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1.
This paper presents the first fully integrated SONET OC-192 transmitter and receiver fabricated in a standard 0.18-/spl mu/m CMOS process. The transmitter consists of an input data register, 16-b-wide first-in-first-out (FIFO) circuit, clock multiplier unit (CMU), and 16:1 multiplexer to give a 10-Gb/s serial output. The receiver integrates an input amplifier for 10-Gb/s data, clock and data recovery circuit (CDR), 1:16 demultiplexer, and drivers for low-voltage differential signal (LVDS) outputs. An on-chip LC-type voltage-controlled oscillator (VCO) is employed by both the transmitter and receiver. The chipset operates at multiple data rates (9.95-10.71 Gb/s) with functionality compatible with the multisource agreement (MSA) for 10-Gb transponders. Both chips demonstrate SONET-compliant jitter characteristics. The transmitter 10.66-GHz output clock jitter is 0.065 UI/sub pp/ (unit interval, peak-to-peak) over a 50-kHz-80-MHz bandwidth. The receiver jitter tolerance is more than 0.4 UI/sub pp/ at high frequencies (4-80 MHz). A high level of integration and low-power consumption is achieved by using a standard CMOS process. The transmitter and receiver dissipate a total power of 1.32 W at 1.8 V and are packaged in a plastic ball grid array with a footprint of 11/spl times/11 mm/sup 2/.  相似文献   

2.
A 43-Gb/s full-rate clock transmitter chip for SONET OC-768 transmission systems is reported. The IC is implemented in a 0.18-/spl mu/m SiGe BiCMOS technology featuring 120 GHz f/sub T/ and 100 GHz f/sub max/ HBTs. It consists of a 4:1 multiplexer, a clock multiplier unit, and a frequency lock detector. The IC features clock jitter generation of 260 fs rms and dissipates 2.3 W from a -3.6-V supply voltage. Measurement results are compared to a previously reported half-rate clock transmitter designed using the same technology.  相似文献   

3.
A harmonic injection-locked frequency divider for high-speed applications is presented in this letter. In order to enhance the bandwidth of the high-order frequency division, a positive feedback is employed in the design of the subharmonic mixer loop. The proposed circuit is implemented in a 0.18-/spl mu/m SiGe BiCMOS process. With a singled-ended super-harmonic input injection of 0dBm, the frequency divider exhibits a locking range of 350MHz (from 59.77 to 60.12GHz) for the divide-by-four frequency division while maintaining an output power of -16.6/spl plusmn/ 0.5dBm within the entire frequency range. The frequency divider core consumes a dc power of 50mW from a 3.6-V supply voltage.  相似文献   

4.
This paper describes an RF SiGe BiCMOS technology based on a standard 0.18-/spl mu/m CMOS process. This technology has the following key points: 1) A double-poly self-aligned SiGe-HBT is produced by adding a four-mask process to the CMOS process flow-this HBT has an SiGe epitaxial base selectively grown on an epi-free collector; 2) two-step annealing of CMOS source/drain/gate activation is utilized to solve the thermal budget tradeoff between SiGe-HBTs and CMOS; and 3) a robust Ge profile design is studied to improve the thermal stability of the SiGe-base/Si-collector junction. This process yields 73-GHz f/sub T/, 61-GHz f/sub max/ SiGe HBTs without compromising 0.18-/spl mu/m p/sup +//n/sup +/ dual-gate CMOS characteristics.  相似文献   

5.
Implemented in a 0.25-/spl mu/m SiGe BiCMOS process, a highly integrated low-power transmitter IC (TxIC) is developed for wideband code-division multiple-access handset applications. Based on a digital-IF heterodyne architecture, it eliminates the external IF surface acoustic wave filter by adopting a meticulous frequency plan and a special-purpose second-order-hold D/A conversion scheme. The TxIC features a low-power high-speed D/A converter designed to drive a dominantly capacitive load. For the upconversion mixer and the RF amplifier, adaptive biases are designed to minimize the quiescent power consumption and to provide current boost only when needed. The TxIC achieves <1% EVM. It consumes 180 mW (3-V supply) for the maximum output power of +5 dBm and reduces to 120 mW during power backoff.  相似文献   

6.
This paper investigates the electrostatic discharge (ESD) characteristics of the silicon-germanium heterojunction bipolar transistor (SiGe HBT) in a 0.18-/spl mu/m SiGe BiCMOS process. According to this letter, the open base configuration in the SiGe HBT has lower trigger voltage and higher ESD robustness than a common base configuration. As compared to the gate-grounded NMOS and PMOS in a bulk CMOS process, the SiGe HBT has a higher ESD efficiency from the layout area point of view. Additionally, any trigger biases used to improve the ESD robustness of the SiGe HBT are observed as invalid, and even they can work successfully in bulk CMOS process.  相似文献   

7.
A direct conversion receiver for ultra-wideband (UWB) applications operates for 3.1 to 8.2 GHz and gives a noise figure of 3.3 to 4.1 dB and a conversion gain of 52 dB. The chip includes the RF receive chain and a 16-GHz quadrature VCO to generate seven carrier frequencies from 3.4 to 7.9 GHz. The circuit was fabricated in a 0.18-/spl mu/m SiGe BiCMOS process and consumes 88 mA from a 2.7-V supply.  相似文献   

8.
This paper proposes a novel low-leakage BiCMOS deep-trench (DT) diode in a 0.18-/spl mu/m silicon germanium (SiGe) BiCMOS process. By means of the DT and an n/sup +/ buried layer in the SiGe BiCMOS process, a parasitic vertical p-n-p bipolar transistor with an open-base configuration is formed in the BiCMOS DT diode. Based on the two-dimensional (2-D) simulation and measured results, the BiCMOS DT diode indeed has the lowest substrate leakage current as compared to the conventional p/sup +//n-well diode even at high temperature conditions, which mainly results from the existence of the parasitic open-base bipolar transistor. Considering the applications of the diode string in electrostatic discharge (ESD) protection circuit designs, the BiCMOS DT diode string also provides a good ESD performance. Owing to the characteristics of the low leakage current and high ESD robustness, it is very convenient for circuit designers to use the BiCMOS DT diode string in their IC designs.  相似文献   

9.
A high-speed optical interface circuit for 850-nm optical communication is presented. Photodetector, transimpedance amplifier (TIA), and post-amplifier are integrated in a standard 0.18-/spl mu/m 1.8-V CMOS technology. To eliminate the slow substrate carriers, a differential n-well diode topology is used. Device simulations clarify the speed advantage of the proposed diode topology compared to other topologies, but also demonstrate the speed-responsivity tradeoff. Due to the lower responsivity, a very sensitive transimpedance amplifier is needed. At 500 Mb/s, an input power of -8 dBm is sufficient to have a bit error rate of 3/spl middot/10/sup -10/. Next, the design of a broadband post-amplifier is discussed. The small-signal frequency dependent gain of the traditional and modified Cherry-Hooper stage is analyzed. To achieve broadband operation in the output buffer, so-called "f/sub T/ doublers" are used. For a differential 10 mV/sub pp/ 2/sup 31/-1 pseudo random bit sequence, a bit error rate of 5/spl middot/10/sup -12/ at 3.5 Gb/s has been measured. At lower bit-rates, the bit error rate is even lower: a 1-Gb/s 10-mV/sub pp/ input signal results in a bit error rate of 7/spl middot/10/sup -14/. The TIA consumes 17mW, while the post-amplifier circuit consumes 34 mW.  相似文献   

10.
Studied the gate finger number and gate length dependence on minimum noise figure (NF/sub min/) in deep submicrometer MOSFETs. A lowest NF/sub min/ of 0.93 dB is measured in 0.18-/spl mu/m MOSFET at 5.8 GHz as increasing finger number to 50 fingers, but increases abnormally when above 50. The scaling gate length to 0.13 /spl mu/m shows larger NFmin than the 0.18-/spl mu/m case at the same finger number. From the analysis of a well-calibrated device model, the abnormal finger number dependence is due to the combined effect of reducing gate resistance and increasing substrate loss as increasing finger number. The scaling to 0.13-/spl mu/m MOSFET gives higher NF/sub min/ due to the higher gate resistance and a modified T-gate structure proposed to optimize the NF/sub min/ for further scaling down of the MOSFET.  相似文献   

11.
This paper presents an integrable RF sampling receiver front-end architecture, based on a switched-capacitor (SC) RF sampling downconversion (RFSD) filter, for WLAN applications in a 2.4-GHz band. The RFSD filter test chip is fabricated in a 0.18-/spl mu/m CMOS technology and the measurement results show a successful realization of RF sampling, quadrature downconversion, tunable anti-alias filtering, downconversion to baseband, and decimation of the sampling rate. By changing the input sampling rate, the RFSD filter can be tuned to different RF channels. A maximum input sampling rate of 1072 MS/s has been achieved. A single-phase clock is used for the quadrature downconversion and the bandpass operation is realized by a 23-tap FIR filter. The RFSD filter has an IIP/sub 3/ of +5.5 dBm, a gain of -1 dB, and more than 17 dB rejection of alias bands. The measured image rejection is 59 dB and the sampling clock jitter is 0.64 ps. The test chip consumes 47 mW in the analog part and 40 mW in the digital part. It occupies an area of 1 mm/sup 2/.  相似文献   

12.
A DCS1800 offset-phase-locked-loop upconversion modulation loop integrated circuit (IC) fabricated in a 0.18-/spl mu/m CMOS technology is presented in this paper. This IC operates at 2.8-V supply voltage with a current consumption of 36 mA. The measured root-mean-square and peak phase errors of the Gaussian minimum shift keying (GMSK) transmission signal are 1.6/spl deg/ and 4/spl deg/, respectively. It is shown that such circuits can be implemented in CMOS process with current dissipation and performance comparable to BiCMOS chips. Advantages of upconversion modulation loop and design issues of I/Q modulators are also described.  相似文献   

13.
A CMOS Bluetooth analog low-IF receiver that includes a low-noise amplifier, image-rejection mixer, IF bandpass active filter, and programmable gain amplifier (PGA) was fabricated in a 0.18-/spl mu/m bulk CMOS process. In order to achieve good sensitivity and tolerance against blocking signals, operational amplifiers were used in the active filter and PGA, the filter and PGA were interleaved to minimize noise, and an on-chip automatic tuner adjusts the filter frequency. Other features included a feedforward automatic gain control with rapid convergence. When connected to the digital demodulator of a BiCMOS Bluetooth transceiver, -88-dBm sensitivity was measured at 65-mW power dissipation. All blocking signal specifications were also satisfied.  相似文献   

14.
Decision-feedback equalisation (DFE) is explored to reduce intersymbol interference and crosstalks in high-speed backplane applications. In the design of the clock and data recovery circuit, embedding DFE within a phase and frequency detector enhances the recovery of data inherently from distorted input signals and facilitates providing DFE with the recovered clock.  相似文献   

15.
This paper describes the results of an implementation of a Bluetooth radio in a 0.18-/spl mu/m CMOS process. A low-IF image-reject conversion architecture is used for the receiver. The transmitter uses direct IQ-upconversion. The VCO runs at 4.8-5.0 GHz, thus facilitating the generation of 0/spl deg/ and 90/spl deg/ signals for both the receiver and transmitter. By using an inductor-less LNA and the extensive use of mismatch simulations, the smallest silicon area for a Bluetooth radio implementation so far can be reached: 5.5 mm/sup 2/. The transceiver consumes 30 mA in receive mode and 35 mA in transmit mode from a 2.5 to 3.0-V power supply. As the radio operates on the same die as baseband and SW, the crosstalk-on-silicon is an important issue. This crosstalk problem was taken into consideration from the start of the project. Sensitivity was measured at -82 dBm.  相似文献   

16.
The paper describes a bioluminescence detection lab-on-chip consisting of a fiber-optic faceplate with immobilized luminescent reporters/probes that is directly coupled to an optical detection and processing CMOS system-on-chip (SoC) fabricated in a 0.18-/spl mu/m process. The lab-on-chip is customized for such applications as determining gene expression using reporter gene assays, determining intracellular ATP, and sequencing DNA. The CMOS detection SoC integrates an 8 /spl times/ 16 pixel array having the same pitch as the assay site array, a 128-channel 13-bit ADC, and column-level DSP, and is fabricated in a 0.18-/spl mu/m image sensor process. The chip is capable of detecting emission rates below 10/sup -6/ lux over 30 s of integration time at room temperature. In addition to directly coupling and matching the assay site array to the photodetector array, this low light detection is achieved by a number of techniques, including the use of very low dark current photodetectors, low-noise differential circuits, high-resolution analog-to-digital conversion, background subtraction, correlated multiple sampling, and multiple digitizations and averaging to reduce read noise. Electrical and optical characterization results as well as preliminary biological testing results are reported.  相似文献   

17.
Scaling of CMOS technologies has a great impact on analog design. The most severe consequence is the reduction of the voltage supply. In this paper, a low voltage, low power, AC-coupled folded-switching mixer with current-reuse is presented. The main advantages of the introduced mixer topology are: high voltage gain, moderate noise figure, moderate linearity, and operation at low supply voltages. Insight into the mixer operation is given by analyzing voltage gain, noise figure (NF), linearity (IIP3), and DC stability. The mixer is designed and implemented in 0.18-/spl mu/m CMOS technology with metal-insulator-metal (MIM) capacitors as an option. The active chip area is 160 /spl mu/m/spl times/200 /spl mu/m. At 2.4 GHz a single side band (SSB) noise figure of 13.9 dB, a voltage gain of 11.9 dB and an IIP3 of -3 dBm are measured at a supply voltage of 1 V and with a power consumption of only 3.2 mW. At a supply voltage of 1.8 V, an SSB noise figure of 12.9 dB, a voltage gain of 16 dB and an IIP3 of 1 dBm are measured at a power consumption of 8.1 mW.  相似文献   

18.
A fully integrated matrix amplifier with two rows and four columns (2-by-4) fabricated in a three-layer metal 0.18-/spl mu/m silicon-on-insulator (SOI) CMOS process is presented. It exhibits an average pass-band gain of 15 dB and a unity-gain bandwidth of 12.5 GHz. The input and output ports are matched to 50 /spl Omega/ using m-derived half sections; the measured S/sub 11/ and S/sub 22/ values exceed -7 and -12 dB, respectively. Integrated in 2.0/spl times/2.9mm/sup 2/, it dissipates 233.4 mW total from 2.4- and 1.8-V power supplies.  相似文献   

19.
This letter presents a 5.7 GHz 0.18 /spl mu/m CMOS gain-controlled differential LNA for an IEEE 802.11a WLAN application. The differential LNA, fabricated with the 0.18 /spl mu/m 1P6M standard CMOS process, uses a current-reuse technology to increase linear gain and save power consumption. The circuit measurement is performed using an FR-4 PCB test fixture. The LNA exhibits a noise figure of 3.7 dB, linear gain of 12.5 dB, P/sub 1dB/ of -11 dBm, and gain tuning range of 6.9 dB. The power consumption is 14.4 mW at V/sub DD/=1.8 V.  相似文献   

20.
This paper presents a 0.18-/spl mu/m CMOS direct-conversion IC realized for the Universal Mobile Telecommunication System (UMTS). The chip comprises a variable gain low-noise amplifier, quadrature mixers, variable gain amplifiers, and local oscillator generation circuits. The solution is based on very high dynamic range front-end blocks, a low-power superharmonic injection-locking technique for quadrature generation and continuous-time dc offset removal. Measured performances are an overall gain variable between 21 and 47 dB, 5.6 dB noise figure, -2 dBm out-of-band IIP3, -10 dBm in-band IIP3, 44.8-dBm minimum IIP2, and -155-dBc/Hz phase noise at 135 MHz from carrier frequency, while drawing 21 mA from a 1.8-V supply.  相似文献   

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