Si1 − xGex metal-oxide-semiconductor capacitors with HfTaOx gate dielectrics

Interfacial reactions and electrical properties of RF sputter deposited HfTaO_x high-k gate dielectric films on Si_1 − xGe_x (x = 19%) are investigated. X-ray photoelectron spectroscopic analyses indicate an interfacial layer containing GeO_x, Hf silicate, SiO_x (layer of Hf-Si-Ge-O) formation during deposition of HfTaO_x. No evidence of Ta-silicate or Ta incorporation was found at the interface. The crystallization temperature of HfTaO_x film is found to increase significantly after annealing beyond 500 °C (for 5 min) along with the incorporation of Ta. HfTaO_x films (with 18% Ta) remain amorphous up to about 500 °C anneal. Electrical characterization of post deposition annealed (in oxygen at 600 °C) samples showed; capacitance equivalent thickness of ~ 4.3-5.7 nm, hysteresis of 0.5-0.8 V, and interface state density = 1.2-3.8 × 10¹² cm^− 2 eV^− 1. The valence and conduction band offsets were determined from X-ray photoelectron spectroscopy spectra after careful analyses of the experimental data and removal of binding energy shift induced by differential charging phenomena occurring during X-ray photoelectron spectroscopic measurements. The valence and conduction band offsets were found to be 2.45 ± 0.05 and 2.31 ± 0.05 eV, respectively, and a band gap of 5.8 ± 05 eV was found for annealed samples.     

Ge and GexSi1 − x islands formation on GexSi1 − x solid solution surface

Critical thicknesses of 2D to 3D growth and morphological ‘hut’-‘dome’ cluster transitions in Ge layers were measured. In comparison with the growth on the pure Si(100) surface, a decrease in the critical thicknesses of 2D-3D and hut-dome transitions was observed and accounted for by the accumulation of elastic strains as Ge content or thickness of the GeSi solid solution increased. The density and size of Ge nanoclusters were determined depending on the solid solution composition. The presence of a thin strained layer of the GeSi solid solution caused not only the changes in critical thicknesses of the transitions, but also affected the properties of the germanium nanocluster array.     

An artificial nonradiative recombination center model created by use of a Si1 − xGex/Si quantum-well-inserted pseudomorphic superlattice

An attempt is made to mimic a system under the influence of nonradiative recombination (NR) by use of a Si_1 − xGe_x quantum well (QW) embedded in a Si_1 − xGe_x/Si strained-layer superlattice. Carrier transfer mediates the coupling between the first miniband of superlattice barrier and QW ground state, which is useful in setting up an artificial NR center based only on radiative channels. Steady-state and transient photoluminescence (PL) reproduces spectroscopic features shared by NR systems at large such as quadratic dependence of PL intensity on excitation power and prolonged decay time at increased pumping, which are quite opposite to radiative recombination.     

Photoluminescence and Raman study of Cu2ZnSn(SexS1 − x)4 monograins for photovoltaic applications

The quaternary semiconductors Cu₂ZnSnSe₄ and Cu₂ZnSnS₄ have attracted a lot of attention as possible absorber materials for solar cells due to their direct bandgap and high absorption coefficient (> 10⁴ cm⁻¹). In this study we investigate the optical properties of Cu₂ZnSn(Se_xS_1 − x)₄ monograin powders that were synthesized from binary compounds in the liquid phase of potassium iodide (KI) flux materials in evacuated quartz ampoules. Radiative recombination processes in Cu₂ZnSn(Se_xS_1 − x)₄ monograins were studied by using low-temperature photoluminescence (PL) spectroscopy. A continuous shift from 1.3 eV to 0.95 eV of the PL emission peak position with increasing Se concentration was observed indicating the narrowing of the bandgap of the solid solutions. Recombination mechanisms responsible for the PL emission are discussed. Vibrational properties of Cu₂ZnSn(Se_xS_1 − x)₄ monograins were studied by using micro-Raman spectroscopy. The frequencies of the optical modes in the given materials were detected and the bimodal behaviour of the A₁ Raman modes of Cu₂ZnSnSe₄ and Cu₂ZnSnS₄ is established.     

Deposition and characterization of pulsed direct current magnetron sputtered Al95.5Cr2.5Si2 (N1 − xOx) thin films

Aluminum rich oxynitride thin films were prepared using pulsed direct current (DC) magnetron sputtering from an Al_95.5Cr_2.5Si₂ (at.%) target. Two series of films were deposited at 400 °C and 650 °C by changing the O₂/(O₂ + N₂) ratio in the reactive gas from 0% (pure nitrides) to 100% (pure oxides). The films were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and nanoindentation. The results showed the existence of three different regions of microstructure and properties with respect to the oxygen concentration. For the samples deposited at 650 °C in the nitrogen rich region (O₂/(O₂ + N₂) ≤ 0.08), the formation of the h-AlN (002) and Al-N bond were confirmed by XRD and XPS measurements. The hardness of the films was around 30 GPa. In the intermediate region (0.08 ≤ O₂/(O₂ + N₂) ≤ 0.24), the presence of an amorphous structure and the shifting of the binding energies to lower values corresponding to non-stoichiometric compounds were observed and the hardness decreased to 12 GPa. The lowering of mechanical properties was attributed to the transition of the clean target to the reacted target under non-steady state deposition conditions. In the oxygen rich region (0.24 ≤ (O₂/(O₂ + N₂) ≤ 1), the existence of α-Al₂O₃-(113), α-Al₂O₃-(116) and Al-O bonds confirmed the domination of this phase in this region of deposition and the hardness increased again to 30-35 GPa. Films deposited at 400 °C showed the same behavior except in the oxygen rich region, where hardness remains low at about 12-14 GPa.     

Structural study of Si1 − xGex nanocrystals embedded in SiO2 films

We have investigated the structural properties of Si_1 − xGe_x nanocrystals formed in an amorphous SiO₂ matrix by magnetron sputtering deposition. The influence of deposition parameters on nanocrystal size, shape, arrangement and internal structure was examined by X-ray diffraction, Raman spectroscopy, grazing incidence small angle X-ray scattering, and high resolution transmission electron microscopy. We found conditions for the formation of spherical Si_1 − xGe_x nanocrystals with average sizes between 3 and 13 nm, uniformly distributed in the matrix. In addition we have shown the influence of deposition parameters on average nanocrystal size and Ge content x.     

Basic properties of Sr1 − xBaxSi2

Basic properties, such as the phase relationship, crystal structure, and energy gap E_g, have been investigated in Sr-rich Sr_1 − xBa_xSi₂. Sr_1 − xBa_xSi₂ (0 ≤ x ≤ 1.0) has two phases: one with the SrSi₂-type structure and another with the BaSi₂-type structure. The SrSi₂ phase exists at x ranging from 0 to 0.13, and the BaSi₂ phase exists at x ranging from 0.24 to 1.0. The volume increases with x in both the SrSi₂ and BaSi₂ phases. A volume jump of 13.7% appears at the structural phase transition from the SrSi₂ phase to the BaSi₂ phase. E_g increases with x in SrSi₂-phase Sr_1 − xBa_xSi₂ but E_g decreases with x in the BaSi₂-phase Sr_1 − xBa_xSi₂. In Sr-rich BaSi₂-phase Sr_1 − xBa_xSi₂, Ba atoms at a specific crystallographic site, the A1 site, are preferentially substituted by Sr atoms, as well as in Ba-rich BaSi₂-phase Sr_1 − xBa_xSi₂.     

Synthesis and electrochemical properties of Ti doped Li3 − xFe2 − xTix(PO4)3/C cathode materials

Li_3 − xFe_2 − xTi_x(PO₄)₃/C (x = 0-0.4) cathodes designed with Fe doped by Ti was studied. Both Li₃Fe₂(PO₄)₃/C (x = 0) and Li_2.8Fe_1.8Ti_0.2(PO₄)₃/C (x = 0.2) possess two plateau potentials of Fe³⁺/Fe²⁺ couple (around 2.8 V and 2.7 V vs. Li⁺/Li) upon discharge observed from galvanostatic charge/discharge and cyclic voltammetry. Li_2.8Fe_1.8Ti_0.2(PO₄)₃/C has higher reversibility and better capacity retention than that of the undoped Li₃Fe₂(PO₄)₃/C. A much higher specific capacity of 122.3 mAh/g was obtained at C/20 in the first cycle, approaching the theoretical capacity of 128 mAh/g, and a capacity of 100.1 mAh/g was held at C/2 after the 20th cycle.     

Fabrication and characterization of all-oxide heterojunction p-CuAlO2 + x/n-Zn1 − xAlxO transparent diode for potential application in “invisible electronics”

Transparent p-n heterojunction diodes have been fabricated by p-type copper aluminum oxide (p-CuAlO_2 + x) and n-type aluminum doped zinc oxide (n-Zn_1 − xAl_xO) thin films on glass substrates. The n-layers are deposited by sol-gel-dip-coating process from zinc acetate dihydrate (Zn(CH₃COO)₂·2H₂O) and aluminum nitrate (Al(NO₃)₃·9H₂O). Al concentration in the nominal solution is taken as 1.62 at %. P-layers are deposited onto the ZnO:Al-coated glass substrates by direct current sputtering process from a prefabricated CuAlO₂ sintered target. The sputtering is performed in oxygen-diluted argon atmosphere with an elevated substrate temperature. Post-deposition oxygen annealing induces excess oxygen within the p-CuAlO_2 + x films, which in turn enhances p-type conductivity of the layers. The device characterization shows rectifying current-voltage characteristics, confirming the proper formation of the p-n junction. The turn-on voltage is obtained around 0.8 V, with a forward-to-reverse current ratio around 30 at ± 4 V. The diode structure has a total thickness of 1.1 μm and the optical transmission spectra of the diode show almost 60% transmittance in the visible region, indicating its potential application in ‘invisible electronics’. Also the cost-effective procedures enable the large-scale production of these transparent diodes for diverse device applications.     

CuIn1 − xAlxSe2 thin films obtained by selenization of evaporated metallic precursor layers

CuIn_1 − xAl_xSe₂ (CIAS) thin films were grown by a two stage process. Cu, In and Al layers were sequentially evaporated and subsequently heated with elemental selenium in a quasi-closed graphite box. Different x values (0 ≤ x ≤ 0.6) were obtained by varying the Al and In precursor layers thicknesses. Selenization conditions such as Se amount provided during the selenization process were adjusted in order to optimize the film properties. Polycrystalline CuIn_1 − xAl_xSe₂ thin films with chalcopyrite structure were obtained. Referred to CuInSe₂ thin films the lattice parameters, the (112) orientation and the average crystallite size decreased and the band gap energy increased with increasing Al content. To optimize structural properties of the CIAS films a higher Se amount was required as the x value increased. The incorporation of Al changed the thin film morphology towards smaller grain sizes and less compact structures.     

High-temperature thermoelectric properties of non-stoichiometric Ag1 − xInTe2 with chalcopyrite structure

Our group has revealed that AgGaTe₂ with the chalcopyrite structure exhibits relatively high thermoelectric (TE) figure of merit (ZT) when it has a deviation of Ag content from the stoichiometry. The maximum ZT value of 0.77 was obtained for Ag_0.95GaTe₂ at 850 K. On the other hand, the TE properties of AgInTe₂ with the same chalcopyrite structure with AgGaTe₂ have not been investigated. In the present study, we examined the high-temperature TE properties of AgInTe₂ with the composition of Ag_1 − xInTe₂ (x = 0, 0.01, 0.03, and 0.05). The deviation of Ag content from stoichiometry slightly enhanced the ZT value. The maximum ZT value was 0.07 at 600 K obtained in the samples of x = 0.03 and 0.05.     

Structure and negative thermal expansion of Pb1 −xBixTiO3

Pb_1-xBi_xTiO₃ (x = 0.0-0.1) compounds were prepared to study the unique dopant effect of bismuth in PbTiO₃. Their thermal expansions and structures were investigated by high-temperature X-ray diffraction and X-ray Rietveld method. The results indicated that Bismuth substitution evidently weakened the tetragonality of PbTiO₃ solid solution, but increased the spontaneous polarization. Both the enhanced spontaneous polarization and the decreased tetragonality led to small volume shrinkage with temperature rising, where the average volumetric thermal expansion coefficient changed from − 1.99 × 10^− 5/°C for pure PbTiO₃ to − 0.56 × 10^− 5/°C for Pb_0.90Bi_0.10TiO₃. The Curie point of Pb_1 − xBi_xTiO₃ was slightly raised compared to PbTiO₃ and permitted one to use it in a wide temperature range.     

Influence of strontium substitution on the dielectric properties of Ca(1 − x)SrxTi0.9Zr0.1O3 solid solutions

A conventional solid-state reaction has been used to synthesize the perovskite Ca_(1 − x)Sr_xTi_(1 − y)Zr_yO₃ (y = 0.1). The aim of this study is focused on the development of new materials with complex perovskite structure and on their dielectric property improvement. The temperature and substitutional ratio effects on the different phase evolutions is investigated by X-ray diffraction (XRD) and scanning electron microscope observations. These ceramics sintered at 1500 °C, present a density higher than 95% and their dielectric properties are significantly affected by the substitution. The CaTiO₃ ceramic present a relative permittivity of 190 and the temperature coefficient of the permittivity of − 1828 ppm/C°. The substitution with zirconium (for x = 0 and y = 0.1: Σ = 145; |Σ = − 917 ppm/C°). Both permittivity and temperature coefficient values decrease; however, an opposite effect is observed when substituting with the strontium. With increasing an x value and maintaining a y value constant (y = 0.1), the dielectric constant increases and the temperature coefficient remains constant. Therefore, the dielectric properties of CaTiO₃ ceramics are improved with the combined substitution.     

Instantaneous preparation of CuIn(S1 − x, Sex)2 films by means of sparks using microwave irradiation

CuIn(S_1 − x,Se_x)₂ (CISSe) films aimed at flexible solar cells were directly prepared on Ti foils from elemental In, Cu, S, and Se particle precursor using microwave irradiation. The formation of the CISSe phase was deduced from X-ray diffraction (XRD) patterns. The (112) peaks of CISSe were well defined and the lattice constants increased in direct proportion to the S/(S + Se) ratio almost satisfying Vegard's law. In particular, CuInSe₂ was formed in the desired chalcopyrite lattice as indicated by the presence of (101), (103) and (211) peaks in the XRD pattern. Porous surfaces and formation of by-products were avoided by employing an evaporated In and Cu films instead of In and Cu particles.     

Structure and thermal conductivity of Gd2(TixZr1 − x)2O7 ceramics

The Gd₂(Ti_xZr_1 − x)₂O₇ (x = 0, 0.25, 0.50, 0.75, 1.00) ceramics were synthesized by solid state reaction at 1650 °C for 10 h in air. The relative density and structure of Gd₂(Ti_xZr_1 − x)₂O₇ were analyzed by the Archimedes method and X-ray diffraction. The thermal diffusivity of Gd₂(Ti_xZr_1 − x)₂O₇ from room temperature to 1400 °C was measured by a laser-flash method. The Gd₂Zr₂O₇ has a defect fluorite-type structure; however, Gd₂(Ti_xZr_1 − x)₂O₇ (0.25 ≤ x ≤ 1.00) compositions exhibit an ordered pyrochlore-type structure. Gd₂Zr₂O₇ and Gd₂Ti₂O₇ are infinitely soluable. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ increases with increasing Ti content under identical temperature conditions. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ first decreases gradually with the increase of temperature below 1000 °C and then increases slightly above 1000 °C. The thermal conductivity of Gd₂(Ti_xZr_1 − x)₂O₇ is within the range of 1.33 to 2.86 W m^− 1 K^− 1 from room temperature to 1400 °C.     

Preparation of CuIn1 − xGaxSe2 films by metalorganic chemical vapor deposition using three precursors

CuInGaSe₂ thin films have been prepared by a low pressure metalorganic chemical vapor deposition technique using three precursors without additional Se. The properties of the resultant films have been examined by scanning electron microscopy, X-ray diffraction, micro-Raman scattering and absorption spectroscopy.     

Preparation and characterization of CuIn1 − xGaxSe2 − ySy thin film solar cells by rapid thermal processing

This paper describes the synthesis and characterization of CuIn_1 − xGa_xSe_2 − yS_y (CIGSeS) thin-film solar cells prepared by rapid thermal processing (RTP). An efficiency of 12.78% has been achieved on ~ 2 µm thick absorber. Materials characterization of these films was done by SEM, EDS, XRD, and AES. J-V curves were obtained at different temperatures. It was found that the open circuit voltage increases as temperature decreases while the short circuit current stays constant. Dependence of the open circuit voltage and fill factor on temperature has been estimated. Bandgap value calculated from the intercept of the linear extrapolation was 1.1-1.2 eV. Capacitance-voltage analysis gave a carrier density of 4.0 × 10¹⁵ cm^− 3.     

Effect of annealing temperature on magnetic property of Si1 − xCrx thin films

Polycrystalline Si_1 − xCr_x thin films have been prepared by magnetron sputtering followed by rapid thermal annealing (RTA) for crystallization. RTA was performed at 800 °C for 5 min, 1200 °C for 30 s and 1200 °C for 2 min, in a N₂ flow. The magnetic hysteresis loops were observed at room temperature in all the samples except for RTA at 800 °C for 5 min, and the annealing caused the decrease of saturation magnetization relative to the as-grown film. X-ray diffraction spectra and Raman spectra showed that the annealing process lead the deposited amorphous film to be crystallized and CrSi₂ phase formed. The magnetism of the films was determined by the competition between crystallinity and precipitation of diamagnetic CrSi₂ phase.     

Formation of CuIn1 − xAlxSe2 thin films studied by Raman scattering

CuIn_1 − xAl_xSe₂ (CIAS) thin films (x = 0.06, 0.18, 0.39, 0.64, 0.80 and 1) with thicknesses of approximately 1 μm were formed by the selenization of sputtered Cu―In―Al precursors and studied via X-ray diffraction, inductively coupled plasma mass spectrometry and micro-Raman spectroscopy at room temperature. Precursor films selenized at 300, 350, 400, 450, 500 and 550 °C were examined via Raman spectroscopy in the range 50-500 cm^− 1 with resolution of 0.3 cm^− 1. Sequential formation of In_xSe_y, Cu_2 − xSe, CuInSe₂ (CIS) and CIAS phases was observed as the selenization temperature was increased. Conversion of CIS to CIAS was initiated at 500 °C. For all CuIn_1 − xAl_xSe₂ products, the A₁ phonon frequency varied nonlinearly with respect to the aluminum composition parameter x in the range 172 cm^− 1 to 186 cm^− 1.     

Enhancing epitaxial SixC1 − x deposition by adding Ge

In this work, a possible way to enhance the epitaxial growth of metastable, tensile strained Si_xC_1 − x layers by the addition of germanium is demonstrated. During ultra-high vacuum chemical vapor deposition growth, the co-mixing of germane to the Si_xC_1 − x precursors was found to enhance the growth rate by a factor of ~ 3 compared to the growth of pure Si_xC_1 − x. Furthermore, an increase of the amount of substitutional incorporated carbon has been observed. Selective Si_xGe_yC_{1 − x − y} deposition processes utilizing a cyclic deposition were developed to integrate epitaxial tensile strained layers into source and drain areas of n-channel transistors.