氮气流量对玻璃衬底上低温沉积GaN薄膜结晶性的影响

采用电子回旋共振-等离子体增强金属有机物化学气相沉积（ECR-PEMOCVD）技术,在康宁7101型普通玻璃衬底上沉积了高度c轴择优取向的多晶GaN薄膜. 利用反射高能电子衍射（RHEED) , X射线衍射 (XRD) 对样品进行检测,研究了在低温（430℃）沉积中氮气流量对GaN薄膜结晶性的影响. 并且利用原子力显微镜 (AFM) 和室温光致发光 (PL) 谱研究了薄膜的表面形貌和发光特性,发现薄膜表面形貌较为平整,其发光峰由较强的紫外近带边发光峰和极其微弱的绿光发光峰组成.     

形貌可控的CdS微米/纳米结构的表征和发光性能(英文)

利用简单的热蒸发CdS粉末方法,可合成出高质量的CdS微米柱。通过调控Si衬底上Au膜的厚度,能够大面积合成出尺寸均一的CdS纳米带和纳米棒。系统地研究了所合成样品的相、微结构和光致发光特性。室温下样品的发光结果表明可在所合成CdS微米柱上观察到位于约512 nm对应于其带隙的强发光峰。与CdS微米柱不同的是,可在所合成的CdS纳米带和纳米棒样品上分别观测到位于约521和543 nm,528和550 nm处对应于带边附近的发射强峰。并且,所合成的CdS纳米带和纳米棒展现出位于约710和712 nm位置处的宽峰,该峰的出现与结构缺陷、离子缺陷或杂质有关。与CdS纳米带的发光性能相比,所合成的CdS纳米棒表现出增强的发光性能。     

厚度与带隙可调、原子层沉积的超薄五氧化二钒纳米晶薄膜

利用原子层沉积方法制备V_2O_5纳米片晶薄膜.薄膜厚度可以被精确控制,并对纳米晶V_2O_5薄膜的结构形貌、光学带隙和拉曼振动有显著影响.原子层沉积过程中V_2O_5薄膜生长的两个阶段导致薄膜具有两个光学带隙,这将有助于理解超薄薄膜生长与功能应用.     

生长时间对氧化锌纳米棒发光性能的影响

为了研究氧化锌纳米棒的生长机理,先用脉冲激光沉积方法在玻璃衬底上制备一层氧化锌薄膜作为种子层,然后用水热法在种子层上生长氧化锌纳米棒,研究了不同反应时间对其结构、形貌及发光特性的影响。利用X射线衍射仪和扫描电子显微镜测定样品的结构和形貌,用自组建的光致发光系统对样品的光致发光光谱进行了测量。结果表明,氧化锌纳米棒沿c轴高度取向并呈六角纤锌矿结构;随着生长时间的增加,氧化锌纳米棒结晶质量明显改善,纳米棒均匀、致密性和取向性均提高,样品的缺陷发光增强而激子发光减弱。     

厚度与带隙可调、原子层沉积的超薄五氧化二钒纳米晶薄膜（英文）

利用原子层沉积方法制备V_2O_5纳米片晶薄膜.薄膜厚度可以被精确控制,并对纳米晶V_2O_5薄膜的结构形貌、光学带隙和拉曼振动有显著影响.原子层沉积过程中V_2O_5薄膜生长的两个阶段导致薄膜具有两个光学带隙,这将有助于理解超薄薄膜生长与功能应用.     

Zn-ZnO纳米结构的制备及退火条件对其光学性能的影响

用电化学沉积方法在Si衬底上制备出Zn-ZnO纳米结构,并在空气中不同温度的条件下对其进行退火处理.分别用X射线衍射仪、扫描电子显微镜和荧光光度分光计对所得样品进行表征.通过对测试结果的分析和讨论发现,退火过程改变了Zn-ZnO纳米结构的物相、结构和晶体质量,进而改变了它的荧光性能.重点关注退火过程对样品紫外荧光峰的影响,并通过高斯拟合揭示了各条件下紫外荧光峰的发光机理.通过比较,800℃的退火条件能明显改善Zn-ZnO纳米结构的表面形貌和晶体质量,显著增强其紫外荧光峰的强度.     

沉积温度对纳米ZnO薄膜的结构和光电性能的影响

采用阴极电沉积的方法,用ZnCl2的二甲基亚砜溶液做电解液,在导电玻璃上制备了纳米ZnO薄膜.研究了沉积温度对薄膜结构特性和光电性能的影响.XRD分析表明,ZnO薄膜为纤锌矿结构,电解液温度的升高能促进纳米ZnO薄膜的(002)面(c轴)择优取向的程度.随着电解液温度的升高,薄膜的禁带宽度和面电阻减小.光学测试表明样品的透射率可高达80%以上,电学测试表明样品的面电阻值最小可达7.57×104 Ω/□.AFM显示电解液温度对ZnO晶粒形貌及晶粒大小的影响很大.     

氧化锡纳米线的光致发光性能分析

通过热蒸发沉积法在常压、900°C高温条件下,合成了氧化锡纳米线结构。利用扫描电子显微镜、透射电子显微镜及选区电子衍射对样品的表面形貌和微结构进行了表征,X射线衍射、傅里叶变换红外光谱进一步证明所制纳米结构为金红石型氧化锡单晶结构。在77K和300K温度条件下,研究了所制氧化锡纳米线及其在氧气气氛中退火后的光致发光性能。     

溶液浓度对ZnO纳米棒形貌和发光的影响

为了获取高质量、高取向排列规则的ZnO纳米棒,玻璃衬底预先用脉冲激光沉积方法制备一层ZnO薄膜作为籽晶层,应用水热法在玻璃衬底上生长ZnO纳米棒。探究了籽晶层及不同溶液浓度对ZnO纳米棒结构和发光的影响,用扫描电子显微镜和X射线衍射仪测量样品的形貌和结构,用组建的光致发光测试系统对样品的室温光致发光光谱进行测定。结果表明,ZnO纳米棒具有高度取向且分布致密均匀;光致发光光谱显示ZnO的近带边发射比深能级发光略低;随着溶液浓度的增加,近带边发光和深能级发光相对强度的比值依次降低。     

在硅片上电沉积不同形貌的ZnO纳米结构的研究

采用简单的电化学沉积方法,通过调节电解液浓度和pH值,在硅衬底上实现了ZnO纳米结构的形貌控制。通过X射线衍射、扫描电镜和光致发光谱等表征手段对不同形貌的ZnO纳米结构进行了研究。研究发现,通过调节沉积条件,可以获得纳米棒、纳米簇丛和纳米片等不同形貌的ZnO纳米结构。其中,溶液pH值是纳米ZnO从一维结构到二维结构转变的关键因素。当pH值为12时,所获得的纳米ZnO为二维片状结构。光致发光谱显示二维ZnO纳米片的紫外本征峰相对于一维ZnO纳米棒发生了明显的蓝移,并且可见区的发光峰大大降低。这一结构将在光电器件、传感器等领域有很好的应用前景。     

Synthesis and photoluminescence properties of CdS hollow nanospheres by chemical vapor deposition

High-density CdS hollow nanospheres are successfully synthesized by a simple chemical vapor deposition technology.The crystal structure,compositional information,and morphological structure are characterized by X-ray diffraction(XRD),scanning electronic microscopy(SEM),transmission electronic microscopy(TEM),and energy-dispersive X-ray spectrometer(EDX).The results show that the as-prepared CdS hollow nanospheres have uniform size about 1-3 μm in diameter.The Kirkendall phenomenon is proposed for the formation of the CdS nanostructures.A strong emission located at 580 nm is observed.     

Ethylene glycol assisted hydrothermal synthesis of graphene sheets supporting CdS nanospheres for quenched photoluminescence

In this paper, we report the obtention of graphene–cadmium sulfide (G/CdS) nanocomposites were successfully synthesized by the ethylene glycol assisted hydrothermal method. The structure and composition of the obtained nanocomposites were confirmed by means of X-ray diffraction (XRD), scanning electronic microscopy (SEM), transmission electron microscopy (TEM), Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and photoluminescence (PL) measurements. XRD patterns showed that the CdS nanospheres belong to hexagonal structure. SEM and TEM images suggested a homogeneous distribution of CdS nanospheres coated on the graphene sheets successfully. FT-IR and XPS analyses indicated that GO has been simultaneously reduced to graphene nanosheets during the deposition of CdS nanocomposite. Moreover, PL investigations demonstrated that the G/CdS nanocomposites displayed significant decrease in PL emission compared with the corresponding sphere-like CdS nanoparticles. The investigation gave a promise to the development of original yet highly efficient graphene oxide-based novel electrode material in optical detectors.     

UHV/CVD法生长硅基低位错密度厚锗外延层

采用超高真空化学气相淀积系统,以高纯Si2 H6和GeH4作为生长气源,用低温缓冲层技术在Si(001)衬底上成功生长出厚的纯Ge外延层.对Si衬底上外延的纯Ge层用反射式高能电子衍射仪、原子力显微镜、X射线双晶衍射曲线和Ra-man谱进行了表征.结果表明在Si基上生长的约550nm厚的Ge外延层,表面粗糙度小于1nm,XRD双晶衍射曲线和Ra-man谱Ge-Ge模半高宽分别为530'和5.5cm-1,具有良好的结晶质量.位错腐蚀结果显示线位错密度小于5×105cm-2可用于制备Si基长波长集成光电探测器和Si基高速电子器件.     

铁电微管的制备与表征

采用化学浸润法在多孔硅模板上制备了锆钛酸铅(PbZr0.52Ti0.48O3,PZT)铁电微管,X射线衍射分析表明铁电微管为钙钛矿结构.运用扫描电子显微镜和原子力显微镜对铁电微管的微现形貌进行了观察,其姑果显示两种方法所测得的铁电微管直径不同.利用压电响应力显微镜观察到了铁电微管的电畴图像,并测得了铁电微管的微区电滞回...     

Selective Atmospheric Pressure Chemical Vapor Deposition Route to CdS Arrays,Nanowires, and Nanocombs

CdS arrays, nanowires, and nanocombs were selectively prepared through an atmospheric pressure chemical vapor deposition (APCVD) process with CdCl₂ and S as sources. The morphologies could be controlled by adjusting the deposition position, the temperature, and the flux of the carrier gas. The phase structure, morphologies, and photoluminescence properties of the CdS products were investigated by X‐ray diffraction (XRD), scanning electron microscopy (SEM), high‐resolution transmission electron microscopy (HRTEM), and photoluminescence (PL) spectra. The formation mechanism of the nanowires is discussed on the basis of the experimental results. The adopted synthetic route is expected to be applied in the synthesis of other metal sulfide one‐dimensional (1D) nanostructures.     

工作压强和退火温度对SiC薄膜结构的影响

用双射频共溅射和溅射后退火的方法在单晶Si(111)衬底上制备了SiC薄膜。利用X射线衍射仪(XRD)、扫描电镜(SEM)及原子力显微镜(AFM)分析了样品的物相组成、形貌和结构。研究发现,此种方法制备得到8H-SiC薄膜,在1.5～3Pa时增大工作压强有利于SiC薄膜退火之后结晶,同时薄膜沉积速率降低,使生长变致密,粗糙度减小,薄膜表面趋于平滑。对SiC薄膜进行850、1000、1150℃退火,结果表明,适当升高退火温度有利于提高薄膜的结晶质量和晶化程度,提高薄膜的致密度,降低薄膜中的缺陷密度。     

二氧化硅纳米花的制备及发光特性研究

采用磁控溅射和化学气相沉积技术制备出二氧化硅纳米花。利用扫描电子显微镜(SEM),X射线光电子能谱(XPS)和傅里叶红外吸收谱(FTIR)对上述纳米结构进行结构表征。用荧光光谱仪(PL)对其光致发光特性进行了研究。结果表明在激发波长为325nm时,在394nm处出现一个发光峰,表现出良好的发光特性。     

Texture and microstructure of thin copper films

Microstructure is an important factor influencing the reliability of thin film interconnects. The microstructure of copper films is of particular interest because of its use in numerous electronic applications. Pole figure x-ray diffraction and transmission electron microcopy were conducted on copper films deposited by several techniques: sputtering, partially ionized beam deposition, chemical vapor deposition, evaporation, and electroplating. Quantitative texture data are determined from fiber texture plots. A typical copper film consists of three texture components: (111), (200), and random. (220) and (511) texture components are possible under some deposition conditions. Compared to aluminum films, the fraction of the random texture component and the distribution of the (hkl) components in copper films are relatively large. Bimodal grain size distributions are observed in some films.     

Thickness dependent physical properties of chemically deposited nanocrystalline MgSe thin films deposited at room temperature by solution growth method

Chemical bath deposition method has been employed to deposit nanocrystalline magnesium selenide thin films of thickness 104–292 nm onto glass substrates at room temperature. The deposition bath consists of magnesium chloride, triethanolamine (TEA) and selenium dioxide. The as deposited films were characterized by X-ray diffraction, scanning electron microscopy (SEM), atomic force microscopy (AFM), optical absorption, electrical resistivity and thermo-emf measurements. The X-ray diffraction (XRD) studies revealed that the crystallinity of the magnesium selenide thin film increases with thickness. SEM studies reveal that MgSe films exhibit uniform distribution of round shaped grains over the entire substrate surface.The optical band-gap and electrical resistivity of MgSe film decrease as the film thickness increases. Such type of dependence is attributed to the quantum size effect that is observed in nanocrystalline semiconductors.The thermo-emf measurement confirms its p-type conductivity.     

A Study on Sputtered Bi-Te Thermoelectric Films with Various Compositions: Microstructure Evolution and the Effects on Thermoelectric and Electrical Properties

This study examined the sensitive effects of composition on the microstructure evolution and thermoelectric properties of sputtered Bi-Te films. Bi-Te films of various Te compositions (49 at.% to 60 at.%) were grown by cosputtering deposition and annealed at 200°C for different durations. We examined the microstructure of the films using x-ray diffraction (XRD) and transmission electron microscopy (TEM), and measured the electronic transport and thermoelectric properties. As the Te composition of the films changed from 49 at.% to 60 at.%, the phase of the as-sputtered film changed from the rhombohedral BiTe-type phase to the metastable rock-salt phase, which eventually transformed to the Bi₂Te₃-type phase upon annealing, instigating microstructure evolution. This phase transformation profoundly influenced the electrical and thermoelectric properties of the films.