Giant modulation of magnetism in(Ga,Mn)As ultrathin films via electric field

Taking the advantages of semiconducting properties and carrier-mediated ferromagnetism in(Ga,Mn)As,a giant modulation of magnetism via electric field in(Ga,Mn)As ultrathin film has been demonstrated.Specifically,huge interfacial electric field is obtained by using ionic liquid as the gate dielectric.Both magnetization and transport measurements are employed to characterize the samples,while the transport data are used to analyze the electric filed effect on magnetism.Complete demagnetization of(Ga,Mn)As film is then realized by thinning its thickness down to ~2 nm,during which the degradation of ferromagnetism of(Ga,Mn)As ultrathin film induced by quantum confinement effect is suppressed by inserting a heavily-doped p-type GaAs buffer layer.The variation of the Curie temperature is more than 100 K,which is nearly 5-times larger than previous results.Our results provide a new pathway on the efficient electrical control of magnetism.     

Ga2O3缓冲层厚度对柔性衬底沉积Cu/ITO薄膜性能的影响

Cu and Cu/ITO films were prepared on polyethylene terephthalate （PET） substrates with a Ga2O3 buffer layer using radio frequency （RF） and direct current （DC） magnetron sputtering. The effect of Cu layer thickness on the optical and electrical properties of the Cu film deposited on a PET substrate with a Ga2O3 buffer layer was studied, and an appropriate Cu layer thickness of 4.2 nm was obtained. Changes in the optoelectrical properties of Cu（4.2 nm）/ITO（30 nm） films were investigated with respect to the Ga2O3 buffer layer thickness. The optical and electrical properties of the Cu/ITO films were significantly influenced by the thickness of the Ga2O3 buffer layer. A maximum transmission of 86%, sheet resistance of 45 Ω/□ and figure of merit of 3.96 × 10^-3 Ω^ -1 were achieved for Cu（4.2 nm）/ITO（30 nm） films with a Ga2O3 layer thickness of 15 nm.     

台阶量子阱的结构和电场对Rashba自旋分裂的影响

Spin splitting of conduction subbands in Al0.3Ga0.7As/GaAs/AlxGa1-xAs/Al0.3Ga0.7As step quantum wells induced by interface and electric field related Rashba effects is investigated theoretically by the method of finite difference.The dependence of the spin splitting on the electric field and the well structure,which is controlled by the well width and the step width,is investigated in detail.Without an external electric field,the spin splitting is induced by an interface related Rashba term due to the built-in structure inversion asymmetry.Applying the external electric field to the step QW,the Rashba effect can be enhanced or weakened,depending on the well structure as well as the direction and the magnitude of the electric field.The spin splitting is mainly controlled by the interface related Rashba term under a negative and a stronger positive electric field,and the contribution of the electric field related Rashba term dominates in a small range of a weaker positive electric field.A method to determine the interface parameter is proposed.The results show that the step QWs might be used as spin switches.     

利用物理气相淀积工艺制备的HfTaON薄膜热力学稳定性研究

We investigate the thermal stability of HfTaON films prepared by physical vapor deposition using high resolution transmission electronic microscope （HRTEM） and X-ray photoelectron spectroscopy （XPS）. The results indicate that the magnetron-sputtered HfTaON films on Si substrate are not stable during the post-deposition annealing （PDA）. HfTaON will react with Si and form the interfacial layer at the interface between HfTaON and Si substrate. Hf-N bonds are not stale at high temperature and easily replaced by oxygen, resulting in significant loss of nitrogen from the bulk film. SiO2 buffer layer introduction at the interface of HfraON and Si substrate may effectively suppress their reaction and control the formation of thicker interfacial layer. But SiO2 is a low k gate dielectric and too thicker SiO2 buffer layer will increase the gate dielectric＇s equivalent oxide thickness. SiON prepared by oxidation of N-implanted Si substrate has thinner physical thickness than SiO2 and is helpful to reduce the gate dielectric＇s equivalent oxide thickness.     

The structure and magnetic properties of β-(Ga0.96Mn0.04)2O3 thin film

High quality epitaxial single phase (Ga0.96Mn0.04)2O3 and Ga2O3 thin films have been prepared on sapphire substrates by using laser molecular beam epitaxy (L-MBE).X-ray diffraction results indicate that the thin films have the monoclinic structure with a (-201) preferable orientation.Room temperature (RT) ferromagnetism appears and the magnetic properties of β-(Ga0.96Mn0.04)2O3 thin film are enhanced compared with our previous works.Experiments as well as the first principle method are used to explain the role of Mn dopant on the structure and magnetic properties of the thin films.The ferromagnetic properties are explained based on the concentration of transition element and the defects in the thin films.     

X-ray reflectivity and atomic force microscopy studies of MOCVD grown AI_xGa_(1-x)N/GaN superlattice structures

The grazing incidence X-ray reflectivity（GIXR） technique and atomic force microscopy（AFM） were exploited to obtain an accurate evaluation of the surfaces and interfaces for metalorganic chemical vapor deposition grown Al_xGa_1-xN/GaN superlattice structures.The X-ray diffraction results have been combined with reflectivity data to evaluate the layer thickness and Al mole fraction in the AlGaN layer.The presence of a smooth interface is responsible for the observation of intensity oscillation in GIXR,which is well correlated to step flow observation in AFM images of the surface.The structure with a low Al mole fraction（x = 0.25） and thin well width has a rather smooth surface for the R_rms,of AFM data value is 0.45 nm.     

在metal/high-k 栅叠层中插入Ti/TiN金属层实现远距离吸氧技术

High permittivity materials have been required to replace traditional SiO₂ as the gate dielectric to extend Moore’s law.However,growth of a thin SiO₂-like interfacial layer（IL） is almost unavoidable during the deposition or subsequent high temperature annealing.This limits the scaling benefits of incorporating high-k dielectrics into transistors.In this work,a promising approach,in which an O-scavenging metal layer and a barrier layer preventing scavenged metal diffusing into the high-k gate dielectric are used to engineer the thickness of the IL,is reported. Using a Ti scavenging layer and TiN barrier layer on a HfO₂ dielectric,the effective removal of the IL and almost no Ti diffusing into the HfO₂ have been confirmed by high resolution transmission electron microscopy and X-ray photoelectron spectroscopy.     

采用Ni/Ti/Ni多层金属在N型4H-SiC衬底改善粘附性和界面的欧姆接触

The Ni/Ti/Ni multilayer ohmic contact properties on a 4H-SiC substrate and improved adhesion with the Ti/Au overlayer have been investigated. The best specific contact resistivity of 3.16 × 10^-5 Ω.cm^2 was obtained at 1050 ℃. Compared with Ni/SiC ohmic contact, the adhesion between Ni/Ti/Ni/SiC and the Ti/Au overlayer was greatly improved and the physical mechanism under this behavior was analyzed by using Raman spectroscopy and X-ray energy dispersive spectroscopy （EDS） measurement. It is shown that a Ti-carbide and Ni-silicide compound exist at the surface and there is no graphitic carbon at the surface of the Ni/Ti/Ni structure by Raman spectroscopy, while a large amount of graphitic carbon appears at the surface of the Ni/SiC structure, which results in its bad adhesion. Moreover, the interface of the Ni/Ti/Ni/SiC is improved compared to the interface of Ni/SiC.     

Morphology of CIGS thin films deposited by single-stage process and three-stage process at low temperature

Cu（In,Ga）Se2 （CIGS） thin films are prepared by a single-stage process and a three-stage process at low temperature in the co-evaporation equipment. The quite different morphologies of CIGS thin films deposited by two methods are characterized by scanning electron microscopy （SEM）. The orientation of CIGS thin films is identified by X-ray dif- fraction （XRD） and Raman spectrum, respectively. Through analyzing the film-forming mechanisms of two prepara- tion processes, we consider the cause of such differences is that the films deposited by three-stage process at low tem- perature evolve from Cu-poor to Cu-rich ones and then back to Cu-poor ones. The three-stage process at low tempera- ture results in the CIGS thin films with the （220）/（204） preferred orientation, and the ordered vacancy compound （OVC） layer is formed on the surface of the film. This study has great significance to large-scale industrial production.     

A new structure and its analytical breakdown model of high voltage SOI device with Step Unmovable Surface Charges of buried oxide layer

A new SOI （Silicon On Insulator） high voltage device with Step Unmovable Surface Charges （SUSC） of buried oxide layer and its analytical breakdown model are proposed in the paper. The unmovable charges are implemented into the upper surface of buried oxide layer to increase the vertical electric field and uniform the lateral one. The 2-D Poisson＇s equation is solved to demonstrate the modulation effect of the immobile interface charges and analyze the electric field and breakdown voltage with the various geometric parameters and step numbers. A new RESURF （REduce SURface Field） condition of the SOl device considering the interface charges and buried oxide is derived to maximize breakdown voltage. The analytical results are in good agreement with the numerical analysis obtained by the 2-D semiconductor devices simulator MEDICI. As a result, an 1200V breakdown voltage is firstly obtained in 3pro-thick top Si layer, 2pro-thick buried oxide layer and 70pro-length drift region using a linear doping profile of unmovable buried oxide charges.     

低温退火对稀磁半导体(Ga,Mn)As性质的影响

利用低温分子束外延技术在GaAs(001)上外延生长出厚度为500nm的稀磁半导体(Ga,Mn)As薄膜. 双晶X射线衍射证明其为闪锌矿结构，晶格参数为0.5683nm，据此推导出其Mn含量为7%. 磁测量结果揭示其铁磁转变温度为65K. 观察了低温退火处理对(Ga,Mn)As磁性质的影响，发现生长后退火处理显著提高了其铁磁转变温度，可以达到115K.     

Fabrication and characterization of thin-film Cu (In,Ga) Se2 solar cells on a PET plastic substrate using screen printing

Chalcopyrite copper indium gallium diselenide (CIGS) ink was prepared by dissolving copper, indium, gallium acetylacetonate and Se powder in oleylamine using the hot injection methods. CIGS films were deposited on a PET plastic substrate by a screen-printing technique using CIGS ink with a Ga content ranging from 0.3 to 0.6. X-ray diffraction patterns reveal that the films exhibit a chalcopyrite-type structure. The crystalline grain sizes of the films decrease with increasing Ga content. AFM data shows that the root mean square (RMS) surface roughness of the CIGS film decreases with increasing Ga content. The effects of the Ga content in the CIGS absorber layer on the optical properties of the corresponding thin films and solar cells were studied. The band-gap energies of the CIGS thin films increased with an increasing Ga/(In+Ga) ratio. The short-circuit current (I_SC) of the solar cell decreased linearly with the Ga/(In+Ga) ratio, while the open-circuit voltage (V_OC) increased with this ratio. The solar cell exhibited its highest efficiency of 4.122% at a Ga/(In+Ga) ratio of 0.3.     

Magnetic and magnetotransport properties in the n-type (Ga,Mn)N thin films

We present the magnetic and magnetotransport properties of epitaxial (Ga,Mn)N films with nominal Mn concentration (x=0.1–0.73%) grown by plasma-enhanced molecular beam epitaxy (PEMBE). X-ray diffraction (XRD) reveals that (Ga,Mn)N has the single-phase wurtzite structure without secondary phases. The epitaxial (Ga,Mn)N films were found to exhibit n-type conductivity, ferromagnetic ordering with Curie temperature in the range 550–700 K, and in-plane magnetic anisotropy. The negative magnetoresistance (MR) was observed at temperatures below 50 K and was found to gradually increase with decreasing temperature.     

Properties of InAs/(Ga,In)Sb strained layer superlattices grown on the {111} orientations

Following the proposal of the extreme type-II InAs/(Ga,In)Sb strained layer superlattice system by Mailhiot and Smith in 1987 for long wavelength infrared detection, a number of groups have experimentally investigated (100) oriented InAs/(Ga,In)Sb strained layer superlattices and demonstrated that these structures can possess energy gaps in the 8–12 μm range with absorption coefficients comparable to HgCdTe. However, a number of advantages are predicted if these structures are grown on the {111} orientations. In this paper, we present details of our investigation of the growth of InAs/GaSb heterostructures and InAs/(Ga,In)Sb strained layer superlattices on the (111)A and (111)B orientations by molecular beam epitaxy, compared to growth on the (100) orientation. Heterojunction growth and incorporation rates of Sb (As) into InAs (GaSb) on (111)A, (111)B, and (100) orientations have been assessed and implications for growth and optical properties of InAs/(Ga,In)SB strained layer superlattices are discussed. GaSb/InAs and InAs/GaSb interfaces on the (111)B orientation are investigated by x-ray photoelectron spectroscopy, and the structural quality of InAs/(Ga,In)Sb strained layer superlattices are investigated by x-ray diffraction.     

Formation of (Ga,Mn)As nanowires and study of their magnetic properties

The molecular-beam epitaxy technique is used to synthesize arrays of (Ga,Mn)As nanowire crystals on a GaAs (111)B surface in the growth-temperature range 480–680°C. It is established that the formation of (Ga,Mn)As nanowires can be described in the context of a vapor-liquid-crystal mechanism. It is shown that the growth of (Ga,Mn)As nanowires must occur in conditions stabilized with respect to Ga. It is found that the field and temperature dependences of the static magnetic susceptibility for samples produced at the temperature 660°C exhibit paramagnetic behavior.     

Photoemission characteristics of transmission-mode negative electron affinity GaAs and (ln,Ga)As vapor-grown structures

Several types of transmission-mode negative electron affinity (NEA) photocathodes were investigated. The first group consisted of GaAs cathodes of various thicknesses grown on a composite structure composed of a GaP substrate and a Ga(As,P) buffer layer. These cathodes were of two types, one having an abrupt Ga(As,P)/GaAs interface and the other having a compositionally graded interface. The latter type exhibited the highest transmission-mode quantum efficiency, 0.11 electron per incident photon at 0.85 μm. It is assumed that the electron diffusion length L in the GaAs layer is limited by misfit dislocations arising from the lattice mismatch between the GaAs and the Ga(As,P) buffer layer. L increased with cathode layer thickness more rapidly for the graded structure, suggesting that misfit dislocation propagation into the GaAs layer is less when the dislocations are generated gradually (graded structure) than when they are introduced abruptly (ungraded structure). The second group of samples consisted of (In, Ga)As alloy cathodes of various compositions grown on both GaAs and GaP substrates with lattice-mismatch-reducing buffer layers of (In, Ga)As, (In, Ga)P, and Ga(As,P). It was found that photosensitivity was improved significantly by reducing the amount of lattice mismatch between the (In, Ga)As cathode layer and the substrate or buffer layer. Using an (In, Ga)As cathode with an (In,Ga)P buffer layer grown on a GaP substrate, transmission quantum efficiencies in excess of 0.01 were obtained over the relatively broad wavelength range of 0.7 to 1.04 µm.     

Features of obtaining diluted magnetic semiconductors in the system of narrow-gap GaInAsSb alloys

Nanotechnology of obtainment of diluted magnetic semiconductors based on the GaInAsSb compounds is developed using the laser deposition of Mn atoms on the surface of the epitaxial layer of a quaternary alloy obtained by liquid-phase epitaxy. Fabricated heterostructures were studied using high-resolution X-ray diffraction for the Bragg and grazing diffraction geometries, and the layer-by-layer analysis is performed by secondary-ion mass spectrometry. It is established that the near-boundary region of the Ga_0.96In_0.04As_0.11Sb_0.89 layer near the deposition surface of atomic Mn exhibits the presence of a quinary compound with Mn atoms in the lattice and Mn₃As₂-type binary inclusions. Saturation of the GaIn(Mn)AsSb multicomponent diluted semiconductor with the Mn compounds makes it possible to specify the concentration of the magnetic impurity in the crystal and control the magnetic properties of the heterostructure.     

基于GaAs的新型稀磁半导体材料(Ga,Mn)As

介绍了一种基于 Ga As的新型稀磁半导体材料 ( Ga,Mn) As,包括 ( Ga,Mn) As的制备方法、结构特性、磁性质及磁输运性质。最后 ,展望了 ( Ga,Mn) As的应用前景     

Tunneling Anisotropic Magnetoresistance-Based Devices

The paper demonstrates the operation of several devices based on tunneling anisotropic magnetoresistance. This effect, which originates from the interplay between the magnetic and transport properties in magnetic materials with strong spin-orbit coupling such as the ferromagnetic semiconductor (Ga,Mn)As, leads to a dependence of the tunneling resistance of devices with respect to the direction of the magnetization in the (Ga,Mn)As layer. We show that such devices can be operated as either information storage elements or sensors. It was also demonstrated that they can be used in either volatile or nonvolatile mode and that they provide either two-state or multiple state devices in either of these modes. Lastly, we present experimental evidence that they can be coupled to traditional ferromagnetic materials to still further enhance the variety of possible device functionalities     

(Ga,Mn)As on patterned GaAs(0 0 1) substrates: Growth and magnetotransport

A new type of (Ga,Mn)As microstructures with laterally confined electronic and magnetic properties has been realized by growing (Ga,Mn)As films on -oriented ridge structures with (1 1 3)A sidewalls and (0 0 1) top layers prepared on GaAs(0 0 1) substrates. The temperature- and field-dependent magnetotransport data of the overgrown structures are compared with those obtained from planar reference samples revealing the coexistence of electronic and magnetic properties specific for (0 0 1) and (1 1 3)A (Ga,Mn)As on a single sample.