study on the nano-composite electroless coating of Ni–P/Au

The nano-composite coating of Ni–P/Au was obtained by adding gold nanoparticles to the Ni–P electroless plating solutions. The scanning electron microscope (SEM), energy dispersive spectrometer (EDS), X-ray diffractometer (XRD) and microsclerometer were used to characterize the compositions, structures, morphologies and hardness of the coatings, respectively. The Ni–P electroless coating contains 11.0 wt.% P while the composite coating of Ni–P/Au contains 9.85 wt.% P and 2.38 wt.% Au. The composite coatings, which contain gold nanoparticles, exhibit better properties of hardness, corrosion resistance and uniformity than the particle-free coatings. The coatings deposited from an electroless bath have the increased hardness after heat treatment due to the transformation of amorphous phase Ni–P to crystalline phase Ni₃P. The composite coating with gold nanoparticles has bigger hardness value than Ni–P coating.