Design methodology of embedded DRAM with virtual-socketarchitecture

This paper proposes the virtual-socket architecture in order to reduce the design turn-around time (TAT) of the embedded DRAM. The required memory density and the function of the embedded DRAM are system dependent. In the conventional design, the DRAM control circuitry with the DRAM memory array is handled as a hardware macro, resulting in the increase in design TAT. On the other hand, our proposed architecture provides the DRAM control circuitry as a software macro to take advantage of the automated tools based on synchronous circuit design. With array-generator technology, this architecture can achieve high quality and quick turn-around time (QTAT) of flexible embedded DRAM that is almost the same as the CMOS ASIC. We applied this virtual-socket architecture to the development of the 61-Mb synchronous DRAM core using 0.18-μm design rule and confirmed the high-speed operation, 166 MHz at CAS latency of two, and 180 MHz at that of three. The experimental results show that our proposed architecture can be applied to the development of the high-performance embedded DRAM with design QTAT     

An 8-ns random cycle embedded RAM macro with dual-port interleavedDRAM architecture (D2RAM)

A novel fast random cycle embedded RAM macro with dual-port interleaved DRAM architecture (D²RAM) has been developed. The macro exploits three key circuit techniques: dual-port interleaved DRAM architecture, two-stage pipelined circuit operation, and write before sensing. Random cycle time of 8 ns under worst-case conditions has been confirmed with a 0.25-μm embedded DRAM test chip. This is six times faster than conventional DRAM     

A 400-MHz random-cycle dual-port interleaved DRAM (D/sup 2/RAM) with standard CMOS Process

This paper describes a standard CMOS process based on embedded DRAM macro with dual-port interleaved DRAM architecture (D/sup 2/RAM), which is suitable for the leading edge CMOS LSIs with both high-speed and large-scale memories on a chip. This macro exploits three key technologies: fully sense-signal-loss compensating technology based on the whole detailed noise element breakdowns, the novel striped trench capacitor (STC) cell, and the write-before-sensing (WBS) circuit by decoded write-bus. A 400-MHz random cycle access has been verified for D/sup 2/RAM fabricated by a 0.15-/spl mu/m standard CMOS process.     

A 12-ns 8-Mbyte DRAM secondary cache for a 64-bit microprocessor

This paper describes three circuit technologies that have been developed for high-speed large-bandwidth on-chip DRAM secondary caches. They include a redundancy-array advanced activation scheme, a bus-assignment-exchangeable selector scheme and an address-zero access refresh scheme. By using these circuit technologies and new small subarray structures, a row-address access time of 12 ns and a row-address cycle time of 16 ns were obtained. An experimental chip made up of an 8-Mbyte DRAM and a 64-bit microprocessor was developed using 0.25-μm merged logic and DRAM process technology     

Refresh re-use based transparent test for detection of in-field permanent faults in DRAMs

In this paper, a transparent test technique for testing permanent faults developed during field operation of DRAMs has been proposed. A three pronged approach has been taken in this work. First, a word oriented transparent March test generation algorithm has been proposed that avoids signature based prediction phase; next the proposed transparent March test is structured in a way that facilitates its implementation during refresh cycles of the DRAM; finally the on-chip refresh circuit is modified to allow its re-use during implementation of the proposed transparent March test on DRAM. Re-use of refresh cycles for test purpose ensures periodic testing of DRAM without interruption. Thus, faults are not allowed to accumulate. Moreover, wait for idle cycles of the processor to perform the test are avoided and test finishes within a definite time. Re-using the refresh circuit for test purpose overcomes requirement of additional Design-For-Testability hardware and brings down the area overhead.Both analytic predictions and simulation results for the method proposed here indicate real estate benefits and test time savings in comparison to other reported techniques. The proposed refresh re-use based transparent test technique provides a cost effective solution by providing facility for periodic tests of DRAM without requiring additional test hardware.     

DRAM macros for ASIC chips

DRAM macros in 4-Mb (0.8-μm) and 16-Mb (0.5-μm) DRAM process technology generations have been developed for CMOS ASIC applications. The macros use the same area efficient one transistor trench cells as 4-Mb (SPT cell) and 16-R Mb (MINT cell) DRAM products. It is shown that the trench cells with capacitor plates by the grounded substrate are ideal structures as embedded DRAM's. The trench cells built entirely under the silicon surface allow cost effective DRAM and CMOS logic merged process technologies. In the 0.8-μm rule, the DRAM macro has a 32-K×9-b configuration in a silicon area of 1.7×5.0 mm² . It achieves a 27-ns access and a 50-ns cycle times. The other DRAM macro in the 0.5-μm technology is organized in 64 K×18 b. It has a macro area of 2.1×4.9 mm and demonstrated a 23-ns access and a 40-ns cycle times. Small densities and multiple bit data configurations provide a flexibility to ASIC designs and a wide variety of application capabilities. Multiple uses of the DRAM macros bring significant performance leverages to ASIC chips because of the wide data bus and the fast access and cycle times. A data rate more than 1.3 Gb/s is possible by a single chip. Some examples of actual DRAM macro embedded ASIC chips are shown     

A 1-Gb DRAM for file applications

A time-shared offset-canceling sensing scheme, a defective word-line Hi-Z standby scheme, and a flexible multimacro architecture have been developed for 1-Gb DRAM. These circuit technologies have been applied to a 1-Gb DRAM for file applications employing 0.25 μm CMOS process technology, a diagonal bit-line cell, and a two-stage pipeline circuit technique. In this DRAM, a 30% chip size reduction and a 400-MB/s data transfer rate have been achieved. A 100% improvement in yield has been estimated by Monte-Carlo simulation. The 1-Gb DRAM die size is 936 mm². The cell size is 0.54 μm². The operating current is 58 mA at 2 V and 100 MHz     

Ultra CSPTM-a wafer level package

There has been a significant amount of work over the past five years on chip scale packaging. The majority of this work has been an extension of conventional integrated circuit (IC) packaging technology utilizing either wire bonders or tape automated bonding (TAB)-type packaging technology. Handling discrete devices during the IC packaging for these type of chip scale packages (CSPs) has resulted in a relatively high cost for these packages. This paper reports a true wafer level packaging (WLP) technology called the Ultra CSP^TM. One advantage of this WLP concept is that it uses standard IC processing technology for the majority of the package manufacturing. This makes the Ultra CSP ideal for both insertion at the end of the wafer fab as well as the facilitation of wafer level test and burn-in options. This is especially true for dynamic random access memory (DRAM) wafers. Wafer level burn-in and wafer level processing can be used for DRAM and other devices as a way to both reduce cost and improve cycle time. Thermal cycling results for Ultra CSPs with a variety of package sizes and input/output (I/O) counts are presented. These test vehicles, assembled to FR-4 boards without underfill, cover a range of footprints typical of flash memory, DRAM and other devices. The electrical and thermal performance characteristics of the Ultra CSP package technology are discussed     

A 1.0-V 230-MHz column access embedded DRAM for portable MPEGapplications

This paper describes a 32-Mb embedded DRAM macro fabricated using 0.13-μm triple-well 4-level Cu embedded DRAM technology, which is suitable for portable equipment of MPEG applications. This macro can operate 230-MHz random column access even at 1.0-V power supply condition. The peak power consumption is suppressed to 198 mW in burst operation. The power-down standby mode, which suppresses the leakage current consumption of peripheral circuitry, is also prepared for portable equipment. With the collaboration of array circuit design and the fine Cu metallization technology, macro size of 18.9 mm² and cell efficiency of 51.3% are realized even with dual interface and triple test functions implemented     

BiCMOS circuit technology for high-speed DRAMs

A BiCMOS circuit technology featured by a novel bit-line sense amplifier has been developed. The bit-line sense amplifier is composed of a BiCMOS differential amplifier, the impedance-converting means featured by the CMOS current mirror circuit or the clocked CMOS inverter between the bit line and the base node of the BiCMOS differential amplifier, and a conventional CMOS flip-flop. This technology can reduce the access time to half that of a conventional CMOS DRAM access time. Applied to a 1-kb DRAM test chip, a new BiCMOS circuit technology was successfully verified. Furthermore, the sensitivity and area penalty of the new BiCMOS bit-line sense amplifier and future applications to megabit DRAMs are discussed     

High-performance embedded SOI DRAM architecture for the low-powersupply

This paper presents the high-performance DRAM array and logic architecture for a sub-1.2-V embedded silicon-on-insulator (SOI) DRAM. The degradation of the transistor performance caused by boosted wordline voltage level is distinctly apparent in the low voltage range. In our proposed stressless SOI DRAM array, the applied electric field to the gate oxide of the memory-cell transistor can he relaxed. The crucial problem that the gate oxide of the embedded-DRAM process must be thicker than that of the logic process can be solved. As a result, the performance degradation of the logic transistor can be avoided without forming the gate oxides of the memory-cell array and the logic circuits individually. In addition, the data retention characteristics can be improved. Secondly, we propose the body-bias-controlled SOI-circuit architecture which enhances the performance of the logic circuit at sub-1.2-V power supply voltage, Experimental results verify that the proposed circuit architecture has the potential to reduce the gate-delay time up to 30% compared to the conventional one. This proposed architecture could provide high performance in the low-voltage embedded SOI DRAM     

Impact of three-dimensional transistor on the pattern area reduction for ULSI

The impact of three-dimensional transistors, double-gate transistor, trench-isolated transistor (TIS) (using sidewall gate)/FinFET, and surrounding gate transistor (SGT) on the pattern area reduction for ultra-large-scale integration (ULSI) has been described. The pattern area of the gate logic, such as NAND or NOR, with the double-gate transistor, TIS/FinFET or SGT can be reduced to 58, 47, 48%, respectively, compared with the conventional planar case using the same feature size, F. The pattern area of the tapered buffer circuit with the double-gate transistor, TIS/FinFET or SGT can be reduced to 58, 20, 48%, respectively. These three-dimensional transistors can be adapted to ULSI such as application specific integrated circuit (ASIC), microprocessor (MPU), dynamic random access memory (DRAM), and embedded DRAM. The smallest pattern area may be realized with TIS/FinFET or SGT of 47-48% for ASIC, with TIS/FinFET of 42% for MPU, with SGT of 65% for DRAM and with TIS/FinFET or SGT for embedded DRAM. For designing the circuit with TIS/FinFET the design of the trench depth (2F for gate logic, 12F for tapered buffer) is the key issue. The design of the cell library for SGT is a task for the future.     

Dynamically shift-switched dataline redundancy suitable for DRAMmacro with wide data bus

A novel dataline redundancy suitable for an embedded DRAM macro with wide data bus is presented. This redundancy reduces the area required for spare cells from 6 to 1.6% of the area required for normal cells and improves chip yield from 50 to 80%. In addition, it provides a high-speed data path. An embedded DRAM macro adopting the redundancy achieves 200-MHz operation and provides 51.2-Gbit/s bandwidth. It has been fabricated with 0.25-μm technology     

A novel circuit technology with surrounding gate transistors(SGT's) for ultra high density DRAM's

This paper describes a novel circuit technology with Surrounding Gate Transistors (SGT's) For ultra high density DRAM's. In order to reduce the chip size drastically, an SGT is employed to all the transistors within a chip. SGT's connected in series and a common source SGT have been newly developed for the core circuit, such as a sense amplifier designed by a tight design rule. Furthermore, to reduce the inherent cell array noise caused by a relaxed open bit line (BL) architecture, a noise killer circuit placed in the word line (WL) shunt region and a twisted BL architecture within the sense amplifier region combined with a novel separation sensing scheme have been newly introduced. Using the novel circuit technology, a 32.9% smaller chip size can be successfully achieved for a 64-Mb DRAM and 34.4% for a 1-Gb DRAM compared with a DRAM composed of the planar transistor without sacrificing the access time, power dissipation, and V_cc margin. Furthermore,the effectiveness of this technology is verified by using the circuit simulation of the internal main nodes such as WL and BL     

An antifuse EPROM circuitry scheme for field-programmable repair inDRAM

An antifuse EPROM and 3-V programming circuit has been demonstrated in an existing 0.22-μm DRAM process technology and is fully compatible with 64-Mb SDRAM specifications. The antifuse circuitry uses an internal high-voltage generator for programming and a dynamic sense and static latch scheme that appropriately enables redundant DRAM address decoders at power-up. For efficient high voltage generation, a high-voltage-tolerant capacitor structure was formed by using the high fringing capacitance available between intralevel and interlevel polysilicon and metal lines. Furthermore, the programmable EPROM element was realized without any process modifications by utilizing destructive dielectric breakdown of the thin, highly reliable oxide-nitride-oxide (ONO) dielectric in the basic DRAM cell capacitor structure. This antifuse EPROM circuit enables implementation of field-programmable DRAM features such as memory repair, output impedance matching, and data encryption     

A 1.6 Gbyte/s data transfer rate 8 Mb embedded DRAM

An 8 Mb embedded DRAM has been developed. The salient feature of this embedded DRAM is page fault tolerance. Accessing across different pages can be performed using a minimum column cycle. This feature is achieved by placing a data latch and a transfer gate between the bit line sense amplifier and the column select gate. This DRAM can be reconfigured as separated 2 Mb units when it is embedded as a macro cell of an ASIC library     

New nibbled-page architecture for high-density DRAMs

A nibbled-page architecture which can be used to access all column addresses on the selected row address randomly in units of 8 bits at the 100 Mbit/s data rate is discussed. To realize such high-speed architecture, three key circuit techniques have been developed. An on-chip interleaved circuit has been used for the high-speed serial READ and WRITE operations. Column address prefetch and WE signal prefetch techniques have been introduced to eliminate idle time between 8 bit units. The nibbled-page architecture has been successfully implemented in an experimental 16 Mb DRAM, and 100 Mb/s operation has been achieved. The DRAM with nibbled-page mode is very effective in simplifying the design of high-speed data transfer systems     

A circuit design of intelligent cache DRAM with automaticwrite-back capability

An intelligent cache based on a distributed architecture that consists of a hierarchy of three memory sections-DRAM (dynamic RAM), SRAM (static RAM), and CAM (content addressable memory) as an on-chip tag-is reported. The test device of the memory core is fabricated in a 0.6 μm double-metal CMOS standard DRAM process, and the CAM matrix and control logic are embedded in the array. The array architecture can be applied to 16-Mb DRAM with less than 12% of the chip overhead. In addition to the tag, the array embedded CAM matrix supports a write-back function that provides a short read/write cycle time. The cache DRAM also has pin compatibility with address nonmultiplexed memories. By achieving a reasonable hit ratio (90%), this cache DRAM provides a high-performance intelligent main memory with a 12 ns(hit)/34 ns(average) cycle time and 55 mA (at 25 MHz) operating current     

A 1.8-V embedded 18-Mb DRAM macro with a 9-ns RAS access time andmemory-cell area efficiency of 33%

A 1.8-V embedded 18-Mb DRAM macro with a 9-ns row-address-strobe access time and memory-cell area efficiency of 33% has been successfully developed with a single-side interface architecture, high-speed circuit design, and low-voltage design. In the high-speed circuit design, a multiword redundancy scheme and Y-select merged sense scheme are developed to achieve the performance goal. In the low-voltage design, a dual-complement charge-pump scheme and a decoupling capacitor utilizing a tantalum-oxide capacitor are developed to retain high performance at low supply voltage     

Approaches to extra low voltage DRAM operation by SOI-DRAM

The newly designed scheme for a low-voltage 16 MDRAM/SOI has been successfully realized and the functional DRAM operation has been obtained at very low supply voltage below 1 V. The key process and circuit technologies for low-voltage/high-speed SOI-DRAM will be described here. The extra low voltage DRAM technologies are composed of the modified MESA isolation without parasitic MOS operation, the dual gate SOI-MOSFETs with tied or floating bodies optimized for DRAM specific circuits, the conventional stacked capacitor with increased capacitance by thinner dielectric film, and the other bulk-Si compatible DRAM structure. Moreover, a body bias control technique was applied for body-tied MOSFETs to realize high performance even at low voltage. Integrating the above technologies in the newly designed 0.5-μm 16 MDRAM, high-speed DRAM operation of less than 50 ns has been obtained at low supply voltage of 1 V