晶体硅表面纳米孔减反光结构的制备及其性能表征

利用金属辅助硅化学刻蚀法在晶体硅表面制备 了 大面积有序硅纳米结构,并基于金属辅助硅化学刻蚀的机理,实现了硅纳米结构从线阵列到 孔阵列转变。漫反射光谱的测试结果表 明,相对于平面、金字塔结构,硅纳米孔织构的晶体硅具有卓越的减反光性能,在300100nm 光谱范围内的AM1.5G太阳光子的光反射损失比低于3.6%。硅纳米孔阵列减反光性能优异, 制备方法简单、快速,且其孔壁互连,有益于晶体硅太阳电池的后续制备工艺及其表面结构 机械稳定,可作为减反光结构应用于晶体硅太阳电池。     

Metallization‒induced recombination losses of bifacial silicon solar cells

In this study, we investigate the metallization‒induced recombination losses of high efficiency bifacial n‒type and p‒type crystalline Si solar cells. From the experimental data, we found that the most efficiency limiting parameter by the screen‒printed metallization is the open‒circuit voltage (V_OC) of the cells. We investigated the mechanism responsible for this loss by varying the metallization fraction on either side of the cell and determined the local enhancement in the dark saturation current density beneath the metal contacts (J_0(met)). Under optimum fabrication conditions, the J_0(met) at metal‒p⁺ (boron) emitter interfaces was found to be significantly higher compared with the values obtained for metal‒n⁺ emitters. A two‒dimensional simulation model was used to get further insight into the recombination mechanism leading to these V_OC losses. The model assumes that metal contacts penetrate (or etch) into the diffused region following the firing process and depassivate the interface. Applying this model to our n‒type solar cells with a boron p⁺ emitter, we demonstrated that the simple loss of passivated area beneath the metal contact cannot explain the degradation observed in the V_OC of the cell without considering a significant etching or metal penetration into the emitter region. Copyright © 2014 John Wiley & Sons, Ltd.     

Metal versus dielectric back reflector for thin‐film Si solar cells with impact of front electrode surface texture

Thin‐film Si solar cells employ a back reflector (BR) for a more efficient use of the long wavelength light. Here, we have carried out a cross evaluation of metal (Ag‐based) and dielectric (white paint‐based) BR designs. Conclusive results have been reached regarding the most suitable BR type depending on the front electrode morphology, both with crater‐like and pyramidal texture. The ZnO/Ag BR is found to be optically more efficient because of improved light trapping, although the gain tends to vanish for rougher front electrodes. Thanks to non‐conventional Raman intensity measurements, this dependence on the front texture has been linked to the different weight of front and back interfaces in the light trapping process for the different morphologies. With rougher substrates, because the minor optical gain is accompanied by sputter‐induced electronic deterioration of the solar cell during the ZnO buffer layer deposition, the white paint‐based BR design is preferred. Copyright © 2016 John Wiley & Sons, Ltd.     

Modeling the potential of screen printed front junction CZ silicon solar cell with tunnel oxide passivated back contact

Carrier selective passivated contacts composed of thin oxide, n + polycrystalline Si and metal on top of a n‐Si absorber can significantly lower the recombination current density (J_orear ≤8 fA/cm²) under the contact while providing excellent specific contact resistance (5–10 mΩ‐cm²); 25.1% efficient small area cells with photolithography front contacts on boron doped selective emitter and Fz wafers have been achieved by Fraunhofer ISE using their tunnel oxide passivated contact (TOPCon) approach. This paper shows a methodology to model such passivated contact cells using Sentaurus device model, which involves replacing the TOPCon region by carrier selective electron and hole recombination velocities to match the measured J_orear of the TOPCon region as well as all the light IV values of the cell. We first validated the methodology by modeling a 24.9% reference cell. The model was then extended to assess the efficiency potential of large area TOPCon cells on commercial grade n‐type Cz material with screen‐printed front contacts. To use realistic input parameters, a 21% n‐type PERT cell was fabricated on Cz wafer (5 Ω‐cm, 1.5‐ms lifetime). Modeling showed that the cell efficiency will improve to only 21.6% if the back of this cell is replaced by the above TOPCon, and the performance is limited by the homogenous emitter. Efficiency was then modeled to improve to 22.6% with the implementation of selective emitter (150/20 Ω/sq). Finally, it is shown that screen printing of 40‐µm‐wide lines and improved bulk material (10 Ω‐cm, 3‐ms lifetime) can raise the single side TOPCon Cz cell efficiency to 23.2%. Copyright © 2016 John Wiley & Sons, Ltd.     

Hemisphere-shaped silicon crystal wafers obtained by plastic deformation and preparation of their solar cells

Hemisphere-shaped crystal wafers can be prepared by the plastic deformation of Si crystal wafers. To obtain hemispherical Si wafers, graphite convex and concave dies were used. A Si wafer was set between dies and pressed at high temperatures. The Si wafer was pressed by an overweight of 200 N at various temperatures. The deformation regions in which well-shaped (100) and (111) wafers can be obtained by plastic deformation were determined using parameters of thickness and temperature. In order to demonstrate that the shaped wafers are of sufficiently high quality to be used in the preparation of devices, solar cells were fabricated using the hemispherical Si wafers pressed at 1,120°C and 1,200°C. The conversion efficiency of the hemispherical solar cells is 8.5–11.5%. It was clarified from the conversion efficiency of solar cells that the quality of the shaped crystal wafers can be improved by a proper annealing process. Thus, the hemispherical shaped wafers are of high quality to be used in the preparation of devices.     

Determination of minority carrier lifetime and effective back surface recombination velocity in BSF silicon solar cells from transient measurements

The method of determining the base lifetime ?B and the effective surface recombination velocity Seff in a BSF solar cell from the transient decay of open-circuit voltage and short-circuit current is extended to include emitter recombinations. If the emitter recombinations in modern Si solar cells are neglected in interpreting the experimental data, the experimental value of Seff is found to be in large error.     

Laser structuring for back junction silicon solar cells

We demonstrate mask‐free fabrication of a 22·0%‐efficient crystalline Si solar cell by applying laser ablation of Si and by laser ablation of protective coatings. The bulk absorber material is a p ‐type float zone silicon wafer and the designated cell area is 4 cm². While the processing time of our laboratory‐type of laser system is far too slow for industrial processing, we estimate on the basis of our experiments that laser processing of 12·5 × 12·5 cm²‐sized solar cells in just a few seconds is feasible with commercially available equipment. Copyright © 2006 John Wiley & Sons, Ltd.     

Theory and experiments on the back side reflectance of silicon wafer solar cells

New passivation layers for the back side of silicon solar cells have to show high performance in terms of electrical passivation as well as high internal reflectivity. This optical performance is often shown as values for the back side reflectance R_b which describes the rear internal reflection. In this paper, we investigate in detail the meaning of this single‐value parameter, its correct determination and the use in one‐dimensional simulations with PC1D. The free‐carrier‐absorption (FCA) as non‐carrier‐generating absorption channel is analyzed for solar cells with varying thickness. We apply the optical analysis to samples with different thickness, silicon oxide layer thickness, rear side topography as well as passivation layers (SiO₂, SiN_x, SiC and stack systems). Additionally, the optical influence of the laser‐fired contacts (LFC) process is experimentally investigated. Finally, we show that with correct parameters, the one‐dimensional simulation of very thin silicon solar cells can successfully be performed. Copyright © 2007 John Wiley & Sons, Ltd.     

Epitaxial solar cells on titanium-doped silicon substrates

Single crystal substrates (0.2 Ω cm, boron doped) purposely doped at 2 × 10¹⁴ cm⁻³ with titanium were used to assess the effect of titanium on solar cell performance. Comparisons were made of all-epitaxial, diffused junction epitaxial, and all diffused junction solar cells fabricated on these substrates. In all cases lower than normal short-circuit current densities were obtained due to diminished red response. However, the short-circuit currents and efficiencies for the epitaxial cells were higher than those for the cells made by direct diffusion into the bulk titanium-doped silicon. The highest efficiency obtained for an epitaxial cell on a titanium-doped substrate was 11.7%. The research reported herein was supported by Jet Propulsion Laboratory, California Institute of Technology under contract No. 954817 and RCA Laboratories, David Sarnoff Research Center, Princeton, New Jersey.     

Silica nanospheres as back surface reflectors for crystalline silicon thin‐film solar cells

In this paper, fabrication of a non‐continuous silicon dioxide layer from a silica nanosphere solution followed by the deposition of an aluminium film is shown to be a low‐cost, low‐thermal‐budget method of forming a high‐quality back surface reflector (BSR) on crystalline silicon (c‐Si) thin‐film solar cells. The silica nanosphere layer has randomly spaced openings which can be used for metal‐silicon contact areas. Using glass/SiN/p⁺nn⁺ c‐Si thin‐film solar cells on glass as test vehicle, the internal quantum efficiency (IQE) at long wavelengths (>900 nm) is experimentally demonstrated to more than double by the implementation of this BSR, compared to the baseline case of a full‐area Al film as BSR. The improved optical performance of the silica nanosphere/aluminium BSR is due to reduced parasitic absorption in the Al film. Copyright © 2007 John Wiley & Sons, Ltd.     

Highly transparent modulated surface textured front electrodes for high‐efficiency multijunction thin‐film silicon solar cells

To further increase the efficiency of multijunction thin‐film silicon (TF‐Si) solar cells, it is crucial for the front electrode to have a good transparency and conduction, to provide efficient light trapping for each subcell, and to ensure a suitable morphology for the growth of high‐quality silicon layers. Here, we present the implementation of highly transparent modulated surface textured (MST) front electrodes as light‐trapping structures in multijunction TF‐Si solar cells. The MST substrates comprise a micro‐textured glass, a thin layer of hydrogenated indium oxide (IOH), and a sub‐micron nano‐textured ZnO layer grown by low‐pressure chemical vapor deposition (LPCVD ZnO). The bilayer IOH/LPCVD ZnO stack guarantees efficient light in‐coupling and light trapping for the top amorphous silicon (a‐Si:H) solar cell while minimizing the parasitic absorption losses. The crater‐shaped micro‐textured glass provides both efficient light trapping in the red and infrared wavelength range and a suitable morphology for the growth of high‐quality nanocrystalline silicon (nc‐Si:H) layers. Thanks to the efficient light trapping for the individual subcells and suitable morphology for the growth of high‐quality silicon layers, multijunction solar cells deposited on MST substrates have a higher efficiency than those on single‐textured state‐of‐the‐art LPCVD ZnO substrates. Efficiencies of 14.8% (initial) and 12.5% (stable) have been achieved for a‐Si:H/nc‐Si:H tandem solar cells with the MST front electrode, surpassing efficiencies obtained on state‐of‐the‐art LPCVD ZnO, thereby highlighting the high potential of MST front electrodes for high‐efficiency multijunction solar cells. Copyright © 2015 John Wiley & Sons, Ltd.     

多晶硅太阳电池背表面刻蚀提升其性能的产线工艺研究

对比研究了产线上多晶硅太阳电池背表面刻蚀对 其光电转换性能的影响。示范性实验结果表明:多晶硅太阳电池背表面刻蚀能够改善其短路 电流, 从而相应的光电转换效 率提升了约 0．1％。依据多晶硅太阳电池背表面刻蚀前后的扫描 电镜(SEM)形貌、背表面漫 反射光谱及完整电池片外量子效率的测试结果,改进的光电转换的原因可能源于背表面刻蚀 “镜面”化有利于太阳光子在背表面内反射和改进印刷Al浆与背表面覆盖接触。背表面刻蚀 与当前晶硅电池产线工艺兼容,能够提升电池片的光电转换效率,是一种可供选择的产线升 级工艺。     

Theory of back surface field silicon solar cells

Back surface field silicon solar cells with n⁺pp⁺ (or sometimes p⁺nn⁺) structures are found to have better characteristics than the conventional solar cells. The existing theories have not been able to satisfactorily predict the experimentally observed parameters on these cells. A theory, based on the transport of both minority and majority carriers under the charge neutrality condition, has been developed in the present paper which explains the behavior of the back surface field solar cells. Good agreement is achieved between the results obtained by using this theory and the experimental observations of earlier workers.     

Experimental and simulation study of thin film silicon solar cells with intermediate reflector

Optical and electrical simulations were carried out for thin film silicon solar tandem cells with intermediate reflector layer (IRL) between top and bottom cell and compared with experimental external quantum efficiency and current voltage characteristics results. Reference data were collected from a series of tandem cells with different thicknesses of the top cell absorber layer (160–240 nm), the bottom cell absorber layer (1750–2100 nm), and the transparent conductive oxides based IRL (10–80 nm). It turned out that for capturing correctly the influence of the IRL on the light management as a function of the IRL thickness, the conventional semicoherent approach is not sufficient. Whereas the optical properties of a very thin IRL are governed by interference effects that are best calculated using a fully coherent model, increasingly thicker IRL show a more and more incoherent behavior. By taking into account, the interface morphology and angular light distribution within the cell stack an algorithm for the effective IRL reflectivity was proposed that explains the experimental findings very well. The consecutive electrical simulations were carried out with the device simulator ASA. The dependence of short circuit current density j_sc and fill factor FF on the thickness d_IRL of the IRL is in qualitative agreement between simulation and experiment showing coincident extrema in j_sc(d_IRL) and FF(d_IRL) at the current matching point. Copyright © 2013 John Wiley & Sons, Ltd.     

Optimizing annealing steps for crystalline silicon solar cells with screen printed front side metallization and an oxide‐passivated rear surface with local contacts

Silicon solar cells that feature screen printed front contacts and a passivated rear surface with local contacts allow higher efficiencies compared to present industrial solar cells that exhibit a full area rear side metallization. If thermal oxidation is used for the rear surface passivation, the final annealing step in the processing sequence is crucial. On the one hand, this post‐metallization annealing (PMA) step is required for decreasing the surface recombination velocity (SRV) at the aluminum‐coated oxide‐passivated rear surface. On the other hand, PMA can negatively affect the screen printed front side metallization leading to a lower fill factor. This work separately analyzes the impact of PMA on both, the screen printed front metallization and the oxide‐passivated rear surface. Measuring dark and illuminated IV‐curves of standard industrial aluminum back surface field (Al‐BSF) silicon solar cells reveals the impact of PMA on the front metallization, while measuring the effective minority carrier lifetime of symmetric lifetime samples provides information about the rear side SRV. One‐dimensional simulations are used for predicting the cell performance according to the contributions from both, the front metallization and the rear oxide‐passivation for different PMA temperatures and durations. The simulation also includes recombination at the local rear contacts. An optimized PMA process is presented according to the simulations and is experimentally verified. The optimized process is applied to silicon solar cells with a screen printed front side metallization and an oxide‐passivated rear surface. Efficiencies up to 18.1% are achieved on 148.8 cm² Czochralski (Cz) silicon wafers. Copyright © 2009 John Wiley & Sons, Ltd.     

Simple analytical model and efficiency improvement of polysilicon solar cells with porous silicon at the backside

The present study developed a simple analytical model to simulate the performance of polysilicon solar cells with porous silicon (PS) layer at the backside. It analytically solved the complete set of equations necessary for the determination of the photocurrent generated under the effect of the reflected light. It also investigated the contribution of the light absorbed by the PS layer and explored the effect that the latter’s number of double porosities and high porosity have had on photovoltaic parameters. The findings suggest that the photovoltaic parameters increase with the number of double porosities that the layer might have in a given structure. When the PS layer is formed by three-double porosity layers 20%/80% and for a 5 μm-thick film c-Si, the backside reflector gives a total improvement of about 2.65 mA/cm² in photocurrent density and 1.4% in cell efficiency. This improvement can even be of much more important for well passivated grain boundaries and back contact of solar cells.     

前结背接触晶硅太阳电池发射区研究

利用Silvaco-TCAD仿真软件全面系统地分析了发射区表面浓度(cE)、结深(xj)及发射区覆盖比率(EF)对P型前结背接触晶硅太阳电池输出特性的影响。结果表明:基于常规低成本P型晶硅衬底(利用直拉法生长,电阻率为1.5?·cm,少子寿命为10μs)的前结背接触太阳电池,其上表面发射区表面浓度及结深对太阳电池的输出特性产生显著影响。上表面发射区表面浓度和结深越大,短波入射光外量子效率越小。当上表面发射区表面浓度为1×1019 cm–3,结深为0.2μm时,电池效率高达20.72%。侧面和下表面发射区表面浓度及结深对太阳电池输出特性的影响较小。但侧面和下表面发射区覆盖比率对太阳电池的输出特性产生显著影响。侧面和下表面发射区覆盖比率越大,太阳电池外量子效率和转换效率越高。     

Two‐dimensional modeling of front contact silicon solar cells

The modeling of a new type of silicon solar cell intended for operation at very high concentration, with all the contacts at its front face, is presented. The two‐dimensional model developed makes use of the theory of the complex variable, and is able to explain the main features of the operation of these cells. It is shown that if all the parameters reach good state‐of‐the‐art values, and with the appropriate layout, this structure can reach 25% efficiency for a range of concentrations wider than any other known silicon cell. Copyright © 2004 John Wiley & Sons, Ltd.     

Determination of diffusion length and surface recombination velocity in interdigitated back contact (IBC) solar cells

A method is presented for measuring the diffusion length and surface recombination velocity of Interdigitated Back Contact (IBC) solar cells. The quantum efficiency of these cells can, under appropriate conditions, be approximated by a linear relationship with respect to the inverse of the absorption coefficient. A simple linear regression on experimental values allows to determine the surface recombination velocity and the diffusion length. Experimental results are presented for some IBC and Front Surface Field (FSF) solar cells.