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介绍了增黏剂(HMDS)的物化性质及其在光刻工艺中的作用,并且通过实验研究将增黏剂应用于锑化铟材料的光刻工艺,改善了锑化铟的表面状态,增强了锑化铟衬底与光刻胶的黏附性,进而在湿法腐蚀等后续工艺中提高了光刻胶的抗腐蚀性. 相似文献
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本文成功制作出了表面光滑且具有100%填充因子的硅微阵列阵列结构。制作流程包括:旋涂光刻胶,热熔融和反应离子可是转移。首先,在硅衬底上旋涂SU-8光刻胶,并光刻显影;其次,热熔融和热处理光刻胶阵列得到光刻胶微透镜阵列;最后,反应离子刻蚀转移形成硅微透镜阵列。实验表明,通过调节反应离子刻蚀气体SF6和O2的量分别到60sccm和50sccm,就可以得到无间距的硅微透镜阵列。在此种情况下,光刻胶和硅衬底的刻蚀速率比值为1:1.44。单个微透镜底端尺寸为30.1微米,高度为3微米,焦距在15.4微米到16.6微米之间。 相似文献
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《半导体技术》1985,(5)
为了改善聚酰亚胺树脂钝化工艺中聚酰亚胺树脂与半导体以及金属表面的粘附性问题,不久前日本富士通有限公司提出了一种新的方法来解决这一问题.其具体做法是:(1)在刻铝后的片子上涂聚酰亚胺树脂前,先涂一层正性光刻胶;(2)对正性光刻胶进行高温热处理,(这时需用N_2保护)使之趋于热稳定;(3)把聚酰亚胺树脂涂在正性光刻胶之上,这样就把正性光刻胶做为永久层保留下来;(4)对聚酰亚胺树脂进行高温热处理,使之固化.(5)光刻引线孔,去掉引线孔处的聚酰亚胺树脂,露出压焊点.由于在片子表面与聚酰亚胺树脂之间加入了一层正性光刻胶的过渡层,从而使聚酰亚胺树脂与表面的粘附性大大提高. 相似文献
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近年来,图形化蓝宝石衬底(PSS)作为GaN基LED外延衬底材料被广泛应用。采用感应耦合等离子体(ICP)技术对涂覆有光刻胶阵列图案的蓝宝石衬底进行刻蚀。通过研究及优化不同ICP刻蚀工艺参数对刻蚀速率和选择比的影响,分别成功制备出蒙古包形和圆锥形图形化蓝宝石衬底片,并在其表面完成InGaN/GaN多量子阱外延及芯片工艺。借助光致发光和电致发光等手段测试其LED器件的光电学性能。实验结果发现圆锥形的图形化蓝宝石衬底拥有更强的光功率和更窄的半峰宽,说明这种形貌的衬底在GaN外延时有效减少了晶格失配造成的缺陷,提高了晶体质量,从而更有效地增加LED出光效率。 相似文献
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对胶体球光刻中单层胶体晶体(MCC)的曝光特性进行了研究。利用磁控溅射的方法在蓝宝石衬底上生长SiO2薄膜并旋涂光刻胶,通过固液界面自组装的方法在光刻胶上制备了单层胶体晶体。胶体球光刻利用单层胶体晶体作为微透镜阵列,通过紫外曝光的方法在光刻胶上制备微孔阵列。光刻胶上图形的周期性与胶体球的直径有关,并且大直径的胶体球的聚光性能要强于小直径胶体球,在曝光过程中随着曝光时间的增加,由于曝光量的增加以及光刻胶的漂白现象,光刻胶上微孔的尺寸也在增加。最后以曝光后的光刻胶为掩膜,将感应耦合等离子体刻蚀技术(ICP)以及湿法腐蚀相结合,制备出了图形化蓝宝石(PSS)衬底。 相似文献
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SU-8胶是一种负性、环氧树脂型、近紫外线光刻胶。它适于制作超厚、高深宽比的MEMS微结构。为电铸造出金属微结构,通常需要采用金属基底。但SU-8胶对金属基底的结合力通常不好,因而限制了其深宽比的提高。从SU-8胶与基底的浸润性、基底表面粗糙度以及基底对近光紫外光的折射特性入手,对SU-8胶与基底的结合力进行分析,首次指出:在近紫外光的折射率高的基底与SU-8胶有很好的结合性。经实验得出经过氧化处理的TI片的SU-8胶的结合性强。这有利于为MEMS提供低成本,高深宽比的金属微结构。 相似文献
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烘箱HMDS预处理系统在提高光刻胶与硅片的黏附性方面具有很多优越性。文章通过对烘箱HMDS预处理过程的工作温度、PRIME时间、PRIME后保持时间等参数的优化实验,得到了最佳的烘箱HMDS预处理程序。通过提高烘箱工作温度(150C)、减少PRIME时间(0.5min)和增加PRIME后保持时间(5min),最终降低了HMDS处理后的硅片接触角,进而降低了光刻胶28%的用量。本方法已经验证在本次开发中,其工艺稳定,完全适用于生产线量产。 相似文献
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Paavo Jalonen 《Microelectronics Journal》2003,34(2):99-107
Miniaturization in electronics means finer lines and smaller vias in substrate technology. Very fine lines on the substrate are difficult to produce by conventional PWB manufacturing means. Thick copper layers are difficult to etch and the accuracy of conventional dry film photoresist is not necessarily sufficient. On the other hand, the environmental issues force us to reduce pollution.In this paper a new concept (FSBC)® for making thin, buried active component in polymer, non-reinforced PWB, using electroformatting, dry process (sputtering), electrical lithography and growing processes, via holes and build-up method, is described.To find reliability, tests of peel strength, roughness and some pre-treatments, which act on the adhesion of metal to the dielectric layer between circuits, have been made. Similarly in the tests, the capability of the electrodeposited photosensitive lithography has been compared with the results of the dry and the spin coated liquid films. 相似文献
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使用光致抗蚀剂的全息干涉曝光、显影方法在GaAs(100)面衬底上形成光致抗蚀剂光栅图形.采用选择化学腐蚀将光致抗蚀剂光栅浮雕图形转换到GaAs(100)面衬底上.已成功地在GaAs(100)面衬底上制作了周期为0.33微米的光栅皱折.在GaAs(100)面上的光栅皱折具有良好的V-形沟槽轮廓. 相似文献
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正A simple method has been developed for the fabrication of a silicon microlens array with a 100%fill factor and a smooth configuration.The microlens array is fabricated by using the processes of photoresist(SU8- 2005) spin coating,thermal reflow,thermal treatment and reactive ion etching(RIE).First,a photoresist microlens array on a single-polished silicon substrate is fabricated by both thermal reflow and thermal treatment technologies. A typical microlens has a square bottom with size of 25μm,and the distance between every two adjacent microlenses is 5μm.Secondly,the photoresist microlens array is transferred to the silicon substrate by RIE to fabricate the silicon microlens array.Experimental results reveal that the silicon microlens array could be formed by adjusting the quantities of the reactive ion gases of SF_6 and O_2 to proper values.In this paper,the quantities of SF_6 and O_2 are 60 sccm and 50 sccm,respectively,the corresponding etch ratio of the photoresist and the silicon substrate is 1 to 1.44.The bottom size and height of a typical silicon microlens are 30.1μm and 3μm,respectively. The focal lengths of the microlenses ranged from 15.4 to 16.6μm. 相似文献
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Inductively coupled plasmas (ICP) are the high-density plasmas of choice for processing HgCdTe and related compounds. Real-time
examination of the ICP plasmas used to process HgCdTe would be desirable. In this preliminary study, the feasibility of using
optical emission spectroscopy (OES) of ICP plasma used for processing HgCdTe has been examined. We have examined the utility
of OES as a real-time diagnostic tool for HgCdTe device fabrication. In this preliminary study it has been found that mercury
and cadmium can be detected but are dependent on several factors: sample area, material composition, etch rate, sample temperature,
photoresist area, and plasma power. Furthermore, we found strong correlation between the amount of hydrogen detected by OES
for samples with photoresist versus samples without photoresist while processing with hydrogen-based plasma. Hydrogen emission
intensity decreased dramatically in samples with photoresist, contrary to the theory that photoresist adds hydrogen to the
plasma effluent. It appears that hydrogen complexes with photoresist, reducing the global amount of hydrogen during the process.
Furthermore, this phenomena may help to explain macroloading issues whereby additional photoresist area slowed HgCdTe, CdTe,
and photoresist etch rates. 相似文献
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MEMS螺线管型电感器正负胶结合的加工工艺 总被引:3,自引:2,他引:1
MEMS螺线管型电感器由于具有很多优点,其用途或潜在用途相当广泛 。为了获得高质量的MEMS螺线管型电感器,在充分利用SU-8特点的基础上,结合使用正胶AZ-4000系列和负胶SU-8系列,新开发了UV-LIGA多层微加工工艺,它主要包括:在基片上溅射Cr/Cu作为电镀种子层,涂布正胶,紫外光刻得到电镀模具,电镀Cu和FeNi分别得到线圈的下层、中层和上层以及铁芯;在完成下层和中层后,分别进行一次负胶工艺以形成电绝缘层和后续结构的支撑平台,即涂布负胶覆盖较下层结构,光刻开通往较上一层的通道并使SU-8聚合、交联以满足性能要求。实验表明该工艺是可行和实用的。它除了可用于螺线管电感器的加工,还可以用来加工其它三维结构的MEMS器件。 相似文献