苯并三氮唑-季铵盐体系缓蚀处理对铜耐腐蚀和抑菌性能的影响

采用由苯并三氮唑(BTA)和季铵盐QAS 1622组成的溶液对铜进行缓蚀处理。研究了BTA和QAS 1622的质量浓度及温度对所得膜层耐腐蚀性能和抑菌性能的影响。结果表明，BTA是一种有效的铜缓蚀剂，季铵盐的加入能够进一步提升其缓蚀效果。当采用3 g/L BTA和1 g/L QAS 1622组成的溶液在温度40°C下对铜处理10 min时，所得的膜层在中性3%NaCl溶液中具有最好的耐蚀性，对铜的缓蚀效率达到98.7%。覆膜法抑菌试验结果表明，3 g/L BTA缓蚀处理对铜的抑菌性能无明显影响，而加入1 g/L QSA 1622能够提升铜的抑菌性能，与大肠杆菌接触1 h的抑菌率达到99.9%。     

BTA与表面活性剂O-20复配对铜CMP缓蚀行为的研究

通过电化学和化学机械抛光实验,研究了铜互连CMP中低浓度缓蚀剂BTA和非离子表面活性剂O-20复配对Cu电化学腐蚀及去除速率的影响,同时利用扫描电子显微镜(SEM)和原子力显微镜(AFM)表征了Cu表面形貌。电化学实验结果表明,在双氧水、甘氨酸体系下,0.5 mmol/L BTA与0.5 mmol/L O-20复配后,Cu表面腐蚀减少,其缓蚀效率动态条件下为59.58%,静态条件下为85.36%,相当于1mmol/L BTA的缓蚀效率。CMP实验结果表明,BTA与O-20复配后,Cu的去除速率为113 nm/min,表面微粗糙度降低,可达0.953 nm。使用低浓度BTA与O-20复配能抑制Cu表面腐蚀,降低Cu表面抛光后的微粗糙度,并且有利于CMP后清洗。     

苯并三氮唑和硅酸钠对铜的协同缓蚀作用

通过静态失重实验、电化学测试和扫描电镜等方法研究了苯并三氮唑(BTA)和硅酸钠单独和复配使用对铜在5%氯化钠溶液中的腐蚀抑制作用。结果表明:单独使用BTA,缓蚀效率随BTA浓度增加而提高;单独使用硅酸钠,质量浓度低于50mg/L会加速铜的腐蚀,高质量浓度硅酸钠则对铜在5%氯化钠溶液中的腐蚀具有缓蚀作用;BTA和硅酸钠组成复合缓蚀剂,在总质量浓度为20 mg/L条件下按不同比例复配,以16 mg/L BTA和4 mg/L硅酸钠复配使用能够降低腐蚀电流密度,产生协同缓蚀作用,属于混合抑制型缓蚀剂。     

四元海水缓蚀剂的缓蚀性能研究

四元海水缓蚀剂由聚天冬氨酸(PASP)、葡萄糖酸钠、七水硫酸锌与2-羟基膦酰基乙酸(HPAA)复配制得.利用失重法和电化学法研究了缓蚀剂在海水中对A3碳钢的缓蚀性能.结果表明,当缓蚀剂的用量为100 mg/L时,其缓蚀率大于94％,该缓蚀剂是一种抑制阳极腐蚀为主的缓蚀剂,在海水中具有优良的缓蚀性能.     

新型铜缓蚀剂进展

<正> 目前国内普遍使用的铜缓蚀剂是苯并三唑(BTA)和2-巯基苯并噻唑(MBT)。近十多年来,人们又发现了一些新型铜缓蚀剂,其缓蚀性能更加优异。下面将那些缓蚀     

高浓度氯离子环境中铜合金缓蚀的电化学研究

应用线性电位扫描(LSV)和Tafel实验等电化学测试技术,研究了苯并三氮唑(BTA)浓度、缓蚀剂的复配、温度对铜合金在高浓度氯离子(25%氯化钙溶液)环境中腐蚀行为的影响。结果表明:缓蚀剂浓度改变将引起缓蚀效果的变化,BTA浓度较低时,铜合金腐蚀电位随缓蚀剂浓度增大而升高,腐蚀速率降低;BTA浓度超过0.2%后,铜合金腐蚀电位和腐蚀速率趋于稳定;NaNO2、Na2MoO4、(NH4)2MoO4等缓蚀剂与BTA复配,对改善缓蚀效果有一定作用;温度对缓蚀效果有重要影响,铜合金在高浓度氯离子溶液中的腐蚀速率随温度的升高而加快,缓蚀剂的缓蚀效果随温度的升高而降低。     

1-羟甲基苯并三氮唑复配物的缓蚀性能研究

以苯并三氮唑(BTA)和甲醛为原料合成了l-羟甲基苯并三氮唑,将其与乙二胺复配得到一种新的铜缓蚀剂。通过静态挂片、极化曲线以及交流阻抗等实验方法对其缓蚀性能进行了测定。实验结果证明,该缓蚀剂在3%的10 mg/L NaCl溶液中对黄铜的缓蚀率达到90%,比BTA缓蚀效果有很大提高。极化曲线测试结果表明,1-羟甲基苯并三氮唑与乙二胺复配得到的是混合型缓蚀剂。     

一种环保型阻垢缓蚀剂的性能

以聚环氧琥珀酸（PESA）、聚丙烯酸（PAA）、水解聚马来酸酐（HPMA）、苯并三氮唑（BTA）为原料,研制出一种新型具有环保功能的复合型高效阻垢缓蚀剂。通过正交试验确定该阻垢缓蚀剂中各组分的最佳浓度为：PESA(1.0 mg/L)/PAA(1.0 mg/L)/HPMA (0.6 mg/L)/BTA(0.5 mg/L)。分别采用鼓泡法、电化学试验和旋转挂片腐蚀试验研究了其阻垢缓蚀性能。试验结果表明,该阻垢缓蚀剂的阻垢率为92%,对A3碳钢、铜、不锈钢的缓蚀率分别达到了83%、97%、99%,动态模拟试验结果也显示该阻垢缓蚀剂满足循环冷却水运行要求。     

多吸附位点席夫碱缓蚀剂的合成及缓蚀效果

以4-三氟甲基苯甲醛与乙二胺为原料,经Schiff反应合成了席夫碱化合物(BEA),反应条件:反应温度为65℃,n(乙二胺)∶n(4-三氟甲基苯甲醛)=5∶1,反应时间为6 h;BEA与均苯三甲酰氯经酰胺化反应合成了多吸附位点席夫碱缓蚀剂(BTA),反应条件:反应温度为50℃,n(BEA)∶n(均苯三甲酰氯)=3.3∶1,反应时间为8 h。采用静态挂片失重法、电化学法和扫描电子显微镜(SEM)研究BEA和BTA对P110钢在1 mol/L盐酸中的缓蚀性能。失重法研究表明,当缓蚀剂质量浓度为200 mg/L时,BTA缓蚀率达99.39%,BEA的缓蚀率仅94.29%;等温吸附行为研究结果表明,缓蚀剂分子能自发地吸附于P110钢表面,满足Langmuir吸附模型;电化学法研究结果表明,BTA属于阳极控制型,在金属表面形成保护性膜,能有效抑制金属腐蚀。因此,多吸附位点缓蚀剂BTA缓蚀性能优于BEA。     

乙二胺化合物在海水中对碳钢的缓蚀作用研究

合成N,N-双(1-苯乙醇)-乙二胺作为碳钢海水缓蚀剂,通过失重实验,电化学实验研究其在静态模拟海水溶液中对碳钢的缓蚀作用,并利用自制流动腐蚀模拟系统,研究湍流流速对碳钢在模拟海水溶液中及添加有缓蚀剂的溶液中的腐蚀速率的影响。从实验结果可以看出,在静态环境中缓蚀剂对碳钢的缓蚀效率达到93%以上,随着流速的增加,腐蚀速率较静态环境增大,缓蚀剂缓蚀性能也逐渐降低。     

苯并三氮唑及其衍生物对铜的协同缓蚀效应

以苯并三氮唑(BTA)和溴代正丁烷为原料,采用一步法合成了N-丁基苯并三氮唑(N-BBTA),研究了BTA、N-BBTA以及N-BBTA与BTA的复配体系对铜在3％(质量分数)NaC1溶液中的缓蚀行为.结果表明,单一N-BBTA和BTA对铜均具有一定的缓蚀能力.当N-BBTA、BTA浓度为10 mmol/L时,缓蚀率分...     

缓蚀剂对水基环保免清洗助焊剂缓蚀性能的影响

以丁二酸、苹果酸（w= 2.00%）为活化剂,乙二醇、异丙醇和乙二醇丁醚（w= 3.00%）为助溶剂,聚乙二醇-6000（w= 0.25%）为成膜剂,咪唑（IM）、苯并咪唑（BIA）和苯并三氮唑（BTA）分别为缓蚀剂,配制系列水基免清洗助焊剂。用静态失重法、电化学阻抗谱法和扫描电子显微镜等方法研究了三种缓蚀剂对金属铜的缓蚀作用。结果表明：随三种缓蚀剂含量的增加,缓蚀率均表现出先提高后降低的趋势。其中BTA的添加量为0.08%时,缓蚀率达 88.78%,金属膜电阻R_f 达1.25×10⁶ Ω·cm²,缓蚀效果最佳。研究还表明：缓蚀剂总量为0.08%时,BIA和BTA复配（0.04%BIA + 0.04% BTA）,缓蚀率达94.25%,R_f 达2.26×10⁶ Ω·cm²,显示出明显的缓蚀协同效应。助焊剂铺展实验也表明,复配缓蚀剂的最佳添加量为0.04% BIA和0.04% BTA。     

An electrochemical and Raman spectroscopic investigation of synergetic effects in the corrosion inhibition of copper

The synergetic inhibition of copper corrosion by benzotriazole (BTA) and benzylamine (BZA) in chloride and cyanide media is assessed by voltammetric and ac impedance measurements. BZA enhances the performance of the strong inhibitor BTA by accelerating the growth of a protective surface layer; used alone, BZA is ineffective as an inhibitor. The competitive adsorption of aggressive anions and inhibitors is studied by surface enhanced Raman scattering (SERS). The dramatic increase in corrosion caused by low concentrations of cyanide ions is shown to be due to the displacement of BTA from the copper electrode surface; comparisons are made with the behaviour of mercaptobenzoxazole (MBO).     

Adsorption-desorption study of benzotriazole in a phosphate-based electrolyte for Cu electrochemical mechanical planarization

In this article, the adsorption-desorption behavior of benzotriazole (BTA) in a phosphate-based electrolyte developed for Cu electrochemical mechanical planarization (ECMP) is studied. The formation of a continuous BTA passive film adsorbed on the Cu surface has been characterized by atomic force microscopy (AFM). Additionally, the adsorption behavior of BTA was found to be mass-transfer-controlled at lower operating potentials (≤0.7 V vs. Ag/AgCl). Using a microfluidic electrochemical device and electrochemical impedance spectrum (EIS), it was also observed that at low BTA concentrations (≤0.002 M), more time was necessary to form an effective passive film on the Cu surface. Furthermore, the desorption time obtained from a potentiometric response to the removal of BTA from the electrolyte increases with increasing BTA concentration or decreasing applied potential. It is critical to expand the operating potential window and to reduce the usage of inhibitors in the proposed ECMP process to enhance the removal rate and the reduction of organic residues. Therefore, the combined microfluidic and electrochemical methodology is proven useful in finding suitable BTA concentrations and a wider potential window.     

Benzotriazole as inhibitor for copper with and without corrosion products in aqueous polyethylene glycol

Electrochemical methods, including polarization experiments and impedance spectroscopy, were used to evaluate the effectiveness of benzotriazole (BTA) in an aqueous solution of polyethylene glycol (PEG) in protecting polished archaeological copper or archaeological copper covered with corrosion products. The adsorption of PEG on the polished copper significantly limited the corrosion current. The presence of benzotriazole enhanced the protection of the polished copper, giving maximum protection at a concentration of 10^–2moll^–1 of BTA in 20 vol% PEG 400 solution. On the other hand, PEG solutions caused degradation of the corrosion products of the copper. This degradation increased with time. When BTA was added, the corrosion products were preserved and, the higher the BTA concentration, the more the corrosion current decreased. In PEG 400 solution protection of the corrosion products of the copper by BTA improved over time.     

Effect of ethylenediamine tetraacetic acid disodium on the corrosion of cold rolled steel in the presence of benzotriazole in hydrochloric acid

The inhibition behavior of cold rolled steel in 0.1 M hydrochloric acid (HCl) by ethylenediamine tetraacetic acid disodium (EDTA) in the absence and presence of benzotriazole (BTA) was investigated with Tafel polarization curve and electrochemical impedance spectroscopy (EIS). The polarization curve results show that the single EDTA acts as an anodic type inhibitor while the combination of EDTA and BTA acts as mixed type inhibitor and mainly inhibits anodic reaction. All impedance spectra in EIS tests exhibit one capacitive loop which indicates that the corrosion reaction is controlled by charge transfer process. Inhibition efficiencies obtained from Tafel polarization, charge transfer resistance (R_t) are consistent. The corrosion of cold rolled steel in 0.1 M HCl is obviously reduced by EDTA in combination with lower concentrations of BTA. Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM) were used to characterize the corrosion surface of cold rolled steel. Probable mechanisms are present to explain the experimental results.     

钨酸盐与BTA对碳钢协同缓蚀作用的研究

采用电化学阻抗谱方法研究了钨酸盐和苯并三氮唑(BTA)对碳钢的协同缓蚀作用。两者单独使用时钨酸盐的缓蚀作用比BTA显著，复配使用时表现出协同缓蚀效应，升高pH对协同缓蚀作用有利。此外还用表面分析法分析了碳钢表面膜，证明Na2WO4和BTA参与了表面膜的形成。     

Effect of benzotriazole (BTA) addition on Polypyrrole film formation on copper and its corrosion protection

Benzotriazole (BTA) was added in a conducting Polypyrrole (PPy) film prepared on copper in oxalic acid aqueous solution containing pyrrole monomer to improve corrosion protection by the PPy film and reduce copper corrosion. When BTA was added in the preparation solution, the copper surface was covered by a BTA–Cu complex layer before the anodic polymerization of PPy was started. On the copper surface with the BTA layer, the initial dissolution of copper was inhibited and the PPy polymerization-deposition was started immediately after the anodic current was imposed. The PPy film thus formed was doped with oxalic ions and ionized BTA and was homogeneous in thickness and strongly adhesive. The PPy film containing BTA protected the copper from corrosion in 3.5 wt.% NaCl solution. In 400 h of immersion, copper dissolution was inhibited with 80% protection efficiency relative to that of bare copper.     

Experimental and atomistic simulation studies of corrosion inhibition of copper by a new benzotriazole derivative in acid medium

The efficiency of N-(2-thiazolyl)-1H-benzotriazole-1-carbothioamide (TBC) as a non-toxic corrosion inhibitor for copper in 0.5 M HCl has been tested by weight loss and electrochemical techniques. Electrochemical techniques show that TBC is a mixed-type inhibitor and its inhibition mechanism on copper surface is adsorption assisted by H-bond formation. Impedance measurements show a wide peak presumably given by more than one time constant in the presence of TBC. Also, impedance results show that the values of CPEs (constant phase elements) tend to decrease and both polarization resistance and inhibition efficiency tend to increase with increasing of TBC concentration due to an increase in the electric double layer. Monte Carlo simulations incorporating molecular mechanics and molecular dynamics show that the TBC adsorb on the copper surface firmly through the thiazolyl and carbothioamide groups, the adsorption energy as well as hydrogen bond length have been calculated for both TBC and benzotriazole (BTA) for comparison. Quantum chemical calculations reveal that TBC has higher HOMO, lower LUMO, lower energy gap and lower dipole moment (μ) than BTA, which proves that TBC is better copper corrosion inhibitor compared with BTA in 0.5 M HCl.     

Effects of BTA2 as the third component on the charge carrier generation and recombination behavior of PTB7:PC71BM photovoltaic system

Effects of a benzotriazole(BTA)-based small molecule,BTA2,as the third component on the charge carrier generation and recombination behavior of poly[[4,8-bis[(2-ethylhexyl)oxy]benzo[1,2-b:4,5-b']dithiophene-2,6-diyl][3-fluoro-2-[(2-ethylhexyl)carbonyl]thieno[3,4-b]thiophenediyl]](PTB7):[6,6]-phenyl-C71-butyric acid methyl ester(PC71BM)organic solar cells(OSCs)were investigated by optical simulation of a transfer matrix model(TMM),photo-induced charge extraction by linearly increasing voltage(photo-CELIV)technique,atomic force microscope(AFM),and the Onsager–Braun model analysis.BTA2 is an A₂-A₁-D-A₁-A₂-type non-fullerene small molecule with thiazolidine-2,4-dione,BTA,and indacenodithiophene as the terminal acceptor(A₂),bridge acceptor(A₁),and central donor(D),respectively.The short-circuit current density of the OSCs with BTA2 can be enhanced significantly owing to a complementary absorption spectrum.The optical simulation of TMM shows that the ternary OSCs exhibit higher internal absorption than the traditional binary OSCs without BTA2,resulting in more photogenerated excitons in the ternary OSCs.The photo-CELIV investigation indicates that the ternary OSCs suffer higher charge trap-limited bimolecular recombination than the binary OSCs.AFM images show that BTA2 aggravates the phase separation between the donor and the acceptor,which is disadvantageous to charge carrier transport.The Onsager-Braun model analysis confirms that despite the charge collection efficiency of the ternary OSCs being lower than that of the binary OSCs,the optimized photon absorption and exciton generation processes of the ternary OSCs achieve an increase in photogenerated current and thus improve power conversion efficiency.