High-T/sub 0/ strain-compensated InGaAsSb-AlGaAsSb quantum-well lasers emitting at 2.43 /spl mu/m

Strain-compensated InGaAsSb-AlGaAsSb quantum-well (QW) lasers emitting near 2.5 /spl mu/m have been grown by solid-source molecular beam epitaxy. The relatively high arsenic composition causing a tensile strain in the Al/sub 0.25/GaAs/sub 0.08/Sb barriers lowers the valence band edge and the hole energy level, leading to an increased hole confinement and improved laser performance. A 60% external differential efficiency in pulsed mode was achieved for 1000-/spl mu/m-long lasers emitting at 2.43 /spl mu/m. A characteristic temperature T/sub 0/ as high as 163 K and a lasing-wavelength temperature dependence of 1.02 nm//spl deg/C were obtained at room temperature. For 2000 /spl times/ 200 /spl mu/m/sup 2/ broad-area three-QW lasers without lateral current confinement, a low pulsed threshold of 275 A/cm/sup 2/ was measured.     

Low-threshold high-T/sub 0/ 1.3-/spl mu/m InAs quantum-dot lasers due to p-type modulation doping of the active region

P-type doping is used to demonstrate high-To, low-threshold 1-3 /spl mu/m InAs quantum-dot lasers. A 5-/spl mu/m-wide oxide confined stripe laser with a 700-/spl mu/m-long cavity exhibits a pulsed T/sub 0/ = 213 K (196 K CW) from 0/spl deg/C to 80/spl deg/C. At room temperature, the devices have a CW threshold current of /spl sim/4.4 mA with an output power over 15 mW. The threshold at 100/spl deg/C is 8.4 mA with an output power over 8 mW.     

Single-frequency 1310-nm AlGaInAs-InP grating-outcoupled surface-emitting lasers

Single-frequency 1310-nm grating-outcoupled surface-emitting (GSE) semiconductor lasers with output slope efficiencies exceeding 0.1 mW/mA into multimode fibers, threshold currents below 22 mA, and >30-dB sidemode suppression ratios are reported. These GSE lasers consist of 500-/spl mu/m-long active ridges that excite one end of surface-emitting second-order outcoupling gratings with 200-/spl mu/m-long first-order distributed Bragg reflector gratings terminating the laser cavities at both ends. The grating outcouplers range from 10 to 50 /spl mu/m in length. These lasers have an open eye pattern for nonreturn-to-zero signals at 2.5 Gb/s into single-mode fibers. The full-width half-maximum far-field beam divergences range from 1.5/spl deg/ /spl times/ 8/spl deg/ to 5/spl deg/ /spl times/ 8/spl deg/.     

Low-threshold native-oxide confined narrow-stripe folded-cavity surface-emitting InGaAs-GaAs lasers

Narrow-stripe folded-cavity surface-emitting InGaAs-GaAs lasers are demonstrated, AlAs native-oxide layers above and below waveguide region are employed for current and optical confinement to form narrow-stripe InGaAs-GaAs quantum-well lasers. A low-temperature (400/spl deg/C) selective wet-oxidation technique and an ion-beam-etching technique are used to fabricate insulator confined narrow-stripes and internal 45/spl deg/ deflectors, respectively. Continuous-wave threshold currents as low as 4.5 mA and 59% surface-emitting quantum efficiencies are achieved on the devices with 2-/spl mu/m-wide aperture and a 420-/spl mu/m-long cavity.     

Continuous-wave operation of quantum cascade laser emitting near 5.6 /spl mu/m

Buried heterostructure quantum cascade lasers emitting at 5.64 /spl mu/m are presented. Continuous-wave (CW) operation has been achieved at -30/spl deg/C for junction down mounted devices with both facets coated. A 750 /spl mu/m-long laser exhibited 3 mW of CW power with a threshold current density of 5.4 kA/cm/sup 2/.     

Low threshold and high uniformity for novel 1.3-/spl mu/m-strained InGaAsP MQW DC-PBH LDs fabricated by the all-selective MOVPE technique

1.3-/spl mu/m-strained InGaAsP multiquantum-well (MQW) double-channel planar buried heterostructure laser diodes (DC-PBH-LDs) were fabricated by all-selective metalorganic vapor phase epitaxy (MOVPE). In the fabrication process, the strained MQW active layer and current-blocking structures were directly formed by selective MOVPE without a semiconductor etching process. A low-threshold current (I/sub th/=2.6 mA@25/spl deg/C for 200-/spl mu/m-long 70%-90% facets) and excellent high-temperature operation (T/sub 0/=84 K, 25/spl deg/C-60/spl deg/C and T/sub 0/=70 K, 25/spl deg/C-85/spl deg/C) were achieved. Furthermore, extremely uniform threshold current and slope efficiency were observed, The median time to failure for these LDs was estimated to be more than 100000 h under the 85/spl deg/C-5 mW aging condition.     

Continuous-wave operation up to 36/spl deg/C of 1.3-/spl mu/m GaInAsP-InP vertical-cavity surface-emitting lasers

We introduced ion-beam assisted deposition in order to improve the quality of Al/sub 2/O/sub 3/ and SiO/sub 2/, which were used as part of the mirrors of 1.3-/spl mu/m GaInAsP-InP vertical-cavity surface-emitting lasers (VCSELs). The refractive index of Al/sub 2/O/sub 3/ was improved to 1.63 from 1.56 and the one of SiO/sub 2/ increased to 1.47 from 1.45. Low-threshold room-temperature continuous-wave (CW) operation of 1.3-/spl mu/m VCSEL with the improved mirrors was demonstrated. The threshold current was 2.4 mA at 20/spl deg/C. The CW operating temperature was raised to 36/spl deg/C, which is a record high temperature for 1.3-/spl mu/m VCSEL.     

Very large temperature-induced absorptive loss in high Te-containing chalcogenide fibers

The change in the absorption loss relative to room temperature of the infrared (IR)-transmitting Ge/sub 15/As/sub 35/Se/sub (50-x)/Te/sub x/ glass fibers in the temperature range of -110/spl deg/C/spl les/T/spl les/110/spl deg/C was investigated. The attenuation increased significantly at T/spl ges/40/spl deg/C. This is mainly attributed to thermally activated free carriers associated with the semimetallic character of the Te atom. For /spl lambda//spl les/4.2 /spl mu/m, the loss due to electronic and free-carrier absorption was strongly affected by temperature. In the wavelength region of 5-11 /spl mu/m, the loss was mainly due to free-carrier absorption. Beyond /spl lambda//spl ges/11 /spl mu/m, multiphonon absorption dominated the loss spectrum at T/spl les/60/spl deg/C while free-carrier absorption contributed mainly to the total loss at T/spl ges/80/spl deg/C.     

Low-threshold continuous-wave 1.5-/spl mu/m GaInNAsSb lasers grown on GaAs

We present the first continuous-wave (CW) edge-emitting lasers at 1.5 /spl mu/m grown on GaAs by molecular beam epitaxy (MBE). These single quantum well (QW) devices show dramatic improvement in all areas of device performance as compared to previous reports. CW output powers as high as 140 mW (both facets) were obtained from 20 /spl mu/m /spl times/ 2450 /spl mu/m ridge-waveguide lasers possessing a threshold current density of 1.06 kA/cm/sup 2/, external quantum efficiency of 31%, and characteristic temperature T/sub 0/ of 139 K from 10/spl deg/C-60/spl deg/C. The lasing wavelength shifted 0.58 nm/K, resulting in CW laser action at 1.52 /spl mu/m at 70/spl deg/C. This is the first report of CW GaAs-based laser operation beyond 1.5 /spl mu/m. Evidence of Auger recombination and intervalence band absorption was found over the range of operation and prevented CW operation above 70/spl deg/C. Maximum CW output power was limited by insufficient thermal heatsinking; however, devices with a highly reflective (HR) coating applied to one facet produced 707 mW of pulsed output power limited by the laser driver. Similar CW output powers are expected with more sophisticated packaging and further optimization of the gain region. It is expected that such lasers will find application in next-generation optical networks as pump lasers for Raman amplifiers or doped fiber amplifiers, and could displace InP-based lasers for applications from 1.2 to 1.6 /spl mu/m.     

Extremely small vertical far-field angle of InGaAs-AlGaAs quantum-well lasers with specially designed cladding structure

We report on a very small vertical far-field angle achieved by lasers with a specially designed structure. For an InGaAs-AlGaAs quantum-well laser with a 2.5-/spl mu/m-wide ridge waveguide, the far-field pattern has a vertical far-field angle of 13/spl deg/ and a lateral far-field angle of 8/spl deg/. Meanwhile, the threshold current remains acceptably low (/spl ap/36 mA for a 500-/spl mu/m-long cavity). The slope efficiency of the L-I characteristic is high (>0.9 W/A) compared to that of the conventional laser.     

Lasing characteristics of high-performance narrow-stripe InGaAs-GaAs quantum-well lasers confined by AlAs native oxide

High-performance narrow-stripe InGaAs-GaAs quantum-well lasers with integral buried AlAs native-oxide layers have been fabricated. AlAs native-oxide layers above and below waveguide region were employed for current and optical confinement to form narrow-stripe lasers. A low temperature (400/spl deg/C) anisotropic wet oxidation technique was used to selectively oxidize AlAs layers in the epitaxial structure. The devices demonstrated continuous wave threshold currents of 3.5 mA, external quantum efficiencies of 82%, and a characteristic temperature of 133 K for 1.8 /spl mu/m-wide aperture, 400 /spl mu/m-long devices. Threshold currents of 1.7 mA were obtained by applying HR/HR coatings.     

Edge-emitting lasers with short-period semiconductor/air distributed Bragg reflector mirrors

We demonstrate a short-cavity edge-emitting 0.98-/spl mu/m GaAs-based laser with semiconductor/air distributed Bragg reflector (DBR) mirrors made by reactive ion etching (RIE). The dc and small-signal modulation properties of 100-/spl mu/m-long lasers have been measured and are characterized by I/sub th/=4.5 mA and f/sub -3dB/=30 GHz under pulsed conditions, respectively. The far-field pattern of light emanating from the DBR is also measured.     

Ridge-width dependence on high-temperature continuous-wave operation of native oxide-confined InGaAsN triple-quantum-well lasers

InGaAsN triple-quantum-well (TQW) ridge waveguide (RWG) lasers were fabricated with contact ridge width of 4, 10, 50, and 100 /spl mu/m, respectively, using pulsed anodic oxidation (PAO). All these lasers worked under continuous-wave operation up to 100/spl deg/C. A clear trend of improved characteristic temperature (T/sub 0/) was observed as the ridge width narrowed. Proper choosing of ridge height and optimized PAO process were believed to minimize the lateral spreading current and reduce the scattering losses at the etched RWG sidewall, both of which are beneficial to the narrow ridge lasers operation. High output power of 298.8 mW, low transparency current density of 130 A/cm/sup 2//well, and high T/sub 0/ of 157.2 K were obtained from InGaAsN TQW 4-/spl mu/m-width lasers.     

Room-temperature pulsed operation of 1.5-/spl mu/m vertical cavity lasers with an InP-based Bragg reflector

We report on a 1.5-/spl mu/m vertical-cavity laser that utilizes one GaInAsP-InP and one Si-SiO/sub 2/ mirror in combination with a strain-compensated GaInAsP quantum-well active layer. Pulsed lasing operation was achieved in a temperature range from -160 to +43/spl deg/C. The lasers exhibit 30-mA pulsed threshold current at room temperature. CW operation was obtained up to -25/spl deg/C.     

High performance quantum dot lasers on GaAs substrates operating in 1.5 /spl mu/m range

Stacked InAs/InGaAs quantum dots are used as an active media of metamorphic InGaAs-InGaAlAs lasers grown on GaAs substrates by molecular beam epitaxy. High quantum efficiency (/spl eta//sub i/>60%) and low internal losses (/spl alpha/<3-4 cm/sup -1/) are realised. The transparency current density per single QD layer is estimated as /spl sim/70 A/cm/sup 2/ and the characteristic temperature is 60 K (20-85/spl deg/C). The emission wavelength exceeds 1.51 /spl mu/m at temperatures above 60/spl deg/C.     

Study on high-temperature performances of 1.3-/spl mu/m InGaAsP-InP strained multiquantum-well buried-heterostructure lasers

Stripe-width and cavity length dependencies of high-temperature performances of 1.3-/spl mu/m InGaAsP-InP well-designed buried-heterostructure strained multiquantum-well (MQW) lasers were investigated. The threshold currents as low as 4.5/10.5 mA and slope efficiencies as high as 0.48/0.42 mW/mA at 25/spl deg/C/85/spl deg/C were obtained in the MQW lasers with 1.5-/spl mu/m width, 250-/spl mu/m length, and 0.3/0.85 facet reflectivity. With temperature increasing from 25/spl deg/C to 85/spl deg/C, the MQW lasers exhibited lower output power degradation, the minimum value was 1.78 dB at an operation current of 45 mA. The MQW lasers were suitable for application in optical access networks.     

Room-temperature self-organised In/sub 0.5/Ga/sub 0.5/As quantum dot laser on silicon

The first room-temperature operation of In/sub 0.5/Ga/sub 0.5/As quantum dot lasers grown directly on Si substrates with a thin (/spl les/2 /spl mu/m) GaAs buffer layer is reported. The devices are characterised by J/sub th//spl sim/1500 A/cm/sup 2/, output power >50 mW, and large T/sub 0/ (244 K) and constant output slope efficiency (/spl ges/0.3 W/A) in the temperature range 5-95/spl deg/C.     

A technique to improve the drive current of high-voltage I/O transistors in digital CMOS technologies

By combining a 0.12-/spl mu/m-long 1.2-V thin-oxide transistor with a 0.22-/spl mu/m-long 3.3-V thick-oxide transistor in a 0.13-/spl mu/m CMOS process, a composite MOS transistor structure with a drawn gate length of 0.34 /spl mu/m is realized. Measurements show that at V/sub GS/=1.2 V and V/sub DS/=3.3 V, the composite transistor has more than two times the drain current of the minimum channel length (0.34 /spl mu/m) 3.3-V thick-oxide transistor, while having the same breakdown voltage (V/sub BK/) as the thick-oxide transistor. Exploiting these, it should be possible to implement 3.3-V I/O transistors with better combination of drive current, threshold voltage (V/sub T/) and breakdown voltage in conventional CMOS technologies without adding any process modifications.     

Reliability investigation of 0.07-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel

The authors have investigated the reliability performance of G-band (183 GHz) monolithic microwave integrated circuit (MMIC) amplifiers fabricated using 0.07-/spl mu/m T-gate InGaAs-InAlAs-InP HEMTs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel on 3-in wafers. Life test was performed at two temperatures (T/sub 1/ = 200 /spl deg/C and T/sub 2/ = 215 /spl deg/C), and the amplifiers were stressed at V/sub ds/ of 1 V and I/sub ds/ of 250 mA/mm in a N/sub 2/ ambient. The activation energy is as high as 1.7 eV, achieving a projected median-time-to-failure (MTTF) /spl ap/ 2 /spl times/ 10/sup 6/ h at a junction temperature of 125 /spl deg/C. MTTF was determined by 2-temperature constant current stress using /spl Delta/G/sub mp/ = -20% as the failure criteria. The difference of reliability performance between 0.07-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with pseudomorphic In/sub 0.75/Ga/sub 0.25/As channel and 0.1-/spl mu/m InGaAs-InAlAs-InP HEMT MMICs with In/sub 0.6/Ga/sub 0.4/As channel is also discussed. The achieved high-reliability result demonstrates a robust 0.07-/spl mu/m pseudomorphic InGaAs-InAlAs-InP HEMT MMICs production technology for G-band applications.     

Performance improvement of 1.52 /spl mu/m (Ga,In)(N,As)/GaAs quantum well lasers on GaAs substrates

(Ga,In)(N,As)/GaAs single quantum well lasers have been grown by molecular beam epitaxy. Room temperature pulsed operation at a wavelength of 1515 nm is achieved. As-cleaved 1000 /spl mu/m-long lasers have a threshold current density of 4.06 kA/cm/sup 2/ and a slope efficiency of 0.075 W/A per facet.