CrAlN纳米复合涂层的组织结构及切削性能研究

目前对CrAlN涂层的研究主要集中在组织结构、力学性能和抗高温氧化性能等方面,对涂层的切削性能研究较少.采用电弧离子镀和脉冲直流磁控溅射共沉积技术制备了一种CrAlN纳米复合涂层,采用XRD、扫描电镜、纳米压痕仪、划痕仪等分析了涂层的组织结构和力学性能.结果 表明:CrAlN纳米复合涂层以fcc-(Cr,Al)N相为主...     

工艺参数对直流溅射沉积CrAlN涂层结构和性能的影响

采用直流反应磁控溅射的方式,用AlCr合金靶,在高速钢(M2)上沉积CrAlN涂层。采用扫描电镜、X射线衍射、能谱和纳米压痕仪等分析和测量手段,系统研究了Ar/N2气流比、气压和基片温度等工艺参数对CrAlN涂层结构和性能的影响。研究表明,Ar/N2气流比、气压和基片温度对涂层均有较大的影响,当Ar/N2气流比为1、总气压为0.2 Pa、基片温度为300℃时所得涂层性能最好,最高硬度和弹性模量分别为34.8,434.3 GPa。     

Al含量对CrAlN涂层微观结构和力学性能的影响

采用不同Al含量的AlCr合金靶,在高速钢(M2)上通过直流反应磁控溅射的方式沉积不同的CrAlN涂层;分别用EDS、XRD、纳米压痕仪、高速往复摩擦磨损试验机和台阶仪测量出涂层的化学成分、物相组成、力学性能、磨损性能和磨损量,研究了不同Al含量对CrAlN涂层微观结构和力学性能的影响。XRD分析表明涂层主要为NaCl结构,纳米压痕仪测得力学性能随Al含量的提升先提高后降低,在Al含量为60%时获得最高硬度和弹性模量分别为36.8 GPa和459.5 GPa和最佳的磨损性能。磨损机制为磨料磨损和微动磨损。     

磁控溅射高温固体自润滑涂层的研究与进展

近年来,高温固体自润滑涂层在许多领域得到了快速发展,尤其是磁控溅射技术制备的微纳米高温固体自润滑涂层可以满足航空领域应用中对涂层厚度、力学性能、摩擦性能的更高要求。在综合国内外大量文献的基础上,对磁控溅射方法制备的高温固体自润滑涂层的材料体系、工艺参数优化和涂层结构设计取得的进展进行了综述,通过分析涂层组成相影响机理、工艺改进措施和涂层复杂界面结构,提出未来高温固体自润滑涂层有待进一步研究的问题。     

铂中间层的制备及对铱钽涂层钛阳极性能的影响

本文从延缓涂层钛阳极基体钝化的角度出发,采用电镀、刷镀、磁控溅射三种工艺在钛基体上制备了含铂中间层;利用SEM研究了三种不同中间层的表面形貌;采用拉开法测试了中间层与基体的附着力;利用XRD分析了三种不同的铂中间层的成分及相结构.本文还系统对比研究了含不同中间层的涂层钛阳极的表面形貌、电化学性能以及加速寿命.研究结果表明含磁控溅射镀铂中间层的涂层钛阳极的寿命最长.     

界面梯度对TiN／不锈钢涂层应力的影响

气相沉积表面涂层在科学技术各领域得到广泛应用，然而，由于涂层与基体在化学和物理性质上的差异，使得涂层与基体在界面两侧产生结构和性能上的突变，影响了涂层功能的充分发挥。为此，采用多靶磁控溅射技术制备了具有梯度过渡层的ＴｉＮ／不多靶磁控溅射技术制备了具有梯度过渡层的ＴｉＮ／不锈钢涂层，并研究了梯度层对涂层内应力的影响。研究结果表明：采用多靶磁控溅射技术，分别控制各靶的功率，能够精确控制梯度层的成份变化     

Ni含量对CrAlNiN薄膜微观结构和腐蚀性能的影响

采用闭合场非平衡磁控溅射离子镀(CFUMSIP)技术在单晶Si和工具钢表面制备不同Ni含量的CrAlNiN薄膜,利用包括纳米压痕仪和电化学工作站等多种技术手段表征了CrAlNiN薄膜的成分、表面和截面形貌、相结构、硬度和腐蚀性能.研究结果表明,CrAlNiN薄膜呈纳米多层结构,Ni掺杂不会改变三元CrAlN薄膜fcc晶...     

磁控溅射技术在微小颗粒表面涂层中的应用

磁控溅射颗粒表面涂层技术相对于流化床CVD工艺来说,在安全、环保、杂质含量控制方面具有较大优势。本文分析了磁控溅射颗粒涂层技术的基本原理、面临的问题与挑战,介绍了国内外磁控溅射颗粒涂层技术的发展现状,为颗粒物料表面磁控溅射涂层技术研究提供参考。     

非晶Fe基涂层的制备工艺研究

本文研究了电弧喷涂中工艺参数对非晶涂层的含量以及性能的影响,以45钢为基材,制备了不同工艺参数下的涂层。研究结果表明,利用电弧喷涂技术可以铁基体上成功制备出含非晶涂层。不同工艺参数条件下所得涂层皆存在非晶相,但所得涂层质量存在明显差异。电弧喷涂完成后,对所制备的涂层与45钢进行了摩擦磨损对比试验,结果显示,在Fe基体上制备的非晶涂层显著改善了摩擦磨损性能。     

CrAlN抗冲蚀涂层制备及性能研究

为提高钛合金材料抗冲蚀性能,利用真空阴极电弧沉积技术在TC11钛合金上沉积CrAlN涂层,研究靶电流、偏压和气压对涂层结构及性能的影响。采用扫描电镜观察膜层表面和截面形貌,金相显微镜对表面的大颗粒进行定量分析;显微硬度计测量膜层的维氏显微硬度;采用喷砂试验机对涂层的抗冲蚀性能进行测试,通过三维表面轮廓仪测量涂层厚度和侵蚀坑的深度;X射线衍射仪表征涂层中的晶体结构。结果表明:靶电流从70A增大到110A,虽可提高涂层的沉积速率,但会导致涂层表面大颗粒增加,从而降低涂层的抗冲蚀性能;气压从1Pa增大至4Pa,可有效地减少涂层表面颗粒的尺寸及数量,但也会一定程度降低沉积速率及硬度;偏压对CrAlN涂层的结构及性能影响最大,偏压在-50V时涂层呈(200)择优取向,-100V涂层呈(111)择优取向,-200V时,涂层择优取向不明显;且随着偏压的增加,涂层的硬度及抗冲蚀性能增大,在高冲蚀角下,冲蚀的失效机理为脆性失效。结论:工艺参数中靶电流对表面质量的影响最大;涂层的生长取向与偏压密切相关;CrAlN涂层的表面质量及硬度直接影响其抗砂粒冲蚀性能,偏压对涂层抗冲蚀性能影响最大。最终优化的工艺参数为:靶电流90A、偏压-100V、气压4Pa。     

Effect of grain size on mechanical properties in CrAlN/SiNx multilayer coatings

Both CrAlN and SiN_x coatings were deposited sequentially by RF magnetron sputtering. During sputtering, thickness of SiN_x layer was set to be 1 nm, while that of CrAlN layer was controlled to be 4, 20, 40, 100, and 200 nm. According to XRD results, it was revealed that grain size of the CrAlN coatings increased from 3.6 nm to 24.2 nm with the increasing thickness. From HRTEM images, the variation on grain size was attributed to the amorphous SiN_x layer, which significantly retarded the continuous growth of CrAlN layer. Hardness of the CrAlN/SiN_x coatings with various bilayer thicknesses was measured by nanoindentation. The relationship between grain size and hardness could be interpreted by the Hall-Petch equation, and an improved hardness around 32 GPa was achieved.     

Microstructure and mechanical properties of CrAlN coatings deposited by modified ion beam enhanced magnetron sputtering on AISI H13 steel

CrAlN coatings were deposited on silicon and AISI H13 steel substrates using a modified ion beam enhanced magnetron sputtering system. At the modified ion beam bombardment, the effects of bias voltage and Al/(Cr + Al) ratio on microstructure and mechanical properties of the coatings were studied. The X-ray diffraction data showed that all CrAlN coatings were crystallized in the cubic NaCl B1 structure, showing the (111), (200), and (220) preferential orientation. It is noted that the (111) diffraction peak intensity decreased and the peaks broadened as the bias voltage increased at the same ratio of Al/Cr targets power, which is attributed to the variation in the grain size and microstrain. The microstructure observation of the coatings by field emission scanning electron microscopy cross-section morphology shows that the columnar grain became more compact and dense with increasing substrate bias voltage and Al concentration. At a substrate bias voltage of −120 V and a Al/(Cr + Al) ratio of 40%, the coating had the highest hardness (33.8 GPa) and excellent adhesion to the substrate.     

氮化物硬质涂层中Cr、Ti和Al元素对摩擦磨损特性的影响

利用四靶闭合场非平衡磁控溅射(CFUBMS)技术在石英玻璃和抛光不锈钢片两种基底上制备含有Cr、Ti和Al元素组合的各种氮化物涂层.采用摩擦磨损仪测试涂层摩擦系数,应用金相显微镜对各个涂层磨痕形态进行分析,结果表明TiN、CrN、TiAlN、CrAlN以及CrTiAlN涂层的摩擦系数依次减小,耐磨特性依次提高;结合涂层的X射线光电子能谱分析,可以得到含有Al元素涂层中形成了AlN的结构,提高涂层的硬度,增加耐磨特性;在涂层中含有Cr元素形成了氧化物Cr2O3可以提高涂层自排屑能力,减小摩擦系数,增加耐磨特性,含Ti元素形成的氧化物TiO2则不利于涂层的摩擦磨损特性;由于CrTiAlN本身具有比三元氮化物更高的涂层硬度,且含有Al和Cr元素,因此该涂层具有最好的摩擦磨损性能.     

Microstructure and mechanical properties of CrAlN/SiNx nanostructure multilayered coatings

Multilayered CrAlN and SiN_x films were deposited periodically by radio frequency reactive magnetron sputtering. In the CrAlN/SiN_x multilayered coatings, the thickness of CrAlN layer was fixed at 4 nm, while that of SiN_x layer was adjusted from 4 nm to 0.3 nm. The dependence of the SiN_x layer thickness on the preferred orientation, crystalline behavior and mechanical properties of multilayered coatings were discussed with the aid of XRD patterns and HRTEM. It was demonstrated that amorphous SiN_x layer transformed to a crystallized one when the thickness decreased from 4 nm to 0.3 nm. The crystalline SiN_x layer grew epitaxially, formed the coherent interface with the CrAlN layer, and the columnar structure was exhibited. The critical layer thickness for the transition from amorphous SiN_x to a crystallized one was found to be around 0.4 nm, and maximum hardness of 33 GPa was revealed.     

直流磁控溅射研究进展

直流磁控溅射是重要的物理气相沉积技术,广泛应用在工业生产和科学研究中.主要评论了近年来直流磁控溅射技术在溅射机理和非平衡闭合磁控靶等方面取得的重要进展,并评述了脉冲磁控模式和基于闭合磁场直流磁控溅射沉积涂层的结构区域模型.直流非平衡磁控溅射是直流磁控溅射技术中的重要里程碑,使磁控溅射技术直接过渡到离子镀阶段,而脉冲磁控溅射技术为稳定沉积高质量的非导电涂层作出了重要的贡献.     

Novel coatings for unique applications

In the present article three different coatings systems are discussed based on reactive and non-reactive sputtering processes utilizing HiPIMS, pulsed DC and DC magnetron sputtering. The HiPIMS platform was used to develop a very hard TiB₂ coating with a low residual stress level. Pulsed DC magnetron sputtering was used to deposit 50 μm thick amorphous Al₂O₃ coating. Finally DC magnetron sputtering was used to deposit a Sr-Ti-O coating capable of releasing Sr facilitating accelerated bone formation and implant ingrowth.     

Application of magnetron sputtering for producing bioactive ceramic coatings on implant materials

Radio frequency (RF) magnetron sputtering is a versatile deposition technique that can produce thin, uniform, dense calcium phosphate coatings. In this paper, principle and character of magnetron sputtering is introduced, and development of the hydroxyapatite and its composite coatings application is reviewed. In addition, influence of heat treatment on magnetron sputtered coatings is discussed. The heat treated coatings have been shown to exhibit bioactive behaviour both in vivo and in vitro. At last, the future application of the bioactive ceramic coating deposited by magnetron sputtering is mentioned.     

High performance hard carbon coatings (diamond‐like coatings)

Different dLc coating types are applied at an industrial scale by sulzer Metco thin Film. The coatings are generated with different coating architecture. Deposition methods are: magnetron sputtering, electron beam evaporation and PA‐cVd. Reactive magnetron sputtering is used to deposit metal containing a‐c:h coatings (a‐c:h:Me), e.g. MAXit W‐ch. Pure a‐c:h coatings as functional top coatings are used for cavidur®, MAXit® AhdLc and special versions of dylyn® coatings. In addition to the pure a‐c:h coatings, doped a‐c:h coatings are also used. The dylyn® family of coatings is comprised of at least one layer a‐c:h:si:O. The dylyn® coatings may be doped with metal (a‐c:h:ti:si:O) to adapt selected properties like electrical conductivity.