Piezoelectric effects in InAs/GaAs(N11) self-assembled quantum dots

The effects of a piezoelectric field on the spectroscopic properties of strained InAs/GaAs self-assembled quantum dot (QD) heterostructures grown on (N11) substrates with A or B termination are presented. An increasing blue shift of photoluminescence (PL) band was observed with increasing excitation density. The PL blue shift of (N11) quantum dots measured at the highest excitation grows with 1/N and shows an asymmetric dependence on whether the substrate has A or B termination. We attributed the blue shift of the photoluminescence band to the screening of the piezoelectric field by the photo-generated carriers, leading to a reduction of the piezoelectric induced quantum confined Stark effect.     

InAs/GaAs multiple quantum dot structures grown by LP-MOVPE

Structures with self-organised InAs quantum dots in a GaAs matrix were grown by the low pressure metal–organic vapour phase epitaxy (LP-MOVPE) technique. Photoluminescence and atomic force microscopy were used as the main characterisation methods for the growth optimisation. The properties of multiple-stacked quantum dot structures are influenced by the thickness of the GaAs separation layers (spacers) between quantum dot-containing InAs layers, by the InAs layer thickness, by arsine partial pressure during growth, and by group III precursor flow interruption time.     

Optically-induced charge storage in self-assembled InAs quantum dots

We present results on spectrally resolved photo-resistance studies of optically-induced charge storage effects in self-organized InAs quantum dots (QDs). The stored charge can be detected and erased electrically. The investigated structure designed for electron or hole storage in the QDs consists of a modulation doped two-dimensional channel which was grown on top of a layer of InAs QDs, separated by an asymmetric tunnel barrier. Our results show that optical QD charging with spectral resolution provides information on the charging dynamics and on the quantity and spectral dependence of stored charges in the QDs. This is a novel technique by which QD excitation spectra can be studied. Spectrally resolved storage effect measurements on electrons as well as on holes allowed to investigate thermal redistribution of carriers in the quantum dot layer. It was found that only at low temperatures carriers can be stored selectively over long time scales in the InAs QDs. The charge storage effect is observable for several hours at temperatures up to 170 K, for several seconds up to 250 K due to an increase in thermal emission of stored charges.     

Study of GaAs spacer layers in InAs/GaAs vertically aligned quantum dot structures

We investigated vertically aligned InAs/GaAs QD structures, grown by atomic layer molecular beam epitaxy, with a number N of layers and with spacer thicknesses d. QD alignment and structure quality were checked by transmission electron microscopy. The dependencies of carrier capture, decay dynamics and existence of quenching channels on the design parameters N and d were studied by time resolved photoluminescence (PL), PL excitation (PLE) and PL temperature-dependent measurements. Our results show that the carrier capture and the radiative efficiency of the QDs are negatively affected by increasing the number of QD layers and by reducing the spacer thicknesses; this effect is likely to be related to the increase of defect concentrations in GaAs spacers, due to relaxation of an increasingly large strain.     

Thermal-induced intermixing effects on the optical properties of long wavelength low density InAs/GaAs quantum dots

The effect of post-growth rapid thermal annealing on the photoluminescence properties of long wavelength low density InAs/GaAs (001) quantum dots (QDs) with well defined electronic shells has been investigated. For an annealing temperature of 650 °C for 30 s, the emission wavelength and the intersublevel spacing energies remain unchanged while the integrated PL intensity increases. For higher annealing temperature, blue shift of the emission energy together with a decrease in the intersublevel spacing energies are shown to occur due to the thermal activated In–Ga interdiffusion. While, this behaviour is commonly explained as a consequence of the enrichment in Ga of the QDs, the appearance of an additional exited state for annealing temperatures higher than 650 °C suggests a variation of the intermixed QDs's volume/diameter ratio toward QDs's enlargement.     

Structural characterization of GaSb-capped InAs/GaAs quantum dots with a GaAs intermediate layer

GaSb incorporation to InAs/GaAs quantum dots is considered for improving the opto-electronic properties of the systems. In order to optimize these properties, the introduction of an intermediate GaAs layer is considered a good approach. In this work, we study the effect of the introduction of a GaAs intermediate layer between InAs quantum dots and a GaSb capping layer on structural and crystalline quality of these heterostructures. As the thickness of the GaAs intermediate layer increases, a reduction of defect density has been observed as well as changes of quantum dots sizes. This approach suggests a promising method to improve the incorporation of Sb to InAs heterostructures.     

Optical anisotropy in self-assembled InAs nanostructures grown on GaAs high index substrate

We present a study of the optical properties of InAs self-assembled nanostructures grown by molecular beam epitaxy on GaAs(11N)A substrates (N?=?3-5). Photoluminescence (PL) measurements revealed good optical properties of InAs quantum dots (QDs) grown on GaAs(115)A compared to those grown on GaAs(113)A and (114)A orientations substrate. An additional peak localized at 1.39 eV has been shown on PL spectra of both GaAs(114)A and (113)A samples. This peak persists even at lower power density. Supporting on the polarized photoluminescence characterization, we have attributed this additional peak to the quantum strings (QSTs) emission. A theoretical study based on the resolution of the three dimensional Schr?dinger equation, using the finite element method, including strain and piezoelectric-field effect was adopted to distinguish the observed photoluminescence emission peaks. The mechanism of QDs and QSTs formation on such a high index GaAs substrates was explained in terms of piezoelectric driven atoms and the equilibrium surfaces at edges.     

Post-growth annealing of type-II GaSb/GaAs quantum dots grown with different V/III ratios

We report the influence of V/III beam-equivalent-pressure ratios and post-growth annealing on the photoluminescence of GaSb quantum dots grown on GaAs(1 0 0) by molecular beam epitaxy. Increasing the V/III beam-equivalent-pressure ratio from 3 to 5 and then to 7 results in decreased photoluminescence intensity and redshifts the photoluminescence wavelength. The post-growth annealing blueshifts the quantum dot photoluminescence emission and decreases the full-width-at-half-maximum of the photoluminescence peak when annealing temperature is increased above 800 °C. The blueshift behavior is found to be independent on the V/III ratios indicating a similar atomic interdiffusion mechanism for all investigated samples regardless of the quantum dot properties. The photoluminescence intensities of the three samples experience an increase after moderate annealing. Whereas the intensity of the sample with the highest V/III ratio further increases, the intensity of the sample with lower V/III ratios decreases again upon higher annealing steps above 900 °C. Furthermore, temperature- and power dependent photoluminescence measurements are performed on as-grown and 870 °C annealed samples with V/III ratios of 3 and 7 in order to study the reduced quantum dot confinement in more detail.     

Optical property of silicon quantum dots embedded in silicon nitride by thermal annealing

We present the effects on the thermal annealing of silicon quantum dots (Si QDs) embedded in silicon nitride. The improved photoluminescence (PL) intensities and the red-shifted PL spectra were obtained with annealing treatment in the range of 700 to 1000 °C. The shifts of PL spectra were attributed to the increase in the size of Si QDs. The improvement of the PL intensities was also attributed to the reduction of point defects at Si QD/silicon nitride interface and in the silicon nitride due to hydrogen passivation effects.     

Self-assembling InAs and InP quantum dots for optoelectronic devices

Stranski–Krastanov growth in molecular beam epitaxy allows the preparation of self assembling InAs and InP quantum dots on GaAs and Ga_0.52In_0.48P buffer layers, respectively. InAs dots in GaAs prepared by slow growth rates and low temperature overgrowth provide intense photoluminescence at the technologically important wavelength of 1.3 μm at room temperature. Strain induced vertical alignment, size modification and material interdiffusion for stacked dot layers are studied. A blue shift of the ground state transition energy is observed for the slowly deposited stacked InAs dots. This is ascribed to enhanced strain driven intermixing in vertically aligned islands. For very small densely stacked InP and InAs dots the reduced confinement shift causes a red shift of the ground state emission. The InP quantum dots show intense and narrow photoluminescence at room temperature in the visible red spectral range. First InP/Ga_0.52In_0.48P quantum dot injection lasers are prepared using threefold stacked InP dots. We observe lasing at room temperature in the wavelength range between 690–705 nm depending on the size of the stacked InP dots.     

Self-organized growth of In(Ga)As/GaAs quantum dots and their opto-electronic device applications

The self-assembly technique of forming three-dimensional islands in the growth of highly strained semiconductor heterostructures has emerged as a powerful technique for the realization of an ordered array of quantum dots. Such quantum dots have been incorporated into the active region of optoelectronic and microelectronic devices in the hope of improving device performance or engineering new ones. Here we present the growth, optical characterization, and device applications for self-assembled InGaAs/GaAs quantum dots.     

Structural and optical properties of ultrananocrystalline diamond / InGaAs/GaAs quantum dot structures

The combination of the unique properties of ultrananocrystalline diamond (UNCD) films and of semiconductor quantum dot (QD) structures could significantly improve the performance of different electronic and optoelectronic devices, where e.g. good thermal management and advanced mechanical parameters are required. In the current work quantum dot InGaAs/GaAs heterostructures have been grown by molecular beam epitaxy (MBE) with different densities between 1.6 × 10¹⁰ cm^− 2 and 1.6 × 10¹¹ cm^− 2 controlled by the substrate temperature in the range between 490 and 515 °C. These structures were overgrown with UNCD by microwave plasma chemical vapor deposition (MWCVD) using methane/nitrogen mixtures at 570 °C. Scanning electron microscopy (SEM) reveals that without ultrasonic pretreatment the diamond nucleation density on QD structures is low and only separate islands of UNCD are deposited, while after pretreatment thin closed films are formed. From the cross-section SEM images a growth rate of ca. 3 nm/min is estimated which is very close to that on silicon at the same deposition conditions. The UNCD coatings exhibit a morphology consisting of two types of structures as shown by atomic force microscopy (AFM). The first one includes nodules with diameters between 180 and 350 nm varying with the density of the underlying QDs; the second is formed by a kind of granular substructure of these nodules with diameters of about 40 nm for all QD densities. The optical properties were investigated by photoluminescence (PL) spectroscopy before and after the deposition of UNCD. The PL signals of QD structures overgrown with UNCD, although with decreased intensity, remain almost unchanged with respect to the peak positions and widths, revealing that the UNCD/QD structures retain the optical properties of uncoated InGaAs/GaAs quantum dots.     

Abnormal optical behaviour of InAsSb quantum dots grown on GaAs substrate by molecular beam epitaxy

InAs(Sb) quantum dots (QDs) samples were grown on GaAs (001) substrate by Molecular Beam Epitaxy (MBE). The structural characterization by Atomic Force Microscopy (AFM) of samples shows that InAsSb islands size increases strongly with antimony incorporation in InAs/GaAs QDs and decreases with reducing the growth temperature from 520 °C to 490 °C. Abnormal optical behaviour was observed in room temperature (RT) photoluminescence (PL) spectra of samples grown at high temperature (520 °C). Temperature dependent PL study was investigated and reveals an anomalous evolution of emission peak energy (EPE) of InAsSb islands, well-known as “S-inverted curve” and attributed to the release of confined carriers from the InAsSb QDs ground states to the InAsSb wetting layer (WL) states. With only decreasing the growth temperature, the S-inverted shape was suppressed indicating a fulfilled 3D-confinement of carriers in the InAsSb/GaAs QD sample.     

InP(001)基衬底上自组织生长InAs量子点(线)的光学性质研究

在InP(001)基衬底上用分子柬外延方法生长InAs纳米结构材料，通过衬底的旋转与否及混合生长模式，得到了两种InAs量子点和量子线，并研究了量子点、线的光学性质，结果表明，两种方式都可生长出较强发光的量子点(线)；由量子点排列构成的量子线的光致发光光谱呈现出多峰结构，分析和理论计算表明这是InAs量子线上各量子点在垂直方向上不同高度分布和非连续性而造成的。     

MOVPE grown self-assembled and self-ordered InSb quantum dots in a GaSb matrix assessed by AFM, CTEM, HRTEM and PL

Self-assembled InSb quantum dots (QDs) were grown by metal-organic vapour phase epitaxy (MOVPE) in a GaSb matrix. Atomic force microscopy (AFM), conventional diffraction contrast transmission electron microscopy (CTEM), high resolution transmission electron microscopy (HRTEM), and photoluminescence (PL) were used for the assessment of the QDs. Reductions in the ^III/_V ratios and growth rates resulted in a change of the morphology of the InSb islands from hillocks without facets, and a low level of order to dumbbell shaped islands with distinct facets and a higher level of order.     

Optical properties of the InAs/InAlGaAs quantum dots subjected to thermal treatments

The inter-diffusion kinetics of group-III elements at the interface between self-assembled InAs quantum dots (QDs) and InAlGaAs barriers were investigated indirectly by post-growth annealing treatments and photoluminescence (PL) spectroscopy. The emission wavelength of the InAs/InAlGaAs QDs subjected to thermal annealing at 550 °C was 1444 nm at 10 K, which indicated a 57 nm red shift compared to the as-grown sample (1387 nm). The emission wavelength was blue-shifted with further increases in annealing temperature to 650 °C. Although there was a blue shift in the emission wavelength at an annealing temperature of 600 and 650 °C, the emission peak was still longer than that of the as-grown sample. These results were explained by the difference in inter-diffusion probability between group-III elements at the interface between the InAs QDs and InAlGaAs barrier.     

Optical and photocatalytic properties of sulfide semiconductor quantum dots (QDs) synthesized by silk fibroin template

Bio-template method is a simple, controllable and environmental friendly strategy to synthesize nanomaterials. It also avails the formation of bioactive and biocompatible nanoparticle–biomolecule hybrid for biotechnical applications. In this paper, silk fibroin was first successfully used as biomolecule template for the biomimic synthesis of CdS and ZnS quantum dots (QDs). The QDs showed promising applications as fluorescence probes and nanocatalysts. The effect of preparation situation to their optical and photocatalytic properties was well researched and CdS QDs with satisfying catalytic activities could be achieved by adjusting the protein matrix. It offers us a low-cost and effective way to synthesize series of sulfide semiconductor nanomaterials using silk fibroin.     

Narrow emission linewidths of positioned InAs quantum dots grown on pre-patterned GaAs(100) substrates

We report photoluminescence measurements on a single layer of site-controlled InAs quantum dots (QDs) grown by molecular beam epitaxy (MBE) on pre-patterned GaAs(100) substrates with a 15 nm re-growth buffer separating the dots from the re-growth interface. A process for cleaning the re-growth interface allows us to measure single dot emission linewidths of 80 μeV under non-resonant optical excitation, similar to that observed for self-assembled QDs. The dots reveal excitonic transitions confirmed by power dependence and fine structure splitting measurements. The emission wavelengths are stable, which indicates the absence of a fluctuating charge background in the sample and confirms the cleanliness of the re-growth interface.     

Optical spectroscopy of single Cd0.6Zn0.4Te/ZnTe quantum dots on Si substrate

Microphotoluminescence (μ-PL) measurements were carried out to investigate the optical properties of single Cd_0.6Zn_0.4Te/ZnTe quantum dots (QDs) grown on Si (001) substrate by using molecular beam epitaxy. The high quality of single Cd_0.6Zn_0.4Te/ZnTe QDs is witnessed by resolution-limited emission, negligible background and absence of measurable spectral jitter or blinking. Polarization-dependent and power-dependent μ-PL spectroscopy measurements were performed to identify the exciton, the biexciton, and the charged exciton in the emission spectra of single QDs. Furthermore a weak linearly polarized line is observed on the low energy side of the neutral exciton and is ascribed to dark exciton recombination.     

Influences of silicon doping in quantum dot layers on optical characteristics of InAs/GaAs quantum dot infrared photodetector

We have investigated the effects of silicon doping concentration within thirty-period self-assembled quantum dot (QD) layers on quantum dot infrared photodetectors (QDIPs). The lens-shaped quantum dots with the dot density of 1 × 10¹¹ cm^− 2 were observed by atomic force microscope (AFM). From the high ratio of photoluminescence (PL) peak intensities from dot layer to that from wetting layer, we have concluded that high dot density caused the short diffusion length for carriers to be easily captured by QDs. Moreover, the Si-doped samples exhibited the multi-state transitions within the quantum dots, which were different to the single level transition of undoped sample. Besides, the dominant PL peaks of Si-doped samples were red-shifted by about 25 meV compared to that of the undoped sample. It should result from the dopant-induced lowest transition state and therefore, the energy difference should be equal to the binding energy of Si in InAs QDs.