Cu－37at％ Ag共晶合金的离子溅射研究

侧重研究了入射Ａｒ＋离子不同剂量轰击时表面微形貌和溅射原子角分布之间的关联，并建议用“元素按靶点表面微形貌特征局域富集模型”来解释溅射原子角分布形状以及择优溅射曲线的变化；发现其结果与实验相符合。     

离子溅射诱发单相合金Cu—12at.%Au表面“元素局域富集”

用扫描电子显微镜结合电子探针微分析技术测定了溅谢诱发的靶点表面成份变化，观察了表面形貌结构凸起和凹陷处的成分差别，实验结果表明，单相合金Ｃｕ－１２ａｔ．％Ａｕ在３０ｋｅＶ Ａｒ＾＋离子溅射过程中产生了“表面元素局域富集”现象。根据“溅射－形貌增强元素局域富集模型”，它包括元素局域富集初级阶段和毛细压力发生的选择性诱发力的作用，并据此对实验结果进行了讨论。     

面对等离子体壁材料中低Z元素的表面偏析

实验观察了三元合金Al-Li-Mg和二元合金Cu-Be中低Z元素(如Li和Be)的表面偏析行为。采用了二次离子质谱仪(SIMS)和俄歇电子谱仪(AES)进行表面分析。Al-Li-Mg合金的实验结果表明:样品温度在150℃到300℃的范围内,表面Li原子的浓度接近100％,这一结果可由Gibbsian偏析理论进行解释,其中Li在样品表面的深度分布有一定程度的展宽,这是由于刻蚀过程中高能氩(Ar)离子反冲植入所致。当样品温度超过360℃时,发现合金中的杂质元素Be开始在表面上偏析。为此,作者采用SIMS和AES对Cu-Be 合金进行了表面偏析研究。在位的AES分析表明:样品升温过程中,Be和O在合金表面富集,考虑到Be和O的化学亲和作用,偏析的根本动力来源于真空中的残余氧气。同时还对Be在合金表面的深度分布进行了测量。     

面对等离子体壁材料中低Z元素的表面偏析(英文)

实验观察了三元合金Al-Li-Mg和二元合金Cu-Be中低Z元素(如Li和Be)的表面偏析行为。采用了二次离子质谱仪(SIMS)和俄歇电子谱仪(AES)进行表面分析。Al-Li-Mg合金的实验结果表明:样品温度在150℃到300℃的范围内,表面Li原子的浓度接近100％,这一结果可由Gibbsian偏析理论进行解释,其中Li在样品表面的深度分布有一定程度的展宽,这是由于刻蚀过程中高能氩(Ar)离子反冲植入所致。当样品温度超过360℃时,发现合金中的杂质元素Be开始在表面上偏析。为此,作者采用SIMS和AES对Cu-Be合金进行了表面偏析研究。在位的AES分析表明:样品升温过程中,Be和O在合金表面富集,考虑到Be和O的化学亲和作用,偏析的根本动力来源于真空中的残余氧气。同时还对Be在合金表面的深度分布进行了测量。     

关于Cu-Au合金溅射机制的研究

本文报道了用热中子活化法测量Cu-Au合金在80keV Ar~+离子不同剂量轰击下的部分溅射产额比S_Cu/S_Au,并用卢瑟福背散射(RBS)技术分析样品中元素的反冲以及表面层成分的相对变化,从而研究了元素择优溅射对表面层变化所起的作用。     

He+离子辐照Inconel 718合金表面形貌改变及机理研究

研究了3种不同剂量He⁺离子辐照后Inconel 718合金的形貌变化规律及其形成机理。结果表明,He⁺离子辐照会在合金表面形成纳米多孔结构,其孔径会随辐照剂量的增加而增大。此外,He⁺离子辐照还会破坏合金表面δ相并导致碳化物的持续溅射损耗,且这一现象会随着辐照剂量的增加而愈发严重。由于辐照过程中氦泡间微观应力σ n作用会引起毗邻材料断裂及氦泡合并长大,且辐照溅射作用又会导致氦泡上层薄膜的损耗甚至破裂,因而这也是He⁺离子辐照Inconel 718合金表面纳米多孔结构的形成机制。     

铀铌合金真空热氧化膜的俄歇电子能谱研究

用俄歇电子能谱(AES)研究了高真空下，环境温度对铀铌合金真空氧化膜的影响。当温度高于603K时，氧化膜表面结构发生明显改变，表面主要由铀碳化合物、金属态的U和Nb组成。利用Ar^ 溅射铀铌合金真空热氧化膜进行深度分布分析，发现在热氧化膜的表面氧含量很小，而在热氧化膜的内部有氧增多的现象。     

Al_xSn_（100－x）合金系统的Ar~＋溅射研究

用捕获膜和卢瑟福背散射技术给出了３０ｋｅＶＡｒ＋轰击ＡｌｘＳｎ１００－ｘ合金系统（Ｘ＝９０，７０，５０，３０，１０）溅射Ｓｎ和Ａｌ原子的角分布及其择优溅射变化。提出一个考虑靶点表面形貌和元素局域富集对发射原子影响的模型，分析结果和实验数据符合较好．     

氩离子辐照对ZrO2—Y2O3薄膜的结构影响

为了研究离子辐照对薄膜结构的影响,对氩离子辐照磁控溅射沉积的ZrO_2-8%(m/m)Y_20_3薄膜,用XRD、AES及XPS进行微观分析。结果表明,溅射沉积的无定形薄膜经离子辐照后发生了晶化,膜内元素与基体元素发生了显著的混合,表面污染的碳向膜内迁移。此外,还研究磁控溅射沉积ZrO_2-8%(m/m)Y_2O_3薄膜氩离子辐照前后表面Zr(3d),Y(3d),O(1s)结合能的位移情况。     

100keV Ar~+、Ne~+轰击铜靶所产生的溅射原子角分布与离子入射角的关系

在40°和70°斜入射条件下,用100keV Ar~+、Ne~+轰击铜靶,Ar~+所产生的溅射原子角分布的溅射优先方向分别位于表面法线的两侧,溅射原子角分布对于表面法线明显不对称;而Ne~+所对应的溅射优先方向都位于表面法线方向,且溅射原子角分布对于表面法线是对称的。用级联碰撞理论分析了所得到的实验结果,并比较了Ar~+和Ne~+溅射机制上的不同。     

An attempt to solve Andersen’s puzzle in surface segregation during alloy sputtering

The paper addresses CuPt alloy sputtering by Ar ions and discusses the well-known experiment performed by Andersen et al. 25 years ago, but not yet properly explained. The atomistic (binary-encounter) simulation has been applied to extract the concentrations of surface Cu and Pt atoms from the experimental data. The results of simulations favor segregation of Cu at all bombarding energies studied experimentally (1.25-320 keV). It has been shown that some mysterious results of the experiment can be explained by a reconstruction of the surface undergoing sputtering. For forecasting purposes, the sputtering of CuPt alloy with 0.25-1 keV Ar ions is also considered.     

Surface segregation of Ti atoms during NiTi alloy sputtering

The paper addresses NiTi alloy sputtering by 9 keV He and Ar ions and discusses the experiment performed by V.S. Chernysh et al. about 10 years ago. The binary collision simulation has been applied to extract the concentrations of surface Ni and Ti atoms from the experimental data. The results of simulations favor segregation of Ti for both He and Ar ion bombardment. The effect of non-symmetric surface collisions (Ti on Ni and Ni on Ti) was found to be negligible. A pronounced effect of the interatomic (target–target) potential is noted.     

Phase changes of the ZrO2—12wt%Y2O3 film with Ar^＋ irradiation

1IntroductionYttrisistabilizedzirconiawithahighresistivityandalargerelativedielectricconstant.isaveryattractiveelectricalinsulator.11]Itcanbeusedforthefabricationofsilicon-oninsulator(SOI)structuresorasthebufferlayerinhighToceramicsuperconductorsonSttoavoidthereactionbetweenStandthesuperconductorfilm.[2]Thepolymorphicbehaviourofzirconiabasedceramicscontaininglessthan20wt%Yaosstillaffectsitsthermalshock-resistancewhenitisusedoveralargetemperaturerange.Ithasbeenfoundthatthereseemsacorrelesnon…     

动态离子束混合技术制备氧化铬薄膜的X射线光电子能谱与俄歇电子能谱研究

本文介绍的动态离子束混合技术制备氧化铬薄膜系在不锈钢基体上进行1keV氩离子束溅射沉积铬(同时通入一定量的O),并用100 keV的氩离子束或氧离子束轰击该样品.对两种离子束轰击形成的氧化铬薄膜进行了X射线光电子能谱(X-ray photoelectron spectroscopy,XPS)和俄歇电子能谱(Auger electron spectroscopy,AES)的分析研究.发现Ar 离子束制备的氧化铬薄膜主要是Cr2O3化合物,而O 离子束制备的氧化铬薄膜含有其它价态的铬氧化物.Ar 离子束制备氧化铬薄膜的污染碳少于O 离子束制备.与O 离子束制备相比较,相同能量的Ar 离子束轰击更有利于提高沉积的Cr原子与周围O2的反应性;Ar 离子束制备的氧化铬薄膜过渡层的厚1/3左右,较厚的过渡层显示了制备的薄膜具有较好的附着力.     

Sputtering of lunar regolith simulant by protons and singly and multicharged Ar ions at solar wind energies

We report preliminary results on sputtering of a lunar regolith simulant at room temperature by singly and multiply charged solar wind ions using quadrupole and time-of-flight (TOF) mass spectrometry approaches. Sputtering of the lunar regolith by solar-wind heavy ions may be an important particle source that contributes to the composition of the lunar exosphere, and is a possible mechanism for lunar surface ageing and compositional modification. The measurements were performed in order to assess the relative sputtering efficiency of protons, which are the dominant constituent of the solar wind, and less abundant heavier multicharged solar wind constituents, which have higher physical sputtering yields than same-velocity protons, and whose sputtering yields may be further enhanced due to potential sputtering. Two different target preparation approaches using JSC-1A AGGL lunar regolith simulant are described and compared using SEM and XPS surface analysis.     

Nanopatterning of silica with mask-assisted ion implantation

In the present paper we combined ion implantation and nanosphere lithography to regularly dope, by a mask-assisted process, a SiO₂ substrate with rare earth ions (Er) by ion implantation and to fabricate by sputtering a plasmonic 2D periodic array of Au nanostructures on the silica surface spatially coupled to the implanted Er³⁺ ions. The aim of this work is to study how Er³⁺ emission at 1.5 μm can be affected by the interaction with a plasmonic nanostructure. In particular we have found a variation of the radiative lifetime of the Er³⁺ emission and a change from single exponential to bi-exponential of the luminescence intensity decay.     

Competition of terrace and step-edge sputtering under oblique-incidence ion impact on a stepped Pt(1 1 1) surface

Using molecular-dynamics simulation, we study the sputtering of a Pt(1 1 1) surface under oblique and glancing incidence 5 keV Ar ions. For incidence angles larger than a critical angle ?_c, the projectile is reflected off the surface and the sputter yield is zero. We discuss the azimuth dependence of the critical angle ?_c with the help of the surface corrugation felt by the impinging ion. If a step exists on the surface, sputtering occurs also for glancing incidence ?>?_c. We demonstrate that for realistic step densities, the total sputtering of a stepped surface may be sizable even at glancing incidence.