The structural,optical, and electrical properties of vacuum evaporated Cu-doped ZnTe polycrystalline thin films

We have studied the structural, optical, and electrical properties of thermally evaporated, Cu-doped, ZnTe thin films as a function of Cu concentration and post-deposition annealing temperature. X-ray diffraction measurements showed that the ZnTe films evaporated on room temperature substrates were characterized by an average grain size of 300Å with a (111) preferred orientation. Optical absorption measurements yielded a bandgap of 2.21 eV for undoped ZnTe. A bandgap shrinkage was observed for the Cu-doped films. The dark resistivity of the as-deposited ZnTe decreased by more than three orders of magnitude as the Cu concentration was increased from 4 to 8 at.% and decreased to less than 1 ohm-cm after annealing at 260°C. For films doped with 6–7 at.% Cu, an increase of resistivity was also observed during annealing at 150–200°C. The activation energy of the dark conductivity was measured as a function of Cu concentration and annealing temperature. Hall measurements yielded hole mobility values in the range between 0.1 and 1 cm²/V·s for both as-deposited and annealed films. Solar cells with a CdS/CdTe/ZnTe/metal structure were fabricated using Cudoped ZnTe as a back contact layer on electrodeposited CdTe. Fill factors approaching 0.75 and energy conversion efficiencies as high as 12.1% were obtained.     

Impact of substrate temperature on the structural,optical and electrical properties of thermally evaporated SnS thin films

Tin Sulfide thin films were deposited on soda lime glass substrates at three different substrate temperatures using thermal evaporation technique. The impact of substrate temperature on the deposited films has been studied thoroughly. Surface morphology was modified with the substrate temperature. XRD spectra shows orthorhombic end-centered type SnS having (1 1 0) orientation. The crystallite size increases with the increase in the substrate temperature. At a high substrate temperature (450 °C) small grains form on the surface and crystallinity decreases. The effect of substrate temperature on optical and electrical properties has been studied using UV–Vis–NIR Spectrophotometer and Hall effect respectively. With the increase in the substrate temperature there is a substantial decrease in the transmittance and bandgap value. Refractive index (n), dielectric constant (ε₁) and extinction co-efficient (k) have also been calculated for different substrate temperatures.     

Effect of the substrate temperature on the electrical and structural properties of spray-deposited SnO2:F thin films

SnO₂:F thin films were prepared by the spray pyrolysis (SP) technique at substrate temperature in the range 360–480 °C. The effect of varying the substrate temperature on the electrical and structural properties of the films was investigated by studying the I–V characteristics, the X-ray diffraction patterns (XRD), and the scanning electron microscope images (SEM). The I–V characteristics of the films were improved by increasing the substrate temperature, i.e. the resistivity of the films had decreased from 98 to 0.22 Ω cm. The X-ray diffraction patterns taken at 400 and 480 °C showed that the films are polycrystalline and two directions of crystal growth appeared in the difractogram of the film deposited at the lower substrate temperature, which correspond to the reflections from the (1 1 0) and (2 0 0) planes. With the increase in the substrate temperature a new direction of crystal growth appeared, which corresponds to the reflection from the (1 0 1) plane. Also the (1 1 0) and (2 0 0) lines were slightly grown at the higher substrate temperature, which means the crystal growth was enhanced and the grain size had increased. The SEM images confirmed these results and showed larger grains and more crystallization for the higher substrate temperature too.     

Characterization of vacuum evaporated CdTe thin films prepared at ambient temperature

Polycrystalline cadmium telluride (CdTe) thin films were prepared by vacuum evaporation on glass substrates at ambient temperature. X-ray diffraction pattern (XRD) showed that the films are polycrystalline with predominant zinc blend structure. A strong reflection from the (111) plane of the cubic phase was seen beside two weak reflections from the (220) and (311) planes of the same phase. Three very weak lines that are characteristic of elemental tellurium were also observed. The average grain size was estimated by using Sherrer's formula and found to be 24±1 nm. The scanning electron microscope (SEM) image showed a uniform surface with submicron grain size. The difference between grain size obtained from Sherrer's formula and that observed in the SEM micrograph means that each grain consists of a large number of smaller crystallites. The composition of the films was explored by using energy dispersive spectroscopy (EDS), which revealed that the surfaces of the films have excess tellurium. The transmittance was measured in the wavelength range λ=400–1100 nm and used to estimate the optical bandgap energy E_g which was found to be E_g=1.48±0.01 eV. The absorption coefficient was calculated and plotted against the photon's energy and tailing in the bandgap was observed. This tailing was found to follow the empirical Urbach rule. The width of the tail was estimated and related to localized states. The linear current–voltage (I–V) plots were used to find the resistivity ρ, where a value of ρ=2.10×10⁶ Ω cm was obtained.     

Effects of substrate temperature on electrical and structural properties of copper thin films

This paper addresses the effects of substrate temperature on electrical and structural properties of dc magnetron sputter-deposited copper (Cu) thin films on p-type silicon. Copper films of 80 and 500 nm were deposited from Cu target in argon ambient gas pressure of 3.6 mTorr at different substrate temperatures ranging from room temperature to 250 °C. The electrical and structural properties of the Cu films were investigated by four-point probe and atomic force microscopy. Results from our experiment show that the increase in substrate temperature generally promotes the grain growth of the Cu films of both thicknesses. The RMS roughness as well as the lateral feature size increase with the substrate temperature, which is associated with the increase in the grain size. On the other hand, the resistivity for 80 nm Cu film decreases to less than 5 μΩ-cm at the substrate temperature of 100 °C, and further increase in the substrate temperature has not significantly decreased the film resistivity. For the 500 nm Cu films, the increase in the grain size with the substrate temperature does not conform to the film resistivity for these Cu films, which show no significant change over the substrate temperature range. Possible mechanisms of substrate-temperature-dependent microstructure formation of these Cu films are discussed in this paper, which explain the interrelationship of grain growth and film resistivity with elevated substrate temperature.     

Effect of Ar ion irradiation on structural and optical properties of e-beam evaporated cadmium telluride thin films

CdTe thin films were prepared using e-beam evaporation technique. The prepared films were irradiated by Ar⁺ ions at different fluencies using multipurpose aluminum (Al) probe as in-situ. This could also be used in ion bombardment for cleaning the substrate prior to coating. The as grown and Ar⁺ ion irradiated films were confirmed to be of polycrystalline nature with X-ray technique. Ar⁺ ion irradiation enhances the growth of (1 1 1) oriented CdTe crystals and the Cd enrichment on the surface of CdTe thin films. Higher Ar⁺ ion flux helps to grow (2 2 0) oriented CdTe thin film. A considerable change in structural parameters like crystallite size, lattice parameter, internal strain, etc. could be observed as a result of high Ar⁺ ion flux. The applied in-plan stress in both as grown and irradiated film was identified to be of tensile nature. The applied stress was observed between 0.016 and 0.067 GPa for all Ar⁺ ion irradiated samples. As a result of the Ar⁺ ion irradiation, the in-plan stress varies between 1.38×10⁹ and 5.58×10⁹ dyn/cm². The observed bad gap was increased for higher Ar⁺ ion flux. It shows the effect of Ar⁺ ion irradiation on the modifications of optical properties. The observed results were encouraging on the use of simple multipurpose Al probe for Ar⁺ ion irradiation process as in-situ.     

Investigation of the optical and structural properties of thermally evaporated cadmium sulphide thin films on polyethylene terephthalate substrate

Cadmium sulphide (CdS) thin films of different thicknesses ranging from 100 to 400 nm were prepared on polyethylene terephthalate (PET) substrates at room temperature by thermal evaporation technique in vacuum of about 3×10⁻⁵ Torr. The structural characterisation was carried out by X-ray diffraction (XRD). These studies confirm the proper phase formation of the cadmium sulphide structure. The root mean square (RMS) roughness of the films was measured using atomic-force microscopy. The root mean square roughness of the films increases as the film thickness increases. The energy gap of CdS on PET substrates was determined through the optical transmission method using an ultraviolet–visible spectrophotometer. The optical band gap values of CdS thin films slightly increase as the film thickness increases. The optical band gap energy was found to be in the range of 2.41–2.56 eV.     

Effect of substrate temperature on structural,morphological, optical and electrical properties of MnIn2S4 thin films prepared by nebulizer spray pyrolysis technique

Manganese indium sulphide (MnIn₂S₄) thin films were deposited using an aqueous solution of MnCl₂, InCl₃ and (NH₂)₂CS in the molar ratio 1:2:4 by simple chemical spray pyrolysis technique. The thin film substrates were annealed in the temperature range between 250 and 350 °C to study their various physical properties. The structural properties as studied by X-ray diffraction showed that MnIn₂S₄ thin films have cubic spinel structure. The formation of cube and needle shaped grains was clearly observed from FE-SEM analysis. The energy dispersive spectrum (EDS) predicts the presence of Mn, In and S in the synthesized thin film. From the optical studies, it is analyzed that the maximum absorption co-efficient is in the order between 10⁴ and 10⁵ cm⁻¹ and the maximum transmittance (75%) was noted in the visible and infrared regions. It is noted that, the band gap energy decreases (from 3.20 to 2.77 eV) with an increase of substrate temperature (from 250 to 350 °C). The observations from photoluminescence studies confirm the emission of blue, green, yellow and red bands which corresponds to the wavelength range 370–680 nm. Moreover, from the electrical studies, it is observed that, as the substrate temperature increases the conductivity also increases in the range 0.29–0.41×10⁻⁴ Ω⁻¹ m⁻¹. This confirms the highly semiconducting nature of the film. The thickness of the films was also measured and the values ranged between 537 nm (250 °C) to 483 nm (350 °C). This indicates that, as the substrate temperature increases, the thickness of the film decreases. From the present study, it is reported that the MnIn₂S₄ thin films are polycrystalline in nature and can be used as a suitable ternary semiconductor material for photovoltaic applications.     

Structural,electrical and optical properties of sintered SnO2 pellets

Tin dioxide (SnO₂) powder was prepared by the co-precipitation method using SnCl₂ solution as a precursor. The powder was then pelletized and sintered. Structural characterization of the samples with XRD confirmed that all the pellets were of SnO₂ having polycrystalline nature with the crystallite size of the order of 90 nm. SEM-EDAX was used to confirm the morphology and composition of the samples. The measurements of electrical properties were carried out in the frequency range of 100 Hz to 100 kHz at various fixed temperatures from 40 °C to 160 °C. The a.c. conductivity and the dielectric constant were found to be dependent on both frequency and temperature. The frequency and temperature dependent conduction properties of SnO₂ are found to be in accordance with correlated barrier hoping model. Infrared and visible spectroscopic studies show that a strong vibration band characteristic of the SnO₂ stretching mode was present at around 620 cm^?1 and the samples exhibited optical transmittance in the visible range.     

Effect of thickness on the structural,optical and electrical properties of RF magnetron sputtered GZO thin films

Gallium-doped zinc oxide (GZO) thin films with very high conductivity and transparency were successfully deposited by RF magnetron sputtering at a substrate temperature of 400 °C. The dependence of the film properties over the thickness was investigated. X-ray diffraction (XRD) results revealed the polycrystalline nature of the films with hexagonal wurtzite structure having preferential orientation along [001] direction normal to the substrate. The lowest resistivity obtained from electrical studies was 5.4×10⁻⁴ Ω cm. The optical properties were studied using a UV–vis spectrophotometer and the average transmittance in the visible region (400–700 nm) was found to be 92%, relative to the transmittance of a soda–lime glass reference for a GZO film of thickness 495 nm and also the transparency of the films decreases in the near IR region of the spectra. The mobility of the films showed a linear dependence with crystallite size. GZO film of thickness 495 nm with the highest figure of merit indicates that the GZO film is suitable as an ideal transparent conducting oxide (TCO) material for solar cell applications.     

Influence of substrate temperature on structural and optical properties of RF sputtered ZnMnO thin films

The ZnMnO thin films were deposited on glass substrates by radio frequency magnetron sputtering method. The properties of ZnMnO thin films were investigated by high-resolution x-ray diffractometer (HRXRD),atomic force microscopy (AFM), UV-Vis spectrometer and room temperature photoluminescence (PL), under the influence of substrate temperature. The substrate temperature was varied from 300, 400 and 500°C. With increasing the substrate temperature, the structure of the films changed from cubic to hexagonal. The cubic ZnMnO thin films grown along [210] direction, while the hexagonal ones grown along [002] direction. The changes in surface morphology provided a proof on the structural transition. Also, decrease and increase of optical band gap is associated with cubic or hexagonal structure of the films.

     

Influence of working pressure on the structural,optical and electrical properties of sputter deposited AZO thin films

Highly oriented crystalline aluminum doped zinc oxide (AZO) films were sputter deposited on glass substrates and a systematic investigation on the as deposited and etched films was reported for its further application in silicon thin film solar cell. Influence of the deposition pressure (from 2 to 8 mTorr) and post-annealing temperature (at 400 °C for 5 min) on the structural, optical and electrical properties of the as-deposited and etched samples were analyzed. The optimum condition for its reproducibility and large area deposition is determined and found that the depositions made at 8 mTorr at 200 W having the distance from source to substrate of 9 cm. All the AZO films exhibited a c-axis preferred orientation perpendicular to the substrate and their crystallinity was improved after annealing. From the XRD pattern the grain size, stress and strain of the films were evaluated and there is no drastic variation. Optical transmittance, resistivity, Hall mobility and carrier concentration for the as deposited and etched-annealed films were found to improve from 79 to 82%; 2.97 to 3.14×10⁻⁴ Ω cm; 25 to 38 cm²/V s; 8.39 to 5.96×10²⁰/cm³ respectively. Based on the triangle diagram between figure of merit and Hall mobility, we obtained a balance of point between the electrical and optical properties to select the deposition condition of film for device application.     

The influence of substrate temperature on the structural and optical properties of ZnS thin films

Thin films of ZnS were deposited on soda lime glass substrates by a modified close-space sublimation technique. The change in optical and structural properties of the films deposited at various substrate temperatures (150–450°C) was investigated. X-ray diffraction spectra showed that films were polycrystalline in nature having cubic structure oriented only along (111) plan. The crystallinity of films increased with the substrate temperature up to 250°C. However, crystallinity decreased with further increase of substrate temperature and films became amorphous at 450°C. The atomic force microscopy data revealed that the films become more uniform and dense with the increase of substrate temperature. Optical properties of the films were determined from the transmittance data using Swanepoel model. It was observed that the energy band gap is increased from 3.52 to 3.65 eV and refractive index of the films are decreased with the increase of substrate temperature. Moreover, considerable improvement in blue response of the films was noticed with increasing substrate temperature.     

Effect of different sputtering gas mixtures on the structural,electrical, and optical properties of p-type NiO thin films

We investigated how mixtures of Ar and O₂ or N₂ gases affect the structural, electrical and optical properties of RF-magnetron-sputtered NiO films. It is shown that the addition of O₂ gas to Ar ambient (namely, Ar:O₂=2:1 to 1:2) slightly reduces the (2 0 0) texturing of the NiO films. The introduction of N₂ gas (from 0 to 2 sccm) to Ar:O₂ (2:1) mixture enhances the (2 0 0) texturing, while the addition of N₂ gas (from 0 to 2 sccm) to Ar ambient slightly weakens the (1 1 1) texturing. The deposition rate is reduced from 6.1 to 1.5 nm/min when O₂ gas is added to Ar ambient. The addition of N₂ gas to the Ar:O₂ (2:1) mixture slightly increases the deposition rate from 1.8 to 2.6 nm/min, whereas adding N₂ gas to Ar only ambient somewhat reduces the rate from 6.1 to 4.4 nm/min. The carrier concentration of the films is increased and the mobility is decreased as the O₂ flow rate in the Ar:O₂ mixture is increased. The addition of N₂ gas to the Ar:O₂ (2:1) mixture increases the resistivity of the films, while adding N₂ gas to Ar ambient decreases the resistivity. The transmittance and optical bandgap of the films are reduced (from 58.4 to 45.5% at 550 nm and from 3.5 to 3.3 eV, respectively) with increasing O₂ flow to Ar ambient. When N₂ gas is added to the Ar:O₂ (2:1) mixture, the transmittance in the visible wavelength range increases from 58.4 to 71.3% and the optical bandgap increases from 3.5 to 3.6 eV. However, adding N₂ gas to the Ar only ambient results in decrease in the transmittance in the visible wavelength region (from 69.3 to 56%) and the optical bandgap (from 3.7 to 3.5 eV).     

Effect of fluorine doping on the structural,optical and electrical properties of spray deposited cadmium stannate thin films

Cadmium stannate (Cd₂SnO₄) thin films were coated on Corning 1737 glass substrates at 540 °C by spray pyrolysis technique, from the aqueous solution of cadmium acetate and tin (II) chloride precursors. Fluorine doped Cd₂SnO₄ (F: Cd₂SnO₄) thin films were prepared by adding ammonium fluoride in the range of 0–5 wt% of the total weight of cadmium acetate and tin (II) chloride in the spray solution. Thickness of the prepared films is about 300 nm. X-ray diffraction analysis of the Cd₂SnO₄ and 3 wt% F: Cd₂SnO₄ films shows the signature for the growth along (222) direction. Scanning electron micrographs showed that fluorine doping effectively modifies the surface morphology of Cd₂SnO₄ films. Average optical transmittance in the visible region (500–850 nm) for Cd₂SnO₄ is ~79% and it is increased to ~83% for 1 wt% doping concentration of the NH₄F in the solution. Fluorescence spectra of F: Cd₂SnO₄ (1 wt% and 3 wt%) exhibit peak at 601 nm. F: Cd₂SnO₄ film (1 wt%) shows mobility of ~42 cm²/V s, carrier concentration of ~9.5×10¹⁹ cm^?3 and resistivity of ~1.5×10^?3 Ω cm.     

The effect of Sn impurity on the optical and structural properties of thin silicon films

The effect of tin impurity on the structure and optical properties of thin-film amorphous silicon is investigated. It is established that tin impurity accelerates crystallization of amorphous silicon. Immediately after deposition of a film onto a substrate at a temperature of ∼300°C, there is a crystalline phase of silicon in samples with tin. High-vacuum annealing at 350–750°C leads to growth of the crystalline phase in films with tin: nanocrystals grow in size from ∼3.0 to 4.5 nm. At the same time, in films without tin, only the degree of the short-range order increases. Silicon film without tin remains amorphous over the entire range of annealing temperatures.     

衬底温度对纳米晶SnO_2薄膜结晶特性的影响

阐述了金属氧化物SnO2纳米薄膜研究的发展情况及其应用前景,介绍了采用磁控溅射技术,使用混合气体Ar和O2,在衬底温度为150～400℃的耐热玻璃基片上制备了纳米晶SnO2∶Sb透明导电薄膜。通过测定x射线衍射谱,表明薄膜择优取向为[110]和[211]方向,SnO2∶Sb薄膜的结晶特性随衬底温度变化。     

The microstructure and physical properties of thin SnO2 films

Thin polycrystalline SnO₂ films were deposited on glass substrates by magnetron sputtering. Electrical, optical, and gas-sensing properties, as well as the structure and phase composition of the films, were studied. The electrical resistance of the films and the concentration and mobility of free charge carriers were determined by the four-point-probe and van der Pauw methods. The band gap and the type of optical transitions in the films were derived from optical absorption spectra. The sensitivity to toxic and explosive gases was measured. The composition, morphology, and crystal structure of the films annealed at 600°C were examined by X-ray diffraction and electron microscopy. The films were found to contain only a tetragonal SnO₂ phase and have good crystallinity. The average grain size in the annealed films is 11–19 nm. A model of the electrical conduction in the polycrystalline SnO₂ films is discussed.