双势垒量子阱薄膜力电耦合特性实验

用分子束外延方法在(001)GaAs衬底上生长了AlAs/InGaAs双势垒量子阱薄膜结构.介绍了量子阱薄膜在(110)与(110)方向单轴压应力作用下的力电耦合实验,测试出量子阱薄膜在室温下随着外加压力变化的I-V曲线.测试结果表明:量子阱薄膜I-V曲线的共振峰在(110)方向单轴应力作用下向正偏压方向漂移,在(110)方向应力作用下向负偏压方向偏移,并分析了量子阱薄膜力电耦合效应的物理成因.该结果与基于量子阱力电耦合特性的介观压阻理论的研究结果相吻合.     

双势垒量子阱薄膜压阻效应实验研究

采用分子束外延方法在砷化镓衬底上生长了AlAs/GaAs双势垒量子阱薄膜结构。介绍了量子阱薄膜在单轴压力作用下的压阻实验,测试出薄膜在压力影响下的I-V曲线,并分析了量子阱薄膜压阻效应的成因。通过实验证实了量子阱薄膜具有较高灵敏度的压阻效应,其压阻灵敏度比目前常用的多晶硅的压阻灵敏度提高一个数量级。     

3～5微米双势垒量子阱红外探测器结构在不同偏压下的光伏响应

首次采用不同偏压下的光伏谱方法无损测量到双势垒量子阱红外探测器结构的量子阱带间跃迁光伏谱响应．分析结果支持探测器有源区存在内建电场的说法：量子阱区存在由生长不对称引起的指向衬底的内建电场，同时势垒区存在相反的内建电场．     

MOVCD生长GaAs/AlGaAs量子阱红外探测器暗电流特性研究

用金属有机物化学气相沉积法(MOCVD)生长了GaAs/AlGaAs量子阱材料,分别制备了300μm×300μm台面,峰值波长8.5μm,外电极压焊点面积80μm×80μm,内电极压焊点面积20μm×20μm的单元测试样品。用变温液氦制冷机测试系统对两个样品进行50～300K的变温测试,分析了器件在不同偏压条件下的暗电流特性。发现该量子阱红外探测器的背景限温度为50K。不同生长次序中GaAs与AlGaAs界面的不对称性,以及掺杂元素的扩散导致了正负偏压下的I/V曲线呈不对成性。探测器电极压焊点面积大小与位置的不同对暗电流有一定的影响。     

一种基于微结构的GaAs HEMT的压阻系数

GaAs HEMT(高电子迁移率晶体管)位于微结构悬臂梁根部附近的最大应力处。介绍了GaAs HEMT和微结构的设计加工,并通过实验研究了GaAs HEMT在平行于HEMT生长方向(Z方向)单轴应力作用下的力电耦合特性。测试结果表明:GaAs HEMT不同偏压下压阻系数不同,且它的最大压阻系数为(1.72±0.33)×10-7Pa-1,比Si高出三个数量级。     

单轴压应变量子阱红外探测器吸收波长的研究

研究了单轴压应力对GaAs/AlGaAs/GaAs量子阱红外探测器(QWIP)吸收波长的影响。以量子阱电子干涉方法以及单轴压应力作用下量子阱应变理论为基础,分析了GaAs/AlGaAs/GaAs量子阱导带中子能级与应变的关系。理论上计算了单轴应力下四个QWIP吸收波长与应变的关系。结果表明,E1与E<1>能级之间的吸收波长和E(1)与EF能级之间的吸收波长随应变的增大而减小的幅度比E1与EF能级之间的吸收波长和E(0)与E1能级之间吸收波长随应变的增大减小的幅度大。     

双量子肼系统伏安特性的数值模拟

本文通过求解薛定谔方程得到由分段线性势垒构成的量子系统的变换矩阵和透射系数的精确解,并利用这一结果计算了双量子阱系统的偏压隧道电流,讨论了双量子阱系统结构变化以其伏安特性的影响。与单量子阱系统的比较表明,双量子阱系统在某些方面,如电流峰谷比,负微分电阻区等优于单量子阱系统。     

双量子阱系统伏安特性的数值模拟

本文通过求解薛定谔方程得到由分段线性势垒构成的量子系统的变换矩阵和透射系数的精确解,并利用这一结果计算了双量子阱系统的偏压隧道电流,讨论了双量子阱系统结构变化对其伏安特性的影响。与单量子阱系统的比较表明,双量子阱系统在某些方面,如电流峰谷比,负微分电阻区等优于单量子阱系统。     

共振隧穿二极管的力电耦合特性

报道了微结构中共振隧穿二极管(RTD)的压阻效应.分析并加工了四梁结构,其中RTD置于应力敏感区.沿[110]晶向和[110]晶向的应力导致RTD电流-电压曲线的改变,即介观压阻变化,尤其是在微分负阻(NDR)区.采用不同测试方法,研究了RTD的力电耦合特性,并获得了较相近的压阻系数为10-9Pa-1.     

GaAs/AlGaAs量子阱的输运特性

本文研究了低迁移率GaAs/AlGaAs量子阱的散射机制。由电导测量和Shubnikov de-Haas振荡曲线分别得到输运散射时间τ_0和弛豫时间τ_q(量子散射时间)。在GaAs/AlGaAs量子阱中,τ_0≈τ_q;而在调制掺杂的异质结中,τ_0》τ_q。用量子阱、异质结中起支配作用的散射机构不同很好地解释了实验结果。本文还研究了弱磁场下量子阱的负磁阻效应,这是磁场抑制了电子局域态的结果。     

Hot-carrier luminescence in sub-quartermicrometer high-speed GaAsMESFET's

Hot-carrier luminescence in high-speed GaAs MESFET's with sub-quartermicrometer gate length was investigated at drain voltages high enough to permit breakdown. The spectral distribution of emitted radiation was analyzed in the energy range of 1.4-2.5 eV. GaAs MESFET's with a gate length of 0.18 μm yielded a prominent peak from the direct recombination across a GaAs bandgap of 1.43 eV. At energies above 1.65 eV, a broad continuous spectra with two peaks and a shoulder were detected. The two peaks coincide with the indirect recombination energies between holes in the Γ valley and electrons in the L or X valley. These peaks, however, were diminished at drain voltages as high as 7.5 V. It is suggested that the luminescence at energies above the bandgap mainly arises from the recombination of hot carriers, and the luminescence resulting from a phonon-assisted conduction to conduction-band transition is superimposed on it. The luminescence from the gate Schottky diode at reversed bias was also examined. There were no peaks from the direct recombination across the bandgap in the spectra. The light emission at the bandgap energy under the FET operation probably originates from the recombination of cold channel electrons and hot holes, which are generated by impact ionization and swept toward the source     

GaInNAs/GaAs量子阱的光致发光谱和光调制反射谱

研究了GaInNAs/GaAs多量子阱在不同温度和激发功率下的光致发光(PL)谱以及光调制反射(PR)谱.发现PL谱主发光峰的能量位置随温度的变化不满足Varshni关系,而是呈现出反常的S型温度依赖关系.进一步测量,特别是在较低的激发光功率密度下,发现有两个不同来源的发光峰,它们分别对应于氮引起的杂质束缚态和带间的激子复合发光.随温度变化,这两个发光峰相对强度发生变化,造成主峰(最强的峰)的位置发生切换,从而导致表观上的S型温度依赖关系.采用一个基于载流子热激发和出空过程的模型来解释氮杂质团簇引起的束缚态发光峰的温度依赖关系.     

InAs／GaAs亚单层结构的静压光谱研究

在１５Ｋ下测量了ＩｎＡｓ／ＧａＡｓ亚单层结构的静压光致发光，静压范围为０～８ＧＰａ．常压下ＩｎＡｓ层中重空穴激子的发光峰随ＩｎＡｓ层厚的减小向高能移动，同时峰宽变窄，强度减小．其压力行为与ＧａＡｓ基体的基本一致，表明量子阱（线、点）模型仍适用于ＩｎＡｓ／ＧａＡｓ亚单层结构．得到平均厚度为１／３单分子层的样品中由于附加的横向限制效应引起的电子和空穴束缚能的增加分别为２３和４２ｍｅＶ     

Si衬底上MBE长成的GaAs中剩余应力起源的研究(英文)

<正> High qualities of GaAs layers directly grown on Si substrates have been obtained by MBE. The residual stress in those MBE grown GaAs layers on     

The resonant tunneling of holes through double-barrier structures with InAs QDs at the center of a GaAs quantum well

The effect of InAs quantum dots (QDs) grown in the center of a GaAs quantum well on the tunneling characteristics of resonant-tunneling diodes based on p-AlAs/GaAs/AlAs heterostructures is studied. The introduction of QDs results in a shift and broadening of resonance peaks in the current-voltage characteristics of the diodes; however, this effect is found to be strongly dependent on the number of the 2D subband involved in the tunneling. The obtained dependence is attributed to origination of the fluctuation potential in the vicinity of the QD layer.     

Mixing of hole states in GaAs/AlAs(110) heterostructures

States in the AlAs/GaAs(12)/AlAs(110) quantum well and AlAs(6)/GaAs(12)(110) superlattice are considered. For analysis of mixing of light- and heavy-hole states in these structures, a parameter-dependent set of basis functions is suggested and the values of the parameter at which one of the functions describes basically heavy-hole states and the other light-hole states are determined. For the energy region considered in the study, four energy levels are determined in the AlAs/GaAs(12)/AlAs(110) quantum well and, correspondingly, four minibands in the AlAs(6)/GaAs(12)(110) superlattice. Analysis shows that the first and fourth levels in the quantum well and the first and fourth minibands in the superlattice are related basically to heavy-hole states. The other two states in the quantum well and the second and third minibands in the super-lattice are structurally more complex: in these states and minibands, the hole states are noticeably mixed. In these minibands, states are substantially separated in space and in spin.     

Growth and characterization of (111)B InGaAs/GaAs multi-quantum well PIN diode structures

High quality piezoelectric strained InGaAs/GaAs multi-quantum well structures on (111)B GaAs substrates have been grown by solid-source molecular beam epitaxy in a PIN configuration. 10K photoluminescence (PL) shows narrow peaks with widths as low as 3 meV for a 25-period structure while room temperature (RT) PL shows several higher order peaks, normally forbidden, indicating breaking of inversion symmetry by the piezoelectric field. Furthermore, both the 10K PL peak position and the form of the RT PL spectra depend on the number of quantum wells within the intrinsic region, suggesting that the electric-field distribution is altered thereby. Diodes fabricated from these structures had sharp avalanche breakdown voltages (V_bd) and leakage currents as low as 8 × 10⁻⁶ A/cm² at 0.95 V_bd, indicating quality as high as in (100) devices. On leave from: Department de Ingeniera Electronica, Universidad Politecnica de Madrid, Madrid, Spain.     

In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下光致发光的对照研究

在77K,0—60kbar范围内对在同一衬底上生长的In_(0.15)Ga_(0.85)As/GaAs和GaAs/Al_(0.3)Ga_(0.7)As量子阱的静压下的光致发光进行了对照研究。在GaAs/Al_(0.3)Ga_(0.7)As量子阱中同时观察到导带到轻重空穴子带的跃迁。而在In_(0.15)Ga_(0.85)As/GaAs阱中只观察到导带到重空穴子带的跃迁。与GaAs/Al_(0.3)Ga_(0.7)As的情况相反,In_(0.15)Ga_(0.85)As/GaAs 量子阱的光致发光峰的压力系数随阱宽的减小而增加。在压力大于48kbar时观察到多个与间接跃迁有关的发光峰,对此进行了简短的讨论。     

Low-voltage phase modulation in GaAs/AlGaAs quantum well opticalwaveguides

Reports GaAs/AlGaAs quantum well waveguide phase modulators with high phase shift coefficients, as large as 520 degrees per V mm. By operating at wavelengths far below the bandedge and applying DC bias the authors achieve large electro-optic modulation with low absorption loss in device lengths on the order of 100 μm and drive voltages on the order of 1 V