Thermal treatment for optical proximity correction

For 32-nm technology node, thermal treatment is one of the process extension techniques with 193-nm ArF lithography equipment and chemically-amplified resist (CAR). However, it is difficult to use these techniques in the manufacture process because the optical proximity effect of thermal effects is quite severe. In this paper, thermal processes, such as softbake, post-exposure bake and thermal reflow, are described and modeled to investigate the property changes of a positive type, 193-nm CAR. The simulated results agree well with the experimental results. For the optical proximity correction (OPC) of the thermal effects, an orthogonal functional method is introduced. Due to contact hole (C/H) pattern, the underbake of post-exposure bake (PEB) and thermal reflow are performed for the 45-nm critical dimension (CD) by using the OPC simulated images, to demonstrate the possibility of controlling these thermal processes for the formation of 32-nm CD.     

Characterization of the spatial distribution of irradiance and spectrum in concentrating photovoltaic systems and their effect on multi‐junction solar cells

The irradiance and spectral distribution cast on the cell by a concentrating photovoltaic system, typically made up of a primary Fresnel lens and a secondary stage optical element, is dependent on many factors, and these distributions in turn influence the electrical performance of the cell. In this paper, the effect of spatial and spectral non‐uniform irradiance distribution on multi‐junction solar cell performance was analyzed using an integrated approach. Irradiance and spectral distributions were obtained by means of ray‐tracing simulation and by direct imaging at a range of cell‐to‐lens distances. At the same positions, I–V curves were measured and compared in order to evaluate non‐uniformity effects on cell performance. The procedure was applied to three different optical systems comprised a Fresnel lens with a secondary optical element consisting of either a pyramid, a dome, or a bare cell. Copyright © 2011 John Wiley & Sons, Ltd.     

光外差测量在无损探伤中的相位匹配

在光外差测量中，信号光与本振光的光程差、探测器的相对位置、探测器光敏面相对于激光光斑的大小和聚焦透镜的焦距，对系统的外差效率都有重要影响。针对光学外差无损探伤应用，计算分析了这4个因素对外差效率的影响。对外差效率的数值计算表明：系统外差效率随着光程差的增大而降低，探测器位置不同，此下降趋势不同；探测器相对位置和探测器光敏面大小则具有最佳值；聚焦透镜对外差效率有很大的影响，其焦距只能在一个很窄的范围内选择，被测目标物体与测量系统中透镜的距离越近，此选择范围越窄。根据理论计算所设计的超声外差探伤系统，外差效率可达0．965。系统用于由脉冲激励超声工件的内部探伤，观察到距离1555mm处钢管微小裂缝的超声反射信号。     

基于光纤传输的激光引信仿真系统

激光引信是制导武器普遍使用的近炸引信，然而要在实验室内获得接收机窗口处的光信号功率并验证信号处理系统的准确性是比较困难的。针对这一问题，提出一种基于光纤传输的激光引信仿真系统。此系统首先通过耦合透镜和自聚焦透镜将发射机输出的激光束耦合进入光纤通道，然后通过程序控制的宽带光强衰减器实时地模拟光束经过目标反射引起的光强衰减，最后将衰减后的光信号通过光纤传输并经过耦合透镜馈入引信的接收机窗口。该系统的设计能够较为准确地模拟激光引信在交会过程中的回波光功率大小，并可实时地仿真激光引信各通道的回波信号，从而可以在实验室内验证激光引信信号处理系统的可靠性。     

利用固体浸没透镜的近场光学存储研究

固体浸没透镜的近场光学存储是一种有效的超高密度光存储方法。在自建的实验装置上利用固体浸没透镜 (SIL)在偶氮聚合物液晶 (P CN)上进行近场光存储实验 ,存储点的尺寸小于 0 5 μm(激光波长为 5 32nm)。并且研究了不同聚焦深度及入射激光强度对记录效果的影响。     

掺铁铌酸钾晶体中的光感生各向异性散射及其光学限制效应

光学限制器是光学系统的保护装置,其保护特性 是由光限制材料与光强或功率有关 的光学非线性效应所产生的,其中光折变晶体中的光感生散射便为该效应之一,多年来受到 世界研究者的广泛研究和关注。对于这类光感生散射,有人提出它是由晶体的表面和体散射 产生的,研究使用的晶体为 LiNbO₃:Fe、LiTaO₃、BaTiO₃,并使用固定的晶体样品和 聚焦透 镜间距。为了进一步探索该散射的产生机理,本文研究了掺铁铌酸钾晶体在激光照射下产生 的光感生各向异性散射特性,利用Z扫描技术测量了该晶体中的 光感生折射率变化,并对晶 体中光散射形成的光学限制特性进行了研究。分析表明该各向异性散射主要是由掺铁铌酸钾 晶体中光感生的柱面透镜效应所导致的。利用光折变晶体中光感生光散射效应的光学限制器 ,一方面可以通过改变晶体尺寸、透镜焦距、小孔光阑大小等来调整其性质,另一方面因其 利用的是低功率连续波激光进行工作,所以能够承受更大的功率和更长的寿命。     

Investigation of photoresist-specific optical proximity effect

Optical proximity effects arising from individual resist characteristics are investigated. The parameters studied are those used in photoresist exposure and development simulation using the SOLID and Prolith/2 programs. The optical proximity effect is found to be independent of the exposure parameters but greatly affected by the development process and is shown to be a function of the Mack parameter, n, which is related to the resist contrast, γ. Finally, in order to put this effect into perspective with other resist selection criteria, the development parameter, n, is also shown to be related to wall angle and depth-of-focus (DOF).

The results of this investigation will therefore enable the user to select the most appropriate photoresist for a specific application.     

深紫外光刻投影物镜的三维偏振像差

深紫外光刻投影物镜是光刻机的核心部件,然而无论是照明光场偏振态的空间分布,还是光刻投影物镜自身的偏振像差都将改变光束的紧聚焦特性,对成像质量造成不可忽略的影响。基于三维琼斯矩阵,把偏振像差函数推广到三维空间,建立了三维相干光场中偏振像差的评价方法,并分析了典型的偏振敏感光学系统深紫外光刻投影物镜的三维偏振像差,详细阐述了其物理意义。研究发现:三维偏振像差函数的光瞳分布与视场、光学薄膜以及光学系统的自身结构密切相关。深入讨论了光学薄膜及偏振效应对光刻投影物镜成像质量的影响,进一步研究了照明光场的偏振态分布与光学系统波像差的关系,研究表明:光学薄膜引入的附加位相将导致光刻投影物镜的像质明显下降,而采用径向矢量光场照明可以改善成像质量。     

Modelling strategies for the incorporation and correction of optical effects in EUVL

Extreme ultraviolet lithography (EUVL) is a leading candidate for the 22 nm node lithography and beyond. However, there are still some critical problems before EUVL may be deployed in high-volume manufacturing. One of the critical problems is to estimate the EUVL aerial image formation for optical proximity correction (OPC) in order to compensate for EUVL effects such as shadowing and flare. This study discusses aerial image formation through modeling of optical transfer function to assimilate optical diffraction, long range layout dependent flare effects, and shadowing effects due to non-telecentric imaging optics in the EUV case. Hence, after optimizing optical process parameters to model the EUV aerial image, this study will investigate OPC modeling methods employed to compensate these optical effects in the mask design flow.     

A compact optical isolator with a plano-convex YIG lens forlaser-to-fiber coupling

An optical isolator for laser-to-single-mode fiber coupling is discussed. The coupling unit consists of a confocal two-lens system with a spherical glass lens and a planoconvex lens which is made of yttrium iron garnet (YIG). To minimize the number of elements, the YIG lens is used as a Faraday rotator as well as a coupling lens. Nevertheless, the planoconvex YIG lens satisfies the requirements of high coupling efficiency, high isolation, and low optical feedback from the Faraday rotator. The arrangement is theoretically and experimentally investigated. At a coupling efficiency of 34%, the total optical feedback into the laser diode was measured to be about -60 dB     

一种实现均匀照明的LED平凸透镜设计

为实现均匀圆形光斑的照明,提出了一种自由曲面平凸透镜的算法。依据非成像光学核心理论:光学扩展量守恒和能量守恒,根据Snell定律,建立透镜轮廓曲线所满足的常微分方程,采用Matlab中的DDE(动态传输)技术与Tracepro中的Scheme语言完成动态数据的链接,从而完成透镜的3D建模,省去了导入3D软件拟合曲线所带来的误差,让建模变得更加精确。结果表明,该种算法可在特定区域实现均匀照明,透镜直径23 mm,材质为光学级PC,且在透镜距离光源10 mm时光学效率可达51.99%     

面向高性能的红外折射式镜头装调技术

针对红外光学材料折射率不均匀导致系统波前产生异常像差,从而引起镜头像质严重下降的问题,提出了一种光学件位置迭代调整和面形修配相结合的系统波前补偿方法,实现面向高性能的红外折射式镜头装调。在光学件精密定心的基础上,设计了在线装调检测装置,依据镜头实测波前并结合计算机辅助装调技术,通过迭代调整光学件位置矫正系统波前初阶像差。对系统残留的中高阶像差,根据各视场测得的系统波前综合分析计算,采用修配光瞳处光学件面形,引入反残留波像差的方式补偿。实验上,通过对某红外折射式镜头装调,将镜头三个视场系统波前RMS (λ=3.39μm)分别由精密定心后的0.162λ、0.118λ、0.166λ降低至0.064λ、0.040λ、0.067λ,平均MTF (@25 lp/mm)由0.31提升至0.67。结果表明,这种装调技术对红外折射式镜头系统波前补偿效果明显,可大幅提升镜头成像性能,具有重要的工程应用价值。     

Three-Dimensional Wave Optical Simulation for Image Sensors by Localized Boundary Element Method

A novel wave optical simulation method [a localized boundary element method (BEM)] has been developed. This method enables us to execute 3-D wave optical simulation with much smaller memory space and much shorter calculation time than conventional BEMs or finite-difference time domain methods. The light gathering power dependence on cell size and microlens height and distance, the color shading characteristics of inner lens structures, and the light gathering power and cross talk of light waveguide were analyzed by this method. A smaller cell needs a shorter focal length microlens, which can be realized by inner lens structures in CCD or the waveguide structures in CMOS image sensors. It is shown that this method can optimize these structures by calculating the color shading dependence on the microlens shape and the cross talk dependence on the waveguide materials. This method was found to be powerful and useful for the 3-D wave optical analysis of image sensors.     

重复率高功率Nd玻璃激光器的热透镜效应的消除

研究了重复率高功率强激光作用下热平衡状态激光的热透镜效应。观察和分析了激光棒从非热平衡到热平衡状态的热透镜效应，通过采取插入光学补偿系统的方法，使得激光器系统在热平衡状态下的热透镜效应得以消除，从而得到较好的激光输出和稳定的实验系统。     

某空间气体监测仪热设计及试验验证

某空间气体监测仪结构布局紧凑,在较小尺寸空间内交错布置有8个镜头组件、11台电子设备内热源和2个电机。内热源数量众多,工作时间长,与镜头控温要求差别大,且1个电机为二维转动热源,这些特点给热设计带来挑战。为有效解决热控难题,采用了多种设计思路组合。基于热管理思路对监测仪各部组件热行为进行系统管理,以节省热控资源;基于间接热控思路对所处热环境复杂的光学镜头组件进行控温,提高其控温精度和温度稳定度;对转动电机则进行辐射冷却,避免在传热路径中引入挠性转动环节,以提高热控系统可靠性;并基于结构热控一体化设计,在结构上充分保证热设计各项需求。热平衡试验结果表明:高低温工况下,监测仪各部组件温度均满足指标要求,且整个寿命周期内,光学镜头温度稳定度较高,同一工况下光学镜头最大温度波动在1℃以内,实现了多热源复杂工作机制下光学镜头的高精度精密热控。     

光微流控可调谐渐变折射率透镜特性研究

基于对流扩散效应,利用有限元分析法建立了一种光学渐变折射率微腔流体透镜。分析了微腔中芯、包层液体在对流扩散过程达到稳定后的浓度分布情况,即所谓的混合流体折射率分布。研究了对流扩散模型结构,分别在一般情况下（芯层流体折射率大于包层流体折射率）和中心凹陷情况下（芯层流体折射率小于包层流体折射率）,沿流体流动方向的不同截面对流扩散后折射率分布情况。     

非球面齐明透镜的设计

鉴于过去文献只对非球面消球差透镜做了分析,根据初级像差理论给出了非球面齐明透镜(同时消球差和彗差)初始结构的求解方法,包括非球面齐明单透镜和非球面齐明双透镜的求解方法;并利用Zemax光学设计软件验证了这种求解方法的正确性.通过大量的计算给出了各种关系曲线,并分析了相对口径与透镜球差的变化关系,这些分析对光学系统的设计都是有益的.     

高斯光束在光纤间的透镜耦合

高斯光束在光纤间的透镜耦合是耦合方式中较为常用的一种。首先指出高斯光束在光纤间利用透镜耦合的基本要求，然后通过归一化高斯光束的成像规律进行数值计算，分析了多个因素对于耦合的影响，得到透镜及整个耦合系统参数选择的一般性结论。最后给出一个耦合实例证明该方法的可行性。     

计算全息技术在光学相关识别中的应用

为了实现光相关匹配滤波系统的小型化、集成化,采用纯计算全息技术,构建了一个光学相关识别系统.理论分析和实验验证表明,用计算全息透镜代替傅里叶透镜制得的复数滤波器,集成了4f系统中第2个傅里叶变换透镜的作用,滤波器后面不再用傅里叶透镜.这样减少了光学元件,同时缩短了光路.结果表明,该系统和4f光学相关识别系统一样,能够进行相关识别且具有平移不变性.     

激光定距引信远场光斑的压缩整形

针对激光定距引信的小型化激光发射系统远场光斑过大、探测距离偏近的问题展开研究。利用几何光学原理对激光定距引信的发射光学系统进行设计,采用非球面透镜与变形棱镜组合实现引信远场光斑的压缩整形,并通过ZEMAX 光学软件仿真优化和光斑试验。仿真试验结果表明,发射光束经过光学系统后,500m处的激光光斑直径被压缩到10 mm 且呈圆对称形状,准直效果显著优于柱透镜光学系统,使原有小型化、低功耗的激光定距引信探测距离明显增大。