Ultralow-voltage boron-doped diamond field emitter vacuum diode

A boron-doped diamond field emitter diode with ultralow turn-on voltage and high emission current is reported. The diamond field emitter diode structure with a built-in cap was fabricated using molds and electrostatic bonding techniques. The emission current versus anode voltage of the capped diamond emitter diode with boron doping, sp² content, and vacuum thermal electric (VTE) treatment shows a very low turn-on voltage of 2 V. A high emission current of 1 μA at an anode voltage of less than 10 V can be obtained from a single diamond tip. The turn-on voltage is significantly lower than comparable silicon field emitters     

Enhancement of electron emission efficiency and stability ofmolybdenum-tip field emitter array by diamond like carbon coating

The effect of diamond like carbon (DLC) films, coated by a layer-by-layer technique using PECVD (plasma enhanced chemical vapor deposition) on the electron emission characteristics of molybdenum (Mo)-tip field emitter array (FEA) is examined. The turn-on voltage was lowered from 80 V for the Mo-tip to 65 V for the DLC-coated Mo-tip FEA while the maximum emission current was increased from 140 μA for the Mo-tip to 320 μA for the DLC-coated Mo-tip FEA composed of 900 emitters. For an anode current of 0.1 (μA/emitter) the gate voltage for the DLC-coated Mo-tip FEA and Mo-tip FEA was about 87 and 107 V, respectively. It was also confirmed that the emission current of a DLC-coated Mo-tip FEA was more stable than that of a Mo-tip FEA     

A novel fabrication process of a silicon field emitter array withthermal oxide as a gate insulator

We have successfully developed a fabrication process of a silicon field emitter array with a gate insulator formed by Si₃N₄ sidewall formation and subsequent thermal oxidation. This process overcomes some problems in the conventional fabrication, such as high etch rate, low breakdown field, and gate hole expansion arising from evaporation of gate oxide. Therefore, we could improve process stability and emission performance, and also reduce gate leakage current. The optimum process conditions were determined by process simulations using SUPREM-4. The turn-on voltage of the fabricated field emitters was approximately 38 V. An anode current of 0.1 μA (1 μA) per tip was measured for a 625-tip array at the gate bias of 80 V (100 V), and the gate current was less than 0.3% of the anode current at those emission levels     

In-situ vacuum-sealed lateral FEAs with low turn-on voltage andhigh transconductance

We have fabricated a new lateral field emitter array, in-situ vacuum-sealed, which exhibits a low turn on voltage and a high transconductance value without any additional vacuum sealing process. The vacuum-sealed lateral FEA (VLFEA) is encapsulated during the fabrication process, so that field emission characteristics can be measured without any additional vacuum environments. Experimental current-voltage (I-V) characteristics show that the anode current is field emission current obeying the linearity of the Fowler-Nordheim (F-N) plot. The experimental turn-on voltage of about 9 V is in good agreement with the extracted one from the F-N plot. In order to verify the integrity of the vacuum sealed micro-cavity, we have measured the anode current of the VLFEA both in a high vacuum chamber and in an atmospheric environment and found that the structure is well sealed. The anode currents as a function of gate voltage of the Mo-sealed VLFEA are analyzed and transconductance is extracted. The experimental results show that the VLFEA has superior field emission characteristics, such as low turn-on voltage and high transconductance, and does not require any additional troublesome vacuum sealing     

Effect of diamond-like carbon coating on the emissioncharacteristics of molybdenum field emitter arrays

We have studied the electron emission characteristics of Mo field emitter arrays (FEAs) using a diamond-like carbon (DLC) film deposited by a layer-by-layer technique using plasma enhanced chemical vapor deposition. The turn-on voltage was lowered from 55 to 30 V by a 20 nm thick hydrogen-free DLC coating and maximum emission current was increased from 166 to 831 μA. Also the gate voltage required to get the anode current of 0.1 (μA/emitter) decreases from 77 to 48 V. Furthermore, the emission current from DLC coated Mo FEAs is more stable than that of noncoated Mo FEAs     

Field-emission enhancement of Mo-tip field-emitted arrays fabricated by using a redox method

This work has improved the emission characteristics for Mo-tips of field-emitter array (FEA) through a reduction-oxidation (redox) process. The maximum emission current of the 1600 tips array significantly increased from 23.2 /spl mu/A to 2.36 mA with the turn-on voltage decreasing from 70 V to 48 V after the redox treatment. Scanning electron microscopy (SEM) and transmission electron microscopy (TEM) indicate that the main factor improving electron field emission characteristics for the Mo-tips is the increase in enhancement factor (/spl beta/) and, possibly, number of emission sites of Mo films.     

A new lateral field emission device using chemical-mechanicalpolishing

A polysilicon lateral field emission device using chemical-mechanical polishing (CMP) is proposed and experimental results on the first prototype are reported. In this method, dry oxidation process determines the interelectrode gap. Thus, it is relatively easy to form electrode gaps with dimensions less than 1 μm. Also, the process allows for good uniformity and reproducibility in controlling the interelectrode gap. The turn-on voltage of the fabricated device with interelectrode gap of 3500 Å is as low as 5.4 V and the emission current is as high as 9 μA at 9.3 V. From the Fowler-Nordheim (FN) equation, field emitting area (α) and field enhancement factor (β) are estimated to explain the low turn-on voltage and the high emission current. The emission current fluctuation is about ±4% for 25 min     

High current density Si field emission devices with plasmapassivation and HfC coating

A novel self-aligned process was developed to fabricate gated Si field emission devices. At a gate voltage of 100 V, the emission current from an array of 100 tips increased from 283 to 460 μA and the turn-on voltage decreased from 31 to 21 V after H₂ plasma passivation using an inductively coupled plasma (ICP) source for 2 min. The improvements correspond to a 1.28-eV reduction in the effective work function of the emitters and the instability of the emission current decreased from ±1,25 to ±0.25% after H₂ plasma passivation. Emitter tips were also coated with Mo silicide and HfC. The emission current increased from 230 μA for uncoated emitters to 268 μA for emitters coated with Mo silicide and 389 μA for emitters coated with HfC. The turn-on voltage decreased from 50 to 41 and 25 V while the breakdown voltage increased from 126 to 129 and 143 V when Mo silicide and HfC were used for coating, respectively, which correspond to reductions of 0.95 and 2.23 eV, respectively, in the effective work function of the emitters. Single emitter tips have similar emission characteristics as high-density field emitter arrays, indicating excellent emission uniformity from the arrays     

An empirical study of dynamic properties of an individual carbon nanotube electron source system

In this paper we present an empirical study of some dynamic properties of an individual carbon nanotube (CNT) field emission electron source system. We propose a circuit model that represents the CNT cathode to anode diode as a capacitor in parallel with a voltage-controlled variable resistor. The transient response of the CNT electron source system to the falling edge of a voltage step input was evaluated. For input voltages below the threshold voltage for field emission, the nanotube loop is effectively open and the circuit response is consistent with a discharging capacitor. On the other hand, for input voltages above field emission threshold, the nanotube loop conducts and now the capacitor discharges to a certain extent through the nanotube loop as well. Field emission current versus voltage data also shows that the resistance across the CNT cathode to anode diode varies as a function of applied voltage. Below turn-on voltage, the diode behaves as an open circuit (4 TΩ at the ammeter noise floor). Above turn-on voltage, resistance falls exponentially, as expected from the Fowler–Nordheim equation for cold field emission current. Experimental current–voltage data is presented for a simple emitter array consisting of two CNTs with equal lengths. Despite the similarity in their lengths the turn-on voltages of the nanotubes varied significantly, viz. 26 V versus 109 V. This large difference in the turn-on voltages can be attributed to tip imperfections. For advanced array applications such as high-throughput parallel e-beam lithography, in which precise dose control is necessary, the diode circuit model will be useful for controlling individually addressed nanotubes to account for dissimilar field emission properties. The model may also be applied to optimize the design of a SEM incorporating a single CNT electron source.     

Field Electron Emission from Diamond—like Carbon Films

A low turn-on field electron emission from diamond-like carbon films has been observed for the first time to author‘s knowledge,Carbon films were prepared by micowave plasma chemical vapor deposition(CVD).Special pretreatment ceramic substrates were used.The characteristics of the film have been identified by using X-ray diffraction(XRD),and Raman spectrum.The field emission experiment has been performed in a vacuum chamber with a base pressure of about 10^-5Pa.The turn-on field of 1.2V/μm,and the current density of 1.25 mA/cm^2 at electric field of 6V/μm were obtained.     

表面形貌特殊的碳纳米管薄膜及其场发射增强

采用磁控共溅射法在Si片表面镀NiTi膜作为碳纳米管生长的催化剂,制备出表面形貌特殊的碳纳米管薄膜,如"丘状"和"星状"的表面微结构。通过扫描电子显微镜对碳纳米管薄膜的形貌进行表征,采用二极管形式测试了碳纳米管薄膜的场发射性能。实验结果表明,这两种碳纳米管薄膜都具有优异的场发射性能,10μA/cm~2时的开启电场分别仅为1.02 V/μm和1.15 V/μm,在外加电场为2.4 V/μm时的电流密度分别达到4.32 mA/cm~2和6.88 mA/cm~2。通过场发射FN的曲线计算得到的场发射增强因子分别为10113和6840。这两种碳纳米管薄膜优异的场发射性能与其表面的微结构有关。表面的粗糙结构增强了部分碳纳米管的局域电场,易于发射电子。     

Ultra-Low-Voltage Schottky-Barrier Field-Enhanced Electron Emission From Gold Nanowires Electrochemically Grown in Modified Porous Alumina Templates

Superior field emission (FE) action has been observed from a tailored array of gold nanowires (AuNWs) grown in porous anodic alumina (PAA) templates. The turn-on voltage was found to be 0.2 V, which is far less than the values reported earlier for diamond-coated cathodes and carbon nanotubes (CNTs). Furthermore, the FE current was unaffected by the ambient gas pressure. Such a low-voltage FE is attributed here to the formation of a Schottky barrier at the interface of gold and amorphous alumina scales that remain on the AuNWs.     

Improvement of the field emission properties of carbon nanotubes by CNT/Fe_3O_4 composite electrophoretic deposition

A simple CNT/Fe_3O_4 composite electrophoretic deposition method to improve the field emission cathode properties of carbon nanotubes(CNTs) is proposed.It is found that CNT/Fe_3O_4 composite electrophoretic deposition leads to better field emission performance than that of single CNT electrophoretic deposition.The result is investigated using SEM,J-E and FE.After the process,the turn-on electric field decreases from 0.882 to 0.500 V/μm at an emission current density of 0.1 mA/cm~2,and the latter increase...     

锌衬底上直接生长密度可调的氧化锌纳米棒阵列和场发射特性

在锌衬底上制备了取向生长、形貌各异、不同密度的氧化锌纳米棒阵列.研究发现,氧化锌纳米棒在温度低于70℃、适量的碱性溶液、大气压下能够在锌衬底上大规模制备,并且氧化锌纳米棒的直径,在锌衬底上的密度和形貌完全依赖于氢氧化钠和硝酸锌的浓度.场发射测试表明:氧化锌纳米棒阵列开启电场较低(电流密度达1μA/cm2时场强仅为3.8 V/μm),显示了氧化锌纳米棒阵列在场发射方面的潜在应用.     

A novel in situ vacuum encapsulated lateral field emitter triode

We have designed and fabricated a novel lateral field emitter triode, which is in situ vacuum encapsulated so that any troublesome additional vacuum sealing process is not required. The device exhibits low turn-on voltage of 7 V, stable current density of 2 μA per tip, and high transconductance of 1.7 μS per 100 tips field emitter array at V_AC=22 V. An in situ vacuum encapsulation employing recessed cavities by isotropic RIE (reactive ion etch) method and an electron beam evaporated molybdenum vacuum seal are implemented to fabricate the new field emitter triode. The superb field emitter characteristics are probably due to sub-micron dimension device structure and the pencil type lateral cathode tip employing upper and lower LOCOS oxidation     

非晶氮化硼薄膜的场致电子发射研究

利用脉冲激光沉积 (PLD)技术在镀钛的陶瓷衬底上制备出了非晶态氮化硼薄膜 ,借助于X射线衍射(XRD)、扫描电子显微镜 (SEM )及Raman光谱分析了该薄膜的结构 ,并研究了薄膜场致电子发射特性 ,阈值电场为4 6V μm ,当电场为 9V μm时 ,电流密度为 5 0 μA cm2 。     

带电子聚焦的氧化锌场发射背光源

液晶显示需要低功耗、均匀度好的光源作为背光源。为了降低功耗,提高显示图像质量,未来的液晶显示需要实现对背光源进行时间与阵列调制。对比现有的液晶显示用背光源,研究制备了氧化锌场发射光源。该光源采用氧化锌纳米针作为场发射阴极,采用平面栅极作为门电极调制结构实现亮度的连续可调,通过带有氧化镁二次电子发射层的金属栅网对电子进行聚焦实现光源的均匀照度。实验结果表明,带电子聚焦的氧化锌场发射光源具有较低的开启场强(1.1V/μm),较小的电压调制区间(小于150V),较高的发光强度(大于1 000cd/m2),且基于电子聚焦结构的设计,实现了光源的均匀稳定照度,可以提高液晶显示的图像质量。带电子聚焦结构的氧化锌场发射光源,既可实现对发光的时间与阵列调制,同时能提高发光的均匀性,将可作为液晶显示的理想背光源。     

Tungsten oxide nanostructures:controllable growth and field emission

正Non-fully oxidized tungsten oxide(WO_(3-x)) nanostructures with controllable morphology were fabricated by adjusting the gas pressure in chemical vapor deposition.The comparative field emission(FE) measurements showed that the obtained W_(18)O_(49) nanowires have excellent FE property.The turn-on field was 7.1 V/μm for 10μA/cm~2 and the observed highest current density was 4.05 mA/cm~2 at a field of 17.2 V/μm.Good electron emission reproducibility was also observed during thermal evaporation and desorption testing.     

电泳法制备平栅极碳纳米管场发射阴极及场发射特性研究

采用电泳法在ITO玻璃基板上选择性制备了碳纳米管(CNTs)阴极薄膜,采用电子扫描(SEM)分析了CNTs薄膜的表面形貌,并测试了碳纳米管阴极的场致发射特性.结果表明,利用电泳法制得的碳纳米管阴极薄膜均匀性、致密性良好,且具有较大发射电流密度;通过控制共面栅控CNTs场发射阴极的栅极电位能够有效控制阴极的场发射电流密度...     

Field Emission From Hydrothermally Grown ZnO Nanoinjectors

An injector-like nanostructure of ZnO fabricated by hydrothermal method was tested for field emission (FE) properties. The turn-on field of 3.8 V/mum was obtained at a current density of 0.1 muA/cm². Above the turn-on field, the emission current density quickly raised up to 1 mA/cm² at about 12.8 V/mum. The field enhancement factor beta was estimated to be 2556 and 1226 in the low and high field regions, respectively. The two-slope FE behavior was attributed to the adsorbates and defects which were introduced in the fabrication process in aqueous solution at low temperature. The good FE properties of the ZnO nanoinjectors indicate that they are applicable as low-cost and low-temperature cathode materials for FE-based devices.