激光焊接过程中电磁场控制等离子体的研究

高功率CO2激光焊接过程中,小孔上方的等离子体会影响激光和工件之间的耦合效率.从分析外加电磁场对等离子体的作用出发,探讨了采用外加电磁场控制激光等离子体的可能性.实验结果表明,选择合适的外加电磁场参数,可以降低等离子体对激光的屏蔽效果,增大熔深.     

激光深熔焊接技术的研究与动向

随着激光器光束质量的改善和输出功率的提高,激光深熔焊接技术在激光加工和焊接领域的份额逐渐增加。对近期国内外激光深熔焊接领域的主要成果进行了概括和总结,讨论了激光深熔焊接的特点和局限性,同时也对激光深熔焊接技术在大功率激光器的开发、激光深熔焊接过程的稳定性、等离子体控制、外加辅助电磁场、激光电弧复合焊接技术等方面的主要研究特点进行了分析和讨论。结合科技发展趋势和激光焊接技术的特点,对激光深熔焊接技术的研究重点进行了讨论和展望。     

激光焊接等离子体电流产生机理及电磁场对其作用研究

理论分析表明,深孔中的等离子体向外喷出时,电子和正离子具有不同的热运动速度,电子速度约为正离子速度的50倍,从而在激光喷嘴和工件间形成一电位差.将喷嘴和工件短路则可产生一等离子体电流,其大小约为10-1 mA量级.在该回路中串联一外加电源,等离子体电流随外加电源电压增大呈线性增大.加入一垂直于激光束方向的磁场,则带电粒子受一侧向电磁力作用而被加速运动离开激光束. 实验采用焊接过程中提升喷嘴的方法,加入辅助电磁场进行焊接可使深熔焊焊缝长度增加,表明驱除熔池上方等离子体后激光效率获得提高.随激磁电流(磁场强度)增大,深熔焊长度增大.随外加电压(电场强度)增大,深熔焊长度在25V外加电压时,达到最大值,过低和过高的外加电压都减小深熔焊长度的增加量.(OE10)     

激光焊接时等离子体电流的产生及外加电磁场的作用

本文从等离子体吸收能量的理论入手，采用提升喷嘴的实验方法，系统研究了电磁场参数对等离子体控制的影响。研究结果表明，随磁场强度的加大，对等离子体的作用加强。而外加电压变化时，则存在一个最佳电压值，P＝1800W，V＝1m/min时，外加电压为25V时对等离子体作用最强。另外研究表明磁场正极性对等离子体有较明显的作用。     

等离子体正负电荷的分离——光对等离子体的扰动

原子法是同位素U~(235)、U~(238)分离的有效手段之一。利用激光的选择性激发可使U~(235)电离而U~(238)保持中性,形成U~(235)的稀薄等离子状态(电子密度10~8～10~(12)cm~(-3))。正负电荷的分离有两种基本方法,其一为磁场法,但U~(235)、U~(238)的能级差限制了外加磁场的大小(<300Gauss)。因此一般采用电场法。由于等离子体存在Debye屏壁效应,故而分离的第一步要破坏等离子体的稳定性。本文目的在于利用外界电磁场对等离子体进行扰动来研究其稳定性。     

激光等离子体和烧蚀对含能材料的激光点火过程的影响

通过测试激光点火的延迟时间、等离子体电荷通量和等离子体对激光的吸收能力，研究了激光等离子体和烧蚀对激光点火过程的影响。实验采用的含能材料为B／KNO3(m(B)：m(KNO3)=40：60)，外加5％的酚醛树脂，激光器为脉冲宽度为680μs的Nd：YAG固体激光器。实验结果表明等离子体密度随激光能量的提高而增大，而且激光等离子体的电荷通量大于燃烧流的电荷通量。当激光能量密度低于某一临界值时，点火延迟时间随激光能量密度的提高而线性变短，然而激光能量密度超过该临界值后，激光点火延迟时间保持恒定。在实验条件下，激光等离子体几乎不吸收入射的激光能量，但是点火延迟时间的变化规律表明了烧蚀会阻碍激光能量向含能材料注入。     

等离子体八木天线的仿真与实验研究

在传统八木天线理论基础上,设计了一款等离子体八木天线,通过CST软件仿真得到其S₁₁参数、辐射方向图,并根据软件仿真优化参数加工制作出等离子体八木天线原理样机,用高性能矢量网络分析仪对原理样机的S₁₁参数进行了测量。结果表明,当等离子体密度较高时,等离子体八木天线具有很好的定向性以及较高的增益,具有与金属天线可比拟的性能。     

日本在材料加工中使用激光器动态

据ICALEO'86会议录报导,日本钟表业使用5kW CO₂激光器制作表壳,特别是焊接表壳表面耐蚀合金,焊接性能良好.据说,用激光束焊接,如果降低周围气氛压力(惰性接氯),可抑制激光产生等离子体,从而有效地增加激光束的熔深,孔隙缩小.     

激光功率密度对自生磁场和电子热传导的影响

为了理解超强激光与等离子体相互作用中产生的自生磁场形成机制和电子热传导特性,采用相对论电磁粒子模拟程序,估算了不同激光功率密度下,在等离子体表面所形成的电磁不稳定性产生的自生磁场大小和空间分布,得到了超热电子和经典Spitzer-Harm理论描述的电子热流随激光功率密度的演化情形.结果表明,非Maxwell速度分布的等离子体,由于电子初始时刻的无规则热运动,在等离子体上激发电磁不稳定性,而不稳定性激发的强电磁场使电子束在非常短的距离内沉积能量,同时对在激光有质动力推开电子时形成的超热电子能量输运产生抑制作用.这一研究结果对更好理解惯性约束核聚变快点火过程中自生磁场的产生、电子热传导等方面有帮助的.     

表面波放电狭缝天线辐射电磁场的三维数值分析

针对平板型表面波放电等离子体源,建立了表面波放电狭缝天线辐射电磁波模型,对狭缝天线辐射电磁场分布进行了三维数值计算,并与表面波电磁场进行对比分析,讨论了平板型表面波放电机理。结果表明:整个狭缝天线阵激发的电磁场是每个狭缝天线激发电磁场的线性叠加;狭缝天线阵直接激发的电磁场强度在临近波导壁面处很大,并且随着空间距离的增大迅速衰减;狭缝天线阵直接激发和表面波的电场均远大于各自的磁场,分析电、磁场对带电粒子的力作用时可以忽略磁场力的作用;表面波电磁场远大于狭缝天线阵直接辐射的电磁场,强电磁场范围也远大于狭缝天线阵直接激发的强电磁场范围,等离子体有增强电磁场强度、扩大强电磁场范围的作用。     

Electromigration in sputtered copper film on plasma-treated hydrogen silsesquioxane dielectric

Electromigration (EM) damage is one of the major causes for the failure of interconnects. Plasma treatment, such as dry etching, is frequently employed in the fabrication of multilevel interconnection patterns. This work investigates the hydrogen silsesquioxane (HSQ) and copper integrated systems and the effect of H₂ plasma treatment on the EM of Cu. Hydrogen plasma bombardment induces a rough HSQ surface and results in a coarse morphology of the Cu film deposited on HSQ. The crystallographic texture of Cu is also affected by the plasma treatment. A decrease in the Cu I(111)/I(200) peak ratio is observed for a specimen treated with H₂ plasma. The activation energy for EM in Cu and the EM lifetime of the Cu interconnect decreases with an increased degree of plasma treatment. The activation energies obtained, ranging from 0.76 eV to 0.94 eV, suggest that the electromigration in copper proceeds via an interfacial diffusion path. Possible mechanisms for the effects of plasma treatment are explored. The rough surface and the retarded Cu (111) orientation induced by H₂ plasma bombardment are the major causes for the decrease of activation energy and EM lifetime.     

Time-dependent EM field characterization in pulsed lasers

The development of the EM field in pulsed solid-state lasers is analyzed with a two-dimensional fast-Fourier transform computational model. The model is designed to enable on-line characterization of the EM field starting from a randomly generated initial spontaneous field. The temporal variation of the laser beam quality together with the power spiking behavior is studied, showing sharp brightness peaks at the beginning of the free generated laser pulse. The instantaneous beam pattern is followed throughout the laser pulse duration. Some important characteristics of the formation of resonator modes are given and the influence of the mode competition on the formation of typical patterns in the integrated beam is analyzed. Intensity pattern oscillations which can be attributed to the previously observed vortex formation were clearly detected, showing well-defined oscillation frequencies of the local EM field, unrelated to transverse intermode beat frequencies. Experiments were carried out on an Er:YAG laser confirming the beam pattern formation and showing good agreement with the computational model     

特征值法模拟计算具有流动饱和增益介质激光器的光场(英文)

提出一种特征值方法用于计算具有流动饱和增益介质的气体激光器的光场分布情况.计算模型中,流动饱和增益介质等效为一个位于激光谐振腔内的大腔镜前面的薄增益片.基于这个模型,可以获得特征值法的传输矩阵.通过求解传输矩阵的特征值与特征向量,能够较容易地获得激光器谐振腔中所有可能存在的光场分布情况,通过比较它们的损耗参数能够获得激光器实际存在的光场分布.模拟计算结果显示:流动饱和增益介质对光场分布具有负面影响,它将导致光场分布沿着气体流动的方向倾斜.该方法的模拟计算结果能够与其它方法的模拟计算结果较好地吻合.     

Investigation for long wavelength fir laser lines for EPR studies: New lines from CH2=CF2

The results described in this work are part of a systematic search for long wavelength laser lines to be used in high magnetic field EPR applications and in plasma diagnostic. Four new far-infrared laser lines of CH₂ = CF₂ (1,1 difluoroethylene), optically pumped by a waveguide CO₂ laser, have been discovered and characterized in wavelength, polarization relative to the pumping radiation and offset relative to the CO₂ center frequency. New measurements of polarization and offset of 5 already known laser lines are also reported. A table of all of the known CO₂ pumped FIR laser lines from this molecule is given.     

Design and fabrication of a novel high damage threshold HfO2/TiO2/SiO2 multilayer laser mirror

This paper describes a new method to design a laser mirror with high reflectivity, wide reflection bandwidth and high laser-induced damage threshold. The mirror is constructed by three materials of HfO2/TiO2/SiO2 based on electric field and temperature field distribution characteristics of all-dielectric laser high reflector. TiO2/SiO2 stacks act as the high reflector (HR) and broaden the reflection bandwidth, while HfO2/SiO2 stacks are used for increasing the laser resistance. The HfO2/TiO2/SiO2 laser mirror with 34 layers is fabricated by a novel remote plasma sputtering deposition. The damage threshold of zero damage probability for the new mirror is up to 39.6 J/cm2 (1064 nm, 12 ns). The possible laser damage mechanism of the mirror is discussed.     

Electromagnetic Reflection from Conductive Plate Coated with Nonuniform Plasma

Based on the theories of electromagnetic (EM) field and generalized reflection coefficient, a simple method is put forward to deal with the EM reflection coefficient of conductive plate coated with nonuniform plasma. The plasma slab is modeled by a series of subslabs, in which the electron-number density is assumed to be constant. The overall number density profile across the whole slab follows any practical distribution function. The reflection coefficient is then deduced and its functional dependence on the number density, incident wave frequency, collision frequency, and background magnetic field is discussed.     

Transient plasma shielding effects during pulsed laser ablation of materials

The absorption of laser energy by the plasma during pulsed laser deposition of thin films has been analyzed theoretically. The amount of laser energy absorbed in the plasma termed as the “plasma shielding factor” is a function of the incident laser wavelength, and time dependent plasma dimensions and electron density. Due to time varying parameters, a quantitative analysis of the plasma absorption is difficult. A model which takes into account the absorption of laser energy by the plasma has been developed. In this model, the time-dependent plasma dimension is replaced by the time dependent ablation depth. Using simulated absorption coefficient values, the ablation characteristics of silicon and high T_c superconductors are computed and compared with experimental results. The plasma shielding factor was found to vary approximately linearly with absorbed laser energy. The calculations also showed that the plasma shielding was strongly dependent on the laser fluence but varies very weakly with the simulated plasma absorption coefficient values. Experimental results on plume shielding showed good agreement with the calculations.     

Multipolar laminated electromagnet for low-field magnetic resonanceimaging and electron paramagnetic resonance imaging

A cylindrical 16-pole electromagnet (EM) for electron paramagnetic resonance imaging (EPRI) and low-field magnetic resonance imaging (MRI) has been designed by means of two-dimensional and three-dimensional (3-D) finite element analysis (FEA). The use of an automatic procedure that combines FEA with a minimization routine allowed the optimization of the design, in order to improve the homogeneity along the axis of the EM. A prototype has been built by using electrical steel sheets that were cut by laser; this solution reduced significantly the manufacturing cost. The EM operates with a maximum flux density, in the bore, of 0.08 T and has a homogeneity along the axis of about 40 parts per million (ppm) in a spherical region 10 cm in diameter. It generates the main field and two of the three field gradients required in the 3-D image reconstruction. Good agreement was found between the results of simulation and the measured values     

Linear Theory of Free Electron Laser with a Plasma-Loaded Cylindrical Waveguide

The dispersion characteristics of plasma–loaded free-electron laser has been analyzed using linear fluid model. The device under consideration consists of the cylindrical metallic waveguide, completely filled with background plasma and a relativistic electron beam which passes through a helical wiggler magnetic field. The result predicts that reasonable plasma density tends to improve the growth rate of the low-frequency optical wave of FEL and causes an shiftup in the operating frequency, However it has little effect on the growth rate of the high-frequency wave. In the plasma–loaded FEL, for the FEL oscillator, it may be tuned by varying the plasma density; and for the FEL amplifier, the wider frequency bandwidth is gained. A critical density n ^c _p for the background plasma density is found.