f=210GHz的超高速InP/InGaAs单异质结晶体管

成功地将Polyimide钝化平坦化工艺应用于InP/InGaAs单异质结晶体管制作工艺中.在Vce=1.1V,Ic=33.5mA的偏置条件下,发射极尺寸为1.4μm×1.5μm的器件,其ft达到210GHz.这种器件非常适合高速低功耗方面的应用,例如超高速数模混合电路以及光学通信系统等.     

InP异质结晶体管

提出了准平面构成的InP HBT新结构，用Si离子注入在半绝缘InP：Fe上形成隐埋n型区来代替通常采用的外延n型收集区，可有效降低器件的高度，减小寄生参数，提高器件的可靠性，测量结果表明，晶体管的hfe=100,VCE=3-4V,fT=10GHz。     

InP异质结晶体管

提出了准平面构成的InP HBT新结构。用Si离子注入在半绝缘In P:Fe上形成隐埋n型区来代替通常采用的外延n型收集区,可有效降低器件的高度,减小寄生参数,提高器件的可靠性。测量结果表明,晶体管的h_(fe)=100,V_(CE)=3～4V,f_T=10GHz。     

用于超高速数字集成电路的0.5um InP/InGaAs双异质结晶体管

报道了用于超高速数字集成电路的0.5μm发射级线宽的InP/InGaAs DBHT器件,及其100 GHz的静态分频器,其工作频率达到国内领先.并详细分析了器件CB结电容对影响高速数字应用的影响,其中Ccb/Ic达到0.4 ps/V,揭示其静态分频器具有工作在150 GHz以上的潜力.     

f＝210GHz的超高速InP/InGaAs单异质结晶体管

成功地将Polyimide钝化平坦化工艺应用于InP/InGaAs单异质结晶体管制作工艺中.在Vce=1.1V,Ic=33.5mA的偏置条件下,发射极尺寸为1.4μm×1.5μm的器件,其ft达到210GHz.这种器件非常适合高速低功耗方面的应用,例如超高速数模混合电路以及光学通信系统等.     

162GHz自对准InP/InGaAs异质结双极型晶体管

报道了发射极自对准的InP基异质结双极型晶体管.在集电极电流Ic=34.2mA的条件下,发射极面积为0.8μm×12μm的InP HBT截止频率fT为162GHz,最大振荡频率fmax为52GHz,最大直流增益为120,偏移电压为0.10V,击穿电压BVCEO达到3.8V(Ic=0.1μA).这种器件非常适合在高速低功耗方面的应用,例如OEIC接收机以及模拟数字转换器.     

截止频率为238GHz的亚微米InGaAs/InP异质结双极晶体管

研制成功了一种无微空气桥的亚微米InP基异质结双极晶体管(HBT).发展了小于100nm的发射极侧向腐蚀工艺,实现了亚微米的InP基HBT.发射极宽度的减小有效提高了频率特性,发射极面积为0.8μm×15μm的HBT的电流增益截止频率达到了238GHz.发展了基极-集电极的侧向过腐蚀工艺,有效减小了结面积,提高了最大振荡频率.Kirk电流密度达到了3.1mA/μm2.据我们所知,电流增益截止频率是目前国内三端器件中最高的,Kirk电流密度是国内报道的HBT中最高的.这对于HBT器件在超高速电路中的应用具有十分重要的意义.     

截止频率为238GHz的亚微米InGaAs/InP异质结双极晶体管

研制成功了一种无微空气桥的亚微米InP基异质结双极晶体管（HBT) . 发展了小于100nm的发射极侧向腐蚀工艺,实现了亚微米的InP基HBT. 发射极宽度的减小有效提高了频率特性,发射极面积为0.8μm×15μm的HBT的电流增益截止频率达到了238GHz. 发展了基极-集电极的侧向过腐蚀工艺,有效减小了结面积,提高了最大振荡频率. Kirk电流密度达到了3.1mA/μm2. 据我们所知,电流增益截止频率是目前国内三端器件中最高的,Kirk电流密度是国内报道的HBT中最高的. 这对于HBT器件在超高速电路中的应用具有十分重要的意义.     

SiN钝化对InGaAs/InP双异质结双极性晶体管直流性能的影响

研究了SiN钝化对InGaAs/InP双异质结双极性晶体管(DHBT)直流性能的影响。在不同温度和不同气体组分条件下淀积了SiN薄膜,并对钝化器件的性能进行了测量和比较。结果表明,低的淀积温度有利于减小淀积过程对器件的损伤;采用氮气(N_2)和硅烷(SiH_4)取代常用的氨气(NH_3)和硅烷(SiH_4)作为淀积SiN薄膜的反应气体,显著地减少了器件发射结(B-E)和集电结(B-C)泄漏电流。另外,与未钝化器件的直流性能相比,钝化后器件的电流增益增加,基区表面复合电流大幅减小,这对提高器件的可靠性至关重要。     

不同微空气桥结构的InP/InGaAs HBT

文章报道了几种具有不同微空气桥结构的InP HBT。由于微空气桥减小了寄生,发射极尺寸为2×12.5 um2 的InP/InGaAs HBT的截止频率和最大震荡频率都接近160GHz。论文将具有不同微空气桥结构的器件高频特性与传统InP HBT进行对比。对比表明,微空气结构明显降低了寄生,且双指微空气桥结构可以更有效的提高器件的射频特性。试验结果同时表明,微空气桥结构对于提高小尺寸发射极InP HBT的高频特性更有潜力。     

Ultra high-speed InP/InGaAs DHBTs with ft of 203 GHz

InP/InGaAs/InP double heterojunction bipolar transistors (DHBTs) were designed for wide band digital and analog circuits, and fabricated using a conventional mesa structure with benzocyclobutene (BCB) passivation and planarization process techniques. Our devices exhibit a maximum ft of 203 GHz, which is the highest ft for DHBTs in mainland China. The emitter size is 1.0×20 μm2. The DC current gain β is 166, and BVCEO=4.34 V. The devices reported here employ a 40 nm highly doped InGaAs base region and a 203 nm InGaAsP composite structure. They are suitable for high speed and intermediate power applications.     

Ultra high-speed InP/InGaAs SHBTs with ft and fmax of 185 GHz

An InP/InGaAs single heterojunction bipolar transistor(SHBT) with high maximum oscillation frequency (f_(max)) and high cutoff frequency(f_t) is reported.Efforts have been made to maximize f_(max) and f_t simultaneously including optimizing the epitaxial structure,base-collector mesa over-etching and base surface preparation.The measured f_t and f_(max) both reached 185 GHz with an emitter size of 1×20μm~2,which is the highest f_(max) for SHBTs in mainland China.The device is suitable for ultra-high spee...     

Ultra high-speed InP/InGaAs DHBTs with ft of 203 GHz

InP/InGaAs/InP double heterojunction bipolar transistors (DHBTs) were designed for wide band digital and analog circuits, and fabricated using a conventional mesa structure with benzocyclobutene (BCB) passivation and planarization process techniques. Our devices exhibit a maximum of 203 GHz, which is the highest for DHBTs in mainland China. The emitter size is 1.0*20 μm². The DC current gain b is 166, and BV_CEO = 4.34 V. The devices reported here employ a 40 nm highly doped InGaAs base region and a 203 nm InGaAsP composite structure. They are suitable for high speed and intermediate power applications.

     

An InGaAs/InP 40 GHz CML static frequency divider

Static frequency dividers are widely used as a circuit performance benchmark or figure-of-merit indicator to gauge a particular device technology’s ability to implement high speed digital and integrated high performance mixed-signal circuits.We report a 2:1 static frequency divider in InGaAs/InP heterojunction bipolar transistor technology.This is the first InP based digital integrated circuit ever reported on the mainland of China. The divider is implemented in differential current mode logic(CML) with 30 transistors.The circuit operated at a peak clock frequency of 40 GHz and dissipated 650 mW from a single -5 V supply.     

40GHz InGaAs/InP CML 结构静态分频器

Static frequency dividers are widely used as a circuit performance benchmark or figure-of-merit indicator to gauge a particular device technology's ability to implement high speed digital and integrated high performance mixed-signal circuits.We report a 2:1 static frequency divider in InGaAs/InP heterojunction bipolar transistor technology.This is the first InP based digital integrated circuit ever reported on the mainland of China. The divider is implemented in differential current mode logic(CML) with ...     

Ultra high-speed InP/InGaAs SHBTs with ft and fmax of 185 GHz

An InP/InGaAs single heterojunction bipolar transistor (SHBT) with high maximum oscillation frequency (f_max) and high cutoff frequency (f_t) is reported. Efforts have been made to maximize f_max and f_t simultaneously including optimizing the epitaxial structure, base–collector mesa over-etching and base surface preparation. The measured f_t and f_max both reached 185 GHz with an emitter size of 1 × 20 μ m², which is the highest f_max for SHBTs in mainland China. The device is suitable for ultra-high speed digital circuits and low power analog applications.