Electrical Breakdown in Pure <Emphasis Type="Italic">n</Emphasis>- and <Emphasis Type="Italic">p</Emphasis>-Si

The results of calculations of the dependences of the kinetic coefficients of impact ionization and thermal recombination on an electric field in pure silicon are presented. By analogy with germanium, the dependences of the breakdown field Е_br on the material compensation ratio K are calculated. The validity of such calculation is justified in detail. The Е_br(K) curves are presented and compared with experimental data in the weak-compensation region. Matching with experimental results at which satisfactory agreement between theory and experiment is observed is performed.     

Recombination of charge carriers in the GaAs-based <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">i</Emphasis>-<Emphasis Type="Italic">n</Emphasis> diode

It is established that the radiative recombination of charge carriers plays a substantial role in the GaAs-based p-i-n diodes at high densities of the forward current. It is shown experimentally that the diodes operating in microwave integrated circuits intensely emit light in the IR range with wavelengths from 890 to 910 nm. The obtained results indicate the necessity of taking into account the features of recombination processes in the GaAs-based microwave p-i-n diodes.     

Anomalous scattering of electrons in <Emphasis Type="Italic">n</Emphasis>-Si crystals irradiated with protons

The aim of this study was to gain insight into the effect of irradiation with 25-MeV protons on the Hall mobility of electrons in n-Si crystals. Irradiated crystals with an initial electron concentration 6 × 10¹³ cm^-3 were studied using the Hall method in the range of temperatures 77–300 K. The studies showed that, in crystals irradiated with the proton dose Φ = 8.1 × 10¹² cm^-2, the effective mobility of conduction electrons μ_eff increases drastically. This effect is direct evidence that inclusions with relatively high conductivity and with nonrectifying junction at interfaces with semiconductor matrix are predominantly formed in n-Si crystals under these conditions. Agglomerations of interstitial atoms or their associations can represent such inclusions.     

Specific features of radiation-stimulated breakdown of a nonuniformly doped <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">n</Emphasis> junction

A quasi-hydrodynamic model of the transport of charge carriers under the ionizing effect of quantum radiation with the allowance made for the dynamics of heating of the semiconductor crystal by the flowing current is developed. Simulation of thermal breakdown of a nonuniformly doped p-n junction caused by a single radiation pulse is investigated. The variation in the times of relaxation of energy and pulse of electrons and suppression of the mechanism of impact ionization under the dynamic increase in the temperature of the semiconductor crystal is taken into account. The adequacy of the results of calculations is proved by comparing them with experimental data.     

Photovoltaic poperties of <Emphasis Type="Italic">n</Emphasis>-ZnO:Al/PbPc/<Emphasis Type="Italic">p</Emphasis>-Si structures

n-ZnO:Al/PbPc/p-Si photosensitive structures are fabricated for the first time. The steady-state current-voltage characteristics and spectral dependences of the relative quantum efficiency of the photoconversion of these structures are studied, and the mechanisms of charge transport and the photosensitivity processes are discussed. It is concluded that they are promising for application as multiband photoconverters of natural light.     

High-efficiency LEDs based on <Emphasis Type="Italic">n</Emphasis>-GaSb/<Emphasis Type="Italic">p</Emphasis>-GaSb/<Emphasis Type="Italic">n</Emphasis>-GaInAsSb/<Emphasis Type="Italic">P</Emphasis>-AlGaAsSb type-II thyristor heterostructures

A new type of light-emitting diodes (LEDs), a high-efficiency device based on an n-GaSb/p-GaSb/n-GaInAsSb/P-AlGaAsSb thyristor heterostructure, with the maximum emission intensity at wavelength λ = 1.95 μm, has been suggested and its electrical and luminescent characteristics have been studied. It is shown that the effective radiative recombination in the thyristor structure in the n-type GaInAsSb active region is provided by double-sided injection of holes from the neighboring p-type regions. The maximum internal quantum efficiency of 77% was achieved in the structure under study in the pulsed mode. The average optical power was as high as 2.5 mW, and the peak power in the pulsed mode was 71 mW, which exceeded by a factor of 2.9 the power obtained with a standard n-GaSb/n-GaInAsSb/P-AlGaAsSb LED operating in the same spectral range. The approach suggested will make it possible to improve LED parameters in the entire mid-IR spectral range (2–5 μm).     

Electrical Properties of <Emphasis Type="Italic">p</Emphasis>-NiO/<Emphasis Type="Italic">n</Emphasis>-Si Heterostructures Based on Nanostructured Silicon

Silicon nanowires are formed on n-Si substrates by chemical etching. p-NiO/n-Si heterostructures are fabricated by reactive magnetron sputtering. The energy diagram of anisotype p-NiO/n-Si heterostructures is constructed according to the Anderson model. The current–voltage and capacitance–voltage characteristics are measured and analyzed. The main current-transport mechanisms through the p-NiO/n-Si heterojunction under forward and reverse biases are established.     

Fabrication and Electrical Characterization of Heterojunction Mn-Doped GaN Nanowire Diodes on <Emphasis Type="Italic">n</Emphasis>-Si Substrates (GaN:Mn NW/<Emphasis Type="Italic">n</Emphasis>-Si)

We demonstrated that manganese (Mn)-doped GaN nanowires (NWs) exhibit p-type characteristics using current–voltage (I–V) characteristics in both heterojunction p–n structures (GaN:Mn NWs/n-Si substrate) and p–p structures (GaN:Mn NWs/p-Si). The heterojunction p–n diodes were formed by the coupling of the Mn-doped GaN NWs with an n-Si substrate by means of an alternating current (AC) dielectrophoresis-assisted assembly deposition technique. The GaN:Mn NWs/n-Si diode showed a clear current-rectifying behavior with a forward voltage drop of 2.4 V to 2.8 V, an ideality factor of 30 to 37, and a parasitic resistance in the range of 93 kΩ to 130 kΩ. On the other hand, we observed that other heterojunction structures (GaN:Mn NWs/p-Si) showed no rectifying behaviors as seen in p–p junction structures.     

Determination of deformation potential constants for <Emphasis Type="Italic">n</Emphasis>-and <Emphasis Type="Italic">p</Emphasis>-Si from the concentration anharmonicity

The contribution of charge carriers to the fourth-order modulus of elasticity β for n-and p-type silicon under uniaxial tension along the [110] direction was analyzed in the approximation of small strains. The effect of concentration on β was measured using spontaneous excitation of Lamb waves in bent plates with different doping levels. Experimental curves were used to determine the deformation potential constants of the conduction band Ξ_u=7±1 eV and the averaged value of the deformation potential of the valence band \(\sqrt[4]{{\left\langle {\Phi ^4 } \right\rangle }} = 5.6 \pm 0.8eV\) at room temperature.     

Features of high-temperature electroluminescence in an LED <Emphasis Type="Italic">n</Emphasis>-GaSb/<Emphasis Type="Italic">n</Emphasis>-InGaAsSb/<Emphasis Type="Italic">p</Emphasis>-AlGaAsSb heterostructure with high potential barriers

The electroluminescent properties of a light-emitting diode n-GaSb/n-InGaAsSb/p-AlGaAsSb heterostructure with high potential barriers are studied in the temperature range of 290–470 K. An atypical temperature increase in the power of the long-wavelength luminescence band with an energy of 0.3 eV is experimentally observed. As the temperature increases to 470 K, the optical radiation power increases by a factor of 1.5–2. To explain the extraordinary temperature dependence of the radiation power, the recombination and carrier transport processes are theoretically analyzed in the heterostructure under study.     

Au-TiB<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>-<Emphasis Type="Italic">n</Emphasis>-6<Emphasis Type="Italic">H</Emphasis>-SiC Schottky barrier diodes: Specific features of charge transport in rectifying and nonrectifying contacts

Mechanism of charge transport in a diode of a silicon carbide’s Schottky barrier formed by a quasi-amorphous interstitial phase TiB _x on the surface of n-6H-SiC (0001) single crystals with an uncompensated donor (nitrogen) concentration of ～10¹⁸ cm^?3 and dislocation density of ～(10⁶–10⁸) cm^?2 has been studied. It is demonstrated that, at temperatures T ? 400 K, the charge transport is governed by the tunneling current along dislocations intersecting the space charge region. At T > 400 K, the mechanism of charge transport changes to a thermionic mechanism with a barrier height of ～0.64 eV and ideality factor close to 1.3.     

Mechanisms of charge transport in anisotype <Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-CdTe heterojunctions

Surface-barrier anisotype n-TiO₂/p-CdTe heterojunctions are fabricated by depositing thin titanium-dioxide films on a freshly cleaved surface of single-crystalline cadmium-telluride wafers by reactive magnetron sputtering. It is established that the electric current through the heterojunctions under investigation is formed by generation-recombination processes in the space-charge region via a deep energy level and tunneling through the potential barrier. The depth and nature of the impurity centers involved in the charge transport are determined.     

Light-Harvesting in <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-Silicon Heterojunctions

Zinc oxide (ZnO) films were deposited onto Si to form n-ZnO/p-Si heterojunctions. Under the illumination of by both ultraviolet (UV) light and sunlight, obvious photovoltaic behavior was observed. It was found that the conversion efficiency of the heterojunctions increased significantly with increasing thickness of the ZnO film, and the mechanism for light-harvesting in the heterojunctions is discussed. The results suggest that ZnO films may be helpful to increasing the harvesting of UV photons, thus decreasing the thermalization loss of UV energy in Si-based solar cells.     

Thin-film polycrystalline <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-CuO heterojunction

Results of X-ray diffraction and spectral-optical studies of n-ZnO and p-CuO films deposited by gas-discharge sputtering with subsequent annealing are presented. It is shown that, despite the difference in the crystal systems, the polycrystallinity of n-ZnO and p-CuO films enables fabrication of a heterojunction from this pair of materials.     

Ammonia sensors based on Pd-<Emphasis Type="Italic">n</Emphasis>-Si diodes

The influence of ammonia on the electrical characteristics of Pd-n-Si diode structures is studied. The kinetics of diode characteristics under exposure to ammonia is considered. It is shown that the response speed of ammonia sensors based on Pd-n-Si diodes can be controlled by applying additional potential pulses to the barrier electrode.     

Electrical properties of <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-CuO heterostructures

The n-ZnO/p-CuO heterostructure is prepared, and its I-V characteristic is measured. It is shown that the heterostructure conductivity is primarily determined by the CuO layer and the n-ZnO/p-CuO heterojunction itself.     

Characterization of an <Emphasis Type="Italic">a</Emphasis>-Si:H/<Emphasis Type="Italic">c</Emphasis>-Si interface by admittance spectroscopy

The capabilities of admittance spectroscopy for the investigation of a-Si:H/c-Si heterojunctions are presented. The simulation and experimental results, which compare very well, show that the admittance technique is sensitive to the parameters of both the a-Si:H layer and the a-Si:H/c-Si interface quality. In particular, the curves showing capacitance versus temperature have two steps, accompanied by two bumps in the temperature dependence of the conductance. The first step, occurring in the low temperature range (100–200 K), is related to the transport and response of gap states in the a-Si:H layer. The second step, occurring at higher temperatures (>200 K), is caused by a carrier exchange with interface states and appears when the interface defect density exceeds 5 × 10¹² cm^?2. Then, the interface defects affect band bending, and, thus, the activation energy of de-trapping, which favors exchange with electrons from a-Si:H and holes from c-Si, respectively, for an increasing defect density.     

The qualitative difference between mechanisms of electroforming in Si-SiO<Subscript>2</Subscript>-W structures based on <Emphasis Type="Italic">n</Emphasis>-Si and <Emphasis Type="Italic">p</Emphasis>-Si

The experimental results of studying electroforming in open Si-SiO₂-W sandwich structures that have an SiO₂ layer approximately 20 nm thick are reported. It is noted that these processes are radically different for p-Si and n-Si. In the former case, the current-voltage characteristic is N-shaped, which is typical of electroforming. In the latter case, the dependence is S-shaped, which is typical of an electrical breakdown with thermal instability. The mechanisms of the above processes are discussed. The noted distinction can be associated with the fact that it is not the hole flow but only the electron flow across the structure that leads to the decomposition of molecules on the surface of the insulating gap and to the formation of conducting-phase particles from these molecules.     

Study of Current Flow Mechanisms in a CdS/<Emphasis Type="Italic">por</Emphasis>-Si/<Emphasis Type="Italic">p</Emphasis>-Si Heterostructure

The temperature dependence of the forward and reverse portions of the current–voltage characteristic and the photovoltage spectrum of a CdS/por-Si/p-Si semiconductor heterostructure are studied. It is found that the current-flow mechanisms are controlled by generation–recombination processes in the spacecharge region of the por-Si/p-Si heterojunction, carrier tunneling in the por-Si film, and the model of space-charge-limited currents. A simplified version of the energy-band diagram of the heterostructure under study is proposed.