AC conductivity and dielectric properties of Sb2Te3 thin films

Sb₂Te₃ films of different thicknesses, in the thickness range 300-620 nm, were prepared by thermal evaporation. X-ray analysis showed that the as-deposited Sb₂Te₃ films are amorphous while the source powder and annealed films showed a polycrystalline nature. The AC conductivity and dielectric properties of Sb₂Te₃ films have been investigated in the frequency range 0.4-100 kHz and temperature range 303-373 K. The AC conductivity σ_AC(ω) was found to obey the power law ω^s where s?1 independent of film thickness. The temperature dependence of both AC conductivity and the exponent s can be reasonably well interpreted by the correlated barrier hopping (CBH) model. The experimental results of the dielectric constant ε₁ and the dielectric loss ε₂ are frequency and temperature dependent and thickness independent. The maximum barrier height W_M calculated from dielectric measurements according to the Guintini equation agrees with that proposed by the theory of hopping of charge carriers over a potential barrier as suggested by Elliott for chalcogenide glasses. The effect of annealing at different temperatures on the AC conductivity and dielectric properties was also investigated. Values of σ_AC, ε₁ and ε₂ were found to increase with annealing treatment due to the increase of the degree of ordering of the investigated films. The Cole-Cole plots for the as-deposited and annealed Sb₂Te₃ films have been used to determined the molecular relaxation time τ. The temperature dependence of τ indicates a thermally activated process.     

Nitrogen-incorporation induced changes in the microstructure of nanocrystalline WO3 thin films

Nitrogen incorporated tungsten oxide (WO₃) films were grown by reactive magnetron sputter-deposition by varying the nitrogen content in the reactive gas mixture keeping the deposition temperature fixed at 400 °C. The crystal structure, surface morphology, chemical composition, and electrical resistivity of nitrogen doped WO₃ films were evaluated using X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and electrical conductivity measurements. The results indicate that the nitrogen-incorporation induced changes in the microstructure and electrical properties of WO₃ films are significant. XRD measurements coupled with SEM analysis indicate that the increasing nitrogen content decreases the grain size and crystal quality. The nitrogen concentration increases from 0 at.% to 1.35 at.% with increasing nitrogen flow rate from 0 to 20 sccm. The corresponding dc electrical conductivity of the films had shown a decreasing trend with increasing nitrogen content.     

Dielectric properties of sol-gel derived Ta2O5 thin films

The dielectric constant and the dielectric loss of tantalum pentoxide (Ta₂O₅) thin films, produced by sol-gel spin-coated process on Corning glass substrates, have been investigated in the frequency range of 20-10⁵ Hz and the temperature range of 183-403 K, using ohmic Al electrodes. The frequency and temperature dependence of relaxation time has also been determined. The capacitance and loss factor were found to decrease with increasing frequency and increase with increasing temperature. The activation energy values were evaluated and a good agreement between the activation energy values obtained from capacitance and dielectric loss factor measurements were observed.     

Growth and dielectric properties of BaTiO3 thin films prepared by the microwave-hydrothermal method

Polycrystalline BaTiO₃ thin films were grown on Ti-covered polymer substrates at 80 °C using the microwave-hydrothermal technique. Onset of BaTiO₃ formation occurred almost instantaneously at 80 °C and complete film coverage was achieved within 2 min. Longer reaction time was necessary for extensive grain growth to achieve dense films. Good quality capacitor films were only achieved at 4 h reaction time but loss tangents were high. Film dielectric constant and dielectric loss values of as-grown M-H films decreased with longer reaction time. Oxygen plasma treatment improved loss tangents to 4% by removal of both absorbed moisture and lattice hydroxyls.     

Improved dielectric properties of CaCu3Ti4O12 thin films on oxide bottom electrode of La0.5Sr0.5CoO3

We report on the effect of La_0.5Sr_0.5CoO₃ (LSCO) bottom electrode to the dielectric properties of CaCu₃Ti₄O₁₂ (CCTO) thin films grown on Ir/Ti/SiO₂/Si substrates. Compared with the films grown directly on Ir/Ti/SiO₂/Si substrates, the dielectric constant has been increased greatly about 100%, and the dielectric loss decreased to lower than 0.2 in the frequency range of 1-100 kHz. The origin has been discussed in details based on the analysis of the X-ray diffraction and impedance spectra measurements. Results of the impedance spectra suggest that the absence of undesired interfacial layer between Ir/CCTO thin films might be one of the major reasons of the improvement of the dielectric properties when the LSCO was introduced as the bottom electrode.     

Frequency and temperature dependence of dielectric and electrical properties of radio-frequency sputtered lead-free K0.48Na0.52NbO3 thin films

Lead-free K_0.48Na_0.52NbO₃ (KNN) ferroelectric thin films were prepared using the radio-frequency magnetron sputtering method. The crystallized KNN phase was confirmed using X-ray diffraction. The KNN thin film exhibited a well-saturated ferroelectric polarization-electric field hysteresis loop with high remanent polarization. The dielectric and electrical properties of the KNN thin film were investigated over a wide range of frequencies from 10 Hz to 1 MHz, and over a wide range of temperatures from 25 °C to 500 °C. The complex impedance relaxations are shown in an impedance Cole-Cole plot. With increasing temperature, the AC conductivity increased, which obeys the power law, σ(ω) = σ₀ + Aω^s. The activation energy for the conduction process is calculated to be 0.57 eV from the slope of the AC conductivity at the low frequency.     

Effect of post-annealing treatment in oxygen on dielectric properties of K0.5Na0.5NbO3 thin films prepared by chemical solution deposition

K_0.5Na_0.5NbO₃ thin films were prepared on Pt/Ti/SiO₂/Si substrates by chemical solution deposition method with different annealing temperatures of 550 °C, 600 °C, 700 °C. The post-annealing treatment was introduced at 550 °C for 3 min in oxygen ambient. It is found that the films were composed of pure provskite phase, and the post-annealing treatment promoted the crystallization and improved the quality of the films, which resulted in the enhancement of the dielectric property of the films. The effect of the post-annealing on the dielectric properties of the films was also discussed.     

Growth and dielectric properties of solvothermal BaTiO3 polycrystalline thin films

Polycrystalline BaTiO₃ thin films were grown solvothermally on Ti-covered substrates in ethanol, distilled water and 1,4-butanediol at 80 °C, 150 °C and 200 °C. Films grown in organic media are finer grained and required more stringent crystallization conditions due to lower solubility of constituent ions. Solvothermal films exhibit less severe proton incorporation. Solvothermal films grown close to the boundary crystallization conditions tend to have higher frequency dispersion and loss tangents. Dielectric properties of BaTiO₃ films grown in ethanol are comparable to that of hydrothermal films. Butanediol-derived films have lower dielectric constants than the aqueous equivalent.     

Colossal magnetocapacitance effect in BiFeO3/La5/8Ca3/8MnO3 epitaxial films

A colossal magnetocapacitance in magnetic fields was observed near the Curie temperature T_c = 220 K of La_5/8Ca_3/8MnO₃ for the BiFeO₃/La_5/8Ca_3/8MnO₃ epitaxial film. It was found that the magnetocapacitance increases with increasing magnetic fields and reaches a maximum up to 1100% enhancement around T_c at 10 T. From the analysis of the dielectric relaxation, one can see that the behavior of relaxation time τ above T_c differs from that below T_c, and the value of τ decreases with increasing magnetic fields. This colossal magnetocapacitance effect near room temperature in BiFeO₃/La_5/8Ca_3/8MnO₃ may have potential applications in multifunctional microelectronic device.     

Magnetodielectric and dielectric properties of orthorhombic HoMnO3 thin films

Sandwich-structural multilayer films Au/HoMnO₃/YBa₂Cu₃O_7 − δ were prepared epitaxially on SrTiO₃ (001) single crystal substrates by using pulsed laser deposition technique. The HoMnO₃ films crystallized in a metastable orthorhombic structure and the Au and YBa₂Cu₃O_7 − δ were used as electrodes to investigate the dielectric and magnetodielectric properties of HoMnO₃ films. The impedance and electric modulus spectroscopic plots were used to discern the intrinsic characteristics of HoMnO₃ films or unwanted interface effects. The low-temperature (~ 2 K) dependence of the dielectric constant of HoMnO₃ films as function of frequency shows anomalies around 43 K and 22 K, which is corresponding to the Néel temperature and lock-in transition of Mn³⁺ moments, respectively. The magnetodielectric effects of HoMnO₃ films were investigated at 100 kHz under a 2T applied magnetic field, and the dielectric constant was tuned resulting in a decrease of 3%. The results indicate the strong coupling between the dielectric properties and magnetic orders in orthorhombic HoMnO₃ films.     

Effect of copper-oxide segregation on the dielectric properties of CaCu3Ti4O12 thin films fabricated by pulsed-laser deposition

We investigated the effects of post-deposition cooling conditions on the surface morphologies and dielectric properties of CaCu₃Ti₄O₁₂ (CCTO) thin films grown by pulsed-laser deposition on Pt/TiO₂/SiO₂/Si substrates. CCTO thin films cooled under the typical cooling parameters, i.e., slow cooling (3 °C/min) at high oxygen pressure (66 kPa) showed a severe segregation of nanoparticles near the grain boundaries, which was identified to be copper oxide from electron probe micro analyzer mapping. On the other hand, we could not observe any segregation on the film surface when the samples were cooled fast (∼ 20 °C/min) at relatively low oxygen pressure (100 Pa). The dielectric constant, ε_r, of CCTO thin films deposited at 750 °C with severe surface segregation (ε_r ∼ 750 at 10 kHz) was found to be much lower than that (ε_r ∼ 2000 at 10 kHz) of CCTO thin films with smooth surface. As the copper-oxide segregation becomes more serious, which preferentially occurs at relatively high ambient oxygen pressure and temperature, the degradation in the dielectric properties of CCTO films becomes larger. The variation of dielectric constant of CCTO films with no copper-oxide segregation could be related to the presence of an impurity phase at grain boundaries.     

FT-IR and UV-Vis-NIR characterisation of pure and mixed MoO3 and WO3 thin films

We report a spectroscopic characterisation of MoO₃, WO₃ and a MoO₃-WO₃ mixed oxide thin films deposited on alumina and silicon substrates. Absorbance FT-IR and diffuse reflectance UV-Vis-NIR spectra were recorded after treatments in vacuum and after interaction with O₂, NO₂/O₂, CO/O₂ or pure CO at increasing temperatures up to 673 K. For all the films, reducing treatments (vacuum, CO or CO/O₂) cause the increase of a variety of broad absorptions both in the Vis-NIR and medium IR regions. These absorptions decrease in intensity after contact with oxidising atmospheres (O₂ or NO₂/O₂), so that they are all assignable to electronic transitions due to the presence of a variety of donor levels related to oxygen defects.     

Deposition and dielectric properties of CaCu3Ti4O12 thin films on Pt/Ti/SiO2/Si substrates using pulsed-laser deposition

CaCu₃Ti₄O₁₂ (CCTO) thin films were successfully deposited on Pt/Ti/SiO₂/Si(1 0 0) substrates using pulsed-laser deposition technique. The crystalline structure and the surface morphology of the CCTO thin films were greatly affected by the substrate temperature and oxygen pressure. Thin films with a (2 2 0) preferential orientation were obtained at the substrate temperature above 700 °C and oxygen pressure above 13.3 Pa. The 480-nm thin films deposited under 720 °C and 26.6 Pa have a fairly high dielectric constant of near 2000 at 10 kHz and room temperature. The values of the dielectric constant and loss and their temperature-dependence under different frequency are comparable with those obtained in the epitaxial CCTO films grown on oxide substrates.     

Ac conductivity and dielectric properties of Ge20Se75In5 films

Amorphous films of Ge₂₀Se₇₅In₅ chalcogenide glass were prepared using a thermal evaporation technique. The chemical composition of the deposited films was examined using energy dispersive X-ray spectroscopy (EDX). The ac conductivity and dielectric properties of the prepared films have been studied as a function of temperature in the range from 300 to 423 K and frequency in the range from 10² to 10⁵ Hz. The experimental results indicate that ac conductivity σ_ac(ω) is proportional to ω^s where s equals 0.902 at room temperature and decreases with increasing temperature. The results obtained are discussed in terms of the correlated barrier hopping (CBH) model. The density of localized states N(E_F) at the Fermi level is found to have values of the order 10¹⁹ eV⁻¹ cm⁻³, which increase with temperature. The dielectric constant ?₁ and dielectric loss ?₂ were found to decrease with increasing frequency and to increase with increasing temperature over the ranges studied. The maximum barrier height W_m was estimated from an analysis of the dielectric loss ?₂ according to Giuntini equation. Its value for the deposited films (0.43 eV) agrees with that proposed by the theory of hopping of charge carrier over a potential barrier as suggested by Elliott for chalcogenide glasses.     

Reproducibility of transition temperature and critical current density of thin films of YBa2Cu3O7 on (100) LaAlO3

Submicrometer epitaxial films of YBa₂Cu₃O₇(YBCO) on (100) LaAlO₃ were made by coevaporation and furnace annealing. Samples from more than a dozen runs are used in this study. The zero resistance transition temperature (T _c) is high (89 or 90 K) if the film composition is phase pure (Ba/Y=2, Cu/Y=3) or if it is enriched in Ba and Cu. For these compositions the critical current density (J _c) at 77 K has an average value of 2×10⁵ A cm^–2, with a tendency for decreasingJ _c with increasing film thickness (0.2 to 0.8m). Variations inJ _c are not correlated with deviations from ideal stoichiometry. Steeper slopes of the resistance-temperature curves above 100 K and lower values of the room-temperature resistivity are associated with high values ofJ _c. If the film composition is enriched in Y relative to Ba and Cu,T _c decreases by several degrees.     

Growth and structure of electron beam evaporated V2O5 thin films

The growth, structure and room temperature electrical conductivity of electron beam evaporated V₂O₅ thin films were studied in detail as a function of deposition temperature. The films deposited at T_s≈553 K and subsequently annealed in oxygen atmosphere at 693 K exhibited orthorhombic layered structure.     

Optimization of annealing temperature for YBa2Cu3O7 thin films post-annealed at a low oxygen partial pressure

Post-annealing of YBa₂Cu₃O₇ (YBCO) thin films is usually performed at 850–900°C in atmospheric-pressure oxygen. In this study, coevaporated YBCO films on LaAlO₃ were post-annealed in an oxygen partial pressure of 29 Pa at temperatures in the range 700–825°C. Zero resistance transition temperatures were 89–90 K. Both d.c. (room-temperature resistance and critical-current density) and a.c. parameters (extracted from eddy-current response measurements at 25 MHz) were monitored. The optimum temperature is close to 750°C, which is on the YBCO thermodynamic stability line at this low oxygen partial pressure.     

Multiferroic properties of BiFeO3/Bi4Ti3O12 double-layered thin films fabricated by chemical solution deposition

Multiferroic BiFeO₃/Bi₄Ti₃O₁₂ (BFO/BTO) double-layered film was fabricated on a Pt(111)/Ti/SiO₂/Si(100) substrate by a chemical solution deposition method. The effect of an interfacial BTO layer on electrical and magnetic properties of BFO was investigated by comparing those of pure BFO and BTO films prepared by the same condition. The X-ray diffraction result showed that no additional phase was formed in the double-layered film, except BFO and BTO phases. The remnant polarization (2P_r) of the double-layered film capacitor was 100 μC/cm² at 250 kV/cm, which is much larger than that of the pure BFO film capacitor. The magnetization-magnetic field hysteresis loop revealed weak ferromagnetic response with remnant magnetization (2M_r) of 0.4 kA/m. The values of dielectric constant and dielectric loss of the double-layered film capacitor were 240 and 0.03 at 100 kHz, respectively. Leakage current density measured from the double-layered film capacitor was 6.1 × 10^− 7 A/cm² at 50 kV/cm, which is lower than the pure BFO and BTO film capacitors.     

Effects of post-deposition annealing on the structure and optical properties of Y2O3 thin films

Y₂O₃ thin film waveguides were prepared by RF magnetron sputtering. The effects of post-deposition annealing on the structure and optical properties have been investigated. The structural evolution of Y₂O₃ films with annealing temperature was investigated by X-ray diffraction (XRD). Spectroscopic ellipsometry was employed to determine the optical properties of Y₂O₃ films annealed at various temperatures. It was found that with increasing annealing temperature, the refractive index (n) of Y₂O₃ films increases. The optical band gap of Y₂O₃ films shifts to higher energy after higher temperature annealing, which is likely due to the reduction of defects and the change of crystalline structure in Y₂O₃ films.     

Effect of lattice-mismatch strain on the structural and dielectric properties of (Pb,Sr)TiO3 thin films grown by pulsed laser deposition

Pb_0.35Sr_0.65TiO₃ (PST) thin films have been fabricated on LaAlO₃ (LAO) and MgO substrates using the pulsed laser deposition technique. The microstructure characteristics of the films were examined by means of X-ray diffraction, atomic force microscopy, scanning electron microscopy and Raman spectroscopy, and the results indicate that the films are epitaxially grown and show good crystallinity. The dielectric constant dependence on DC bias voltage and temperature were measured in a planar capacitor configuration for these films. Compared to the PST thin film grown on LAO, the film grown on MgO showed a higher temperature of the capacitance maximum and a higher dielectric constant at zero bias. We explain the results by taking into account the lattice-mismatch strain between the substrate and the film. In contrast to the in-plane compressive strain induced by the LAO substrate, the in-plane tensile strain induced by the MgO substrate enlarges the unit cell of PST and enhances the magnitude of dipole moments, which increases the dielectric constant. These results indicate that a reasonable in-plane tensile strain could improve the dielectric properties of PST thin films.