Tungsten-doped tin oxide thin films prepared by pulsed plasma deposition

Transparent conductive oxide tungsten-doped tin oxide thin films were deposited on glass substrates from ceramic targets by the pulsed plasma deposition method. The structural, electrical and optical properties have been investigated as functions of tungsten doping content and oxygen partial pressure. The lowest resistivity of 2.1 × 10^? 3 Ω?cm was reproducibly obtained, with carrier mobility of 30 cm²V^? 1s^? 1 and carrier concentration of 9.6 × 10¹⁹ cm^? 3 at the oxygen partial pressure of 1.8 Pa. The average optical transmission was in excess of 80% in the visible region from 400 to 700 nm, with the optical band gap ranging from 3.91 to 4.02 eV.     

Chemical bonding and optoelectrical properties of ruthenium doped yttrium oxide thin films

Highly infrared transparent conductive ruthenium doped yttrium oxide (RYO) films were deposited on zinc sulfide and glass substrates by reactive magnetron sputtering. The structural, optical, and electrical properties of the films as a function of growth temperature were studied. It is shown that the sputtered RYO thin films are amorphous and smooth surface is obtained. The infrared transmittance of the films increases with increasing the growth temperature. RYO films maintain greater than ∼65% transmittance over a wide wavelength range from 2.5 μm to 12 μm and the highest transmittance value reaches 73.3% at ∼10 μm. With increasing growth temperature, the resistivity changed in a wide range and lowest resistivity of about 3.36 × 10⁻³ Ω cm is obtained at room temperature. The RYO thin films with high conductivity and transparency in IR spectral range would be suitable for infrared optical and electromagnetic shielding devices.     

Room temperature deposition of IZTO transparent anode films for organic light-emitting diodes

This study was to investigate anodic electrode IZTO films deposited by pulsed DC magnetron sputter at room temperature with various oxygen partial pressures onto glass substrate and to analyze the structural, electrical, and optical properties, as well as the relationship between the chemical binding state of the surface and the characteristics of IZTO films. In addition, the prepared IZTO films were used to fabricate the organic light emitting diodes (OLEDs) as an anode layer to study the device performances. The IZTO film deposited at optimal oxygen partial pressure of 2.0% in sputtering process showed the best properties, such as a low electrical resistivity and high optical transmittance of <5.1 × 10^?4 Ω cm and >80% in the visible wavelength of 400–800 nm, respectively. The OLED characteristics with the optimum condition showed good brightness and the lowest turn-on voltage of >10,000 cd/m² and 4.67 V. These results indicate that IZTO films can be a promising candidate as an alternative TCO electrode material for flexible and OLED devices.     

Preparation of ZnO:Al thin film on transparent TPT substrate at room temperature by RF magnetron sputtering technique

Aluminum doped ZnO thin films (ZnO:Al) deposited on flexible substrates are suitable to be used as transparent conductive oxide (TCO) thin films in solar cells because of the excellent optical and electrical properties. TPT films are a kind of composite materials and are usually used as encapsulation material of solar panels. In this paper, ZnO:Al film was firstly deposited on transparent TPT substrate by RF magnetron sputtering. The structural, optical, and electrical properties of the film were investigated by X-ray diffractometry (XRD), scanning electron microscope (SEM), UV–visible spectrophotometer, as well as Hall Effect Measurement System. Results revealed that the obtained film had a hexagonal structure and a highly preferred orientation with the c-axis perpendicular to the substrate. Also, the film showed a high optical transmittance over 80% in the visible region and a resistivity of about 3.03 × 10^? 1 Ω·cm.     

Evolution of different structural phases of TiO2 films with oxygen partial pressure and Fe doping and their electrical properties

We have studied the influence of oxygen partial pressure (OPP; 250 mTorr–1 × 10^?5 Torr) and Fe doping (2 and 4 at.%) on structural and electrical properties of TiO₂ thin films on LaAlO₃ substrates. X-ray photoelectron spectroscopy suggests that Fe is not in metal cluster form. It is found that the evolution of the three phases; anatase, rutile and brookite of TiO₂ as well as the magneli phase (Ti_nO_2n?1) strongly depends on the OPP and Fe doping concentration. All the films grown at 250 mTorr show insulating behavior, whereas films grown at 1 × 10^?2 and 1 × 10^?4 Torr reveal high temperature metallic to low temperature semiconducting transition. Interestingly, films deposited at 1 × 10^?5 Torr reveal charge ordering, which is contributed to the magneli phase of TiO₂. The present study suggests that functionality of TiO₂ thin film based devices can be tuned by properly selecting the OPP and dopant concentration.     

Effect of annealing on conversion efficiency of nanostructured CdS/CuInSe2 heterojunction thin film solar cell prepared by chemical ion exchange route at room temperature

We report, the effect of air annealing on solar conversion efficiency of chemically grown nanostructured heterojunction thin films of CdS/CuInSe₂, such 100, 200 and 300 °C air annealed thin films characterized for physicochemical and optoelectronic properties. XRD pattern obtained from annealed thin films confirms tetragonal crystal geometry of CuInSe₂ and an increase in average crystallite size from 16 to 32 nm. An EDAX spectrum confirms expected and observed elemental composition in thin films. AFM represents high energy induced grain growth and agglomeration due to polygonization process. Increase in optical absorbance strength and decrease in energy band gap from 1.36 to 1.25 eV is observed. Increase in charge carrier concentration from 2 × 10¹⁶ to 8 × 10¹⁷ cm^?3 is observed as calculated from Hall effect measurements and an enhancement in solar conversion efficiency from 0.26 to 0.47% is observed upon annealing.     

Epitaxial growth of non-polar m-plane ZnO thin films by pulsed laser deposition

Non-polar ZnO thin films were deposited on m-plane sapphire substrates by pulsed laser deposition at various temperatures from 300 to 700 °C. The effects of growth temperature on surface morphology, structural, electrical, and optical properties of the films were investigated. All the films exhibited unique m-plane orientation indicated by X-ray diffraction and transmission electron microscopy. Based on the scanning electron microscopy and atomic force microscopy, the obtained films had smooth and highly anisotropic surface, and the root mean square roughness was less than 10 nm above 500 °C. The maximum electron mobility was ～18 cm²/V s, with resistivity of ～0.26 Ω cm for the film grown at 700 °C. Room temperature photoluminescence of the m-plane films was also investigated.     

Thermal expansion of hydroxyapatite between − 100 °C and 50 °C

Hydroxy apatite (HAp) ceramic was synthesized using traditional sintering. Dilatometric and lattice thermal expansion properties of a HAp ceramic were evaluated at temperatures of ? 100–50 °C. In that temperature range, the dilatometric thermal expansion coefficient and the lattice thermal expansion coefficient of the HAp ceramic were, respectively, 10.6 × 10^? 6/°C and 9.9 × 10^? 6/°C. Furthermore, thermal expansion properties of a human tooth were measured. The thermal expansion coefficient of the horizontal direction perpendicular to the growing direction of a tooth was 15.5 × 10^? 6/°C; that of the vertical direction along with the direction of tooth growth was 18.9 × 10^? 6/°C at the temperature range described above.     

Formation of F-doped ZnO transparent conductive films by sputtering of ZnF2

Fluorine-doped ZnO transparent conductive thin films were successfully deposited on glass substrate by radio frequency magnetron sputtering of ZnF₂. The effects of rapid thermal annealing in vacuum on the optical and electrical properties of fluorine-doped ZnO thin films have been investigated. X-ray diffraction spectra indicate that no fluorine compounds, such as ZnF₂, except ZnO were observed. The specimen annealed at 500 °C has the lowest resistivity of 6.65 × 10^? 4 Ω cm, the highest carrier concentration of 1.95 × 10²¹ cm^? 3, and the highest energy band gap of 3.46 eV. The average transmittance in the visible region of the F-doped ZnO thin films as-deposited and annealed is over 90%.     

Structural and optical studies on dc reactive magnetron sputtered Cu2O films

Cuprous oxide (Cu₂O) thin films were deposited by dc reactive magnetron sputtering technique onto glass substrates by sputtering of pure copper target in a mixture of argon and oxygen gases under various oxygen partial pressures in the range 8 × 10^− 3–1 × 10^− 1 Pa at a constant substrate temperature of 473 K and a sputtering pressure of 4 Pa. The dependence of cathode potential on the oxygen partial pressure was explained in terms of cathode poisoning effect. The influence of oxygen partial pressure on the structural and optical properties of Cu₂O films was systematically studied. Single phase films of Cu₂O were obtained at an oxygen partial pressure of 2 × 10^− 2 Pa. The films formed at an oxygen partial pressure of 2 × 10^− 2 Pa were polycrystalline with cubic structure and exhibited an optical band gap of 2.04 eV.     

Growth and characterization of indium oxide thin films prepared by spray pyrolysis

Highly transparent and conducting indium oxide thin films are prepared on glass substrates from precursor solution of indium chloride. These films are characterized by X-ray diffraction, scanning electron microscopy and optical transmission. The preferential orientation of these films is found to be sensitive to deposition parameters. A comparative study has been made on the dependence on the thickness of the film on substrate temperatures with aqueous solution and 1:1 C₂H₅OH and H₂O as precursors. Films deposited at optimum conditions have 167 nm thickness and exhibited a resistivity of 2.94 × 10⁻⁴ Ω m along with transmittance better than 82% at 550 nm. The analytical expressions enabling the derivation of the optical constants of these films from their transmission spectrum only have successfully been applied. Finally, the refractive index dispersion is discussed in terms of the single-oscillator Wemple and Didomenico model.     

Formation of nanotubes in Cz Si wafers using He+ implantation and subsequent O+- or N+-plasma treatment

Standard 4.5 Ω cm n-type and 12 Ω cm p-type Cz Si wafers were implanted with helium ions of 300 keV energy and the fluences of 1 × 10¹⁵, 5 × 10¹⁵, 1 × 10¹⁶ or 2 × 10¹⁶ at/cm² at room temperature. The implanted wafers were then annealed in vacuum at 650, 700, 750 or 800 °C. Then oxygen or nitrogen ions of the fluence of 2 × 10¹⁷ cm^?2 were introduced to the silicon wafers from a plasma source followed by annealing the samples in vacuum at 900 °C.The structural properties of the samples were investigated using SEM. To control the treatment's influence on the electrical properties of the wafers, the measurements of charge carriers' lifetime were carried out.1D defects (nanotubes) normal to the sample surface with defect's length equal to the projected range of the implanted ions were formed in the Cz Si wafers following He⁺ implantation with subsequent vacuum annealing and plasma treatment. The surfaces of wafers contained a small density of defects.     

Oxygen partial pressure dependence of the structural properties of CdO thin films deposited by a modified reactive vacuum evaporation process

Thin films of cadmium oxide were thermally deposited on glass substrates at partial pressures of oxygen, pO₂ in the range 1.33×10⁻² to 0.133 Pa at a substrate temperature of 160 °C. Energy dispersive analysis of X-ray fluorescence (EDAX) revealed that the CdO films deposited at pO₂ value of 4.00×10⁻² Pa were nearly stoichiometric. X-ray diffractometry (XRD) confirmed the polycrystalline nature of the film structure. All the films showed an fcc structure of the NaCl-type, as the dominant phase. The films exhibited preferred orientation along the (1 1 1) diffraction plane. The texture coefficients calculated for the various planes at different oxygen partial pressures (pO₂) indicated that the maximum preferred orientation of the films occurred along the (1 1 1) plane at an oxygen partial pressure of 4.00×10⁻² Pa. This was interpreted in terms of oxygen chemisorption and desorption processes. The lattice parameters determined from the diffraction peaks were in the range 4.655–4.686 Å. The average lattice parameter a₀ found by extrapolation using the Nelson–Riley function was 4.696 Å. Both the lattice parameter and the crystallite size were found to increase with increased partial pressure of oxygen. On the other hand, the strain and dislocation density were found to decrease as the partial pressure of oxygen was raised. A maximum (80%) in the optical transmittance at λ=600 nm and minimum in the electrical resistivity (9.1×10⁻⁴ Ω cm) of the films occurred at an optimum partial pressure of oxygen of 4.00×10⁻² Pa. The results are discussed.     

Spectroscopic ellipsometry study of thin film thermo-optical properties

Spectroscopic ellipsometry (SE) was employed to realize in-situ monitoring and the determination of thermo-optic coefficients (TOC) of thin films by integrating a temperature controlled hot stage to the ellipsometer and applying the empirical relationship of Cauchy between the refractive index and wavelength in the data analysis. Magnetron sputtered titanium oxide thin films of 350 nm thick both as-deposited and post-deposition annealed were prepared on silicon wafers for this investigation. Results of ellipsometric analysis show that as-deposited TiO₂ films have a negative TOC of ? 1.21 × 10^? 4 K^? 1 at 630 nm over the test temperature range 304–378 K. The post-deposition annealing at 923 K for 2 hours leads an increase in film refractive index to 2.29 from 2.17 for as-deposited TiO₂ films, and an enhancement in TOC up to ? 2.14 × 10^? 4 K^? 1. X-ray diffraction (XRD) and scanning electron microscopy (SEM) cross-sectional analysis were performed for film structure characterization.     

Effects of ZnO addition on electrical and structural properties of amorphous SnO2 thin films

Amorphous Zn–Sn–O (ZTO) thin films with relative Zn contents (= [at.% Zn]/([at.% Zn] + [at.% Sn])) of 0, 0.08 and 0.27 were fabricated by co-sputtering of SnO₂ and ZnO targets at room temperature. Changes in structural, electrical and optical properties together with electron transport properties were examined upon post-annealing treatment in the temperature range from 200 to 600 °C in vacuum and in air. Characterization by XRD showed that an amorphous ZTO thin film crystallized at higher temperatures with increasing Zn content. Crystallized ZTO films with a relative Zn content of 0.27 might not contain a single SnO₂ phase which is observed in the films of the other compositions. Amorphous ZTO films showed decreasing electrical resistivities with increasing annealing temperature, having a minimum value of 1 × 10^− 3 Ω cm. Upon crystallization, the resistivities increased drastically, which was attributed to poor crystallinity of the crystallized films. All the ZTO films were found to be degenerate semiconductors with non-parabolic conduction bands having effective masses varying from 0.15 to 0.3 in the carrier concentration range of 6 × 10¹⁸ to 2 × 10²⁰ cm^− 3. As for a ZTO film with a relative Zn content of 0.27, the degree of non-parabolicity was much lower compared with films of the other compositions, leading to a relatively stable mobility over a wide range of carrier concentration.     

Hydrothermal synthesis of mesoporous VO2·½(H2O) nanosheets and study of their electrical properties

Layered sheet-like nanocrystalline VO₂·½(H₂O) has been synthesized by hydrothermal process using V₂O₅ as vanadium source and 2-phenylethylamine as a reducing agent and a structure-directing template. Techniques X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), Fourier transform infrared spectroscopy (FTIR) and nitrogen adsorption/desorption isotherms have been used to characterize the structure, morphology and composition of the materials. Electrical conductivity measurements showed that the as synthesized VO₂·½(H₂O) nanosheets has a conductivity value which goes from 75 × 10^?6 Ω^?1 cm^?1 at 298 K, to 68 10^?5 Ω^?1 cm^?1 at 386 K with activation energy of 0.24 eV.     

Structural and pyroelectric properties of sol–gel derived multiferroic BFO thin films

Multiferroic BFO/PZT multilayer films were fabricated by spin-coating method on the (1 1 1)Pt/Ti/SiO₂/Si substrate alternately using PZT(30/70), PZT(70/30) and BFO alkoxide solutions. The structural and ferroelectric properties were investigated for uncooled infrared detector applications. The coating and heating procedure was repeated six times to form BFO/PZT multilayer films. All films showed the typical XRD patterns of the perovskite polycrystalline structure without presence of the second phase such as Bi₂Fe₄O₃. The thickness of BFO/PZT multilayer film was about 200–220 nm. The ferroelectric properties such as dielectric constant, remnant polarization and pyroelectric coefficient were superior to those of single composition BFO film, and those values for BFO/PZT(70/30) multilayer film were 288, 15.7 μC/cm² and 9.1 × 10^?9 C/cm² K at room temperature, respectively. Leakage current density of the BFO/PZT(30/70) multilayer film was 3.3 × 10^?9 A/cm² at 150 kV/cm. The figures of merit, F_V for the voltage responsivity and F_D for the specific detectivity, of the BFO/PZT(70/30) multilayer film were 6.17 × 10^?11 Ccm/J and 6.45 × 10^?9 Ccm/J, respectively.     

Hydrothermal synthesis,characterization and electrical investigation of poly(para-phenylenediamine)/vanadium oxide nanocomposite nanosheets

Sheet-like mesoporous poly(paraphenylenediamine)/vanadium oxide nanocomposite has been synthesized by the hydrothermal process using the vanadium oxide V₂O₅ as inorganic precursor and paraphenylendiamine as reducing and a structure-directing agent. Such techniques as X-ray diffraction (XRD), scanning electron microscopy (SEM), thermal analysis (TG-DTA), Fourier transform infrared spectroscopy (FTIR), Raman Spectroscopy, X-ray photoelectron spectroscopy (XPS) and nitrogen adsorption/desorption isotherms (BET) have been used to characterize the structure, morphology and the texture of the material. The conductivity of the material was measured by complex impedance spectroscopy which increases from 72 × 10^?5 Ω^?1 cm^?1 at 298 K to 95 × 10^?4 Ω^?1 cm^?1 at 493 K. The Arrhenius diagram is not linear, it presents a rupture situated at 407 K and the activation energies’ average values are 0.044 eV and 0.13 eV.     

High permittivity and low dielectric loss of Na0.5Bi0.5−xLaxCu3Ti4O12 ceramics

The phase structure, microstructure and dielectric properties of Na_0.5Bi_0.5?xLa_xCu₃Ti₄O₁₂ (NBLCTO) ceramics were investigated. La³⁺ substitution had a great influence on the phase structure and dielectric properties. The results showed that the pure phase could be more easily obtained when substituting La³⁺ for Bi³⁺. Under the same processing condition (970 °C for 7.5 h) and measuring condition (10 kHz around room temperature), NBLCTO ceramics with x = 0.10 possessed the highest permittivity (1.02 × 10⁴) and lowest dielectric loss (0.022). The obtained NBLCTO ceramics with x = 0.10 also had good frequency stability and good temperature stability (?1.87% to +3.27%) from ?60 °C to 120 °C at both 1 and 10 kHz. Complex impedance results revealed that the grain resistance R_g was 7.18 Ω cm and the grain boundary resistance R_gb was 1.19 × 10⁶ Ω cm.     

Crosslinked collagen–gelatin–hyaluronic acid biomimetic film for cornea tissue engineering applications

Cornea disease may lead to blindness and keratoplasty is considered as an effective treatment method. However, there is a severe shortage of donor corneas worldwide. This paper presents the crosslinked collagen (Col)–gelatin (Gel)–hyaluronic acid (HA) films developed by making use of 1-ethyl-3-(3-dimethyl aminopropyl) carbodiimide (EDC) and N-hydroxysuccinimide (NHS) as the crosslinker. The test results on the physical and biological properties indicate that the CGH631 film (the mass ratio of Col:Gel:HA = 6:3:1) has appropriate optical performance, hydrophilicity and mechanical properties. The diffusion properties of the CGH631 film to NaCl and tryptophan are also satisfactory and the measured data are 2.43 × 10^? 6 cm²/s and 7.97 × 10^? 7 cm²/s, respectively. In addition, cell viability studies demonstrate that the CGH631 film has good biocompatibility, on which human corneal epithelial cells attached and proliferated well. This biocompatible film may have potential use in cornea tissue engineering.