AlxGa−xAs/GaAs heterostructure characterization by wet chemical etching

Selective wet chemical etching of the Al_xGa_1−xAs/GaAs system has been applied to heterostructure characterization. Samples of LPE grown AlGaAs/GaAs laser double-heterostructures and separate confinement heterostructures as well as antiresonant reflecting optical waveguides heterostructures were treated with “I2 solution” (I₂:KI:H₂O) and hydrochloric acid. These compounds selectively etch the ternary Al_xGa_1−xAs layers, but with different “threshold composition” x_th values (the x value is that above which the etching rate of a given compound increases sharply). Selectively etched samples have been examined by SEM. The experimental dependence of etching rate on the x value for I2 solution has been derived. From this dependence, the x composition of any ternary layer can be estimated simply. Observations were made of the “microscopic” properties of the heterostructure, such as the smoothness of the interfaces and the uniformity of layers. All imperfections resulting from the growth process, such as interface perturbations or compositional nonuniformity of layers, are clearly seen. An additional advantage of this etching technique is its simplicity. It allows quick examination of grown heterostructure for the selection of wafers for further processing.     

Photoluminescence study of the nitrogen content effect on GaAs/GaAs1 − xNx/GaAs/AlGaAs: (Si) quantum well

We study the effect of nitrogen content in modulation-doped GaAs/GaAs_1 − xN_x/GaAs/GaAlAs:(Si) quantum well using low-temperature photoluminescence spectroscopy. The samples were grown on GaAs (001) substrates by molecular-beam epitaxy with different nitrogen compositions. The variation of the nitrogen composition from 0.04% to 0.32% associated to the bi-dimensional electron gas gives a new interaction mode between the nitrogen localized states and the GaAs_1 − xN_x/GaAs energies levels. The red-shift observed in photoluminescence spectra as function of nitrogen content has been interpreted in the frame of the band anticrossing model.     

Heteroepitaxial growth of Zn1−xCdxSe on cleavage-induced GaAs (110) surface in ultra high vacuum

Zn_1−xCd_xSe epitaxial growth by molecular beam epitaxy (MBE) on the GaAs (110) surface cleaved in ultra high vacuum (UHV) was investigated. The growth mode of Zn_1−x Cd_xSe on GaAs (110) was not a simple Stranski–Krastanow type. At initial growth stage, growth mode was two-dimensional type. However, as the growth proceeds three-dimensional island growth and two-dimensional growth modes compete. As a result, two kinds of structures were spontaneously formed on the surface, pyramidal-shaped islands and ridge structures aligned to the [1 0] direction. Anisotropic in-plane strain relaxation on (110) is suggested as the formation mechanism of such structures.     

Temperature dependence of optical transitions in AlxGa1–xAs/GaAs quantum well structures grown by molecular beam epitaxy

Quantum well (QW) structures of Al_xGa_1–xAs/GaAs were characterized by photoluminescence technique as a function of the temperature between 10 and 300 K. The structures were grown on a 500 nm thick GaAs buffer layer with Molecular Beam Epitaxy technique. We have studied the properties of in-situ Cl₂-etched GaAs surfaces and overgrown QW structures as a function of the etching temperature (70 and 200 °C). Several models were used to fit the experimental points. Best fit to experimental points was obtained with the Pässler model.     

Exploring the fracture toughness KIE and KIC of a medium-Strength steel plate using the surface-flaw test

The fracture toughness of a 30 CrMnSiA steel plate of three thicknesses (10,8 and 5 mm) and three widths (110,80 and 56 mm) has been investigated by using surface-flaw method under room temperature. It is not easy to compute the value of K_IE by the maximum applied load. But the values of K_IE and K_IC could be obtained easily, if the computation of the conditional applied load P₁₀ and P₅ based on the relative effective extension Δa/a₀ = 10% and 5% were adopted, together with the conditions of P_max/P₁₀ 1.2 and P_max/P₅ 1.3. The K_R — Δ_a curve, i.e. the resistance-curve described by the parameter K, has been plotted. The values of K_IC and K_IE are then the resistances corresponding to the real extensions of flaws of Δ/a₀ = 2 and 7%, respectively. These values so obtained are in good agreement with the computed values of K_IC and K_IE by using the conditional applied loads. The values of K_IC and K_IE so obtained are also in agreement with the value of K_IC converted from the J-integral and the effective value of K_IE computed by the maximum applied load, respectively.

An approximate relation between K_IC and K_IE has been found to be: K_IC = (0.85˜0.95)K_IE.

The requirements for the dimensions of specimens are: Thickness of plate: B 1.0(K_IC/σ_0.2)² or 1.25(K_ICσ_0.2)²]; Width of plate: 8 W/B 10, 4 W/2c 5; Effective length: l 2W.     

Hardness, internal stress and fracture toughness of epitaxial AlxGa1−xAs films

Vickers microhardness indentations of 10 μm (001) oriented epilayers of Al_xGa_1−xAs on GaAs substrates have been utilized to evaluate the hardness H_v, the internal stress, and the fracture toughness K_Ic of the layers as a function of their composition parameter x. The hardness H_v varies linearly according to: (6.9-2.2x) GPa and K_Ic increases linearly with x according to: K_1c = (0.44+1.30x) MPa m^1/2. The influence of the substrate on these measurements was found to be negligible for the layer thickness (10 μm) and the indentation load (0.25 N) used, disregarding internal stresses.

Internal film stresses were evaluated by the bimorph buckling method, and were found to depend on the composition parameter according to σ = 0.13x GPa. These stresses did not notably affect the H_v measurements, but for K_Ic corrections as large as 25% had to be made.

The radial cracks observed were of the shallow Palmqvist type. In contradiction to previous reports on this type of cracking, it was found to initiate during unloading, not during loading, and a physical explanation for this deviation is given. No deep radial/median cracks were observed. It was found important to use expressions based on the correct crack geometry in the K_Ic evaluation. Also, a simple theory for the influence of internal stresses on the K_Ic results has been developed.     

Molecular beam epitaxy synthesis of Si1−yCy and Si1−x−yGexCy alloys and Ge islands using an electron cyclotron resonance argon/methane plasma

We report the growth of Si_1−yC_y and Si_1−x−yGe_xC_y alloys on Si(001) by electron cyclotron resonance plasma-assisted Si molecular beam epitaxy using an argon/methane gas mixture. Various Si/Si_1−yC_y and Si/Si_1−x−yGe_xC_y multilayers have been grown and characterized principally by X-ray diffraction and Raman spectroscopy. The influence of growth parameters and electron cyclotron resonance plasma source operating conditions on the C substitutional incorporation was studied. Under optimum growth conditions the structures show good structural properties and sharp interfaces with carbon being essentially substitutionally incorporated up to concentrations of 1%. No significant carbon incorporation was measured in films grown under a high methane partial pressure without plasma excitation. Si_1−x−yGe_xC_y layers grown with this technique exhibit the strain compensation and enhanced thermal stability expected for these ternary alloys. Carbon pre-deposition of Si through surface exposure to the argon/methane plasma is shown to act as an antisurfactant on the growth of Ge islands by suppressing the formation of a Ge wetting layer on the surface.     

Properties of composite BxCyNz nanotubes and related heterojunctions

We review the stability and electronic properties of composite B_xC_yN_z nanotubes, including BN-, BC₂N- and B-doped carbon nanotubes. We show in particular that BC₂N systems are driven towards the segregation of pure C and BN sections. The same process of segregation into BC₃ islands is evidenced in the case of B-doped carbon nanotubes. These spontaneous segregation processes lead to the formation of quantum dots or nanotube heterojunctions with potential important technological applications.     

Compositional dependence of the elastic constants and the Poisson ratio of GaxIn1−xSb

The pseudopotential method within the virtual crystal approximation combined with the Harrison bond-orbital model were used to determine all three elastic constants, and hence Poisson's ratio of Ga_xIn_1−xSb semiconductor alloys. Our results for parent compounds are compared to experiment and other theoretical calculations and showed generally good agreement. The effect of compositional disorder on the studied quantities has been examined. We found an important bowing in all elastic constants and bulk modulus versus Ga content. The Poisson ratio was found to be independent of alloy composition x.     

Bulk Si1−xGex single- and poly-crystals: a new prospective material for electronics

Si_1−xGe_x is a prospective material for electronics. This is mostly because Si_1−xGe_x-based technology is close to silicon-based technology, which is advanced, widely applicable, and cheap. The majority of work on this material is devoted to Si_1−xGe_x-based heteroepitaxy, and in particular to the Si_1−xGe_x/Si system; few publications are devoted to bulk single-crystal. Here we focus on some interesting properties of bulk Si_1−xGe_x solid solutions. First, under heat treatment and alpha- and beta-irradiation the efficiency of defect introduction decreases with the increase of Ge composition of the Si_1−xGe_x single-crystal. This is because Ge atoms in a crystal lattice are annihilation centers for primary defects. Hence, this material is more resistant to temperature and radiation than silicon. Second, it is known that, since Z(Ge)Z(Si), the sensitivity of the material to irradiation should increase with the concentration of Ge. We show that Si_1−xGe_x nuclear detectors have efficiency three times higher than silicon detectors. Finally, we note that one of the major problems in materials based on solid solutions is the composition uniformity. Our investigations on the influence of composition fluctuations on material properties have shown that the material has a sufficient uniformity at x<0.1. Such an alloy is a prospective material for electronics.     

Epitaxial grown K1−xRbxTiOPO4 films with extremely flat surfaces for waveguiding

We report on epitaxial {1 0 0} K_1−xRb_xTiOPO₄ waveguide films for the visible spectral range grown on KTiOPO₄ substrates by liquid phase epitaxy. Using the m-line technique a refractive index increase of Δn_x≈0.007 and Δn_z≈0.004 for TM and TE polarisation has been determined for a K_0.78Rb_0.22TiOPO₄ film. Optical transmission and nearfield distribution are comparable to conventional ion-exchanged waveguides. Typical attenuation of about 1 dB/cm for both TM and TE polarisation was obtained at λ=532 and 1064 nm. Energy-dispersive X-ray spectrometry reveals solid-solution films with graded rubidium composition profiles. X-ray rocking curve analyses confirm the epitaxial growth process and indicate perfect and relaxed K_1−xRb_xTiOPO₄ films. Atomic force microscopy investigations reveal regular step structures with step heights Δh<1.3 nm resulting in rms-roughness values of ≈0.4 nm.     

Structural and optical properties of sintered ZnSxSe1−x films

Sintered ZnS_xSe_1−x films have been prepared in the entire composition range from ZnSe to ZnS by using the screen printing method. To deposit good quality films, optimum conditions have been determined. Wide band gap ternary films have wide applications in solar cells. The band gap of these films are determined by reflection spectra in the wavelength range of 325–600 nm using the Tauc relation. These films have a direct band gap, which varies from 3.50 eV for ZnS to 2.66 eV for ZnSe films. The wurtzite structure of ZnSSe films was confirmed by X-ray diffraction analysis of these films.     

Bond-lengths of the atomic nearest-neighbor and next-nearest-neighbor in A1−xBxC1−yDy III–V solid solutions

On the basis of the FDUC model and the hypothesis of the constant covalent radii, the expressions of the atomic nearest-neighbor and the next-nearest-neighbor bond-lengths were derived for A_1−xB_xC_1−yD_y III–V quaternary solid solutions. This set of bond-length expressions predicts the averaged bond-lengths and bond angles at any concentration (x, y) for the III–V pseudobinary and quaternary solid solutions, which are only dependent on the lattice parameters and the concentrations of the pure end compounds. When x=0, 1 or y=0, 1, A_1−xB_xC_1−yD_y III–V quaternary solid solutions degenerate into the relative pseudobinary solid solutions, in which the nearest-neighbor and the next-nearest-neighbor bond-lengths agree well with the experimental results. Further discussion and comparison with other theoretical models are also given in this paper.     

Transmission electron microscopy of annealed a-Si1−xCx:H/Al films with different Al grain sizes

The crystallization behavior of a-Si_1−xC_x:H/Al films after annealing has been investigated by transmission electron microscopy and Raman scattering. It is found that the crystallization process is complex and non-uniform, and that both equiaxial and branching Si grains with many twins and stacking faults arise at annealing temperatures as low as 250 °C. Both fine polycrystalline β-SiC grains and fractal-like -SiC aggregates are first observed in a few regions in a-Si_1−xC_x:H/Al films annealed at 350 °C. The increase of the Al grain size can cause a decrease in the crystallization temperature and a rise in the grain growth rate of Si. At higher annealing temperatures, the reaction process SiC+Al→Al₄C₃+Si is predominant.     

Kic Transition-temperature behavior of A517-F Steel

Linear-elastic fracture mechanics has been widely used to obtain K_ic values on very-high-strength steels (yield strengths > 200 ksi) that generally do not exhibit a ductue-to-brittie transition in failure mode as a function of temperature. However, as the use of the K_ic test approach is extended to those steels that do exhibit a ductile-to-brittle transition, information on the K_ic transition-temperature behavior of steels is required. Therefore, to establish general relations between K_ic and Charpy test results, slow-bend K_ic fracture tests and various Charpy tests were conducted on A517-F steel at temperatures between −320 and +80°F.

The results indicated that a plane-strain K_ic température transition does exist for A517-F steel. Furthermore, this transition occurred in the same temperature range (−150 to −50°F) as the transition denned by slow-bend Charpy test results for fatigue-cracked specimens. In both the K_ic tests and the Charpy tests, the transition-temperature behavior appeared to be related to a gradual change in the microscopic fracture mechanism. The upper shelf, as denned by slow-bend Charpy tests, appeared to be a region in which K_ic values cannot be obtained, regardless of specimen geometry, because of general yielding and crack blunting.

A procedure is proposed in which the dynamic K_ic behavior of a material can be predicted from static K_ic test data by shifting the static K_ic values along the temperature axis by the same amount as the static Charpy energy values are shifted by impact testing.

In general, the results of this investigation have demonstrated that a transition in K_ic behavior of A517-F steel does exist as a fution of temperature and that that transition is independent of the K_ic to K_c stress-state transition.     

Characterization of GaN epitaxial layers on SiC substrates with AlxGa1−xN buffer layers

High quality GaN epitaxial layers were obtained with Al_xGa_1−xN buffer layers on 6H–SiC substrates. The low-pressure metalorganic chemical vapor deposition (LP-MOCVD) method was used. The 500 Å thick buffer layers of Al_xGa_1−xN (0≤x≤1) were deposited on SiC substrates at 1025°C. The FWHM of GaN (0004) X-ray curves are 2–3 arcmin, which vary with the Al content in Al_xGa_1−xN buffer layers. An optimum Al content is found to be 0.18. The best GaN epitaxial film has the mobility and carrier concentration about 564 cm² V⁻¹ s⁻¹ and 1.6×10¹⁷ cm⁻³ at 300 K. The splitting diffraction angle between GaN and Al_xGa_1−xN were also analyzed from X-ray diffraction curves.     

Photoelectrochemical investigations of n-CdSe1−xTex thin film electrodes

An electrode/electrolyte interface has been formed between an n-type CdSe_1−xTe_x (0≤x≤1) alloyed/mixed type semiconductor and a sulphide/polysulphide redox electrolyte. It has been investigated through the current–voltage, capacitance–voltage and spectrally selective properties. The dependence of the dark current through the junction and the junction capacitance on the voltage across the junction have been examined and analysed. It appeared that the current transport mechanism across the junction is strongly influenced by the recombination mechanism at the interface and series resistance effects. Upon illumination of the interface with a light of 20 mW cm⁻², an open circuit voltage of the order of 0.35 V and a short circuit current of 212 μA cm⁻² have been developed (for x=0.2), yielding an efficiency of energy conversion equal to 0.2% and a form factor of 45%. The action spectra in the 450–1000 nm wavelength range showed presence of the interface states at the electrode/electrolyte interface. The magnitudes of the barrier heights at the interfaces were also determined. It has been seen that a significant improvement in the electrochemical performance of a cell is noticed for the electrode composition with x=0.2.     

Photoconductors based on ZnxCd1−xS and CdSe1−ySy thin films, fabricated with multilayer structure

Photoconductors based on evaporated Zn_xCd_1−xS and CdSe_1−yS_y thin films, with a novel multilayer structure, were fabricated and characterized through spectral response measurements. The device structure is constituted by several layers of different energy gaps, sequentially deposited side by side and interconnected in series or in parallel. The influence of the preparation conditions, number of layers and electrode configuration, on the performance of the photoconductors was determined. Photoresistors with a detection range between 400 and 750 nm were developed, using four layers with energy gaps varying between 1.8 eV and 2.8 eV and interconnected in parallel.     

Study of optical constants in CdxSe1−x

Thin films of Cd_xSe_1−x (0<x<1) have been deposited by the vacuum evaporation technique onto ultra clean substrates maintained at 300°C. The optical properties (specially transmission spectra) of these films were studied. The wavelength dependence of refractive index and extinction coefficient of the films along with the variation of these constants with composition was studied.     

Synthesis and humidity sensitive properties of nanocrystalline Ba1−xSrxTiO3 thick films

Nanocrystalline Ba_1−xSr_xTiO₃ (x=0, 0.2, 0.4, 0.6, 0.8 and 1.0) precursors were synthesized using the stearic acid gel method. After the precursors had been calcined at 600–950°C for 0.5–1 h, nanocrystalline powders with the cubic perovskite structure were obtained and these were made into thick films. The powder samples were characterized by differential thermal analysis, X-ray diffraction and transmission electron microscopy, and the thick film samples were characterized by scanning electron microscopy and X-ray diffraction. The humidity-sensitive properties of the nanocrystalline Ba_1−xSr_xTiO₃ thick films were investigated. The results show that these nanocrystalline thick films possess higher humidity sensitivity and lower resistance than those of conventional materials.