Carrier properties of B atomic-layer-doped Si films grown by ECR Ar plasma-enhanced CVD without substrate heating

Abstract

The atomic-layer (AL) doping technique in epitaxy has attracted attention as a low-resistive ultrathin semiconductor film as well as a two-dimensional (2-D) carrier transport system. In this paper, we report carrier properties for B AL-doped Si films with suppressed thermal diffusion. B AL-doped Si films were formed on Si(100) by B AL formation followed by Si cap layer deposition in low-energy Ar plasma-enhanced chemical-vapor deposition without substrate heating. After fabrication of Hall-effect devices with the B AL-doped Si films on unstrained and 0.8%-tensile-strained Si(100)-on-insulator substrates (maximum process temperature 350°C), carrier properties were electrically measured at room temperature. Typically for the initial B amount of 2?×?10¹⁴ cm^?2 and 7?×?10¹⁴ cm^?2, B concentration depth profiles showed a clear decay slope as steep as 1.3 nm/decade. Dominant carrier was a hole and the maximum sheet carrier densities as high as 4?×?10¹³ cm^?2 and 2?×?10¹³ cm^?2 (electrical activity ratio of about 7% and 3.5%) were measured respectively for the unstrained and 0.8%-tensile-strained Si with Hall mobility around 10–13 cm² V^?1 s^?1. Moreover, mobility degradation was not observed even when sheet carrier density was increased by heat treatment at 500–700 °C. There is a possibility that the local carrier (ionized B atom) concentration around the B AL in Si reaches around 10²¹ cm^?3 and 2-D impurity-band formation with strong Coulomb interaction is expected. The behavior of carrier properties for heat treatment at 500–700 °C implies that thermal diffusion causes broadening of the B AL in Si and decrease of local B concentration.     

Effect of annealing time on the structural,optical and electrical characteristics of DC sputtered ITO thin films

Using an Indium tin oxide (ITO) ceramic target (In₂O₃:SnO₂, 90:10 wt%), ITO thin films were deposited by conventional direct current magnetron sputtering technique onto glass substrates at room temperature. The obtained ITO films were annealed at 400 °C for different annealing times (1, 2, 5, 7, and 9 h). The effect of annealing time on their structural, optical and electrical properties was investigated by X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microcopy (AFM), ultra violet–visible (UV–Vis) spectrometer, and temperature dependence Hall measurements. XRD data of obtained ITO films reveal that the films were polycrystalline with cubic structure and exhibit (222), (400) and (440) crystallographic planes of In₂O₃. AFM and Scanning Electron Microscopy SEM have been used to probe the surface roughness and the morphology of the films. The refractive index (n), thickness and porosity (%) of the films were evaluated from transmittance spectra obtained in the range 350–700 nm by UV–Vis. The optical band gap of ITO film was found to be varying from 3.35 to 3.47 eV with the annealing time. The annealing time dependence of resistivity, carrier concentration, carrier mobility, sheet resistance, and figure of merit values of the films at room temperature were discussed. The carrier concentration of the films increased from 1.21 × 10²⁰ to 1.90 × 10²⁰ cm^?3, the Hall mobility increased from 11.38 to 18 cm² V^?1 s^?1 and electrical resistivity decreased from 3.97 × 10^?3 to 2.13 × 10^?3 Ω cm with the increase of annealing time from 1 to 9 h. Additionally, the temperature dependence of the carrier concentration, and carrier mobility for the as-deposited and 400 °C annealed ITO films for 2 and 9 h were analysed in the temperature range of 80–350 K.     

Novel process for synthesis of α-Fe2O3: microstructural and optoelectronic investigations

Novel chemical synthesis method has been successfully employed for the preparation of n type α-Fe₂O₃ nanoparticles. Thin films of annealed Fe₂O₃ powders processed on glass substrates using spin coating technique. The effects of process temperature on the structural, morphological, electrical transport and optical properties were studied. X-ray diffraction study revealed formation of single phase nanocrystalline hexagonal α-Fe₂O₃. Microstructural analysis confirms nanostructured morphology. Dc electrical conductivity measurement reveled the semiconducting nature with room temperature electrical conductivity increased from 10^?4 to 10^?3 (Ω cm)^?1 as process temperature of Fe₂O₃ increased from 400 to 700 °C respectively. The n-type electrical conductivity is confirmed from thermo-emf measurement with no appreciable change in thermoelectric power after increasing processing temperature. The decrease in the band gap energy from 3.88 to 2.62 eV was observed after increasing process temperature.     

Structural,optical and electrical properties of SnO<Subscript>2</Subscript>:F thin films deposited by spray pyrolysis for application in thin film solar cells

Fluorine doped tin oxide (FTO) thin films with adequate properties to be used as transparent electrical contact for PV solar cells were synthesised using the spray pyrolysis technique, which provides a low cost operation. The deposition temperature and the fluorine doping have been optimized for achieving a minimum resistivity and maximum optical transmittance. No post-deposition annealing treatments were carried out. The X-ray diffraction study showed that all the FTO films were polycrystalline with a tetragonal crystal structure and preferentially oriented along the (200) direction. The grain size ameliorates with the increase in substrate temperature. The samples deposited with the substrate temperature at 440 °C and fluorine content of 20 wt % exhibited the lowest electrical resistivity (1.8 × 10^?4 Ω cm), as measured by four-point probe. Room-temperature Hall measurements revealed that the 20 wt% films are degenerate and exhibit n-type electrical conductivity with carrier concentration of ~4.6 × 10²⁰ cm^?3, sheet resistance of 6.6 Ω/□ and a mobility of ~25 cm² V^?1 s^?1. In addition, the optimized growth conditions resulted in thin films (~500 nm thickness) with average visible transmittance of 89 % and optical band-gap of 3.90 eV. The electrical and optical characteristics of the deposited films revealed their excellent quality as a TCO material.     

Thermoelectric properties of zinc antimonide thin film deposited on flexible polyimide substrate by RF magnetron sputtering

Zinc-antimony binary system is one of the most promising P-type thermoelectric materials for low cost intermediate temperature thermoelectric application. In this work, zinc antimonide thin film was deposited on the flexible polyimide substrate using zinc antimonide alloy target. All the samples were annealed in argon atmosphere at different temperatures and the thermoelectric properties of all the samples were significantly boosted. X-ray diffraction results displayed that single ZnSb phase was obtained when the annealing temperature above 300 °C. The thin film annealed at 325 °C possessed the carrier concentration of 3.59 × 10¹⁹ cm^?3, which was the most optimum carrier concentration. The maximum Seebeck coefficient of 280 μV K^?1 and the maximum power factor of 2.35 × 10^?3 Wm^?1 K^?2 was obtained at 260 °C. The Seebeck coefficient and the power factor increase with the increasing of the testing temperature. The thermoelectric properties of thin film annealed at 325 °C were better than other samples.     

Effects of annealing on thermoelectric properties of Sb2Te3 thin films prepared by radio frequency magnetron sputtering

Antimony telluride (Sb₂Te₃) thin films were deposited on silicon substrates at room temperature (300 K) by radio frequency magnetron sputtering method. The effects of annealing in N₂ atmosphere on their thermoelectric properties were investigated. The microstructure and composition of these films were characterized using scanning electron microscopy, energy dispersive X-ray spectroscopy and X-ray diffraction, respectively. The electrical transport properties of the thin films, in terms of electrical conductivity and Seebeck coefficient were determined at room temperature. The carrier concentration and mobility were calculated from the Hall coefficient measurement. Both of the Seebeck coefficient and Hall coefficient measurement showed that the prepared Sb₂Te₃ thin films were p-type semiconductor materials. By optimizing the annealing temperature, the power factor achieved a maximum value of 18.02 μW cm^?1 K^?2 when the annealing temperature was increased to 523 K for 6 h with a maximum electrical conductivity (1.17 × 10³ S/cm) and moderate Seebeck coefficient (123.9 μV/K).     

Electrical,optical and magnetoresistive behavior of nanostructured ZnO:Cu thin films deposited by sputtering

Copper doped ZnO (ZnO:Cu) nanostructured films with magnetoresistive behavior were produced by growing ZnO/Cu/ZnO arrays at room temperature (RT) by the sputtering technique on corning glass substrates. The arrays were made with two electrical insulating ZnO films of 50 and 105 nm, and a Cu film of 5 nm, both materials were deposited at RT by the RF- and DC-sputtering technique, respectively. The processing method involves two stages that proceed in the course of the growth process, the main one is originated by the non-equilibrium regime of the sputtering technique, and the second is the diffusion-redistribution of the intermediate Cu film towards the neighborhood ZnO layers aided by the nanocrystalline films character. The influence of applying an additional annealing stage to the arrays in N₂ atmosphere at 250 and 350 °C by periods of 30 min were studied. The resistivity of the ZnO:Cu films can be varied from 0.0034 to 2.83 Ω-cm, corresponding to electron concentrations of 1.12?×?10²¹ and 7.85?×?10¹⁷ cm^?3 with carrier mobility of 1.6 and 2.8 cm²/V s. Measured changes on the magnetoresistance behavior of the films at RT were of ?R?~?3% for annealed samples with electron concentration of 1.12?×?10²¹ cm^?3. The X-ray diffraction measurements show that the films are comprised of nanocrystallites with dimensions between 13 and 20 nm in size with preferred (002) orientation. The transmittance of the films in the visible region was of 83% with an optical band gap of ~?3.3 eV for the low-resistivity samples.     

Structural,morphological and optoelectronic properties of porous silicon combined alumina coating film deposited by PLD

Pulsed laser deposition of Al₂O₃ onto porous silicon (PS) is shown to provide excellent passivation of multi-crystalline silicon surfaces intended for solar cells applications. Surface passivation and reflectivity are investigated before and after the deposition of various nominal thicknesses of Al₂O₃ ranging from isolated nanoparticles to ~80 nm-thick films. The level of surface passivation is determined by techniques based on photoconductance and FTIR. As a result, the effective minority carrier lifetime increase from 1 to 130 μs at a minority carrier density (Δn) of 1?×?10¹³ cm^?3. However, passivation scheme provide a significant decrease in the reflectivity; it’s reduced from 28% to about 5% after Al₂O₃/PS coating.     

Reduced graphene oxide film with record-high conductivity and mobility

Graphene has attracted significant attention in both scientific and industrial fields. The scalable and high-yield chemical functionalization methods have been widely used to produce graphene, such as reduced graphene oxide (RGO). However, previously reported conductivity (<1500 S cm^?1) and mobility (<5 cm² V^?1 s^?1) values for RGO film are relatively low, which limits its application in many fields. In this work, we report a RGO film with a record-high conductivity of 6300 S cm^?1 and a record-high mobility of 320?cm²?V^?1?s^?1, which was reduced by Joule heating at an extremely high temperature of 3000?K. Thermal reduction process challenges of Joule heating were overcome by employing a two-step reduction and a curved RGO film. An investigation into how charge transport properties of RGO film are influenced by the reduction temperature was pursued. As the reduction temperature increases, the oxygen-containing functional groups, acting as dopant sources and scattering centers, are gradually removed, such that the carrier density gradually decreases, and the mobility and conductivity gradually increases. The localization length, corresponding to the size of graphitic sp² domains, is 8.7?nm for the 3000-K-reduced RGO film, which exceeds previously reported values. The unique features of the reported 3000-K-reduced RGO film, such as less defects/impurities and large graphitic sp² domains within a dense structure, enable both record-high conductivity and mobility.     

Surface passivation of multicrystalline silicon wafers by porous silicon combined with an ultrathin nanoparticles aluminum coating film

In this paper, we demonstrate that we may efficiently improve surface passivation of multi-crystalline silicon (mc-Si) while combining formation of porous silicon (PS) and deposition of ultrathin aluminum (Al) film. Aluminum Nanoparticles were deposited by thermal evaporation onto PS formed on mc-Si wafers. Optoelectronic properties of Al/PS/mc-Si and Al/mc-Si treated samples were investigated before and after annealing in the 400–700 °C temperature range. The surface passivation effectiveness was pointed out based on minority carrier lifetime and photoluminescence measurements. It was found that, at a minority carrier density Δn = 10¹⁵ cm^?3, the effective minority carrier lifetime increases from 1.5 μs (for the bare mc-Si wafer) to about 6 and 14 μs before and after thermal annealing, respectively. FTIR analyses show strong correlation between the minority carrier lifetime values and hydrogen and Al passivation. Major beneficial effect of the co-presence of Al and Al–O on the optoelectronic properties is also demonstrated. The reflectivity of Al/PS treated mc-Si decrease significantly at 500 nm as compared to untreated mc-Si (from 31 % for untreated mc-Si wafers to 8 % for Al/PS treated ones), which is due to the roughly ordered structure and to the Al nanoparticles.     

Structural and optical properties of sulfurized Cu2ZnSnS4 thin films from Cu–Zn–Sn alloy precursors

This study reports the preparation of Cu₂ZnSnS₄ (CZTS) thin films by magnetron sputtering deposition with a Cu–Zn–Sn ternary alloy target and sequential sulfurization. The effects of substrate temperatures on the structural, morphological, compositional as well as optical and electrical properties were characterized. The results showed the CZTS thin films prepared by sulfurization at substrate temperature of 570 °C yielded secondary phases along with CZTS compound. The relatively good properties of CZTS thin film were obtained after sulfurization at substrate temperature of 550 °C. This CZTS film showed compact structure with large grain size of 900 nm, direct optical band gap of 1.47 eV, optical absorption coefficient over 10⁴ cm^?1, resistivity of 4.05 Ω cm, carrier concentration of 8.22 × 10¹⁸ cm^?3, and mobility of 43.38 cm² V^?1 S^?1.     

Electrical properties of boron- and phosphorous-doped microcrystalline silicon thin films prepared by magnetron sputtering of heavily doped silicon targets

The boron(B)- and phosphorous(P)-doped microcrystalline silicon (Si) thin films were prepared by magnetron sputtering of heavily B- and P-doped Si targets followed by rapid thermal annealing (RTA), their electrical properties were characterized by temperature-dependent Hall and resistivity measurements. It was observed that the dark conductivity and carrier concentration of the 260 nm B-doped Si films annealed at 1,100 °C in Ar were 3.4 S cm^?1 and 1.6 × 10¹⁹ cm^?3, respectively, which were about one order of magnitude higher than that of P-doped Si films. The activation energy of the B- and P-doped Si films were determined to be 0.23 eV and 0.79 eV, respectively. The dark conductivity of B- and P-doped Si films increased with the increase of film thickness, RTA temperature, and the incorporation of H₂ in Ar during RTA. The present work provides an easy and non-toxic method for the preparation of doped microcrystalline Si thin films.     

Electronic transport and optical properties of nano-structured Pt-doped CdO films: evaluate the effect of treatment in hydrogen gas

Cadmium oxide (CdO) has various applications related to its natural optoelectronic properties as an oxide, which belongs to group of transparent conducting oxides. However, those properties could be controlled to a desired choice by doping method. For developing the application in the field of optoelectronics, the conduction parameters (conductivity, carrier mobility, and carrier concentration) together with the transparency in the NIR should be improved. Therefore, it is important to seek ways to realise those improvements. Doping method is the way that used to attain that aim. In the present work, CdO thin films doped with different amounts of platinum (Pt) ions were deposited on glass and silicon substrates by the method of physical vapour deposition. The deposited films were characterized by X-ray fluorescence, X-ray diffraction, optical absorption spectroscopy, and electrical measurements. A variety of results was obtained in the present work; the optimum improvement in the electrical properties was found with CdO film doped with 0.13 wt% Pt. A combination of low resistivity (1.74?×?10^?4 Ω cm), high carrier concentration (1.02?×?10²¹ cm^?3) and relatively high mobility (35.4 cm²/V s) were obtained under hydrogenation.     

Low indium content In–Zn–O system towards transparent conductive films: structure,properties and comparison with AZO and GZO

In this work, low content indium doped zinc oxide (IZO) thin films were deposited on glass substrates by RF magnetron sputtering using IZO ceramic targets with the In₂O₃ doping content of 2, 6, and 10 wt%, respectively. The influences of In₂O₃ doping content and substrate temperature on the structure and morphology, electrical and optical properties, and environmental stability of IZO thin films were investigated. It was found that the 6 wt% doped IZO thin film deposited at 150?°C exhibited the best crystal quality and the lowest resistivity of 9.87?×?10^?4 Ω cm. The corresponding Hall mobility and carrier densities were 9.20 cm² V^?1 s^?1 and 6.90?×?10²⁰ cm^?3, respectively. Compared with 2 wt% Al₂O₃ doped ZnO and 5 wt% Ga₂O₃ doped ZnO thin films, IZO thin film with the In₂O₃ doping content of 6 wt% featured the lowest surface roughness of 1.3 nm. It also showed the smallest degradation with the sheet resistance increased only about 4.4% at a temperature of 121?°C, a relative humidity of 97% for 30 h. IZO thin film with 6 wt% In₂O₃ doping also showed the smallest deterioration with the sheet resistance increased only about 2.8 times after heating at 500?°C for 30 min in air. The results suggested that low indium content doped ZnO thin films might meet practical requirement in environmental stability needed optoelectronic devices.     

Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition

A method of fabricating uncooled thermally sensitive sandwich structures based on amorphous hydrated silicon films is discussed and experimental results are reported. The structures have an area of 10⁻⁴ cm², a resistance of ≅10 kΩ, and a temperature coefficient of resistance ≃2%/K. At 30 Hz and a current of ≃1 μA, the excess noise exceeds the thermal resistance noise by a factor of 1.7. Pis’ma Zh. Tekh. Fiz. 23, 63–68 (June 26, 1997)     

Study on Specific Heat of Water Adsorbed in Zeolite Using DSC

In this study, the specific heat of water included in an adsorbent was analyzed by a differential scanning calorimeter in the temperature range from ?50 °C to 50 °C. Zeolites with pore sizes of 3 Å and 9 Å were employed as adsorbents, and the measurement was performed with various water mass fractions in zeolites. In this article, the water was defined as being composed of adsorbed water and free water that is not adsorbed in zeolite. As a result, the specific heat of the dry zeolite increased with temperature. The specific heat of the adsorbed water was measured by a special experimental procedure to establish the experimental accuracy. It was found that the specific heat of the adsorbed water had values in the range from (3 to 5) J · g^?1 · K^?1.     

A 1300 mm2 Ultrahigh‐Performance Digital Imaging Assembly using High‐Quality Perovskite Single Crystals

By fine‐tuning the crystal nucleation and growth process, a low‐temperature‐gradient crystallization method is developed to fabricate high‐quality perovskite CH₃NH₃PbBr₃ single crystals with high carrier mobility of 81 ± 5 cm² V^?1 s^?1 (>3 times larger than their thin film counterpart), long carrier lifetime of 899 ± 127 ns (>5 times larger than their thin film counterpart), and ultralow trap state density of 6.2 ± 2.7 × 10⁹ cm^?3 (even four orders of magnitude lower than that of single‐crystalline silicon wafers). In fact, they are better than perovskite single crystals reported in prior work: their application in photosensors gives superior detectivity as high as 6 × 10¹³ Jones, ≈10–100 times better than commercial sensors made of silicon and InGaAs. Meanwhile, the response speed is as fast as 40 µs, ≈3 orders of magnitude faster than their thin film devices. A large‐area (≈1300 mm²) imaging assembly composed of a 729‐pixel sensor array is further designed and constructed, showing excellent imaging capability thanks to its superior quality and uniformity. This opens a new possibility to use the high‐quality perovskite single‐crystal‐based devices for more advanced imaging sensors.     

Nanocrystalline copper selenide thin films by chemical spray pyrolysis

Thin films of copper selenide were deposited onto amorphous glass substrates at various substrate temperatures by computerized spray pyrolysis technique. The as deposited copper selenide thin films were used to study a wide range of characteristics including structural, surface morphological, optical and electrical, Hall Effect and thermo-electrical properties. X-ray diffraction study reveals that the films are polycrystalline in nature with hexagonal (mineral klockmannite) crystal structure irrespective of the substrate temperature. The crystalline size is found to be in the range of 23–28 nm. The SEM study reveals that the grains are uniform with uneven spherically shaped and spread over the entire surface of the substrates. EDAX analysis confirmed the nearly stoichiometric deposition of the film at 350 °C. The direct band gap values are found to be in the range 2.29–2.36 eV depending on the substrate temperature. The Hall Effect study reveals that the films exhibit p-type conductivity. The values of carrier concentration and mobility for the film are found to be 5.02 × 10¹⁷ cm^?3 and 5.19 × 10^?3 cm² V^?1 s^?1; respectively for film deposited at 350 °C.     

The variation of the features of SnO2 and SnO2:F thin films as a function of V dopant

V doped SnO₂ and SnO₂:F thin films were successfully deposited on glass substrates at 500 °C with spray pyrolysis. It was observed that all films had SnO₂ tetragonal rutile structure and the preferential orientation depended on spray solution chemistry (doping element and solvent type) by X-ray diffraction measurements. The lowest sheet resistance and the highest optical band gap, figure of merit, infrared (IR) reflectivity values of V doped SnO₂ for ethanol and propane-2-ol solvents and V doped SnO₂:F films were found to be 88.62 Ω–3.947 eV–1.02 × 10^?4 Ω^?1–65.49 %, 65.35 Ω–3.955 eV–8.54 × 10^?4 Ω^?1–72.58 %, 5.15 Ω–4.076 eV–6.15 × 10^?2 Ω^?1–97.32 %, respectively, with the electrical and optical measurements. Morphological properties of the films were investigated by atomic force microscope and scanning electron microscope measurements. From these analysis, the films consisted of nanoparticles and the film morphology depended on doping ratio/type and solvent type. It was observed pyramidal, polyhedron, needle-shaped and spherical grains on the films’ surfaces. The films obtained in present study with these properties can be used as front contact for solar cells and it can be also one of appealing materials for other optoelectronic and IR coating applications.