共查询到20条相似文献,搜索用时 62 毫秒
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2010年5月17~28日,LSO/IEC JTG1/SC32工作组会议及全体会议在中国昆明召开,来自中国、日本、韩国、美国、英国、加拿大、德国共7个国家的70位代表参加了本次会议,中国代表团由工业和信息化部电子工业标准化研究所、中国标准化研究院、武汉大学等单位的23名代表组成。国家标准化管理委员会作为ISO/IEC,JTC1中国国家委员会承办了本次会议。 相似文献
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2009年6月1-5日,ISO/IEC JTC1/S06全会在日本东京召开,参加此次会议的有11个国家以及来自ECMA international、ITU—T和IEEE LMSC等联络组织的代表。中国代表团团长为工业和信息化部电子工业标准化研究所徐冬梅。 相似文献
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从1988年起,邮电部第五研究所开始SDH系统的开发。最近该所又用3年时间,同中国邮电工业总公司合作开发了622Mbit/s和155Mbit/s两个速率级的全套设备(包括TM、ADM、中继机)和FP1.0版的网元管理系统。本文将介绍开发的背景和产品开发的成果 相似文献
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总的来说,LS3/5A就是LS3/5A的声音LS3/SA设计于20世纪70年代初,当时正值古典音乐盛行,流行音乐初步萌生的时代,这个时期也是英国的传统音响工业发展最为鼎盛的阶段。 相似文献
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1/f噪声,由于其反映了器件的质量、可靠性等参数,其研究越来越为人们所重视。本文首先较为系统地介绍了1/f噪声源两种较为成熟的理论:载流子数涨落和迁移率涨落模型,最后将研究MOS晶体管中1/f噪声的现象。在n管中,较为成功地用△N模型;而在PMOS晶体管中,△μ模型可较为成功地解释其1/f噪声特性。 相似文献
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Wei-Chou Hsu Dong-Hai Huang Yu-Shyan Lin Yeong-Jia Chen Jun-Chin Huang Chang-Luen Wu 《Electron Devices, IEEE Transactions on》2006,53(3):406-412
This paper proposes a In/sub 0.5/Al/sub 0.5/As/In/sub x/Ga/sub 1-x/As/In/sub 0.5/Al/sub 0.5/As (x=0.3-0.5-0.3) metamorphic high-electron mobility transistor with tensile-strained channel. The tensile-strained channel structure exhibits significant improvements in dc and RF characteristics, including extrinsic transconductance, current driving capability, thermal stability, unity-gain cutoff frequency, maximum oscillation frequency, output power, power gain, and power added efficiency. 相似文献
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《Electronics letters》1990,26(1):27-28
AlGaAs/GaInAs/GaAs pseudomorphic HEMTs with an InAs mole fraction as high as 35% in the channel has been successfully fabricated. The device exhibits a maximum extrinsic transconductance of 700 mS/mm. At 18 GHz, a minimum noise figure of 0.55 dB with 15.0 dB associated gain was measured. At 60 GHz, a minimum noise figure as low as 1.6 dB with 7.6 dB associated gain was also obtained. This is the best noise performance yet reported for GaAs-based HEMTs.<> 相似文献
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A 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode array
Zheng X.G. Hsu J.S. Sun X. Hurst J.B. Li X. Wang S. Holmes A.L.Jr. Campbell J.C. Huntington A.S. Coldren L.A. 《Quantum Electronics, IEEE Journal of》2002,38(11):1536-1540
We report a 12 /spl times/ 12 In/sub 0.53/Ga/sub 0.47/As-In/sub 0.52/Al/sub 0.48/As avalanche photodiode (APD) array. The mean breakdown voltage of the APD was 57.9 V and the standard deviation was less than 0.1 V. The mean dark current was /spl sim/2 and /spl sim/300 nA, and the standard deviation was /spl sim/0.19 and /spl sim/60 nA at unity gain (V/sub bias/ = 13.5 V) and at 90% of the breakdown voltage, respectively. External quantum efficiency was above 40% in the wavelength range from 1.0 to 1.6 /spl mu/m. It was /spl sim/57% and /spl sim/45% at 1.3 and 1.55 /spl mu/m, respectively. A bandwidth of 13 GHz was achieved at low gain. 相似文献
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Yi-Jen Chan Ming-Ta Yang 《Electron Devices, IEEE Transactions on》1995,42(10):1745-1749
The properties of both lattice-matched and strained doped-channel field-effect transistors (DCFET's) have been investigated in AlGaAs/In/sub x/Ga/sub 1-x/As (0/spl les/x/spl les/0.25) heterostructures with various indium mole fractions. Through electrical characterization of grown layers in conjunction with the dc and microwave device characteristics, we observed that the introduction of a 150-/spl Aring/ thick strained In/sub 0.15/Ga/sub 0.85/As channel can enhance device performance, compared to the lattice-matched one. However, a degradation of device performance was observed for larger indium mole fractions, up to x=0.25, which is associated with strain relaxation in this highly strained channel. DCFET's also preserved a more reliable performance after biased-stress testings.<> 相似文献
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S. Privitera F. Wang P. Dumont-Girard K. Liu C. Bongiorno 《Microelectronic Engineering》2010,87(3):430-433
SixCryCzBv thin films with several compositions have been studied for integration of high precision resistors in 0.8 μm BICMOS technology. These resistors, integrated in the back-end of line, have the advantage to provide high level of integration and attractive electrical behavior in temperature, for analog devices. The film morphology and the structure have been investigated through transmission electron microscopy analysis and have been then related to the electrical properties on the base of the percolation theory. According to this theory, and in agreement with experimental results, negative thermal coefficient of resistance (TCR) has been obtained for samples with low Cr content, corresponding to a crystalline volume fraction below the percolation threshold.Samples with higher Cr content exhibit, instead, a variation of the TCR as a function of film thickness: negative TCR values are obtained for thickness lower than 5 nm, corresponding to a crystalline volume fraction below the percolation threshold; positive TCR are obtained for larger thickness, indicating the establishment of a continuous conductive path between the Cr rich grains. This property seems to be determinant in order to assure the possibility to obtain thin film resistors almost independent on the temperature. 相似文献
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Jie Liu Yugang Zhou Rongming Chu Yong Cai Chen K.J. Lau K.M. 《Electron Device Letters, IEEE》2005,26(3):145-147
We report an Al/sub 0.3/Ga/sub 0.7/N-Al/sub 0.05/Ga/sub 0.95/N-GaN composite-channel HEMT with enhanced linearity. By engineering the channel region, i.e., inserting a 6-nm-thick AlGaN layer with 5% Al composition in the channel region, a composite-channel HEMT was demonstrated. Transconductance and cutoff frequencies of a 1 /spl times/100 /spl mu/m HEMT are kept near their peak values throughout the low- and high-current operating levels, a desirable feature for linear power amplifiers. The composite-channel HEMT exhibits a peak transconductance of 150 mS/mm, a peak current gain cutoff frequency (f/sub T/) of 12 GHz and a peak power gain cutoff frequency (f/sub max/) of 30 GHz. For devices grown on sapphire substrate, maximum power density of 3.38 W/mm, power-added efficiency of 45% are obtained at 2 GHz. The output third-order intercept point (OIP3) is 33.2 dBm from two-tone measurement at 2 GHz. 相似文献
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Patrick W. C. Ho Firas Odai Hatem Haider Abbas F. Almuri T. Nandha Kumar 《半导体学报》2016,37(6):064001-13
Nonvolatile memories have emerged in recent years and have become a leading candidate towards replacing dynamic and static random-access memory devices. In this article, the performances of TiO2 and TaO2 nonvolatile memristive devices were compared and the factors that make TaO2 memristive devices better than TiO2 memristive devices were studied. TaO2 memristive devices have shown better endurance performances (108 times more switching cycles) and faster switching speed (5 times) than TiO2 memristive devices. Electroforming of TaO2 memristive devices requires~4.5 times less energy than TiO2 memristive devices of a similar size. The retention period of TaO2 memristive devices is expected to exceed 10 years with sufficient experimental evidence. In addition to comparing device performances, this article also explains the differences in physical device structure, switching mechanism, and resistance switching performances of TiO2 and TaO2 memristive devices. This article summarizes the reasons that give TaO2 memristive devices the advantage over TiO2 memristive devices, in terms of electroformation, switching speed, and endurance. 相似文献
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M. Blomqvist S. Khartsev A. Grishin 《Photonics Technology Letters, IEEE》2005,17(8):1638-1640
We report on waveguiding and electrooptic properties of epitaxial Na/sub 0.5/K/sub 0.5/NbO/sub 3/ films grown by radio-frequency magnetron sputtering on Al/sub 2/O/sub 3/(11_02) single crystal substrates. High optical waveguiding performance has been demonstrated in infrared and visible light. The in-plane electrooptic effect has been recorded in transmission using a transverse geometry. At dc fields, the effective linear electrooptic coefficient was determined to 28 pm/V, which is promising for modulator applications. 相似文献