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本文介绍了 C_yF_(14)+ O_2等离子刻蚀 a=Si:H/a-C:H 超晶格的工艺原理及方法,简便可行. 相似文献
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本文采用AMPS-1D(Analysis of Microelectronic and Photonic Structures)模拟软件在AM1.5G (100 mW/cm2) 的辐射及室温条件下模拟了a-Si:H/a-SiGe:H/a-SiGe:H三叠层太阳能电池的各项性能。本文首先对三个子电池进行模拟,设定构成叠层电池的三个子电池的带隙分别为1.8、1.6和1.4 eV。计算结果表明:缺陷态是影响电池开路电压及填充因子的重要因素。在对三叠层太阳能电池的数值模拟过程中采用两步匹配法进行电流匹配,并对隧穿结进行优化设计。模拟结果表明:叠层电池的开路电压、填充因子和转换效率在优化隧穿结后都得到提高,且S型的J-V曲线消失。同时本文还对叠层太阳能电池的能带图和载流子复合图进行分析,并将本模拟结果与实验数据相比较,可以得出模拟结果与实验数据符合的较好。 相似文献
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<正> 由辉光放电分解硅烷淀积的氢化非晶态薄膜中都包含相当数量的氢,含氢量的多少直接对薄膜的结构、性质及稳定性有很大的影响。利用核磁共振(1H NMR)可以给出有关氢的局部环境和分布的信息。它与通常所用的红外、ESR、核共振等方法所获得的信息是不同的,因此1H NMR在材料结构分析方面是有其特色的。 相似文献
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<正> 尽管过去几年对非晶半导体多层膜及其界面对多层膜传输性能影响的研究甚多,然而对于界面缺陷态的特性及其密度了解甚少。不同的测量方法得到的a-Si:H/a-SiNx:H界面缺陷态密度可从1010变到1012cm-2。这一实验结果反映了每一测试方法仅能探测某些能级的缺陷,在某些情况下可能是不同类的缺陷。非晶硅系材料都包含有氢。已发现,在多层膜的沉积过程中,由于组成多层膜的子层间应力释放的需要以及两子层材料的氢扩散系数不同而 相似文献
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The g-values of the ESR signals caused by dangling bonds in a-Si:H, a-SiC:H and a-SiN:H alloy systems have been calculated for a cluster by using the CNDO method, and compared with the observed g-values. The detailed formula for the calculation of g-values was derived from the formula of A.J.Stone. It is found that the g-values for dangling bonds on Si atoms are affected by the surrounding C or N atoms in a-SiC:H or a-SiN: H alloy systems and the calculated results are in good accordance with the observed ones. Some usefull discussions have also been made. 相似文献
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采用PECVD技术在P型硅衬底上制备了a-SiOx:H/a-SiOy:H多层薄膜,利用AES和TEM技术研究了这种薄膜微结构的退火行为,结果表明:a-SiOxL:H/a-SiOy:H多层薄膜经退火处理形成nc-Si/SiO2多层量子点复合膜,膜层具有清晰完整的结构界面,纳米硅嵌埋颗粒呈多晶结构,颗粒大小随退火温度升高而增大小随退火温度升高而增大,在一定的实验条件下,样品在650℃下退火可形成尺寸大 相似文献
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We have studied the conduction mechanism of a series of a-Si:H/a-SiNx:H multi-layers samples which have an identical sublayer thickness and periodic numbers, except the ratio of N/Si in a-SiNx:H sublayers. It is shown that the temperature characteristic of conductivity of these samples has a kink point in the range of 120-140℃. The kink temperature and the acttivation energy of conductivity are related to the N/Si ratio in the a-SiNx:H sublayers. We recognized preliminarily that the mechanism above and below the kink temperature could be the bulk or the interfacial conduction in a-Si:H well layers. 相似文献
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a—SiNx:H薄膜对a—Si:H TFT阈值电压的影响 总被引:4,自引:0,他引:4
介绍了测定a-Si:HTFT闽值电压的实验方法。重点研究了改变a-SiNx:H薄膜淀积时反应气体NH3/SiH4流速比以及a-SiNx:H膜厚对a-Si:HTFT阈值电压的影响。对实验结果进行了分析。实验结果表明:a-Si:HTFT的阈值电压随a-SiNx:H的膜厚增加而增大;增大X-SiNx:H薄膜淀积时NH3/SiH4气体流速比,可明显减小a-Si:HTFT的阈值电压。 相似文献
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We have studied TV content influence in two ranges of x(R1.,R2) by Raman, PL, IR spectra on PCVD a-Si:H/a-SiNx:H samples with constant sublayer thickness and cycle number but whole range of x respectively. Raman shows that the FWHM of TO-like peaks increases with x in range R1 and so does the bond angle fluctuation. PL exhibits that the band tail width increases and the NR activation energy as well as the PL efficiency decrease? with x in R1, because of the increase of lattice strain introduced by structural mismatch at interfaces. The above parameters change towards the opposite direction in R2 with a turn at x=0.9, This might be caused by the structure change of a-SiNx into Si3N4 and the greatly increasing of N-H bonds in R2, which enhances the softness of the matrix and relaxes the lattice strain. 相似文献
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The paper reports the effects of nitrogen content on the temperature dependence of photoconductivity σρ(T) and interface states NS in a-Si:H/ a-SiNx:H super-lattices by means of electroabsorption (EA) photothermal deflection spectroscopy (PDS). A critical value of nitrogen content for Ns and for intensity of N-H bond was found to be 0.6. The computer fitting of σρ(T) to determine the interface states was carried out which vas consistent with the results by PDS. A model of charged nitrongen dangling bond to illustrate the above results is discussed here. 相似文献
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The a-Si∶H/SiNx∶H sample series are investigated by means of Raman scattering technique(RST). The result shows that due to the structural mismatch between a-Si∶H and a-SiNx∶H, severe induced distortions are produced in the interface of the heterojunction, and these induced distortions tend towards a certain energy state. The ordering of the interface structure depends on the periodic number of multilayer thin films. 相似文献
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We demonstrate a new self-aligned TFT process for hydrogenated amorphous silicon thin-film transistors (a-Si:H TFTs). Two backside exposure photolithography steps are used to fabricate fully self-aligned tri-layer TFTs with deposited n+ contacts. Since no critical data alignment is required, this simple process is well suited to fabrication of short channel TFTs. We have fabricated fully self-aligned tri-layer a-Si:H TFTs with excellent device performance, and contact overlaps <1 μm. For a 20-μm channel length TFT with an a-Si:H thickness of 13 nm, the linear region (VDS=0.1 V) and saturation region (VDS=25 V) extrinsic mobility values are both 1.2 cm2/V-s, the off currents are <1 pA, and the on/off current ratio is >107 相似文献
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低温高速率沉积非晶硅薄膜及太阳电池 总被引:1,自引:0,他引:1
采用射频等离子体增强化学气相沉积(RF-PECVD)技术,保持沉积温度在125℃制备非晶硅薄膜材料及太阳电池。在85 Pa的低压下以及400~667 Pa的高压下,改变Si H4浓度和辉光功率等沉积参数,对本征a-Si材料的性能进行优化。结果表明,在高压下,合适的Si H4浓度和压力功率比可以使a-Si材料的光电特性得到优化,并且薄膜的沉积速率得到一定程度的提高。采用低压低速和高压高速的沉积条件,在125℃的低温条件下制备出效率为6.7%的单结a-Si电池,高压下本征层a-Si材料的沉积速率由0.06~0.08 nm/s提高到0.17~0.19 nm/s。 相似文献