Plasma assisted degradation of phenol solutions

Solutions of 2-chlorophenol, 4-chlorophenol and 2,6-dichlorophenol in bidistilled and water from the river Danube were treated in plasma reactor. In this reactor, based on coaxial dielectric barrier discharge at atmospheric pressure, plasma is formed over a thin layer of treated water. After one pass through the reactor, starting chlorophenols concentration of 20 mg/l was diminished up to 95%. Kinetics of the chlorophenols degradation was monitored by High Pressure Liquid Chromatography method (HPLC).     

Decolorization of reactive textile dyes using water falling film dielectric barrier discharge

Decolorization of reactive textile dyes Reactive Black 5, Reactive Blue 52, Reactive Yellow 125 and Reactive Green 15 was studied using advanced oxidation processes (AOPs) in a non-thermal plasma reactor, based on coaxial water falling film dielectric barrier discharge (DBD). Used initial dye concentrations in the solution were 40.0 and 80.0 mg/L. The effects of different initial pH of dye solutions, and addition of homogeneous catalysts (H₂O₂, Fe²⁺ and Cu²⁺) on the decolorization during subsequent recirculation of dye solution through the DBD reactor, i.e. applied energy density (45-315 kJ/L) were studied. Influence of residence time was investigated over a period of 24 h. Change of pH values and effect of pH adjustments of dye solution after each recirculation on the decolorization was also tested. It was found that the initial pH of dye solutions and pH adjustments of dye solution after each recirculation did not influence the decolorization. The most effective decolorization of 97% was obtained with addition of 10 mM H₂O₂ in a system of 80.0 mg/L Reactive Black 5 with applied energy density of 45 kJ/L, after residence time of 24 h from plasma treatment. Toxicity was evaluated using the brine shrimp Artemia salina as a test organism.     

Surface modification of materials by dielectric barrier discharge deposition of fluorocarbon films

Dielectric barrier discharges have been used to deposit fluorocarbon (FC) films on various materials, such as paper, glass, and silicon substrates. The primary monomers used for plasma polymerization were difluoromethane (CH₂F₂), octafluoropropane (C₃F₈), and octafluorocyclobutane (C₄F₈). FC films were characterized using Fourier transform infrared spectroscopy, atomic force microscopy, static contact angle measurements, and scanning electron microscopy. Surface and structural properties of deposited films are strongly dependent on the plasma compositions and plasma parameters. FC films deposited on paper are to enhance its barrier properties and to achieve hydrophobic surfaces. Contact angle studies reveal that a minimum FC film thickness of about 200 nm on paper is required to completely cover surface and near-surface fibers, thereby providing the paper with long term hydrophobic character. In the C₃F₈ and C₄F₈ systems, the contact angles of the deposited films do not change appreciably with plasma parameters and are strongly dependent on the substrate roughness. Hydrogenated FC films deposited with CH₂F₂ plasmas show the relatively low contact angles due to the existence of CH_X (x = 1-3) groups.     

介质阻挡放电照相机理的研究

讨论了介质阻挡放电照相的物理过程,并建立了相应数学模型。在此基础上得出了介质阻挡放电照相的衬度曲线,以此探讨了介质阻挡放电照相的机理,并用实验对此进行了验证。论文工作是对Kirlianphotography和coronadischargephotography的完善和发展。     

Removal of ammonia from gas streams with dielectric barrier discharge plasmas

We reported on the experimental study of gas-phase removal of ammonia (NH3) via dielectric barrier discharge (DBD) at atmospheric pressure, in which we mainly concentrated on three aspects--influence of initial NH3 concentration, peak voltage, and gas residence time on NH3 removal efficiency. Effectiveness, e.g. the removal efficiency, specific energy density, absolute removal amount and energy yield, of the self-made DBD reactor had also been studied. Basic analysis on DBD physical parameters and its performance was made in comparison with previous investigation. Moreover, products were detected via ion exchange chromatography (IEC). Experimental results demonstrated the application potential of DBD as an alternative technology for odor-causing gases elimination from gas streams.     

Localized material growth by a dielectric barrier discharge

In this paper, we have reported a localized material growth method by dielectric barrier discharge (DBD) in a mixture of acetylene and argon. We found that, in the discharge, plasma polymerization takes place and the material growth rate is much higher along the discharge filaments than it is in other locations. Three layers of material, which correspond to three modes of discharge, are observed after the plasma polymerization. One layer is homogeneous, which corresponds to a glow-like discharge. The second layer is made of small and dense columns, which can be seen only under microscope, and this layer of material's growth corresponds to a corona-like discharge. The third layer is made of a few bigger columns, which can be seen visually, and they are grown along patterned discharge streamers. By scanning electron microscope (SEM), we see that the bigger columns are made of small ball-like material with the diameter of approximately 0.1 μm. A Fourrier transfer infra-red (FTIR) spectrum of the deposited material is also shown to confirm the polymerization.     

大气压不同脉冲上升时间的介质阻挡放电仿真研究

脉冲介质阻挡放电在等离子体领域具有良好的应用前景,研究脉冲激励参数对等离子的获取具有重要意义。对此,本文建立了二维的板-板介质阻挡放电简化模型,外施脉冲激励,仿真模拟了单个脉冲周期内,脉宽恒定为600 ns,四种不同脉冲上升时间T=25、50、75、100 ns下的气体间隙内电子密度、电子温度及电势分布情况。仿真数据显示:随着上升时间延长,最大电子密度、平均电子密度以及最大电子温度三者的峰值点对应时刻较上升沿末端均近似一致,且三者峰值都与上升时间呈反比;放电进入下降沿尾端后,空间电势发生反转现象,电势在近阳极减小、近阴极增大,自阴极向阳极递减,不同上升时间下,电势反转初始时刻对应的脉冲电压值和阴极附近最大电势值都接近。     

不同激励参数对DBD等离子体放电功率的影响

为探索DBD等离子体放电功率与各激励参数之间的联系,本文建立了二维的板-板电极简化仿真模型,分别研究了脉冲、正弦交流两种激励的放电频率、电压与放电功率间的具体函数关系。仿真结果显示：一定条件下,放电功率正比于脉冲电压峰值的1.381次方、正比于脉冲放电频率的1.097次方,即放电功率与脉冲电压峰值及脉冲放电频率间均有幂函数关系;放电功率与正弦交流电压幅值呈现指数函数关系,放电功率与正弦交流放电频率间近似线性关系;实际工程中,需要增大DBD等离子体放电功率时,应尽量选用提高电压峰值（幅值）,而避免选择提高放电频率。     

Metal surface oxidation by using dielectric barrier discharge

The surface oxidation of metal is investigated through plasma treatments with an atmospheric-pressure dielectric barrier discharge (DBD) for comparison with a conventional thermal oxidation process. After the plasma treatment of a copper plate, the Cu surface was noted to have abundant CuO and Cu(OH)₂ which act the part of hydrophilic functional elements. Highly improved wettability was also noted. When a greater amount of atomic oxygen is generated in the plasma by the DBD at a high applied voltage and a high O₂ additive concentration, the hydrophilic functional elements become more abundant and therefore enhance the wettability of the oxidized surface.     

Effect of O2 on NO removal by ammonia radical injection using one-cycle sinusoidal power source

NO reduction experiment was performed by injecting ammonia radicals, which were externally generated by flowing the NH₃ gas diluted with Ar gas through a dielectric barrier discharge with a one-cycle sinusoidal-wave power source. The discharge was intermittently formed between coaxial cylindrical electrodes with a space of 1.5 mm at an applied peak-to-peak voltage of 3-25 kV. The generated radicals were injected into simulation gas (NO/O₂/N₂). The simulation gas contained 0-5.6% O₂, and the effect of O₂ on NO_x removal was discussed. The minimum reaction temperature for NO reduction was low when simulation gas contained O₂. High O₂ concentration (O₂=5.6%) in simulation gas, high repetition rate to NH₃, and high applied power to NH₃ decreased NO removal efficiency.     

Studies on the removal of arsenic (III) from water by a novel hybrid material

The present work provides a method for removal of the arsenic (III) from water. An ion-exchanger hybrid material zirconium (IV) oxide-ethanolamine (ZrO-EA) is synthesized and characterized which is subsequently used for the removal of selective arsenic (III) from water containing 10,50,100 mg/L of arsenic (III) solution. The probable practical application for arsenic removal from water by this material has also been studied. The various parameters affecting the removal process like initial concentration of As (III), adsorbent dose, contact time, temperature, ionic strength, and pH are investigated. From the data of results, it is indicated that, the adsorbent dose of 0.7 mg/L, contact time 50 min after which the adsorption process comes to equilibrium, temperature (25 ± 2), solution pH (5-7), which are the optimum conditions for adsorption. The typical adsorption isotherms are calculated to know the suitability of the process. The column studies showed 98% recovery of arsenic from water especially at low concentration of arsenic in water samples.     

A cold plasma cross made of three bullet-like plasma plumes

In contrast to other atmospheric pressure plasma jets, two perpendicular jet-like plasmas generated in ambient air by a special designed plasma device are reported. High-speed photographs taken by an ICCD camera with exposure time of 2 ns show that the horizontal part of the plasma is actually ignited by the vertical part of the plasma. Both the vertical and horizontal parts of the plasma are in fact a small bullet like volume of plasma traveling along different directions at high velocities. The horizontal plasma volume velocity is about half of the vertical plasma volume velocity at the same instant.     

空气中大气压下低温等离子体对聚四氟乙烯进行表面改性的研究

建立了空气中产生大气压下辉光放电 (APGD)和介质阻挡放电 (DBD)的装置 ,通过放电的电气特性和发光特性测量 ,界定了APGD和DBD的放电特点。研究了空气中APGD和DBD对聚四氟乙烯 (PTFE)表面进行改性的效果 ,用扫描电子显微镜 (SEM)观察、接触角测量和X射线光电子能谱分析 (XPS)等手段 ,研究APGD和DBD处理后PTFE的表面特性 ,并解释了两种放电形式处理效果不同的原因。结果表明 :APGD的处理效果要优于DBD ,即APGD可以对PTFE表面进行均匀处理 ,在其表面引入更多的O元素 ,使其接触角下降到更低值。     

介质阻挡放电离子源背景噪声抑制方法数值模拟研究

针对单电极介质阻挡放电离子源(DBDI)的外置金属网抑制环境背景噪声技术,采用二维等离子体流体模型进行了数值模拟研究。通过对比施加金属网前后单电极DBDI低温等离子体羽流(LTPP)中各物种的演化发展特性,给出了金属网孔隙参数在调控LTPP效能方面的一般规律。结果表明,金属网通过显著提高DBDI等离子体羽流的亚稳态离子总量并抑制背景杂质离子,从而提升其软电离效果和质谱检测信噪比。特别地,当金属网孔隙为0.5 mm时,亚稳态离子总量占比提高了约5.3倍;各离子密度峰值降低了3倍以上,而He^*、N₂^*的密度峰值则分别增大了7.86倍和2.31倍。随着金属网孔隙不断减小,亚稳态离子总量占比越高,但当孔隙为0.3 mm时,亚稳态离子总量开始减小;在0.3 mm≤g≤0.4 mm范围内,可获得更好的背景离子抑制效果,从而有效抑制背景噪声影响。     

Oxygen plasma treatment of SiOxCy(− H) films polymerized by atmospheric pressure dielectric barrier discharge using hexamethylcyclrotrisiloxane

The SiO₂-like layers were obtained by plasma-oxidation of the SiO_xC_y(− H) films deposited from hexamethylcyclotrisiloxane (HMCTSO) with helium and oxygen. The SiO₂-like layers were formed on as-deposited SiO_xC_y(− H) films within a second by oxidation using the He/O₂ atmospheric pressure dielectric barrier discharge (APDBD). The elemental ratio of oxygen to silicon in the layer was increased up to 1.95 which is closed to stoichiometry of SiO₂. The elemental composition and surface morphology were studied by means of x-ray photoelectron spectroscopy and atomic force microscopy. Wettability of the oxidized thin films was investigated by water droplet contact angle measurement. The contact angle of SiO_xC_y(− H) films are decreased from 63° to below 10° within a second by oxidation. Correlation between the elemental composition and the contact angle were discussed. The effects of oxidation duration and discharge generation voltage on the composition and surface morphology of the film were investigated.     

Removal of arsenic from water streams: an overview of available techniques

Arsenic poisoning has become one of the major environmental worries worldwide, as millions of people, which have been exposed to high arsenic concentrations (through contaminated drinking water), developed severe health problems. The high toxicity of this element made necessary the enforcement of stringent maximum allowable limits in drinking water. So, the development of novel techniques for its removal from aqueous streams is a very important issue. This paper offers an overview of geochemistry, distribution, sources, toxicity, regulations and applications of selected techniques for arsenic removal. The contribution briefly summarizes adsorption processes and mechanism of arsenic species removal from water streams by means of iron oxide/oxyhydroxide based materials. Sorption capacities of various sorbents (e.g. akaganeite, goethite, hydrous ferric oxide, iron oxide coated sand, Fe(III) loaded resin, granular ferric hydroxide, Ce(IV) doped iron oxide, natural iron ores, iron oxide coated cement, magnetically modified zeolite, Fe-hydroxide coated alumina) have been compared.     

超滤技术用于饮用水、工业用水及废水处理

在世界范围内，膜技术越来越多地用于满足高质量供水的需求．由于饮用水中难以杀灭的，而又致命的细茵的历史性的爆发，人们发现膜可以作为去除这些细菌和病毒的安全屏障，从而被广泛用于引用水生产和供应．在废水处理领域，膜可以用于分离废水中的悬浮颗粒和物质，通过膜技术深度处理后的水可以回用．文章对超滤膜在饮用水、工业用水及废水回用方面的应用情况进行了综述．     

The effects of permittivity and thickness of dielectric layers on micro dielectric barrier discharges

The discharge characteristics of a plasma display panel (PDP) cell are investigated by two-dimensional fluid simulation and experiment in order to analyze the effects of permittivity and thickness of dielectric layers. Four-inch test panels having the same cell size as a 50-inch FHD (full high definition) resolution were fabricated to measure static margin, luminance, power consumption, and luminous efficacy. As the dielectric permittivity decreases and the dielectric thickness increases, firing voltage increases, but luminous efficacy increases due to the decreases of power consumption. It was observed that the luminous efficacy increases by 30% in the case of relative permittivity ε_r = 7 and dielectric thickness d = 25 µm compared with the case of ε_r = 12 and d = 35 µm.     

Laboratory based approaches for arsenic remediation from contaminated water: recent developments

Arsenic contamination in water has posed severe health problems around the world. In spite of the availability of some conventional techniques for arsenic removal from contaminated water, development of new laboratory based techniques along with enhancement and cost reduction of conventional techniques are essential for the benefit of common people. This paper provides an overview of the arsenic issue in water such as modes of contamination of ground water as well as surface water by arsenic, its metabolism and health impacts, factors influencing arsenic poisoning, fundamentals of arsenic poisoning mechanism and world scenario of arsenic poisoning. It discusses and compares the conventional laboratory based techniques, like precipitation with alum, iron, Fe/Mn, lime softening, reverse osmosis, electro dialysis, ion exchanges, adsorption on activated alumina/carbon, etc., for arsenic removal from contaminated water. It also discusses the best available techniques and mentions the cost comparison among these techniques too. Recent developments in the research on the laboratory based arsenic removal techniques, like improvement of conventional techniques and advances in removal technology along with its scopes and limitations have also been reviewed.     

膜混凝反应器除砷

用国产中空纤维膜组件,研究膜混凝反应器小试规模条件下的除砷效果.结果表明:膜混凝反应器的除砷效果良好,砷的去除率高达92.8%～98.2%,可使原水中As(V)的浓度从100 μg/L左右降至10μg/L以下,出水平均舍砷4.40μg/L,完全满足城市供水水质标准的要求;膜污染是导致膜比通量下降的主要原因,铁盐对膜污染的贡献较小,膜污染主要是有机物污染,占总量的67.2%;通过物理清洗和化学清洗可使膜比通量恢复到新膜的87.8%.