在线低能气体离子源

材料中氦和氢积累可引起材料性能的恶化甚至失效。为研究材料内氦和氢的存在形式、氦与氢及缺陷的相互作用、气泡的形成和演变过程以及各种因素的影响,建立一套离子束能量最高20keV的潘宁型气体离子源引出和聚焦系统,与200kV透射电镜联机,在离子注入现场原位观察氦和氢不同注入浓度下材料内部的微观结构及变化过程。对离子源进行氦离子的起弧、引出和聚焦测试。离子源在15–60mA放电电流范围内稳定地工作。在5×10–3Pa和1.5×10–2Pa工作气压下,放电电压约380V和320V。低气压下引出离子束流比高气压下大,且引出束流随放电电流和吸极电压的增加而增加。等径三圆筒透镜有显著聚焦作用,在距透镜出口150cm处,离子束流密度提高一个量级以上。能量10keV左右的氦离子获得束流密度约200nA·cm–2的离子束,可满足多种材料进行在线离子注入和原位电镜观测的需要。     

间热式大面积六硼化镧中空阴极

介绍了适用于强流离子源的间热式大面积六硼化镧中空阴极。在１５ｃｍ双潘宁离子湖泊 上放电特性研究表明，该阴极性能良好，能可靠工作，使用过程中多次暴露于大气中，发射性能并未变坏，加热功率为１．４５ｋＷ，ＬａＢ６发射电流密度为２０Ａ／ｃｍ＾２，放电电流４００Ａ，脉冲宽度３０ｍｓ，放电波形重复性很好。使用１００ｈ后，发射体尺寸无明显变化。     

Extraction Characteristics of Radio Frequency ICP Ion Source

An inductively coupled radio frequency ion source has been developed and its extraction characteristics measured. Beam current density up to 0.11 mA/ cm2 was obtained with argon at a rf discharge power of about 140 W. The dependences of ion beam on the discharge parameters such as rf source power, gas pressure and gas flow rate was studied.     

低能高束流氩离子源的结构及性能

离子源技术是等离子体研究中的一项重要内容,而低能大束流源则是离子源技术研究中的一个重要方向,因为这样的源在离子束刻蚀、离子束溅射镀膜以及荷能粒子与物质相互作用方面都有广泛的应用;本文采用空心阴极空心阳极结构,用热阴极电子发射弧放电驱动并用磁场约束产生等离子体,用曲面发射引出离子束,研制成了氩气放电溅射离子源;研究了灯丝加热电流、弧压对弧流的影响和弧流与工作气体压力对离子束引出的影响规律.离子源的引出电压在0-4.0 kV之间连续可调,最大引出束流为100 mA,束斑面积为φ6.0 cm,以Ti为溅射靶时的最大溅射沉积率为0.45 nm/s,离子源可连续工作160 h.     

真空弧离子源脉冲工作瞬间的放电行为

采用高速摄影和光谱诊断的方法研究了真空弧离子源脉冲工作瞬间的放电行为。拍摄了离子源放电瞬间吸氢电极上阴极斑的形成过程，分析了不同放电电流时阴极斑的发射光谱。实验结果表明，当脉冲工作电流为10^1—10^2A时，真空弧离子源放电区一般只有单个阴极斑，阴极斑的位置在同一次放电中的变化很小；较大的脉冲工作电流有利于提高阴极斑的温度，并最终导致氢离子浓度的增加，但也会使阴极材料的溅射更加严重，造成离子源等离子体品质下降。     

Influence of heating on the discharge characteristics of a hollow cathode

Hollow cathodes are widely used as electron sources and neutralizers in ion and Hall electric propulsion. Special applications such as commercial aerospace and gravitational wave detection require hollow cathodes with a very wide discharge current range. In this paper, a heater is used to compensate for the temperature drop of the emitter at low current. The self-sustained current can be extended from 0.6 to 0.1 A with a small discharge oscillation and ion energy when the flow rate is constant. This is also beneficial for long-life operation. However, when the discharge current is high(1 A), heating can cause discharge oscillation, discharge voltage and ion energy to increase. Further, combined with a rapid decline of pressure inside the cathode and an increase in the temperature in the cathode orifice plate, electron emission in the orifice and outside the orifice increases and the plasma density in the orifice decreases. This leads to a change in the cathode discharge mode.     

High Pressure Micro-Slot Hollow Cathode Discharge

A direct current glow discharge source structure operating at high pressure based on the micro-slot hollow cathode is presented in this article. A 100 μm width slot cathode was fabricated of copper, and a stable DC glow discharge with an area of 0.5 mm^2 was produced in noble gases （He, Ne） and air over a wide pressure range （kPa - 10 kPa）. The current-voltage characteristics and the near UV radiation emission of the discharge were studied.     

Analysis of Effects of the Arc Voltage on Arc Discharges in a Cathode Ion Source of Neutral Beam Injector

A hot cathode bucket ion source is used for the EAST(experimental advanced superconducting tokamak)neutral beam injector.The thermal electrons emitted from the surface of the cathode are extracted and accelerated by the electric field formed by the arc voltage,which is applied between the arc chamber of the ion source and the cathode.This paper analyzes the effects of arc voltage on the arc discharge in a hot cathode high current ion source.     

Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device

Plasma source is the most important part of the laboratory plasma platform for fundamental plasma experimental research. Barium oxide coated cathode plasma source is well recognized as an effective technique due to its high electron emission current. An indirectly heated oxide coated cathode plasma source has been constructed on a linear magnetized plasma device. The electron emission current density can reach 2 A/cm 2 to 6 A/cm ² in pulsed mode within pulse length 5–20 ms. A 10 cm diameter, 2 m long plasma column with density 10 ¹⁸ m ⁻³ to 10 ¹⁹ m ³ and electron temperature T_e ≈ 3–7 eV is produced. The spatial uniformity of the emission ability is less than 4% and the discharge reproducibility is better than 97%. With a wide range of the plasma parameters, this kind of plasma source provides great flexibility for many basic plasma investigations. The detail of construction and initial characterization of oxide coated cathode are described in this paper.     

Production of Multiply-Charged Ions of Ne, Ar, Kr and Xe by the Electron-Bonbarded Hot Cathode IoN Source of IPCR

Production of multiply-charged ions of Ne, Ar, Kr and Xe has been studied by use of an electron-bombarded hot cathode type ion source of the IPCR 160cm cyclotron, which is similar to Morozov's source. These multiply-charged ions were accelerated by a 3rd harmonics acceleration mode in the cyclotron and detected with a beam probe fixed at the radius of 55cm. Observed multiply-charged ions are Ne2+, Ne3+, Ne4+, Ne5+, Ar3+, Ar4+ Ar5+, Ar6+, Ar7+, Ar8+, Kr6+, Kr7+, Kr8+, Kr9+, Xe9+, Xe10+ and Xe11+. Relative abundance of each charge state of four elements were measured. In case of Kr and Xe , the intensity of observed multiply-charged ions decreased to 1/3 or 1/4 when the charge number is increased by one. Intensities of Ar4+, Ar6+, Ar8+, Kr6+ and Kr8+ were measured as a function of the operation conditions of the ion source, such as arc voltage, arc power and gas flow rate. It was found that a smaller gas flow and a higher arc power brought about a higher yield in all the measured ions. Obtained current intensities of ion source output are 40?A Ar8+, 600?A Kr6+, 40?A Kr9+, 150?A Xe9+ and 10?A Xe11+ respectively.     

A Source for Multiply-Charged Ions and Acceleration of C, N and O Ions by IPCR Cyclotron

The design and performance of the ion source which is now used in the IPCR variable energy cyclotron are described. The source is of the electron-bombarded hot cathode type having two cylindrical cathodes of tungsten and a water-cooled copper anode containing a replaceable molybdenum slit plate. The arc discharge is established continuously but not pulsed. The source is usually operated very stably under an arc power of 1.5 to 3kW with a gas flow rate of 1 to 2 cc/min. The lifetime of the source is mainly limited by the erosion of the upper tungsten cathode at about 24 hours. At present, C4+, N4+, O4+, N5+ and O5+ ions are accelerated up to 48~100, 56~1100, 70~95, 56~125 and 70~125 MeV respectively, and a few micro-amperes of these ions are extracted from the cyclotron. The vacuum obtainable in the accelerating chamber is usually 2 ~ 4 × 10-6 mHg, and the loss of ion beam by the charge exchange effect is comparatively small. Extracted ion beams are used in several experiments for about 1900 hours in a year.     

Current self-limitation in a transverse nanosecond discharge with a slotted cathode

A high-voltage transverse pulsed nanosecond discharge with a slotted hollow cathode was found to be a source of high-energy (few kV) ribbon electron beams.Conditions for the formation and extinction of electron beams were experimentally studied in discharges in helium at pressures of 1-100 Torr.It was found that interaction of fast electrons with a non-uniform electric field near the slotted cathode led to limitation of the magnitude of the discharge current.A physical model was developed to describe the discharge current self-limitation that was in satisfactory agreement with the experimental results.Some technical solutions that are expected to increase the upper current limits in transverse nanosecond discharge are discussed.     

Duoplasmatron Ion Sources

A survey on questions related to the production of multiply charged ions with the Duoplasmatron ion source is given. In spite of differences of the multiply charged ion source and the mass separator type, design considerations show that high containment is a common feature to be attained in both subjects. Multiply charged metal ions are produced by material evaporation into the magnetically confined anodic plasma and auxiliary gas feed into the cathode discharge regions. Energy spreads of ion beams from the low and the high arc current source are compared. The Duoplasmatron ion source proves to be a hygieneous source of high containment that permits the production of medium charge states up to 9+ for xenon at modest energy spread and good brilliance of the extracted ion beam in a high current-low voltage discharge mode.     

Power Supplies for Cold Cathode Penning Discharge Ion Sources

For the generation of heavy ions at high charge states, the cold-cathode Penning discharge ion source requires a power supply capable of both the high potential essential for striking an arc and the high current for sustaining it. A series-regulated power supply developed at Oak Ridge provides up to 6 kV of striking voltage and up to 12 amperes of arc current. The power supply operates in a constant current mode with the arc voltage dependent on the gas pressure in the ion source. With this source in ORIC, the typical operating conditions are 5 to 10 amperes arc current, 600 to 2000 volts arc potential, and 5 to 20 kW power dissipation in the arc. A larger power supply is planned for extending the arc current to about 25 amperes. Various arrangements, including pre-regulators and multiple power supplies, are under consideration to reduce power dissipation in the series regulator tubes.     

High efficiency metal ion source

A double hollow cathode ion source can produce a high amount and high current density of metal ions (Mo) by using a new sputtering discharge mode of hollow cathode discharge. It is evident that the new sputtering discharge mode occurs under suitable conditions of the diameter of the second hollow cathode and the magnetic field. At a sputter voltage of 600 V and magnetic field of 1.0 kG, the metal ion beam ratio of reaches 50%.     

Feedback model of secondary electron emission in DC gas discharge plasmas

Feedback is said to exist in any amplifier when the fraction of output power in fed back as an input.Similarly,in gaseous discharge ions that incident on the cathode act as a natural feedback element to stabilize and self sustain the discharge.The present investigation is intended to emphasize the feedback nature of ions that emits secondary electrons(SEs)from the cathode surface in DC gas discharges.The average number of SEs emitted per incident ion and non ionic species(energetic neutrals,metastables and photons)which results from ion is defined as effective secondary electronemission coefficient(ESEEC,_Eg).In this study,we derive an analytic expression that corroborates the relation between_Eg and power influx by ion to the cathode based on the feedback theory of an amplifier.In addition,experimentally,we confirmed the typical positive feedback nature of SEEfrom the cathode in argon DC glow discharges.The experiment is done for three different cathode material of same dimension(tungsten(W),copper(Cu)and brass)under identical discharge conditions(pressure:0.45 mbar,cathode bias:-600 V,discharge gab:15 cm and operating gas:argon).Further,we found that the_Eg value of these cathode material controls the amount of feedback power given by ions.The difference in feedback leads different final output i.e the power carried by ion at cathode(P_i _C￠∣).The experimentally obtained value of P_i _C￠∣is 4.28 W,6.87 W and9.26 W respectively for W,Cu and brass.In addition,the present investigation reveals that the amount of feedback power in a DC gas discharges not only affect the fraction of power fed back to the cathode but also the entire characteristics of the discharge.     

Study the Characteristic of the Hot Cathode of High Current Ion Source

The difference of hot cathode operation mode has great influence on the arc discharge of high current ion source. Based on the analysis of the theory of hot filament with two operation modes and combined with ion source experiments, the paper studies the effects of hot filament operation modes on ion source arc discharge.     

An Experimental Study on Atmospheric Pressure Glow Discharge in Different Gases

Usually,the electrical breakdown of dielectric barrier discharge(DBD) at atmospheric pressure leads to a filamentary non-homogeneous discharge,However,it is also possible to obtain a diffuse DBD in homogeneous form,called atmospheric pressure glow discharge(APGD).We obtained a uniform APGD in helium and in the mixture of argon with alcohol,and studied the electrical characteristics of helium APGD.It if found that the relationship between discharge current and source frequency is different depending on the difference in gas gap when the applied voltage is kept constant.The discharge current shows an increasing trend with the increased frequency when gas gap is 0.8cm ,but the discharge current tends to decrease with the increased frequency when the gas gap increases.The discharge current always increases with the increased applied voltage when the source frequency is kept constant.We also observed a glow-like discharge in nitrogen at atmospheric pressure.     

Ion property and electrical characteristics of 60 MHz very-high-frequency magnetron discharge at low pressure

The pre-ionized 60 MHz very-high-frequency (VHF) magnetron discharge at low pressure, assisted by inductively coupled plasma (ICP) discharge, was developed. The measurement of ion flux density and ion energy to the substrate was carried out by a retarding field energy analyzer. The electric characteristics of discharge were also investigated by voltage–current probe technique. It was found that by reducing the discharge pressure of VHF magnetron discharge from 5 to 1 Pa, the ion flux density increased about four times, meanwhile the ion energy also increased doubly. The electric characteristics of discharge also showed that a little improvement of sputtering effectiveness was achieved by reducing discharge pressure. Therefore, the deposition property of VHF (60 MHz) magnetron sputtering can be improved by reducing the discharge pressure using the ICP-assisted pre-ionized discharge.